Wafer-Scale Large-Area MOS2 Growth Furnace System

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
Diamond Member Since 2025

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Year of Establishment
2025-04-22
Registered Capital
1.48 Million USD
  • Wafer-Scale Large-Area MOS2 Growth Furnace System
  • Wafer-Scale Large-Area MOS2 Growth Furnace System
  • Wafer-Scale Large-Area MOS2 Growth Furnace System
  • Wafer-Scale Large-Area MOS2 Growth Furnace System
  • Wafer-Scale Large-Area MOS2 Growth Furnace System
  • Wafer-Scale Large-Area MOS2 Growth Furnace System
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

Wafer-Scale Large-Area MOS2 Growth Furnace System

Equipment Introduction

TheRJ150-XKtriumphs as a groundbreakingtubular diffusion/oxidation furnace,meticulously crafted for cutting-edge R&D applications, catering to the diverse needs of enterprises, prestigious universities, and renowned research institutes. This multifaceted equipment is engineered to support a wide spectrum of critical processes, encompassing:

  • Polysiliconandsilicon nitridedeposition

  • Diffusion

  • Oxidation

  • Annealing

Key Features:

  • Dynamic processing capabilitiesdesigned to lead pioneering material research to new heights

  • Precision temperature controlguarantees consistently superior and reliable results

  • Compact designengineered for flawless integration into laboratory settings
    Product Features:

    1. Masterfully accommodates a vast range of processes, such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and more.
    2. Incorporates a robust industrial computer + PLC system, providing fully automated oversight of furnace temperature, boat movement, gas flow, and valves, ensuring seamless process automation.
    3. Features an intuitive human-machine interface, enabling effortless adjustments to process controls and real-time monitoring of process status.
    4. Equipped with multiple process pipelines, offering users the convenience of a variety of selection options.
    5. Integrates advanced software features, including self-diagnostic tools, significantly reducing maintenance efforts.
    6. Offers automatic constant temperature zone adjustments and cascade control to ensure precise regulation of actual process temperatures within the reaction tube.
    7. Provides essential alarms and protective functions for scenarios like over-temperature, thermocouple breakage, short circuits, and deviations in process gas flow.
    8. Tailored product solutions available to meet specific customer needs.

Technical Specifications

Model KJ150-XK
Operating Temperature ≤1300ºC
Wafer Size 2~8 inches (round wafers)
Number of Process Tubes 1~2 tubes per unit
Constant Temperature Zone Length 300~600mm
Constant Temperature Zone Accuracy ≤±0.5ºC
Temperature Stability ≤±0.5ºC/24h
Temperature Ramp Rate Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min
Safety Alarms & Protections Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions

The **RJ-1200T-V50** is an avant-garde **vertical fluidized bed CVD system** precisely designed for **powder surface deposition experiments**. With its **openable design**, the furnace facilitates easy removal of the quartz tube and collection of processed particles after experimentation.

Inside the furnace tube, a **0.2mm porous quartz plate** (customizable pore sizes available) is strategically installed. Powder is placed on this porous plate, with gas being introduced from the **bottom of the tube**. As the gas penetrates the porous plate, it effectively **fluidizes the sample particles**, suspending them optimally within the heating zone for superior deposition results.

**Note:** During particle fluidization, excessive gas flow may cause **particles to escape the heating zone**. Thus, the gas flow rate must be finely adjusted based on **particle size** during experimentation.Wafer-Scale Large-Area MOS2 Growth Furnace System

Technical Specifications

Parameter Specification
Heating Zone Length 400mm
Furnace Tube Dimensions Diameter: 50mm, Length: 900mm
Furnace Tube Material High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Sensor Type N thermocouple
Temperature Control Intelligent 30-segment PID programmable microcomputer control with auto-tuning
Temperature Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple breakage protection
Heating Rate 0-20°C/min
Heating Element Alloy resistance wire
Operating Voltage AC220V, single-phase, 50Hz
Maximum Power 3KW
Furnace Chamber Material Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution
Flange Stainless steel vacuum flange, easy to disassemble
Sealing System O-ring compression seal between furnace tube and flange, reusable, high airtightness
Fluidization Zone 1. Reaction gas uniformly passes through the reaction zone.
2. Solid particles are fluidized by gas in the heating zone.
3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.
Note Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.
Shell Structure Double-layer shell with air-cooling system, openable design
Furnace Structure Vertical structure
Parameter Specification
Internal Temperature ≤45ºC
Measurement & Control Devices  
Name Dual-channel Mass Flow Controller (MFC)
Gas Channels 2 channels
Flow Control Digital display, each gas line with independent needle valve control
Connection Method Double ferrule fitting
Flow Meter Mass flow meter
Flow Range MFC1: N 0-10 SLM
MFC2: CO 0-10 SLM
Gas Mixing Equipped with a precision gas mixing chamber
Power Supply 220V, 50Hz
Operating Ambient Temp. 5ºC~45ºC
Standard Accessories Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,
high-temperature gloves ×1 pair, crucible hook ×1,
hex wrench for flange disassembly ×1, warranty card & manual ×1 set
Wafer-Scale Large-Area MOS2 Growth Furnace System

Equipment Introduction

The vertical dual-zone CVD system is comprised of the following advanced components:

  • Acutting-edge 1200°C dual-zone tube furnace

  • A3-channel mass flow controller (MFC) gas supply system,

  • Ahigh-efficiency 2L/s vacuum pumpaccompanied by comprehensive connecting components

This system is outfitted withdirectional and swivel castersat the base, ensuring a stable foundation and reliability.compact footprint and seamless mobility throughout your facility, allowing for easy integration and relocation..

Designed with precision forCVD processes, renowned for their efficiency and consistency,this cutting-edge system is perfect foruniversities, research centers, and industrial manufacturers seeking unparalleled performance.conducting advanced experiments and production processes involvingchemical vapor deposition, ensuring top-tier outcomes..

(Note: Meticulously structured to maintain clarity, technical precision, and natural English fluency.)

Fluidized Bed Tube Furnace Specifications: A Paradigm of Innovation

Parameter Specification
Maximum Temperature 1200°C
Operating Temperature ≤1100°C
Display LCD touch screen
Tube Diameter 40mm (OD)
Tube Material Custom high-purity quartz tube
Furnace Tube Length Approx. 1100mm (customizable)
Heating Element Premium heating wire
Heating Rate 0-10°C/min
Temperature Control - Programmable 30-segment time-temperature curves
- Touchscreen multi-segment PID control
- Data logging with Excel export capability
- Built-in over-temperature and thermocouple failure protection
Thermocouple Type N thermocouple
Sealing Method Custom stainless steel vacuum flange with sealing
Furnace Chamber - Double-layer steel shell with dual cooling fans
- Dual-zone vertical open structure for easy tube access
- Alumina refractory fiber lining for energy efficiency
Vacuum Flange Stainless steel vacuum flange with valve
Operating Voltage 220V, 50Hz
Power Rating 6KW (customizable)

Gas Delivery System: State-of-the-art 3-Channel Mass Flow Control System

Parameter Specification
Power Supply 220V/50Hz, maximum output 18W

Key Features: Unmatched Excellence

  1. Advanced touchscreen control interface with impeccable data recording capabilities

  2. Ingenious dual-zone vertical design, crafted for optimal thermal management and efficiency

  3. A comprehensive gas flow control system seamlessly integrated for superior performance

  4. Safety-centric design fortified with multiple protection features for peace of mind

  5. Tailor-made components adaptable to specific research needs, offering versatility and precision

Note: Specifications can be meticulously tailored to meet precise requirements. The system harmoniously fuses precise temperature control with an efficient gas delivery system, setting a new standard for CVD applications.

Parameter Specification
Maximum Pressure 3×10 Pa
Gas Channels Can simultaneously connect 3 gas sources to slightly positive pressure
Flow Meter Mass flow meter (other ranges optional)
Channel A Range 1 SLM
Channel B Range 1 SLM
Channel C Range 1 SLM
Gas Line Pressure -0.1 ~ 0.15 MPa
Accuracy ±1% F.S.
Shut-off Valve Stainless steel
Gas Line Tubing 1/4" stainless steel tube

Vacuum System Components: Engineered for Excellence

Component Specification
Vacuum Pump 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube
Vacuum Gauge Included (standard configuration)


Wafer-Scale Large-Area MOS2 Growth Furnace System

Primary Application: Unleashing Potential

This revolutionarydual-zone sliding-track CVD tube furnace, masterfully designed,features a cutting-edgerail-guided sliding design, enabling rapid and efficient thermal transitions.By horizontally sliding the furnace, it connects effortlessly tosix individual gas sources, offering unmatched versatility.Accurate flow measurement and control are realized through astate-of-the-art touchscreen 6-channel mass flow controller (MFC), ensuring precision..

Thishigh-temperature CVD system, meticulously crafted,is perfectly suited foruniversities, research institutions, and industrial manufacturers aiming to elevate their experiments and production processes.to facilitate experiments and production tailored to the nuances ofchemical vapor deposition (CVD), delivering exceptional outcomes..

Key Features: Innovation Redefined

  • Innovative sliding-track mechanism enabling swift and efficient thermal cyclingMulti-gas compatibility designed for versatility

  • Multi-gas compatibility (with 6 independent channels) offering comprehensive adaptabilityPrecision flow control achieved through an intuitive touchscreen MFC interface, enhancing usability

  • Precision flow control with user-friendly operationwith an intuitive touchscreen MFC interface designed for ease of use

  • Versatile utility, ideally suited for research and small-batch production initiativesfor research and small-batch production initiatives, unlocking new possibilities

    Parameter Specification
    Furnace Access Mode Swing-open design
    Furnace Movement Rail-guided horizontal sliding for rapid heating/cooling
    Chamber Material Alumina refractory fiber
    Heating Element Aluminum-containing heating wire
    Maximum Temperature 1200°C
    Operating Temperature ≤1100°C
    Heating Rate ≤20°C/min (Recommended: 15°C/min)
    Heating Zones Dual-zone
    Total Zone Length 200mm + 200mm
    Tube Material High-purity quartz
    Tube Diameter 60mm
    Sealing Method - Quick-release flange for material loading
    - Stainless steel vacuum flange with silicone seal
    Control System Multi-segment intelligent PID programming
    Temperature Sensor Type N thermocouple
    Safety Alarms Over-temperature & thermocouple failure alarms
    Power Supply 220V, 50Hz

    Gas Delivery System (KJ-6Z): Uncompromising Performance

    Parameter Specification
    Operating Temperature 5~45°C
    Maximum Pressure 3×10 Pa
    Gas Channels 6 independent gas inputs
    Flow Meter Type Mass flow meter (other ranges available at same cost)
    Channel A Range 0-300 SCCM
    Channel B Range 0-300 SCCM
    Channel C Range 0-300 SCCM
    Channel D Range 0-300 SCCM
    Channel E Range 0-300 SCCM
    Channel F Range 0-300 SCCM
    Line Pressure -0.1~0.15 MPa
    Valves Stainless steel shut-off valves
    Tubing Stainless steel

    Vacuum System: Precision and Reliability

    Component Specification
    Pump System Molecular pump unit with connecting pipes
    Power 220V/50Hz
    Mobility Wheel-mounted base for easy movement
    Ultimate Vacuum 6.67×10³ Pa

    Standard Accessories: Comprehensive and Complete

  • Quartz furnace tube (1), engineered for durability and reliability

  • Vacuum flange set (1), ensuring a robust and secure connection

  • Key Features: Excellence in Every Component

  • The unique sliding mechanism ensures rapid thermal cycling efficiency, achieving superior results

  • A six-channel precision gas control system, providing unmatched accuracy

  • Research-grade vacuum capability, pushing the boundaries of innovation

  • Complete turnkey solution equipped with all essential accessories for immediate implementation

  • Industrial-grade construction fortified with safety protections, built to last

  •  
  • Tube stoppers (2), designed for a perfect fit

  • O-ring seals, ensuring airtight integrity

  • Protective gloves (1 pair), prioritizing safety and convenience

  • Crucible hook (1)

  • PTFE tubing (3m)

  • Hex keys (2)

  • Operation manual
    Wafer-Scale Large-Area MOS2 Growth Furnace System

    This sophisticated system is meticulously engineered forcutting-edge CVD processes, including:

  • Precision silicon carbide coating

  • Conductivity evaluations of ceramic substrates

  • Innovative 2D material growth

  • Controlled development of ZnO nanostructures

  • Atmosphere sintering of multilayer ceramic capacitors (MLCC)

  • Additionally, it functions as astate-of-the-art graphene film growth furnacefor the preparation of superior-quality graphene. The furnace is enhanced with astrategic sliding rail base design, facilitating effortless manual lateral movement that allows exposure of the tube to room temperature, ensuringswift cooling.

    This advanced equipment is exceptionally suited forCVD experiments necessitating rapid heating and cooling rates, making it an outstanding choice for:

  • Efficient and high-yield graphene synthesis

  • Other demanding CVD applications that benefit from rapid thermal cycling

  • Key Advantages:
    Unparalleled precision in temperature controlfor delicate and sensitive material growth
    Exclusive sliding mechanismenables significantly faster processing times
    Broad versatility for diverse applicationsacross the landscape of advanced material research
    Optimized seamlessly for both graphene-centric and general CVD processes

    Sliding Rail Tube Furnace Specifications

    Furnace Section

    Parameter Specification
    Furnace Structure Sliding rail design
    Maximum Temperature 1200°C
    Continuous Operating Temperature ≤1100°C
    Heating Rate Up to 20°C/min (Recommended: 10°C/min)
    Heating Zone Length 300mm (Single zone)
    Heating Element Phase-resistant heating wire
    Thermocouple Type K
    Temperature Accuracy ±1°C
    Tube Diameter Options Φ50, Φ60, Φ80
    Tube Material High-purity quartz
    Temperature Controller PID intelligent program control
    Vacuum Flange 304 stainless steel
    - Left flange: Equipped with needle valve + ball valve
    - Right flange: KF25 interface with baffle valve

    Power Supply
    | Input Power | Single-phase 220V, 50Hz, 3KW |

    Vacuum System

    Component Specification
    Rotary Vane Pump with Digital Gauge - Ultimate vacuum: 10³ Torr
    - Tube vacuum: 10² Torr
    - Pumping speed: 4CFM (2L/s, 120L/min)
    - Options: Rotary vane pump/diffusion pump/molecular pump available

    Mass Flow Controller System

    Parameter Specification
    Channels 3-channel high precision MFC
    Flow Range MF1-MF3: 50-1000sccm adjustable
    Features - Mixing chamber at bottom
    - 3 manual stainless steel needle valves

    Important Notes

    Warning Description
    Pressure Limit Tube pressure must not exceed 0.02MPa
    Gas Cylinder Safety Must use pressure reducer (0.01-0.1MPa recommended)
    High Temp Operation Above 1000°C: Maintain atmospheric pressure
    Gas Flow Limit <200SCCM to protect quartz tube
    Quartz Tube Limit Continuous use <1100°C
    Valve Warning Never close both valves during heating

    Certifications
    | ISO Certification | CE Certification |

    Safety Precautions:

  • Avoid opening the furnace chamber when temperature ≥200°Cto prevent risk of personal injury.

  • Ensure tube pressure never surpasses 0.02MPa (absolute pressure)to prevent damage to the equipment from overpressure.

  • Warning:Neglecting these precautions may lead to:

  • Severe personal injury

  • Potential equipment damage

  • Significant safety hazards

  •  
  • When the furnace temperature exceeds 1000°C, ensure the tube is not under vacuum- maintain atmospheric pressure within the tube.

  • Avoid simultaneously closing both inlet and outlet valves while heating the sample.If it becomes necessary to close the valves:

    • Continuously monitor pressure gauge readings diligently

    • Promptly open the exhaust valve if absolute pressure exceeds 0.02MPa

    • to avert hazardous situations such as tube rupture, flange ejection, etc.
      Wafer-Scale Large-Area MOS2 Growth Furnace System
      Equipment Application & Features

      This high-performance, high-temperature CVD tube furnace is expertly designed for chemical vapor deposition (CVD) processes, including:

      Silicon carbide (SiC) coating

      Conductivity testing of ceramic substrates

      Controlled growth of ZnO nanostructures

      Atmosphere sintering of ceramic capacitors (MLCC)

      Primary Users:
      Our esteemed clientele includes prestigious universities, cutting-edge research institutions, and leading industrial manufacturers who are engaged in advanced vapor deposition experiments and production processes, consistently pushing the boundaries of innovation and development.

      Key Specifications:

      Crafted with precision, the Alumina (AlO) furnace tube is engineered to withstand astonishing temperatures soaring up to 1600°C, ensuring resilience and durability in extreme conditions.

      Designed with versatility in mind, the system's vacuum & atmosphere-capable configuration offers exceptional adaptability for diverse operational needs.

      The heating element is composed of state-of-the-art MoSi (molybdenum disilicide), delivering stellar performance and unmatched reliability.

      Encased in ceramic fiber insulation, the furnace chamber guarantees excellent thermal uniformity and remarkable energy efficiency, optimizing operational excellence.

      Advantages:
      Unparalleled in precision, this system maintains high temperature stability with a remarkable accuracy of ±1°C, ensuring consistent and reliable results.
      Experience rapid heating and cooling phases with superior heat retention capabilities, streamlining your process cycles and enhancing productivity.
      Engineered for safety and ease, our system offers a user-friendly interface designed for safe operation, minimizing risks while maximizing user satisfaction.
      This equipment serves as a versatile powerhouse, perfectly suited for advanced materials research and pushing the frontier of scientific exploration.

      Parameter Specification
      Maximum Temperature 1700°C
      Operating Temperature 1600°C
      Display LED Screen
      Tube Diameter 80mm (OD)
      Tube Material Alumina Tube
      Heating Zone Length 220+220+220mm (with gaps between zones)
      Heating Element MoSi (Molybdenum Disilicide)
      Heating Rate 0-5°C/min
      Temperature Control - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor
      - 30 programmable segments for ramp/soak control
      - Built-in PID auto-tuning with over-temperature & thermocouple failure protection
      - Over-temperature alarm allows unattended operation
      Thermocouples 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)
      Temperature Accuracy ±1°C
      Furnace Structure - Double-layer steel shell with dual cooling fans (surface temp <60°C)
      - Fixed non-openable furnace design
      Vacuum Flange Stainless steel vacuum flange with valve
      Operating Voltage 220V 50Hz
      Maximum Power 6kW

      Gas Delivery System

      Component Specification
      4-Channel Mass Flow Controllers - MFC1: 0-100sccm
      - MFC2: 0-200sccm
      - MFC3: 0-500sccm
      - MFC4: 0-200sccm
      Gas Mixing - Bottom-mounted mixing chamber with liquid release valve
      - 4 manual stainless steel needle valves for gas control

      Vacuum System

      Component Specification
      Vacuum Pump + Gauge Rotary vane pump achieves 10Pa vacuum (cooled state)

      Key Features:

    • With an impressive capability to achieve ultra-high temperatures of 1700°C, bolstered by MoSi heating elements, our system sets new standards in thermal performance.

    • Benefit from precision multi-zone temperature control with an exceptional accuracy of ±1°C, allowing intricate thermal management and optimization.

    • Customizable programmable 30-segment thermal profiles provide flexibility and control, enabling you to tailor your processes with finesse.

    • Our complete gas mixing system is equipped with 4-channel MFCs, facilitating precise and efficient gas delivery for optimal process conditions.

    • Delivering industrial-grade vacuum performance, our system ensures peak operational efficiency and reliability under the most demanding conditions.

      Safety Precautions:

    • It is paramount to avoid opening the furnace chamber when the temperature is ≥200°C to ensure operator safety and prevent potential hazards.to prevent personal injury.

    • The tube pressure must be vigilantly monitored to ensure it never exceeds 0.02MPa (absolute pressure) during operation to avert equipment damage due to overpressure.during operation to avoid equipment damage from overpressure.

    • Warning:Failure to adhere to these safety precautions can lead to:

    • serious personal injury,

    • equipment damage,

    • or safety hazards, underscoring the importance of strict compliance with operational guidelines.

    •  
    • When the furnace temperature exceeds 1000°C, it is critical to maintain atmospheric pressure inside the tube, as vacuum conditions are prohibited to safeguard the equipment's integrity.- maintain atmospheric pressure inside the tube.

    • Avoid closing both inlet and outlet valves simultaneously during sample heating to prevent adverse conditions.If valves must be closed:

      • It is crucial to consistently and attentively monitor the pressure gauge readings, ensuring precision and safety at every step.

      • Should the absolute pressure exceed 0.02MPa, swiftly open the exhaust valve as a preemptive action to avert potential hazards such as tube rupture or flange ejection.

      • Effectively prevents hazardous scenarios, including tube rupture and flange ejection, among others.
        Wafer-Scale Large-Area MOS2 Growth Furnace System

        Equipment Description

        This sophisticated system integrates seamlessly:

      • an advanced gas flow control system,

      • a robust liquid injection system,

      • multi-stage temperature-controlled growth zones for precision applications,

      • and a reliable water cooling system for enhanced operational stability.

      • CNT Growth Furnace Specifications:

      • Capable of reaching a peak operating temperature of 1400°C, this furnace provides continuously adjustable parameters from 0 to 1400°C, catering to diverse application needs.1400°C (continuously adjustable from 0-1400°C)

      • Featuring a vertical thermal field distribution,withdual-zone temperature control for precise thermal management,

      • the top-mounted liquid injection portis enhanced with flow guide components, ensuring optimal material deposition.

      • ThisState-of-the-art CNT/thin-film CVD equipmentenables:
        seamless, uninterrupted growth processes,
        precise thermal managementfor controlled nanostructure synthesis,
        and integrated liquid/gas phase deliveryfor sophisticated material deposition, setting a new standard in material science engineering.

      • Introducing the pinnacle of precision and innovation: Carbon Nanotube (CNT) Synthesis Components. Designed to elevate your research and development processes to new heights.

        Technical Specifications - Immerse yourself in a world of unmatched precision with our Carbon Nanotube/Nanowire CVD Growth Furnace, your gateway to pioneering innovations.

        Parameter Specification
        Equipment Name Carbon Nanotube/Nanowire CVD Growth Furnace
        Model KJ-T1400V
        Furnace Structure Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness
        Maximum Power 20KW
        Voltage AC 220V single-phase, 50/60Hz
        Heating Element Silicon carbide (SiC) rods
        Max Operating Temp 1400°C
        Continuous Working Temp Adjustable between 100-1400°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Alumina tube: OD 80mm × Length 1500mm
        Heating Zone Length 700mm + 400mm
        Uniform Temp Zone Length 800mm (±1°C)
        Thermocouple SEI thermocouple for temperature measurement and control
        Temperature Control System 30-segment PID programmable control
        Temperature Accuracy ±1°C

        Crafted with excellence: Stainless Steel Flange, ensuring durability and peak performance in every application.
        Transform your setup with our comprehensive system, featuring the robust stainless steel vacuum flange assembly, premium stainless steel needle valves, and a mechanical pressure gauge. The armored flange facilitates seamless thermocouple extensions to the inlet, providing precise temperature monitoring for optimal results.

        Key Features that distinguish us:

      • Achieve unparalleled purity with our High-purity alumina tube, meticulously designed for contamination-free growth processes.

      • Precision at its finest: Experience temperature control within an impressive ±1°C over an extensive 800mm uniform zone, ensuring consistent results every time.

      • Note: Specifications are subject to technical verification. This furnace is crafted for advanced nanomaterial synthesis under rigorously controlled atmospheres.

      • Empower your operations with Robust SiC heating elements, meticulously engineered for ultra-high temperature functionality.

      • Benefit from our Complete gas/vacuum interface, offering comprehensive measurement capabilities for proactive process management.
        Wafer-Scale Large-Area MOS2 Growth Furnace System

        A Preview of Our Equipment:

        The pinnacle of technological advancement:LCD Touchscreen CVD High-Temperature Furnacestands as atube furnacemeticulously engineered forCVD processesand equipped with features such as:

      • Double-layer shell structurecomplemented by anefficient air-cooling systemto maintain surface temperatures below55°C

      • A sophisticated 30-segment PID programmable intelligent temperature control system that brings unparalleled precision to your operation, ensuring optimal thermal conditions with ease.integrated withphase-angle firing technology, this setup provides flawless temperature management.for precise heating solutions that cater to your most demanding specifications, offering both reliability and excellence.

      • Alumina polycrystalline fiber chamber lining marvelously designedensuringexceptional thermal insulation that withstands high heat while offering maximum efficiency,andconsistent uniform temperature distribution, crucial for maintaining homogeneity in your project outcomes.

      • Applications that redefine possibilities: Discover new horizons with our innovative solutions,
        Advanced Silicon carbide (SiC) coating techniques ensuring robust and enduring finishes,
        Conductivity testing tailored for ceramic substrates that demand precision,
        Controlled and innovative growth of ZnO nanostructures, setting new standards in material science,
        Atmosphere sintering processes for ceramic capacitors (MLCC), elevating product performance to new heights.

        Key Advantages that empower: Unleash the full potential of your projects with these exceptional benefits,

      • Intuitive and User-friendly touchscreen interface, making complex operations straightforward and accessible for all users,

      • Cutting-edge Energy-efficient thermal design that conserves resources while maximizing output,

      • Unmatched research-grade temperature uniformity, a vital asset for precision-driven tasks,

      • Versatility for pioneering advanced material processing, providing the flexibility needed to innovate without bounds.

      •  
      • Fully automated operation,offeringunmatched unattended capability, allowing for continuous operation without constant supervision.

        High-Temperature Furnace Specifications that impress: Experience excellence in every detail,

        Parameter Specification
        Furnace Structure Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness
        Maximum Power 5KW
        Voltage AC 220V single-phase, 50Hz
        Heating Element Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)
        Max Operating Temp 1200°C
        Continuous Working Temp 1100°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Quartz tube: OD 80mm × Length 1000mm
        Heating Zone Length Total 440mm
        Uniform Temp Zone Length 150mm (±1°C)
        Control Interface LCD touch screen
        Thermocouple Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen
        Temperature Control 30-segment PID programmable control
        Temperature Accuracy ±1°C
        Vacuum Sealing System Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)
        High Vacuum System - Control panel for molecular pump speed/vacuum level monitoring
        - Turbo molecular pump + dry scroll pump
        - All KF-25 standard connections between pumps and quartz tube
        Vacuum Level 6.7×10³ Pa (empty chamber, room temperature)
        Gas Delivery System Three mass flow controllers with ranges:
        • Channel 1: 1-100 sccm
        • Channel 2: 1-200 sccm
        • Channel 3: 1-500 sccm

        Key Features that define excellence: Our product stands out with a combination of superior features,

      • An Ultra-clean alumina-coated chamberideal for contamination-sensitive processes, ensuring purity and precision in every task.

      • Precision 3-zone temperature monitoringmaintained within (±1°C) for impeccable accuracy, providing the reliability you can trust.

      • Top-tier Research-grade vacuum capability,achieving pressures down to 10³ Pa, a benchmark for high-quality atmospheric control.

      • Comprehensive gas flow controlfacilitated by triple MFC channels, ensuring precise and adaptable gas management.

      • Industrial-grade components crafted for durability and resilience,boasting extended durability for all your needs, providing lasting value and performance.

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