PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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Year of Establishment
2025-04-22
Registered Capital
1.48 Million USD
  • PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition
  • PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition
  • PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition
  • PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition
  • PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition
  • PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition

Equipment Introduction

The RJ150-XK is a state-of-the-art tubular diffusion/oxidation furnace meticulously crafted for cutting-edge R&D applications within enterprises, universities, and research institutes. This versatile apparatus supports a myriad of advanced processes, including:

  • Polysilicon and silicon nitride deposition

  • Diffusion

  • Oxidation

  • Annealing

Key Features:

  • Comprehensive processing for pioneering material research

  • Exceptional precision in temperature control for consistent, high-quality results

  • Streamlined, compact design perfectly tailored for laboratory environments
    Product Features:

    1. Masterfully engineered to accommodate processes like polysilicon, silicon nitride, diffusion, oxidation, annealing, and many more.
    2. Boasts a robust industrial computer + PLC system delivering fully automated control over furnace temperature, boat movement, gas flow, and valves, ensuring seamless automation of the process.
    3. Designed with an intuitive human-machine interface for effortless modification of process control parameters and real-time monitoring of various process statuses.
    4. Provides a plethora of process pipelines for user-friendly selection.
    5. Integrates powerful software functionalities, including innovative self-diagnostic tools to drastically reduce maintenance time.
    6. Features automatic adjustment of the constant temperature zone and cascade control to ensure meticulous regulation of the actual process temperature within the reaction tube.
    7. Equipped with alarms and protective mechanisms for over-temperature, thermocouple breakage, short circuits, and deviations in process gas flow, guaranteeing safety.
    8. Offers the flexibility of customizable products tailored to meet specific customer requirements.

Technical Specifications

Model KJ150-XK
Operating Temperature ≤1300ºC
Wafer Size 2~8 inches (round wafers)
Number of Process Tubes 1~2 tubes per unit
Constant Temperature Zone Length 300~600mm
Constant Temperature Zone Accuracy ≤±0.5ºC
Temperature Stability ≤±0.5ºC/24h
Temperature Ramp Rate Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min
Safety Alarms & Protections Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions

The **RJ-1200T-V50** represents an advanced **vertical fluidized bed CVD system**, precisely crafted for **powder surface deposition experiments**. This furnace features an **ingenious openable design** that allows the furnace body to be opened post-experiment, facilitating easy removal of the quartz tube and retrieval of processed particles.

Within the furnace tube, a **0.2mm porous quartz plate** (customizable pore size available) is installed. The ingenious design enables the powder to be placed atop this plate while gas is channelled from the **bottom of the tube**. As the gas streams through, it **fluidizes the sample particles**, elegantly suspending them within the heating zone for optimal deposition.

**Note:** During fluidization, it's crucial to monitor gas flow to prevent particles from **escaping the heating zone**. Thus, the gas flow rate should be astutely adjusted according to the **particle size** during experiments.PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition

Technical Specifications

Parameter Specification
Heating Zone Length 400mm
Furnace Tube Dimensions Diameter: 50mm, Length: 900mm
Furnace Tube Material High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Sensor Type N thermocouple
Temperature Control Intelligent 30-segment PID programmable microcomputer control with auto-tuning
Temperature Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple breakage protection
Heating Rate 0-20°C/min
Heating Element Alloy resistance wire
Operating Voltage AC220V, single-phase, 50Hz
Maximum Power 3KW
Furnace Chamber Material Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution
Flange Stainless steel vacuum flange, easy to disassemble
Sealing System O-ring compression seal between furnace tube and flange, reusable, high airtightness
Fluidization Zone 1. Reaction gas uniformly passes through the reaction zone.
2. Solid particles are fluidized by gas in the heating zone.
3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.
Note Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.
Shell Structure Double-layer shell with air-cooling system, openable design
Furnace Structure Vertical structure
Parameter Specification
Internal Temperature ≤45ºC
Measurement & Control Devices  
Name Dual-channel Mass Flow Controller (MFC)
Gas Channels 2 channels
Flow Control Digital display, each gas line with independent needle valve control
Connection Method Double ferrule fitting
Flow Meter Mass flow meter
Flow Range MFC1: N 0-10 SLM
MFC2: CO 0-10 SLM
Gas Mixing Equipped with a precision gas mixing chamber
Power Supply 220V, 50Hz
Operating Ambient Temp. 5ºC~45ºC
Standard Accessories Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,
high-temperature gloves ×1 pair, crucible hook ×1,
hex wrench for flange disassembly ×1, warranty card & manual ×1 set
PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition

Equipment Introduction

The vertical dual-zone CVD system is expertly comprised of:

  • A high-temperature 1200°C dual-zone tube furnace

  • A sophisticated 3-channel mass flow controller (MFC) gas supply system

  • A high-efficiency 2L/s vacuum pump integrated with related connecting components

The system is enhanced with directional and swivel casters strategically positioned at the base, ensuring a remarkably compact footprint and enhanced mobility.

Designed for CVD processes, this system is ideal for universities, research centers, and industrial manufacturers conducting experiments and production involving chemical vapor deposition.

(Note: Structured for clarity while maintaining technical accuracy and natural English flow.)

Fluidized Bed Tube Furnace Specifications

Parameter Specification
Maximum Temperature 1200°C
Operating Temperature ≤1100°C
Display LCD touch screen
Tube Diameter 40mm (OD)
Tube Material Custom high-purity quartz tube
Furnace Tube Length Approx. 1100mm (customizable)
Heating Element Premium heating wire
Heating Rate 0-10°C/min
Temperature Control - Programmable 30-segment time-temperature curves
- Touchscreen multi-segment PID control
- Data logging with Excel export capability
- Built-in over-temperature and thermocouple failure protection
Thermocouple Type N thermocouple
Sealing Method Custom stainless steel vacuum flange with sealing
Furnace Chamber - Double-layer steel shell with dual cooling fans
- Dual-zone vertical open structure for easy tube access
- Alumina refractory fiber lining for energy efficiency
Vacuum Flange Stainless steel vacuum flange with valve
Operating Voltage 220V, 50Hz
Power Rating 6KW (customizable)

Gas Delivery System: 3-Channel Mass Flow Control System

Parameter Specification
Power Supply 220V/50Hz, maximum output 18W

Key Features:

  1. Advanced touchscreen control with data recording

  2. Dual-zone vertical design for optimal thermal management

  3. Complete gas flow control system included

  4. Safety-focused design with multiple protection features

  5. Customizable components for specific research needs

Note: Specifications may be customized based on actual requirements. The system combines precision temperature control with efficient gas delivery for advanced CVD applications.

Parameter Specification
Maximum Pressure 3×10 Pa
Gas Channels Can simultaneously connect 3 gas sources to slightly positive pressure
Flow Meter Mass flow meter (other ranges optional)
Channel A Range 1 SLM
Channel B Range 1 SLM
Channel C Range 1 SLM
Gas Line Pressure -0.1 ~ 0.15 MPa
Accuracy ±1% F.S.
Shut-off Valve Stainless steel
Gas Line Tubing 1/4" stainless steel tube

Vacuum System Components

Component Specification
Vacuum Pump 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube
Vacuum Gauge Included (standard configuration)


PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition

Primary Application:

This dual-zone sliding-track CVD tube furnace features a rail-guided sliding design, allowing for rapid heating and cooling of materials by horizontally moving the furnace. It can simultaneously connect six gas sources, with precise flow measurement and control via a touchscreen 6-channel mass flow controller (MFC).

This high-temperature CVD system is primarily designed for universities, research institutions, and industrial manufacturers to conduct experiments and production related to chemical vapor deposition (CVD).

Key Features:

  • Sliding-track mechanism for fast thermal cycling

  • Multi-gas compatibility (6 independent channels)

  • Precision flow control with touchscreen MFC interface

  • Versatile applications in research and small-batch production

    Parameter Specification
    Furnace Access Mode Swing-open design
    Furnace Movement Rail-guided horizontal sliding for rapid heating/cooling
    Chamber Material Alumina refractory fiber
    Heating Element Aluminum-containing heating wire
    Maximum Temperature 1200°C
    Operating Temperature ≤1100°C
    Heating Rate ≤20°C/min (Recommended: 15°C/min)
    Heating Zones Dual-zone
    Total Zone Length 200mm + 200mm
    Tube Material High-purity quartz
    Tube Diameter 60mm
    Sealing Method - Quick-release flange for material loading
    - Stainless steel vacuum flange with silicone seal
    Control System Multi-segment intelligent PID programming
    Temperature Sensor Type N thermocouple
    Safety Alarms Over-temperature & thermocouple failure alarms
    Power Supply 220V, 50Hz

    Gas Delivery System (KJ-6Z)

    Parameter Specification
    Operating Temperature 5~45°C
    Maximum Pressure 3×10 Pa
    Gas Channels 6 independent gas inputs
    Flow Meter Type Mass flow meter (other ranges available at same cost)
    Channel A Range 0-300 SCCM
    Channel B Range 0-300 SCCM
    Channel C Range 0-300 SCCM
    Channel D Range 0-300 SCCM
    Channel E Range 0-300 SCCM
    Channel F Range 0-300 SCCM
    Line Pressure -0.1~0.15 MPa
    Valves Stainless steel shut-off valves
    Tubing Stainless steel

    Vacuum System

    Component Specification
    Pump System Molecular pump unit with connecting pipes
    Power 220V/50Hz
    Mobility Wheel-mounted base for easy movement
    Ultimate Vacuum 6.67×10³ Pa

    Standard Accessories

  • Quartz furnace tube (1)

  • Vacuum flange set (1)

  • Key Features:

  • Unique sliding mechanism enables rapid thermal cycling

  • Six-channel precision gas control system

  • Research-grade vacuum capability

  • Complete turnkey solution with all necessary accessories

  • Industrial-grade construction with safety protections

  •  
  • Tube stoppers (2)

  • O-ring seals

  • Protective gloves (1 pair)

  • Crucible hook (1)

  • PTFE tubing (3m)

  • Hex keys (2)

  • Operation manual
    PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition

    This system is designed for CVD processes, including:

  • Silicon carbide coating

  • Conductivity testing of ceramic substrates

  • 2D material growth

  • Controlled growth of ZnO nanostructures

  • Atmosphere sintering of ceramic capacitors (MLCC)

  • It also serves as a dedicated graphene film growth furnace for graphene preparation. The furnace features a sliding rail base design, allowing manual lateral movement to expose the tube to room temperature for rapid cooling.

    This equipment is particularly suitable for CVD experiments requiring fast heating/cooling rates, making it ideal for:

  • High-efficiency graphene synthesis

  • Other CVD applications demanding rapid thermal cycling

  • Key Advantages:
    Precision temperature control for sensitive material growth
    Unique sliding mechanism enables faster processing
    Versatile applications across advanced material research
    Optimized for both graphene and general CVD processes

    Sliding Rail Tube Furnace Specifications

    Furnace Section

    Parameter Specification
    Furnace Structure Sliding rail design
    Maximum Temperature 1200°C
    Continuous Operating Temperature ≤1100°C
    Heating Rate Up to 20°C/min (Recommended: 10°C/min)
    Heating Zone Length 300mm (Single zone)
    Heating Element Phase-resistant heating wire
    Thermocouple Type K
    Temperature Accuracy ±1°C
    Tube Diameter Options Φ50, Φ60, Φ80
    Tube Material High-purity quartz
    Temperature Controller PID intelligent program control
    Vacuum Flange 304 stainless steel
    - Left flange: Equipped with needle valve + ball valve
    - Right flange: KF25 interface with baffle valve

    Power Supply
    | Input Power | Single-phase 220V, 50Hz, 3KW |

    Vacuum System

    Component Specification
    Rotary Vane Pump with Digital Gauge - Ultimate vacuum: 10³ Torr
    - Tube vacuum: 10² Torr
    - Pumping speed: 4CFM (2L/s, 120L/min)
    - Options: Rotary vane pump/diffusion pump/molecular pump available

    Mass Flow Controller System

    Parameter Specification
    Channels 3-channel high precision MFC
    Flow Range MF1-MF3: 50-1000sccm adjustable
    Features - Mixing chamber at bottom
    - 3 manual stainless steel needle valves

    Important Notes

    Warning Description
    Pressure Limit Tube pressure must not exceed 0.02MPa
    Gas Cylinder Safety Must use pressure reducer (0.01-0.1MPa recommended)
    High Temp Operation Above 1000°C: Maintain atmospheric pressure
    Gas Flow Limit <200SCCM to protect quartz tube
    Quartz Tube Limit Continuous use <1100°C
    Valve Warning Never close both valves during heating

    Certifications
    | ISO Certification | CE Certification |

    Safety Precautions:

  • Do not open the furnace chamber when temperature ≥200°C to prevent personal injury.

  • Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.

  • Warning: Failure to follow these precautions may result in:

  • Serious personal injury

  • Equipment damage

  • Safety hazards

  •  
  • When furnace temperature >1000°C, the tube must not be under vacuum - maintain atmospheric pressure inside the tube.

  • Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:

    • Continuously monitor pressure gauge readings

    • Immediately open exhaust valve if absolute pressure exceeds 0.02MPa

    • Prevents hazardous situations (tube rupture, flange ejection, etc.)
      PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition
      Equipment Application & Features

      This high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including:

      Silicon carbide (SiC) coating

      Conductivity testing of ceramic substrates

      Controlled growth of ZnO nanostructures

      Atmosphere sintering of ceramic capacitors (MLCC)

      Primary Users:
      Our cutting-edge technology is the prime choice for universities, research institutions, and industrial manufacturers seeking excellence in vapor deposition-related experiments and production. Harness the power of innovation with us!

      Key Specifications: Explore the Unmatched Excellence

      Alumina (AlO) furnace tube ensures durability and can withstand temperatures soaring up to an impressive 1600°C, pushing the boundaries of innovation.

      Designed to excel in both vacuum & atmospheric conditions, our equipment guarantees versatility and reliable performance.

      Heating element: Experience unmatched power and efficiency with our high-performance MoSi (molybdenum disilicide) heating element, setting new standards in performance.

      Furnace chamber: Our ceramic fiber insulation ensures excellent thermal uniformity & outstanding energy efficiency, making it a cornerstone of effective thermal processing.

      Advantages: Unlock the Potential of Superior Technology
      Achieve high temperature stability with precision control at an incredible ±1°C, elevating your research capabilities.
      Experience rapid heating and cooling with superior heat retention, allowing for greater efficiency and productivity.
      Enjoy safe & user-friendly operation, making complex processes simple and accessible.
      Versatility redefined for advanced materials research, offering endless possibilities for innovation.

      Parameter Specification
      Maximum Temperature 1700°C
      Operating Temperature 1600°C
      Display LED Screen
      Tube Diameter 80mm (OD)
      Tube Material Alumina Tube
      Heating Zone Length 220+220+220mm (with gaps between zones)
      Heating Element MoSi (Molybdenum Disilicide)
      Heating Rate 0-5°C/min
      Temperature Control - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor
      - 30 programmable segments for ramp/soak control
      - Built-in PID auto-tuning with over-temperature & thermocouple failure protection
      - Over-temperature alarm allows unattended operation
      Thermocouples 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)
      Temperature Accuracy ±1°C
      Furnace Structure - Double-layer steel shell with dual cooling fans (surface temp <60°C)
      - Fixed non-openable furnace design
      Vacuum Flange Stainless steel vacuum flange with valve
      Operating Voltage 220V 50Hz
      Maximum Power 6kW

      Gas Delivery System: Precision and Consistency at Your Fingertips

      Component Specification
      4-Channel Mass Flow Controllers - MFC1: 0-100sccm
      - MFC2: 0-200sccm
      - MFC3: 0-500sccm
      - MFC4: 0-200sccm
      Gas Mixing - Bottom-mounted mixing chamber with liquid release valve
      - 4 manual stainless steel needle valves for gas control

      Vacuum System: Unmatched Industrial-Grade Performance

      Component Specification
      Vacuum Pump + Gauge Rotary vane pump achieves 10Pa vacuum (cooled state)

      Key Features: Unleash the Full Spectrum of Innovation

    • Benefit from ultra-high temperature capability reaching an astounding 1700°C, supported by MoSi heating elements for exceptional results.

    • Our precision multi-zone temperature control maintains a steady ±1°C, ensuring optimal conditions for your projects.

    • Utilize programmable 30-segment thermal profiles for tailored processing solutions, meeting diverse and complex thermal requirements.

    • Our complete gas mixing system with 4-channel MFCs offers unparalleled flexibility and control for precise experimentation.

    • Experience industrial-grade vacuum performance that sets the benchmark for reliability and efficiency.

      Safety Precautions: Prioritize Safety with Best Practices

    • Never open the furnace chamber when the temperature is ≥200°C to ensure safety from potential hazards. to prevent personal injury.

    • The tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avert equipment damage caused by overpressure. during operation to avoid equipment damage from overpressure.

    • Warning: Strict Adherence is Crucial Failure to follow these precautions may result in:

    • Serious personal injury

    • Equipment damage

    • Safety hazards

    •  
    • When furnace temperature exceeds 1000°C, the tube must not be under vacuum-maintain atmospheric pressure to ensure safety. - maintain atmospheric pressure inside the tube.

    • Avoid closing both inlet and outlet valves simultaneously during sample heating to prevent pressure-related issues. If valves must be closed: Prioritize Safety Measures

      • Continuously monitor pressure gauge readings to ensure safe operation conditions.

      • Immediately open the exhaust valve if the absolute pressure exceeds 0.02MPa, safeguarding against potential risks.

      • Prevents hazardous situations (tube rupture, flange ejection, etc.) by maintaining stringent control measures.
        PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition

        Equipment Description: A Seamless Integration of Advanced Systems

        This system integrates: Innovative and Efficient Solutions

      • Gas flow control system, ensuring perfect harmony and precision in operations.

      • Liquid injection system, tailored for versatile and accurate substance delivery.

      • Multi-stage temperature-controlled growth zones, providing exceptional control over processing conditions.

      • Water cooling system, vital for maintaining optimal temperatures and system efficiency.

      • CNT Growth Furnace Specifications: Engineering Excellence

      • Maximum operating temperature: Reach up to 1400°C with continuous adjustability from 0-1400°C, offering expansive flexibility. 1400°C (continuously adjustable from 0-1400°C)

      • Vertical thermal field distribution, enhancing uniformity and processing outcomes. with dual-zone temperature control, revolutionizing precision thermal management.

      • Top-mounted liquid injection port with flow guide components, designed for seamless integration and efficiency. with flow guide components

      • This CNT/thin-film CVD equipment enables: Unparalleled Innovation and Control Continuous, uninterrupted growth processes, optimizing production and research outcomes.
        Continuous, uninterrupted growth processes
        Precise thermal management, offering unrivaled control over synthesis processes. for controlled nanostructure synthesis
        Integrated liquid/gas phase delivery, enhancing material interactions and results. Efficiently crafted for the intricate demands of complex material deposition.

      • Components specifically engineered for the synthesis of carbon nanotubes (CNT), enabling cutting-edge advancements.

        Technical Specifications - State-of-the-art Carbon Nanotube/Nanowire Chemical Vapor Deposition (CVD) Growth Furnace.

        Parameter Specification
        Equipment Name Carbon Nanotube/Nanowire CVD Growth Furnace
        Model KJ-T1400V
        Furnace Structure Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness
        Maximum Power 20KW
        Voltage AC 220V single-phase, 50/60Hz
        Heating Element Silicon carbide (SiC) rods
        Max Operating Temp 1400°C
        Continuous Working Temp Adjustable between 100-1400°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Alumina tube: OD 80mm × Length 1500mm
        Heating Zone Length 700mm + 400mm
        Uniform Temp Zone Length 800mm (±1°C)
        Thermocouple SEI thermocouple for temperature measurement and control
        Temperature Control System 30-segment PID programmable control
        Temperature Accuracy ±1°C

        Durable Stainless Steel Flange for robust structural integrity.
        The system boasts a precision-engineered stainless steel vacuum flange assembly, complete with stainless steel needle valves and a mechanical pressure gauge. This armored flange is designed to permit thermocouple extension right to the inlet, ensuring precise temperature monitoring.

        Key Features:

      • High-purity alumina tube ensures growth that's entirely free from contamination.

      • Achieve precision temperature control with an accuracy of ±1°C across an impressive 800mm uniform zone.

      • Note: All specifications are subject to comprehensive technical verification, meticulously designed for the synthesis of advanced nanomaterials under strictly controlled atmospheres.

      • Robust SiC heating elements designed for ultra-high temperature operations, ensuring reliability and performance.

      • Comprehensive gas/vacuum interface complete with advanced measurement capabilities, supporting versatile process requirements.
        PVD Vacuum Magnetron Sputtering Coating System for Thin Film Deposition

        Equipment Introduction

        The LCD Touchscreen CVD High-Temperature Furnace is a sophisticated tube furnace specially engineered for CVD processes, featuring:

      • Innovative double-layer shell structure complete with an efficient air-cooling system, maintaining surface temperatures safely below 55°C

      • Advanced 30-segment PID programmable intelligent temperature control with sophisticated phase-angle firing technology for unparalleled precise heating.

      • Alumina polycrystalline fiber chamber lining provides superior thermal insulation and ensures uniform temperature distribution.

      • Applications:
        Expertly designed for Silicon carbide (SiC) coating processes.
        Ideal for conducting conductivity testing of ceramic substrates.
        Facilitates controlled growth of ZnO nanostructures with precision.
        Perfect for atmosphere sintering of ceramic capacitors (MLCC).

        Key Advantages:

      • Intuitive and user-friendly touchscreen interface for ease of operation.

      • Energy-efficient thermal design ensures optimal performance with minimal energy consumption.

      • Achieve research-grade temperature uniformity for high-precision applications.

      • Versatile solution for advanced material processing across various industries.

      •  
      • Fully automated operation with the capability for unattended operation, enhancing efficiency.

        High-Temperature Furnace Specifications

        Parameter Specification
        Furnace Structure Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness
        Maximum Power 5KW
        Voltage AC 220V single-phase, 50Hz
        Heating Element Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)
        Max Operating Temp 1200°C
        Continuous Working Temp 1100°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Quartz tube: OD 80mm × Length 1000mm
        Heating Zone Length Total 440mm
        Uniform Temp Zone Length 150mm (±1°C)
        Control Interface LCD touch screen
        Thermocouple Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen
        Temperature Control 30-segment PID programmable control
        Temperature Accuracy ±1°C
        Vacuum Sealing System Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)
        High Vacuum System - Control panel for molecular pump speed/vacuum level monitoring
        - Turbo molecular pump + dry scroll pump
        - All KF-25 standard connections between pumps and quartz tube
        Vacuum Level 6.7×10³ Pa (empty chamber, room temperature)
        Gas Delivery System Three mass flow controllers with ranges:
        • Channel 1: 1-100 sccm
        • Channel 2: 1-200 sccm
        • Channel 3: 1-500 sccm

        Key Features:

      • Ultra-clean alumina-coated chamber, meticulously designed for contamination-sensitive processes. Precision 3-zone temperature monitoring

      • ensures accuracy with a tolerance of (±1°C). Achieve research-grade vacuum capability

      • with vacuum levels reaching down to 10³ Pa. Complete gas flow control

      • provided by triple MFC channels for precise management. Industrial-grade components

      • crafted for extended durability and reliability in demanding environments. Crafted with industry-leading expertise.

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