Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
Diamond Member Since 2025

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Year of Establishment
2025-04-22
Registered Capital
1.48 Million USD
  • Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition
  • Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition
  • Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition
  • Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition
  • Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition
  • Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition

Equipment Introduction

The RJ150-XK is an impressive tubular diffusion/oxidation furnace specifically engineered for R&D applications across enterprises, universities, and research institutes. It adeptly supports a diverse range of processes, including:

  • Polysilicon and silicon nitride deposition

  • Diffusion

  • Oxidation

  • Annealing

Key Features:

  • Versatile processing capabilities perfect for cutting-edge material research

  • Precision temperature control mechanisms ensuring consistent and reliable results

  • Compact design tailored for optimized lab environments
    Product Features:

    1. Proficient in handling a wide array of processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and beyond.
    2. Employs a robust industrial computer + PLC system for seamless automation of furnace temperature, boat movement, gas flow, and valves, facilitating fully automated process control.
    3. Boasts an intuitive human-machine interface, permitting effortless modification of control parameters and real-time observation of multiple process statuses.
    4. Provides numerous process pipelines for user-friendly selection.
    5. Comes equipped with comprehensive software capabilities, including self-diagnostic tools designed to significantly minimize maintenance time.
    6. Features automatic adjustments for the constant temperature zone and cascade control for precise temperature regulation within the reaction tube.
    7. Includes sophisticated alarms and protective functions against over-temperature, thermocouple breakage and short circuits, as well as deviations in process gas flow.
    8. Offers customizable configurations to align with specific customer requirements.

Technical Specifications

Model KJ150-XK
Operating Temperature ≤1300ºC
Wafer Size 2~8 inches (round wafers)
Number of Process Tubes 1~2 tubes per unit
Constant Temperature Zone Length 300~600mm
Constant Temperature Zone Accuracy ≤±0.5ºC
Temperature Stability ≤±0.5ºC/24h
Temperature Ramp Rate Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min
Safety Alarms & Protections Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions

The **RJ-1200T-V50** is a state-of-the-art **vertical fluidized bed CVD system**, meticulously crafted for **powder surface deposition experiments**. Its innovative **openable design** permits the furnace body to be opened post-experiment, allowing for easy removal of the quartz tube and retrieval of processed particles.

Within the furnace tube lies a **0.2mm porous quartz plate** (with customizable pore sizes). Powder is placed atop this porous plate, with gas introduced from the **bottom of the tube**. As the gas navigates through the porous plate, it **fluidizes the sample particles**, suspending them within the heating zone for effective deposition.

**Note:** During particle fluidization, excessive gas flow might cause particles to **escape the heating zone**. Hence, it is crucial to adjust the gas flow rate in accordance with the **particle size** during experimental procedures.Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition

Technical Specifications

Parameter Specification
Heating Zone Length 400mm
Furnace Tube Dimensions Diameter: 50mm, Length: 900mm
Furnace Tube Material High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Sensor Type N thermocouple
Temperature Control Intelligent 30-segment PID programmable microcomputer control with auto-tuning
Temperature Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple breakage protection
Heating Rate 0-20°C/min
Heating Element Alloy resistance wire
Operating Voltage AC220V, single-phase, 50Hz
Maximum Power 3KW
Furnace Chamber Material Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution
Flange Stainless steel vacuum flange, easy to disassemble
Sealing System O-ring compression seal between furnace tube and flange, reusable, high airtightness
Fluidization Zone 1. Reaction gas uniformly passes through the reaction zone.
2. Solid particles are fluidized by gas in the heating zone.
3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.
Note Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.
Shell Structure Double-layer shell with air-cooling system, openable design
Furnace Structure Vertical structure
Parameter Specification
Internal Temperature ≤45ºC
Measurement & Control Devices  
Name Dual-channel Mass Flow Controller (MFC)
Gas Channels 2 channels
Flow Control Digital display, each gas line with independent needle valve control
Connection Method Double ferrule fitting
Flow Meter Mass flow meter
Flow Range MFC1: N 0-10 SLM
MFC2: CO 0-10 SLM
Gas Mixing Equipped with a precision gas mixing chamber
Power Supply 220V, 50Hz
Operating Ambient Temp. 5ºC~45ºC
Standard Accessories Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,
high-temperature gloves ×1 pair, crucible hook ×1,
hex wrench for flange disassembly ×1, warranty card & manual ×1 set
Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition

Equipment Introduction

The pioneering vertical dual-zone CVD system primarily comprises:

  • A high-performance 1200°C dual-zone tube furnace

  • A sophisticated 3-channel mass flow controller (MFC) gas supply system

  • A powerful 2L/s vacuum pump complemented by related connecting components

The system is adeptly equipped with directional and swivel casters at its base, ensuring a compact footprint combined with flexible mobility.

Crafted meticulously for precision and reliability, the most advanced CVD processes, this state-of-the-art system is perfectly suited for leading universities, pioneering research centers, and top industrial manufacturers to perform groundbreaking experiments and high-quality production involving cutting-edge chemical vapor deposition techniques.

(Note: Presented with structured clarity, ensuring technical precision and a seamless English narrative.)

Fluidized Bed Tube Furnace: Specifications at a Glance

Parameter Specification
Maximum Temperature 1200°C
Operating Temperature ≤1100°C
Display LCD touch screen
Tube Diameter 40mm (OD)
Tube Material Custom high-purity quartz tube
Furnace Tube Length Approx. 1100mm (customizable)
Heating Element Premium heating wire
Heating Rate 0-10°C/min
Temperature Control - Programmable 30-segment time-temperature curves
- Touchscreen multi-segment PID control
- Data logging with Excel export capability
- Built-in over-temperature and thermocouple failure protection
Thermocouple Type N thermocouple
Sealing Method Custom stainless steel vacuum flange with sealing
Furnace Chamber - Double-layer steel shell with dual cooling fans
- Dual-zone vertical open structure for easy tube access
- Alumina refractory fiber lining for energy efficiency
Vacuum Flange Stainless steel vacuum flange with valve
Operating Voltage 220V, 50Hz
Power Rating 6KW (customizable)

Gas Delivery System: A sophisticated 3-Channel Mass Flow Control System ensures precision.

Parameter Specification
Power Supply 220V/50Hz, maximum output 18W

Key Features that Set Us Apart:

  1. User-friendly advanced touchscreen control equipped with comprehensive data recording capabilities

  2. Ingenious dual-zone vertical design crafted for optimal thermal regulation

  3. A fully integrated and complete gas flow control system comes as standard

  4. A design focused on safety, offering multiple layers of protection features

  5. Customizable components tailored to meet specific and unique research demands

Note: Specifications are adaptable to your precise requirements. This system seamlessly marries precision temperature control with highly efficient gas delivery, perfect for advanced CVD applications.

Parameter Specification
Maximum Pressure 3×10 Pa
Gas Channels Can simultaneously connect 3 gas sources to slightly positive pressure
Flow Meter Mass flow meter (other ranges optional)
Channel A Range 1 SLM
Channel B Range 1 SLM
Channel C Range 1 SLM
Gas Line Pressure -0.1 ~ 0.15 MPa
Accuracy ±1% F.S.
Shut-off Valve Stainless steel
Gas Line Tubing 1/4" stainless steel tube

Vacuum System Components: Engineered for Excellence

Component Specification
Vacuum Pump 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube
Vacuum Gauge Included (standard configuration)


Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition

Primary Application: Unmatched in Versatility

This cutting-edge dual-zone sliding-track CVD tube furnace boasts a sophisticated rail-guided sliding design, enabling rapid and efficient heating and cooling of materials by moving the furnace horizontally. It offers connection to six distinct gas sources, with a seamless flow measurement and control experience through a touchscreen-operated 6-channel mass flow controller (MFC).

This high-performance high-temperature CVD system is meticulously designed for renowned universities, innovative research institutions, and leading industrial manufacturers to execute advanced experiments and high-tech production related to sophisticated chemical vapor deposition (CVD) processes.

Key Features: Unmatched in Innovation

  • Ingenious Sliding-track mechanism ensures rapid thermal cycling and efficiency

  • Exceptional Multi-gas compatibility (6 independent, expertly controlled channels)

  • Precision flow control achieved with an intuitive touchscreen MFC interface

  • Versatile applications abound in groundbreaking research and small-batch, high-quality production

    Parameter Specification
    Furnace Access Mode Swing-open design
    Furnace Movement Rail-guided horizontal sliding for rapid heating/cooling
    Chamber Material Alumina refractory fiber
    Heating Element Aluminum-containing heating wire
    Maximum Temperature 1200°C
    Operating Temperature ≤1100°C
    Heating Rate ≤20°C/min (Recommended: 15°C/min)
    Heating Zones Dual-zone
    Total Zone Length 200mm + 200mm
    Tube Material High-purity quartz
    Tube Diameter 60mm
    Sealing Method - Quick-release flange for material loading
    - Stainless steel vacuum flange with silicone seal
    Control System Multi-segment intelligent PID programming
    Temperature Sensor Type N thermocouple
    Safety Alarms Over-temperature & thermocouple failure alarms
    Power Supply 220V, 50Hz

    Gas Delivery System (KJ-6Z): Precision Beyond Compare

    Parameter Specification
    Operating Temperature 5~45°C
    Maximum Pressure 3×10 Pa
    Gas Channels 6 independent gas inputs
    Flow Meter Type Mass flow meter (other ranges available at same cost)
    Channel A Range 0-300 SCCM
    Channel B Range 0-300 SCCM
    Channel C Range 0-300 SCCM
    Channel D Range 0-300 SCCM
    Channel E Range 0-300 SCCM
    Channel F Range 0-300 SCCM
    Line Pressure -0.1~0.15 MPa
    Valves Stainless steel shut-off valves
    Tubing Stainless steel

    Vacuum System: A Benchmark of Excellence

    Component Specification
    Pump System Molecular pump unit with connecting pipes
    Power 220V/50Hz
    Mobility Wheel-mounted base for easy movement
    Ultimate Vacuum 6.67×10³ Pa

    Standard Accessories: Included for Your Convenience

  • Quartz furnace tube (1): Robust and Reliable

  • Vacuum flange set (1): Essential and Efficient

  • Key Features: Exceeding Expectations

  • Unique sliding mechanism that enables swift and effective thermal cycling

  • Advanced six-channel precision gas control system

  • Research-grade vacuum capabilities ensure optimal performance

  • Complete turnkey solution featuring all necessary accessories

  • Industrial-grade construction reinforced with comprehensive safety protections

  •  
  • Tube stoppers (2): Promoting Safety and Efficiency

  • O-ring seals: Ensuring Integrity

  • Protective gloves (1 pair): Safety First

  • Crucible hook (1): Convenience in Handling

  • PTFE tubing (3m): High-Quality and Durable

  • Hex keys (2): Essential Tools

  • Operation manual: Comprehensive and User-Friendly
    Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition

    This system is ingeniously designed for CVD Processes: Harness the cutting-edge capabilities of our state-of-the-art equipment specifically designed to revolutionize chemical vapor deposition (CVD) processes.Applications include a diverse range of advanced material growth techniques, such as:

  • Silicon Carbide Coating: Achieve unparalleled surface protection with our precision-driven silicon carbide coating process.

  • Conductivity Testing of Ceramic Substrates: Ensure optimal conductivity and performance with our rigorous testing methodologies for ceramic substrates.

  • 2D Material Growth: Expand the horizons of material science with our sophisticated methods for the growth of two-dimensional materials.

  • Controlled Growth of ZnO Nanostructures: Master the art of nanotechnology with our precise ZnO nanostructure growth techniques.

  • Atmosphere Sintering of Ceramic Capacitors (MLCC): Achieve superior electrical performance in multilayer ceramic capacitors with our atmosphere sintering expertise.

  • It also serves as an exceptional platform for specialized applications, acting as a dedicated graphene film growth furnace. For graphene preparation, the furnace boasts a pioneering Sliding Rail Base Design: This innovative feature providesmanual lateral movement, enabling the tube's exposure to room temperature for swift, efficient rapid cooling.This attribute ensures your processes maintain momentum.

    This equipment is particularly engineered for excellence in CVD experiments necessitating expedited heating and cooling rates,making it the preferred choice for:

  • High-Efficiency Graphene Synthesis: Propel your graphene production to new heights with unmatched efficiency.

  • Other CVD Applications: Ideal for any scenario requiring rapid thermal cycling, ensuring versatility in your research endeavors.

  • Key Advantages: Discover the incredible benefits of our advanced system, including:
    Precision Temperature Control: Meticulously manage temperature for the sensitive growth of materials. This ensures optimal results tailored to your specific needs.
    Unique Sliding Mechanism: A breakthrough in processing speed, this mechanism accelerates your workflows to deliver faster, consistent outcomes.
    Versatile Applications: Seamlessly apply our furnace's capabilities across diverse fields, supporting cutting-edge research in advanced materials.
    Optimized for both graphene and general CVD processes, amplifying productivity and innovation.

    Sliding Rail Tube Furnace Specifications: Detailed specifications outline the technical prowess of our system.

    Furnace Section: Explore the core of our furnace, engineered for excellence.

    Parameter Specification
    Furnace Structure Sliding rail design
    Maximum Temperature 1200°C
    Continuous Operating Temperature ≤1100°C
    Heating Rate Up to 20°C/min (Recommended: 10°C/min)
    Heating Zone Length 300mm (Single zone)
    Heating Element Phase-resistant heating wire
    Thermocouple Type K
    Temperature Accuracy ±1°C
    Tube Diameter Options Φ50, Φ60, Φ80
    Tube Material High-purity quartz
    Temperature Controller PID intelligent program control
    Vacuum Flange 304 stainless steel
    - Left flange: Equipped with needle valve + ball valve
    - Right flange: KF25 interface with baffle valve

    Power Supply: Empower your operations with reliable energy solutions.
    | Input Power | Single-phase 220V, 50Hz, 3KW | The backbone of our system's robust power management.

    Vacuum System: Ensure a controlled environment with our advanced vacuum technology.

    Component Specification
    Rotary Vane Pump with Digital Gauge - Ultimate vacuum: 10³ Torr
    - Tube vacuum: 10² Torr
    - Pumping speed: 4CFM (2L/s, 120L/min)
    - Options: Rotary vane pump/diffusion pump/molecular pump available

    Mass Flow Controller System: Sophisticated control of gas flow for precise experimental conditions.

    Parameter Specification
    Channels 3-channel high precision MFC
    Flow Range MF1-MF3: 50-1000sccm adjustable
    Features - Mixing chamber at bottom
    - 3 manual stainless steel needle valves

    Important Notes: Stay informed with crucial operational guidelines and safety protocols.

    Warning Description
    Pressure Limit Tube pressure must not exceed 0.02MPa
    Gas Cylinder Safety Must use pressure reducer (0.01-0.1MPa recommended)
    High Temp Operation Above 1000°C: Maintain atmospheric pressure
    Gas Flow Limit <200SCCM to protect quartz tube
    Quartz Tube Limit Continuous use <1100°C
    Valve Warning Never close both valves during heating

    Certifications: Our commitment to quality and safety is evidenced by our certifications:
    | ISO Certification | CE Certification | Stands as a testament to our adherence to international standards.

    Safety Precautions: Safeguard your team and equipment by adhering to our comprehensive safety measures:

  • Do not open the furnace chamber when the temperature exceeds 200°C, ensuring operator safety. This prevents personal injury by maintaining operational safety standards.

  • Avoid tube pressure exceeding 0.02MPa (absolute pressure) to prevent equipment damage, ensuring longevity and reliability of the system during high-pressure operations.

  • Warning: Strict compliance with safety measures is mandatory to avoid risks. Failure to follow these precautions may result in severe consequences, such as:

  • Serious personal injury, necessitating utmost care and attention.

  • Equipment damage, potentially compromising the integrity of your work.

  • Safety hazards, which can be mitigated through vigilant adherence to guidelines.

  •  
  • When furnace temperature exceeds 1000°C, avoid vacuum conditions by maintaining atmospheric pressure inside the tube, ensuring safe and stable operational conditions for high-temperature processes.

  • Avoid closing both inlet and outlet valves simultaneously during sample heating. If valve closure is unavoidable, take immediate action by:

    • Continuously monitoring pressure gauge readings,

    • Opening the exhaust valve immediately if pressure surpasses 0.02MPa,

    • thereby preventing dangerous situations such as tube rupture or flange ejection.
      Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition
      Equipment Application & Features: Engineered for the pinnacle of CVD processes,

      This high-temperature CVD tube furnace, designed for comprehensive chemical vapor deposition (CVD) processes, includes:

      Silicon Carbide (SiC) Coating: Delivering robust surface enhancements.

      Conductivity Testing of Ceramic Substrates: Unmatched precision in performance analysis.

      Controlled Growth of ZnO Nanostructures: Elevating nanotechnology frontiers.

      Atmosphere Sintering of Ceramic Capacitors (MLCC): Refining capacitor reliability and efficiency.

      Primary Users:
      Esteemed institutions such as universities, research centers, and cutting-edge industrial manufacturers, who are pioneering the future in vapor deposition experiments and production, will find this machine indispensable.

      Key Specifications:

      Ultra-resilient Alumina (AlO) furnace tube, designed to withstand extreme temperatures of up to 1600°C, ensuring durability and reliability.

      Ingenious design capable of operating under vacuum and atmospheric conditions, broadening its application scope.

      Equipped with a high-performance MoSi (molybdenum disilicide) heating element, delivering unparalleled efficiency and thermal performance.

      The furnace chamber boasts ceramic fiber insulation, offering superior thermal uniformity and maximizing energy efficiency.

      Advantages:
      Exceptional high-temperature stability with a precision of ±1°C, ensuring consistent and reliable outcomes.
      Experience rapid heating and cooling, coupled with outstanding heat retention for optimal operational efficiency.
      Designed for safe and user-friendly operation, making it accessible even for less experienced users.
      Versatile design tailored for advanced materials research, opening new possibilities in scientific exploration.

      Parameter Specification
      Maximum Temperature 1700°C
      Operating Temperature 1600°C
      Display LED Screen
      Tube Diameter 80mm (OD)
      Tube Material Alumina Tube
      Heating Zone Length 220+220+220mm (with gaps between zones)
      Heating Element MoSi (Molybdenum Disilicide)
      Heating Rate 0-5°C/min
      Temperature Control - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor
      - 30 programmable segments for ramp/soak control
      - Built-in PID auto-tuning with over-temperature & thermocouple failure protection
      - Over-temperature alarm allows unattended operation
      Thermocouples 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)
      Temperature Accuracy ±1°C
      Furnace Structure - Double-layer steel shell with dual cooling fans (surface temp <60°C)
      - Fixed non-openable furnace design
      Vacuum Flange Stainless steel vacuum flange with valve
      Operating Voltage 220V 50Hz
      Maximum Power 6kW

      Gas Delivery System

      Component Specification
      4-Channel Mass Flow Controllers - MFC1: 0-100sccm
      - MFC2: 0-200sccm
      - MFC3: 0-500sccm
      - MFC4: 0-200sccm
      Gas Mixing - Bottom-mounted mixing chamber with liquid release valve
      - 4 manual stainless steel needle valves for gas control

      Vacuum System

      Component Specification
      Vacuum Pump + Gauge Rotary vane pump achieves 10Pa vacuum (cooled state)

      Key Features:

    • Remarkable ultra-high temperature capability reaching 1700°C, powered by MoSi heating elements for superior performance.

    • Precision multi-zone temperature control with an accuracy of ±1°C, allowing for meticulous thermal management.

    • Programmable 30-segment thermal profiles provide flexibility and control over heating processes.

    • Comprehensive gas mixing system with 4-channel MFCs, enabling precise gas delivery for various applications.

    • Industrial-grade vacuum performance enhances operational effectiveness and reliability.

      Safety Precautions:

    • Avoid opening the furnace chamber when the temperature is at or above 200°C to prevent personal injury. to prevent personal injury.

    • Ensure tube pressure does not exceed 0.02MPa (absolute pressure) during operation to prevent equipment damage from overpressure. during operation to avoid equipment damage from overpressure.

    • Warning: Neglecting to follow these precautions may lead to:

    • Serious personal injury, compromising the safety of operators.

    • Equipment damage, resulting in costly repairs and downtime.

    • Potential safety hazards, putting the entire operation at risk.

    •  
    • When furnace temperature surpasses 1000°C, ensure the tube is not under vacuum to maintain atmospheric pressure inside. - maintain atmospheric pressure inside the tube.

    • Avoid simultaneously closing both inlet and outlet valves during sample heating to prevent pressure build-up. If it becomes necessary to close the valves:

      • Constantly monitor pressure gauge readings to ensure safe operation.

      • Immediately open the exhaust valve if the absolute pressure exceeds 0.02MPa, preventing hazardous situations.

      • Prevents hazardous situations (tube rupture, flange ejection, etc.)
        Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition

        Equipment Description

        This advanced system integrates the following components:

      • A sophisticated gas flow control system for precise gas management.

      • Innovative liquid injection system to accommodate diverse material processing.

      • Multi-stage temperature-controlled growth zones for tailored processing conditions.

      • A robust water cooling system ensures optimal operating conditions and extends equipment lifespan.

      • CNT Growth Furnace Specifications:

      • Maximum operating temperature: 1400°C, continuously adjustable from 0-1400°C for versatile application potential.

      • Vertical thermal field distribution with dual-zone temperature control for enhanced precision and reliability.

      • Top-mounted liquid injection port with flow guide components, facilitating seamless material introduction.

      • This state-of-the-art CNT/thin-film CVD equipment enables:
        Continuous, uninterrupted growth processes for consistent and high-quality results.
        Precise thermal management for controlled nanostructure synthesis, pushing the boundaries of material science.
        Integrated liquid/gas phase delivery system ensuring comprehensive and versatile processing capability. Designed for intricate material deposition, this state-of-the-art machine offers unparalleled precision and efficiency.

      • Specialized components for synthesizing Carbon Nanotubes (CNTs) ensure superior quality and performance.

        Exploring the Technical Specifications - This Carbon Nanotube/Nanowire CVD Growth Furnace is engineered for precision in the growth of nanomaterials.

        Parameter Specification
        Equipment Name Carbon Nanotube/Nanowire CVD Growth Furnace
        Model KJ-T1400V
        Furnace Structure Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness
        Maximum Power 20KW
        Voltage AC 220V single-phase, 50/60Hz
        Heating Element Silicon carbide (SiC) rods
        Max Operating Temp 1400°C
        Continuous Working Temp Adjustable between 100-1400°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Alumina tube: OD 80mm × Length 1500mm
        Heating Zone Length 700mm + 400mm
        Uniform Temp Zone Length 800mm (±1°C)
        Thermocouple SEI thermocouple for temperature measurement and control
        Temperature Control System 30-segment PID programmable control
        Temperature Accuracy ±1°C

        Manufactured with high-grade Stainless Steel Flange, ensuring robust and reliable operation.
        The system is equipped with a stainless steel vacuum flange assembly, complete with stainless steel needle valves and a mechanical pressure gauge. The armored flange facilitates thermocouple extension to the inlet, ensuring precise temperature monitoring.

        Discover the Key Features that set this equipment apart:

      • Utilizes a high-purity alumina tube to guarantee contamination-free growth of your materials.

      • Offers precision temperature control (±1°C) across an extensive 800mm uniform zone for consistent results.

      • Note: All specifications are open to technical verification. Expertly designed for advanced nanomaterial synthesis under precisely controlled atmospheres.

      • Equipped with robust SiC heating elements, this machine is crafted for ultra-high temperature operations.

      • Features a comprehensive gas/vacuum interface equipped with advanced measurement capabilities.
        Triple Source PVD Vacuum Thermal Evaporation Coating Machine for Wafer Film Deposition

        Introducing the Equipment: A blend of innovation and technology.

        The LCD Touchscreen CVD High-Temperature Furnace is a sophisticated tube furnace specially engineered for CVD processes, featuring cutting-edge technology such as:

      • A double-layer shell structure integrated with an air-cooling system, ensuring the surface temperature remains below 55°C for optimal safety.

      • Utilizes 30-segment PID programmable intelligent temperature control enhanced with phase-angle firing to achieve precise and consistent heating.

      • The chamber is lined with high-quality alumina polycrystalline fiber to ensure excellent thermal insulation and uniform temperature distribution throughout.

      • Applications that benefit from this technology include:
        Silicon carbide (SiC) coatings for enhanced durability.
        Accurate conductivity testing of ceramic substrates.
        Facilitates controlled growth of ZnO nanostructures for research and development.
        Enables atmosphere sintering of ceramic capacitors (MLCC) with precision.

        Key Advantages of our cutting-edge furnace include:

      • A user-friendly touchscreen interface that simplifies operation.

      • An energy-efficient thermal design that reduces operational costs.

      • Delivers research-grade temperature uniformity for consistent results.

      • Highly versatile, suitable for advanced material processing across various applications.

      •  
      • Provides fully automated operation with unmatched unattended capability for optimized performance.

        High-Temperature Furnace Specifications at a Glance:

        Parameter Specification
        Furnace Structure Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness
        Maximum Power 5KW
        Voltage AC 220V single-phase, 50Hz
        Heating Element Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)
        Max Operating Temp 1200°C
        Continuous Working Temp 1100°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Quartz tube: OD 80mm × Length 1000mm
        Heating Zone Length Total 440mm
        Uniform Temp Zone Length 150mm (±1°C)
        Control Interface LCD touch screen
        Thermocouple Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen
        Temperature Control 30-segment PID programmable control
        Temperature Accuracy ±1°C
        Vacuum Sealing System Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)
        High Vacuum System - Control panel for molecular pump speed/vacuum level monitoring
        - Turbo molecular pump + dry scroll pump
        - All KF-25 standard connections between pumps and quartz tube
        Vacuum Level 6.7×10³ Pa (empty chamber, room temperature)
        Gas Delivery System Three mass flow controllers with ranges:
        • Channel 1: 1-100 sccm
        • Channel 2: 1-200 sccm
        • Channel 3: 1-500 sccm

        Key Features that make a difference:

      • Ultra-clean alumina-coated chamber designed for contamination-sensitive processes. Ensures the integrity of your materials with utmost precision.

      • Precision 3-zone temperature monitoring (±1°C)

      • Delivers research-grade vacuum capability with precision down to 10³ Pa, ensuring optimal conditions.

      • Incorporates complete gas flow control with triple MFC channels for flawless performance.

      • Built with industrial-grade components that promise extended durability and reliability.

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