Customization: | Available |
---|---|
After-sales Service: | on-Line Service |
Warranty: | One Year |
Suppliers with verified business licenses
Equipment Introduction
The RJ150-XK is a state-of-the-art tubular diffusion/oxidation furnace meticulously crafted for cutting-edge R&D applications within enterprises, universities, and research institutes. This versatile apparatus supports a myriad of advanced processes, including:
Polysilicon and silicon nitride deposition
Diffusion
Oxidation
Annealing
Comprehensive processing for pioneering material research
Exceptional precision in temperature control for consistent, high-quality results
Streamlined, compact design perfectly tailored for laboratory environments
Product Features:
1. Masterfully engineered to accommodate processes like polysilicon, silicon nitride, diffusion, oxidation, annealing, and many more.
2. Boasts a robust industrial computer + PLC system delivering fully automated control over furnace temperature, boat movement, gas flow, and valves, ensuring seamless automation of the process.
3. Designed with an intuitive human-machine interface for effortless modification of process control parameters and real-time monitoring of various process statuses.
4. Provides a plethora of process pipelines for user-friendly selection.
5. Integrates powerful software functionalities, including innovative self-diagnostic tools to drastically reduce maintenance time.
6. Features automatic adjustment of the constant temperature zone and cascade control to ensure meticulous regulation of the actual process temperature within the reaction tube.
7. Equipped with alarms and protective mechanisms for over-temperature, thermocouple breakage, short circuits, and deviations in process gas flow, guaranteeing safety.
8. Offers the flexibility of customizable products tailored to meet specific customer requirements.
Technical Specifications
Model | KJ150-XK |
---|---|
Operating Temperature | ≤1300ºC |
Wafer Size | 2~8 inches (round wafers) |
Number of Process Tubes | 1~2 tubes per unit |
Constant Temperature Zone Length | 300~600mm |
Constant Temperature Zone Accuracy | ≤±0.5ºC |
Temperature Stability | ≤±0.5ºC/24h |
Temperature Ramp Rate | Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min |
Safety Alarms & Protections | Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions |
Technical Specifications
Parameter | Specification |
---|---|
Heating Zone Length | 400mm |
Furnace Tube Dimensions | Diameter: 50mm, Length: 900mm |
Furnace Tube Material | High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable) |
Operating Temperature | ≤1100°C |
Maximum Temperature | 1200°C |
Temperature Sensor | Type N thermocouple |
Temperature Control | Intelligent 30-segment PID programmable microcomputer control with auto-tuning |
Temperature Accuracy | ±1°C |
Temperature Protection | Over-temperature and thermocouple breakage protection |
Heating Rate | 0-20°C/min |
Heating Element | Alloy resistance wire |
Operating Voltage | AC220V, single-phase, 50Hz |
Maximum Power | 3KW |
Furnace Chamber Material | Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution |
Flange | Stainless steel vacuum flange, easy to disassemble |
Sealing System | O-ring compression seal between furnace tube and flange, reusable, high airtightness |
Fluidization Zone | 1. Reaction gas uniformly passes through the reaction zone. 2. Solid particles are fluidized by gas in the heating zone. 3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments. |
Note | Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size. |
Shell Structure | Double-layer shell with air-cooling system, openable design |
Furnace Structure | Vertical structure |
Parameter | Specification |
---|---|
Internal Temperature | ≤45ºC |
Measurement & Control Devices | |
Name | Dual-channel Mass Flow Controller (MFC) |
Gas Channels | 2 channels |
Flow Control | Digital display, each gas line with independent needle valve control |
Connection Method | Double ferrule fitting |
Flow Meter | Mass flow meter |
Flow Range | MFC1: N 0-10 SLM MFC2: CO 0-10 SLM |
Gas Mixing | Equipped with a precision gas mixing chamber |
Power Supply | 220V, 50Hz |
Operating Ambient Temp. | 5ºC~45ºC |
Standard Accessories | Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4, high-temperature gloves ×1 pair, crucible hook ×1, hex wrench for flange disassembly ×1, warranty card & manual ×1 set |
Equipment Introduction
The vertical dual-zone CVD system is expertly comprised of:
A high-temperature 1200°C dual-zone tube furnace
A sophisticated 3-channel mass flow controller (MFC) gas supply system
A high-efficiency 2L/s vacuum pump integrated with related connecting components
The system is enhanced with directional and swivel casters strategically positioned at the base, ensuring a remarkably compact footprint and enhanced mobility.
Designed for CVD processes, this system is ideal for universities, research centers, and industrial manufacturers conducting experiments and production involving chemical vapor deposition.
(Note: Structured for clarity while maintaining technical accuracy and natural English flow.)
Fluidized Bed Tube Furnace Specifications
Parameter | Specification |
---|---|
Maximum Temperature | 1200°C |
Operating Temperature | ≤1100°C |
Display | LCD touch screen |
Tube Diameter | 40mm (OD) |
Tube Material | Custom high-purity quartz tube |
Furnace Tube Length | Approx. 1100mm (customizable) |
Heating Element | Premium heating wire |
Heating Rate | 0-10°C/min |
Temperature Control | - Programmable 30-segment time-temperature curves - Touchscreen multi-segment PID control - Data logging with Excel export capability - Built-in over-temperature and thermocouple failure protection |
Thermocouple | Type N thermocouple |
Sealing Method | Custom stainless steel vacuum flange with sealing |
Furnace Chamber | - Double-layer steel shell with dual cooling fans - Dual-zone vertical open structure for easy tube access - Alumina refractory fiber lining for energy efficiency |
Vacuum Flange | Stainless steel vacuum flange with valve |
Operating Voltage | 220V, 50Hz |
Power Rating | 6KW (customizable) |
Gas Delivery System: 3-Channel Mass Flow Control System
Parameter | Specification |
---|---|
Power Supply | 220V/50Hz, maximum output 18W |
Key Features:
Advanced touchscreen control with data recording
Dual-zone vertical design for optimal thermal management
Complete gas flow control system included
Safety-focused design with multiple protection features
Customizable components for specific research needs
Note: Specifications may be customized based on actual requirements. The system combines precision temperature control with efficient gas delivery for advanced CVD applications.
Parameter | Specification |
---|---|
Maximum Pressure | 3×10 Pa |
Gas Channels | Can simultaneously connect 3 gas sources to slightly positive pressure |
Flow Meter | Mass flow meter (other ranges optional) |
Channel A Range | 1 SLM |
Channel B Range | 1 SLM |
Channel C Range | 1 SLM |
Gas Line Pressure | -0.1 ~ 0.15 MPa |
Accuracy | ±1% F.S. |
Shut-off Valve | Stainless steel |
Gas Line Tubing | 1/4" stainless steel tube |
Vacuum System Components
Component | Specification |
---|---|
Vacuum Pump | 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube |
Vacuum Gauge | Included (standard configuration) |
Primary Application:
This dual-zone sliding-track CVD tube furnace features a rail-guided sliding design, allowing for rapid heating and cooling of materials by horizontally moving the furnace. It can simultaneously connect six gas sources, with precise flow measurement and control via a touchscreen 6-channel mass flow controller (MFC).
This high-temperature CVD system is primarily designed for universities, research institutions, and industrial manufacturers to conduct experiments and production related to chemical vapor deposition (CVD).
Sliding-track mechanism for fast thermal cycling
Multi-gas compatibility (6 independent channels)
Precision flow control with touchscreen MFC interface
Versatile applications in research and small-batch production
Parameter | Specification |
---|---|
Furnace Access Mode | Swing-open design |
Furnace Movement | Rail-guided horizontal sliding for rapid heating/cooling |
Chamber Material | Alumina refractory fiber |
Heating Element | Aluminum-containing heating wire |
Maximum Temperature | 1200°C |
Operating Temperature | ≤1100°C |
Heating Rate | ≤20°C/min (Recommended: 15°C/min) |
Heating Zones | Dual-zone |
Total Zone Length | 200mm + 200mm |
Tube Material | High-purity quartz |
Tube Diameter | 60mm |
Sealing Method | - Quick-release flange for material loading - Stainless steel vacuum flange with silicone seal |
Control System | Multi-segment intelligent PID programming |
Temperature Sensor | Type N thermocouple |
Safety Alarms | Over-temperature & thermocouple failure alarms |
Power Supply | 220V, 50Hz |
Gas Delivery System (KJ-6Z)
Parameter | Specification |
---|---|
Operating Temperature | 5~45°C |
Maximum Pressure | 3×10 Pa |
Gas Channels | 6 independent gas inputs |
Flow Meter Type | Mass flow meter (other ranges available at same cost) |
Channel A Range | 0-300 SCCM |
Channel B Range | 0-300 SCCM |
Channel C Range | 0-300 SCCM |
Channel D Range | 0-300 SCCM |
Channel E Range | 0-300 SCCM |
Channel F Range | 0-300 SCCM |
Line Pressure | -0.1~0.15 MPa |
Valves | Stainless steel shut-off valves |
Tubing | Stainless steel |
Vacuum System
Component | Specification |
---|---|
Pump System | Molecular pump unit with connecting pipes |
Power | 220V/50Hz |
Mobility | Wheel-mounted base for easy movement |
Ultimate Vacuum | 6.67×10³ Pa |
Standard Accessories
Quartz furnace tube (1)
Vacuum flange set (1)
Key Features:
Unique sliding mechanism enables rapid thermal cycling
Six-channel precision gas control system
Research-grade vacuum capability
Complete turnkey solution with all necessary accessories
Industrial-grade construction with safety protections
Tube stoppers (2)
O-ring seals
Protective gloves (1 pair)
Crucible hook (1)
PTFE tubing (3m)
Hex keys (2)
Operation manual
This system is designed for CVD processes, including:
Silicon carbide coating
Conductivity testing of ceramic substrates
2D material growth
Controlled growth of ZnO nanostructures
Atmosphere sintering of ceramic capacitors (MLCC)
It also serves as a dedicated graphene film growth furnace for graphene preparation. The furnace features a sliding rail base design, allowing manual lateral movement to expose the tube to room temperature for rapid cooling.
This equipment is particularly suitable for CVD experiments requiring fast heating/cooling rates, making it ideal for:
High-efficiency graphene synthesis
Other CVD applications demanding rapid thermal cycling
Key Advantages:
Precision temperature control for sensitive material growth
Unique sliding mechanism enables faster processing
Versatile applications across advanced material research
Optimized for both graphene and general CVD processes
Sliding Rail Tube Furnace Specifications
Furnace Section
Parameter | Specification |
---|---|
Furnace Structure | Sliding rail design |
Maximum Temperature | 1200°C |
Continuous Operating Temperature | ≤1100°C |
Heating Rate | Up to 20°C/min (Recommended: 10°C/min) |
Heating Zone Length | 300mm (Single zone) |
Heating Element | Phase-resistant heating wire |
Thermocouple | Type K |
Temperature Accuracy | ±1°C |
Tube Diameter Options | Φ50, Φ60, Φ80 |
Tube Material | High-purity quartz |
Temperature Controller | PID intelligent program control |
Vacuum Flange | 304 stainless steel - Left flange: Equipped with needle valve + ball valve - Right flange: KF25 interface with baffle valve |
Power Supply
| Input Power | Single-phase 220V, 50Hz, 3KW |
Vacuum System
Component | Specification |
---|---|
Rotary Vane Pump with Digital Gauge | - Ultimate vacuum: 10³ Torr - Tube vacuum: 10² Torr - Pumping speed: 4CFM (2L/s, 120L/min) - Options: Rotary vane pump/diffusion pump/molecular pump available |
Mass Flow Controller System
Parameter | Specification |
---|---|
Channels | 3-channel high precision MFC |
Flow Range | MF1-MF3: 50-1000sccm adjustable |
Features | - Mixing chamber at bottom - 3 manual stainless steel needle valves |
Important Notes
Warning | Description |
---|---|
Pressure Limit | Tube pressure must not exceed 0.02MPa |
Gas Cylinder Safety | Must use pressure reducer (0.01-0.1MPa recommended) |
High Temp Operation | Above 1000°C: Maintain atmospheric pressure |
Gas Flow Limit | <200SCCM to protect quartz tube |
Quartz Tube Limit | Continuous use <1100°C |
Valve Warning | Never close both valves during heating |
Certifications
| ISO Certification | CE Certification |
Safety Precautions:
Do not open the furnace chamber when temperature ≥200°C to prevent personal injury.
Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.
Warning: Failure to follow these precautions may result in:
Serious personal injury
Equipment damage
Safety hazards
When furnace temperature >1000°C, the tube must not be under vacuum - maintain atmospheric pressure inside the tube.
Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:
Continuously monitor pressure gauge readings
Immediately open exhaust valve if absolute pressure exceeds 0.02MPa
Prevents hazardous situations (tube rupture, flange ejection, etc.)
Equipment Application & Features
This high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including:
Silicon carbide (SiC) coating
Conductivity testing of ceramic substrates
Controlled growth of ZnO nanostructures
Atmosphere sintering of ceramic capacitors (MLCC)
Primary Users:
Our cutting-edge technology is the prime choice for universities, research institutions, and industrial manufacturers seeking excellence in vapor deposition-related experiments and production. Harness the power of innovation with us!
Key Specifications: Explore the Unmatched Excellence
Alumina (AlO) furnace tube ensures durability and can withstand temperatures soaring up to an impressive 1600°C, pushing the boundaries of innovation.
Designed to excel in both vacuum & atmospheric conditions, our equipment guarantees versatility and reliable performance.
Heating element: Experience unmatched power and efficiency with our high-performance MoSi (molybdenum disilicide) heating element, setting new standards in performance.
Furnace chamber: Our ceramic fiber insulation ensures excellent thermal uniformity & outstanding energy efficiency, making it a cornerstone of effective thermal processing.
Advantages: Unlock the Potential of Superior Technology
Achieve high temperature stability with precision control at an incredible ±1°C, elevating your research capabilities.
Experience rapid heating and cooling with superior heat retention, allowing for greater efficiency and productivity.
Enjoy safe & user-friendly operation, making complex processes simple and accessible.
Versatility redefined for advanced materials research, offering endless possibilities for innovation.
Parameter | Specification |
---|---|
Maximum Temperature | 1700°C |
Operating Temperature | 1600°C |
Display | LED Screen |
Tube Diameter | 80mm (OD) |
Tube Material | Alumina Tube |
Heating Zone Length | 220+220+220mm (with gaps between zones) |
Heating Element | MoSi (Molybdenum Disilicide) |
Heating Rate | 0-5°C/min |
Temperature Control | - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor - 30 programmable segments for ramp/soak control - Built-in PID auto-tuning with over-temperature & thermocouple failure protection - Over-temperature alarm allows unattended operation |
Thermocouples | 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube) |
Temperature Accuracy | ±1°C |
Furnace Structure | - Double-layer steel shell with dual cooling fans (surface temp <60°C) - Fixed non-openable furnace design |
Vacuum Flange | Stainless steel vacuum flange with valve |
Operating Voltage | 220V 50Hz |
Maximum Power | 6kW |
Gas Delivery System: Precision and Consistency at Your Fingertips
Component | Specification |
---|---|
4-Channel Mass Flow Controllers | - MFC1: 0-100sccm - MFC2: 0-200sccm - MFC3: 0-500sccm - MFC4: 0-200sccm |
Gas Mixing | - Bottom-mounted mixing chamber with liquid release valve - 4 manual stainless steel needle valves for gas control |
Vacuum System: Unmatched Industrial-Grade Performance
Component | Specification |
---|---|
Vacuum Pump + Gauge | Rotary vane pump achieves 10Pa vacuum (cooled state) |
Key Features: Unleash the Full Spectrum of Innovation
Benefit from ultra-high temperature capability reaching an astounding 1700°C, supported by MoSi heating elements for exceptional results.
Our precision multi-zone temperature control maintains a steady ±1°C, ensuring optimal conditions for your projects.
Utilize programmable 30-segment thermal profiles for tailored processing solutions, meeting diverse and complex thermal requirements.
Our complete gas mixing system with 4-channel MFCs offers unparalleled flexibility and control for precise experimentation.
Experience industrial-grade vacuum performance that sets the benchmark for reliability and efficiency.
Safety Precautions: Prioritize Safety with Best Practices
Never open the furnace chamber when the temperature is ≥200°C to ensure safety from potential hazards. to prevent personal injury.
The tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avert equipment damage caused by overpressure. during operation to avoid equipment damage from overpressure.
Warning: Strict Adherence is Crucial Failure to follow these precautions may result in:
Serious personal injury
Equipment damage
Safety hazards
When furnace temperature exceeds 1000°C, the tube must not be under vacuum-maintain atmospheric pressure to ensure safety. - maintain atmospheric pressure inside the tube.
Avoid closing both inlet and outlet valves simultaneously during sample heating to prevent pressure-related issues. If valves must be closed: Prioritize Safety Measures
Continuously monitor pressure gauge readings to ensure safe operation conditions.
Immediately open the exhaust valve if the absolute pressure exceeds 0.02MPa, safeguarding against potential risks.
Prevents hazardous situations (tube rupture, flange ejection, etc.) by maintaining stringent control measures.
Equipment Description: A Seamless Integration of Advanced Systems
This system integrates: Innovative and Efficient Solutions
Gas flow control system, ensuring perfect harmony and precision in operations.
Liquid injection system, tailored for versatile and accurate substance delivery.
Multi-stage temperature-controlled growth zones, providing exceptional control over processing conditions.
Water cooling system, vital for maintaining optimal temperatures and system efficiency.
CNT Growth Furnace Specifications: Engineering Excellence
Maximum operating temperature: Reach up to 1400°C with continuous adjustability from 0-1400°C, offering expansive flexibility. 1400°C (continuously adjustable from 0-1400°C)
Vertical thermal field distribution, enhancing uniformity and processing outcomes. with dual-zone temperature control, revolutionizing precision thermal management.
Top-mounted liquid injection port with flow guide components, designed for seamless integration and efficiency. with flow guide components
This CNT/thin-film CVD equipment enables: Unparalleled Innovation and Control Continuous, uninterrupted growth processes, optimizing production and research outcomes.
Continuous, uninterrupted growth processes
Precise thermal management, offering unrivaled control over synthesis processes. for controlled nanostructure synthesis
Integrated liquid/gas phase delivery, enhancing material interactions and results. Efficiently crafted for the intricate demands of complex material deposition.
Components specifically engineered for the synthesis of carbon nanotubes (CNT), enabling cutting-edge advancements.
Technical Specifications - State-of-the-art Carbon Nanotube/Nanowire Chemical Vapor Deposition (CVD) Growth Furnace.
Parameter | Specification |
---|---|
Equipment Name | Carbon Nanotube/Nanowire CVD Growth Furnace |
Model | KJ-T1400V |
Furnace Structure | Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness |
Maximum Power | 20KW |
Voltage | AC 220V single-phase, 50/60Hz |
Heating Element | Silicon carbide (SiC) rods |
Max Operating Temp | 1400°C |
Continuous Working Temp | Adjustable between 100-1400°C |
Heating Rate | 1-10°C/min |
Furnace Tube Material & Dimensions | Alumina tube: OD 80mm × Length 1500mm |
Heating Zone Length | 700mm + 400mm |
Uniform Temp Zone Length | 800mm (±1°C) |
Thermocouple | SEI thermocouple for temperature measurement and control |
Temperature Control System | 30-segment PID programmable control |
Temperature Accuracy | ±1°C |
Durable Stainless Steel Flange for robust structural integrity.
The system boasts a precision-engineered stainless steel vacuum flange assembly, complete with stainless steel needle valves and a mechanical pressure gauge. This armored flange is designed to permit thermocouple extension right to the inlet, ensuring precise temperature monitoring.
Key Features:
High-purity alumina tube ensures growth that's entirely free from contamination.
Achieve precision temperature control with an accuracy of ±1°C across an impressive 800mm uniform zone.
Note: All specifications are subject to comprehensive technical verification, meticulously designed for the synthesis of advanced nanomaterials under strictly controlled atmospheres.
Robust SiC heating elements designed for ultra-high temperature operations, ensuring reliability and performance.
Comprehensive gas/vacuum interface complete with advanced measurement capabilities, supporting versatile process requirements.
Equipment Introduction
The LCD Touchscreen CVD High-Temperature Furnace is a sophisticated tube furnace specially engineered for CVD processes, featuring:
Innovative double-layer shell structure complete with an efficient air-cooling system, maintaining surface temperatures safely below 55°C
Advanced 30-segment PID programmable intelligent temperature control with sophisticated phase-angle firing technology for unparalleled precise heating.
Alumina polycrystalline fiber chamber lining provides superior thermal insulation and ensures uniform temperature distribution.
Applications:
Expertly designed for Silicon carbide (SiC) coating processes.
Ideal for conducting conductivity testing of ceramic substrates.
Facilitates controlled growth of ZnO nanostructures with precision.
Perfect for atmosphere sintering of ceramic capacitors (MLCC).
Key Advantages:
Intuitive and user-friendly touchscreen interface for ease of operation.
Energy-efficient thermal design ensures optimal performance with minimal energy consumption.
Achieve research-grade temperature uniformity for high-precision applications.
Versatile solution for advanced material processing across various industries.
Fully automated operation with the capability for unattended operation, enhancing efficiency.
High-Temperature Furnace Specifications
Parameter | Specification |
---|---|
Furnace Structure | Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness |
Maximum Power | 5KW |
Voltage | AC 220V single-phase, 50Hz |
Heating Element | Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan) |
Max Operating Temp | 1200°C |
Continuous Working Temp | 1100°C |
Heating Rate | 1-10°C/min |
Furnace Tube Material & Dimensions | Quartz tube: OD 80mm × Length 1000mm |
Heating Zone Length | Total 440mm |
Uniform Temp Zone Length | 150mm (±1°C) |
Control Interface | LCD touch screen |
Thermocouple | Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen |
Temperature Control | 30-segment PID programmable control |
Temperature Accuracy | ±1°C |
Vacuum Sealing System | Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve) |
High Vacuum System | - Control panel for molecular pump speed/vacuum level monitoring - Turbo molecular pump + dry scroll pump - All KF-25 standard connections between pumps and quartz tube |
Vacuum Level | 6.7×10³ Pa (empty chamber, room temperature) |
Gas Delivery System | Three mass flow controllers with ranges: • Channel 1: 1-100 sccm • Channel 2: 1-200 sccm • Channel 3: 1-500 sccm |
Key Features:
Ultra-clean alumina-coated chamber, meticulously designed for contamination-sensitive processes. Precision 3-zone temperature monitoring
ensures accuracy with a tolerance of (±1°C). Achieve research-grade vacuum capability
with vacuum levels reaching down to 10³ Pa. Complete gas flow control
provided by triple MFC channels for precise management. Industrial-grade components
crafted for extended durability and reliability in demanding environments. Crafted with industry-leading expertise.