| Customization: | Available |
|---|---|
| After-sales Service: | on-Line Service |
| Warranty: | One Year |
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Introducing the innovative Vacuum RTP (Rapid Thermal Processing) Annealing Furnace, a marvel of high-vacuum, swift-heating technology enveloped in a robust tubular design. Featuring a pristine quartz chamber coupled with vacuum flanges, this state-of-the-art furnace employs halogen lamp heating to deliver an unparalleled rapid heating rate of up to 50°C per second, this cutting-edge furnace also boasts advanced PID automatic control with an impressive 30 programmable segments, ensuring precision and reliability at every turn.
Purposefully engineered for the annealing of semiconductor or solar cell substrates, this high-temperature tubular furnace facilitates swift thermal processing of various samples in vacuum or carefully controlled atmosphere environments. Its extensive utility is recognized across university laboratories and leading industrial research facilities for an array of applications including:
Thin-film deposition
Rapid annealing of diverse materials
Silicidation
Diffusion
Crystallization
Densification
| Parameter | 2-inch Wafer | 4-inch Wafer | 6-inch Wafer |
|---|---|---|---|
| Wafer Size | 2 inches | 4 inches | 6 inches |
| Furnace Tube Outer Diameter | 100 mm | 110-150 mm | 180 mm |
| Heating Zone Length | 200 mm | 300 mm | 400 mm |
Note: Customization is available to accommodate different sizes based on specific customer requirements.
| Feature | Specification |
|---|---|
| Product Name | RTP Rapid Annealing Furnace |
| Operating Temperature | 900°C |
| Controller | LED (Touchscreen LED optional) |
| Furnace Chamber | Open-type, sliding rail design |
| Tube Size | Customizable based on requirements |
| Heating Element | Halogen lamps |
| Heating Rate | 0-50°C/s |
| Thermocouple | Custom-designed based on actual needs |
| Temperature Controller | 30-segment high-precision digital programmable controller |
The ingeniously designed sliding tube furnace comes with a pair of sliding rails at its base, supporting dual tube furnaces that can glide effortlessly left and right, ensuring rapid cooling. This RTP rapid annealing furnace excels in heating samples in diverse environments including vacuum, atmospheric, and air conditions. It is optimally used for rapid annealing, silicidation, diffusion, crystallization, densification, and other complex processes for a multitude of materials.
| Parameter | Specification |
|---|---|
| Display | LED |
| Temperature | 1200°C |
| Continuous Operating Temp | ≤1100°C |
| Heating Rate | Recommended 0-10°C/min |
| Furnace Tube | Tube Dimensions: OD50/ID44 × L1800mm |
| First Furnace: Heating Zone Length: 350mm | |
| Second Furnace: Heating Zone Length: 150mm | |
| (Other sizes customizable based on customer requirements) | |
| Heating Element | Molybdenum Disilicide (MoSi) Heating Wire |
| Sliding Rails/Table | Chrome-Plated Steel Dual Rails, Sliding Length: 1800mm |
| (Other sizes customizable based on customer requirements) | |
| Thermocouple | Type N |
| Tube Material | High-Purity Quartz |
| Sealing Flange | Stainless Steel Water-Cooled KF25 Flange (with mechanical vacuum gauge port) |
| Temperature Accuracy | ±1°C |
| Temperature Control | Two Independently Controlled Furnaces |
| - 30-step PID Auto Control via SCR Power Regulation |
The advanced sliding three-zone tube furnace is a pinnacle of rapid thermal annealing technology, featuring an 80mm outer diameter quartz tube and a formidable maximum temperature capacity of 1200°C. The furnace is adeptly mounted on sliding rails, enabling seamless movement across the tube to achieve both rapid heating and cooling.
To realize the fastest heating, preheat the furnace to the desired temperature, then effortlessly slide it over the sample position. When cooling is required, simply slide the furnace away from the sample post-heating.
This system stands as an exceptional low-cost solution for rapid thermal processing (RTP)that expertly harmonizes performance with affordability.
| Parameter | Specification |
|---|---|
| Shell Structure | Double-layer air-cooled |
| Furnace Chamber Material | Alumina refractory fiber |
| Max Temperature | 1200°C |
| Operating Temperature | 1100°C |
| Heating Rate | 10°C/min |
| Heating Element | Resistance wire |
| Temperature Control | PID temperature regulation, supports 30-segment heating/cooling programs, with over-temperature and thermocouple break protection |
| Thermocouple | Type N |
| Heating Zone Length | 220mm + 220mm + 220mm (other sizes customizable upon request) |
| Furnace Tube Size | Ø80mm × 2400mm (other sizes customizable upon request) |
| Furnace Tube | High-purity quartz tube |
| Sliding Rails | Chrome-plated steel dual rails |
| Rail Length | ~2500mm (other sizes customizable upon request) |
| Flange | 304 stainless steel sealing flange with silicone O-ring, easy assembly, reusable |
| Compatible Gas | Inert gas (slight positive pressure) |
This bespoke RTP (Rapid Thermal Processing) annealing furnace is composed of an innovative RTP sliding-rail tube furnace, a sophisticated multi-channel mass flow controller system, and a robust vacuum system, meticulously crafted for the annealing of semiconductor wafers, solar cells, or other samples up to 3 inches in size.
Harnessing the power of infrared lamp heating, this furnace achieves an extraordinarily rapid heating rate of 50°C per second, and it incorporates 30-segment precise temperature control with a remarkable accuracy of ±1°C. Outfitted with an RS485 interface and intuitive control software, the furnace offers seamless operation and monitoring via computer, with real-time display of temperature curves providing an insightful user experience.
This state-of-the-art rapid thermal processing tube furnace is a revolutionary tool widely used for the innovative large-area 2D graphene growth via the cutting-edge CVD process and is meticulously optimized for the demanding applications of semiconductor and solar cell wafer annealing. Its advanced computer system controls the furnace in real-time efficiently through the sophisticated RS485 interface and its dedicated robust software, simultaneously visualizing intricate temperature profiles with precision.
| Parameter | Specification |
|---|---|
| Product Name | Open-Type Dual-Zone RTP Tube Furnace |
| Operating Temperature | ≤1000ºC |
| Controller | LCD Touch Screen |
| Furnace Tube Size | Quartz Tube OD80mm/ID72mm, Single-End Open (Custom sizes available) |
| Heating Zone | 300mm (Custom lengths available) |
| Furnace Type | Open-Type |
| Heating Element | Halogen Lamp Heating |
| Heating Rate | 30ºC/min |
| Temperature Sensor | Type N Thermocouple |
| Temperature Controller | 30-Segment High-Precision Digital Programmable Controller |
Part 2: Advanced Gas Mixing System
| Parameter | Specification |
|---|---|
| Flow Range | MFC1: Argon (O) 0-200sccm MFC2: Argon (Ar) 0-200sccm |
Part 3: Precision Vacuum System
| Component | Specification |
|---|---|
| Vacuum Pump | Rotary Vane Pump |
| Accessories | Exhaust Filter + Corrosion-Resistant Digital Vacuum Gauge |
The rapid annealing furnace is ingeniously equipped with vacuum flanges at both ends of the furnace tube, capable of achieving an impressive vacuum level of 10-5 Torr with a molecular pump and 10-3 Torr with a mechanical pump. A pair of sliding rails is meticulously installed at the bottom of the furnace, allowing for seamless manual movement. The maximum heating and cooling rates can reach a remarkable 100°C per minute. To attain the fastest heating efficiency, the furnace can be strategically preheated to the set temperature and then precisely moved to the sample position. For optimal rapid cooling, the furnace can be adeptly moved to the opposite end post-heating. Under vacuum or in inert gas conditions, the heating and cooling rates can escalate to an impressive 10°C per second, rendering it an ideal and cost-effective solution for rapid thermal processing.
| Parameter | Specification |
|---|---|
| Furnace Tube Dimensions | Φ60mm × 1500mm (Customizable per customer requirements) |
| Heating Zone Length | 440mm (Customizable per customer requirements) |
| Operating Temperature | ≤1100°C |
| Maximum Temperature | 1200°C |
| Temperature Control System | 30-segment PID microcomputer programmable control (Optional LCD touchscreen display) |
| Temperature Control Accuracy | ±1°C |
| Temperature Protection | Over-temperature and thermocouple break protection |
| Heating Rate | 0~10°C/min |
| Heating Element | Resistance wire |
| Gas Tightness | 4.03 × 10<sup>-3</sup> Pa |
| Furnace Chamber Material | Japanese imported chamber material, no powdering, excellent insulation, high reflectivity, uniform temperature distribution, strong resistance to thermal expansion and contraction |
| Slide Rail Dimensions | Heavy-duty steel bidirectional slide rails, sliding length: 1200mm (Customizable per customer requirements) |
| Flange Connections | Standard with two stainless steel vacuum flanges, pre-installed mechanical pressure gauge and stainless steel shut-off valve |
| Sealing System | Silicone O-ring compression seal between furnace tube and flange, easy disassembly, reusable, excellent airtightness (ensures pressure gauge remains stable for 12 hours) |
| Furnace Tube Options | Fused quartz tube or alumina tube |
| Temperature Sensor | Type N thermocouple |
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