| Customization: | Available |
|---|---|
| After-sales Service: | on-Line Service |
| Warranty: | One Year |
Suppliers with verified business licenses
Equipment Introduction
The RJ150-XK is a tubular diffusion/oxidation furnace designed meticulously for R&D applications in enterprises, universities, and research institutes. Embrace a wide array of transformative processes including:
Polysilicon and silicon nitride deposition
Diffusion
Oxidation
Annealing
Versatile processing capabilities for pioneering material research
Precision temperature control to ensure impeccable results
Compact design specifically optimized for lab environments
Product Features:
1. Seamlessly accommodates a multitude of processes including polysilicon, silicon nitride, diffusion, oxidation, annealing, and beyond.
2. Employs a robust industrial computer + PLC system, delivering fully automated control over furnace temperature, boat movement, gas flow, and valves, thus facilitating entire process automation.
3. Showcases a user-friendly human-machine interface, enabling straightforward modification of process control parameters with real-time visualization of diverse process statuses.
4. Provides multiple process pipelines offering convenient user selection.
5. Integrated with powerful software functionalities, including self-diagnostic tools to substantially minimize maintenance time.
6. Automatic constant temperature zone adjustment and cascade control ensure precise modulation of the process temperature within the reaction tube.
7. Comes with comprehensive alarms and protective functions for over-temperature, thermocouple breakage, short circuits, and process gas flow deviations.
8. Options for customization available based on specific customer requirements.
Technical Specifications
| Model | KJ150-XK |
|---|---|
| Operating Temperature | ≤1300ºC |
| Wafer Size | 2~8 inches (round wafers) |
| Number of Process Tubes | 1~2 tubes per unit |
| Constant Temperature Zone Length | 300~600mm |
| Constant Temperature Zone Accuracy | ≤±0.5ºC |
| Temperature Stability | ≤±0.5ºC/24h |
| Temperature Ramp Rate | Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min |
| Safety Alarms & Protections | Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions |
Technical Specifications
| Parameter | Specification |
|---|---|
| Heating Zone Length | 400mm |
| Furnace Tube Dimensions | Diameter: 50mm, Length: 900mm |
| Furnace Tube Material | High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable) |
| Operating Temperature | ≤1100°C |
| Maximum Temperature | 1200°C |
| Temperature Sensor | Type N thermocouple |
| Temperature Control | Intelligent 30-segment PID programmable microcomputer control with auto-tuning |
| Temperature Accuracy | ±1°C |
| Temperature Protection | Over-temperature and thermocouple breakage protection |
| Heating Rate | 0-20°C/min |
| Heating Element | Alloy resistance wire |
| Operating Voltage | AC220V, single-phase, 50Hz |
| Maximum Power | 3KW |
| Furnace Chamber Material | Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution |
| Flange | Stainless steel vacuum flange, easy to disassemble |
| Sealing System | O-ring compression seal between furnace tube and flange, reusable, high airtightness |
| Fluidization Zone | 1. Reaction gas uniformly passes through the reaction zone. 2. Solid particles are fluidized by gas in the heating zone. 3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments. |
| Note | Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size. |
| Shell Structure | Double-layer shell with air-cooling system, openable design |
| Furnace Structure | Vertical structure |
| Parameter | Specification |
|---|---|
| Internal Temperature | ≤45ºC |
| Measurement & Control Devices | |
| Name | Dual-channel Mass Flow Controller (MFC) |
| Gas Channels | 2 channels |
| Flow Control | Digital display, each gas line with independent needle valve control |
| Connection Method | Double ferrule fitting |
| Flow Meter | Mass flow meter |
| Flow Range | MFC1: N 0-10 SLM MFC2: CO 0-10 SLM |
| Gas Mixing | Equipped with a precision gas mixing chamber |
| Power Supply | 220V, 50Hz |
| Operating Ambient Temp. | 5ºC~45ºC |
| Standard Accessories | Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4, high-temperature gloves ×1 pair, crucible hook ×1, hex wrench for flange disassembly ×1, warranty card & manual ×1 set |
Equipment Introduction
The vertical dual-zone CVD system is composed primarily of:
A 1200°C dual-zone tube furnace
A state-of-the-art 3-channel mass flow controller (MFC) gas supply system
A high-efficiency 2L/s vacuum pump with all necessary connecting components
The system is further enhanced with directional and swivel casters at the base, assuring a compact footprint and seamless mobility.
Expertly designed for Chemical Vapor Deposition (CVD) processes, this highly sophisticated system is ideal for top-tier universities, cutting-edge research centers, and leading industrial manufacturers conducting pivotal experiments and high-precision production involving the art and science of chemical vapor deposition.
(Note: Expertly structured for enhanced clarity while maintaining technical accuracy and a smooth, natural English flow.)
Fluidized Bed Tube Furnace Specifications
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1200°C |
| Operating Temperature | ≤1100°C |
| Display | LCD touch screen |
| Tube Diameter | 40mm (OD) |
| Tube Material | Custom high-purity quartz tube |
| Furnace Tube Length | Approx. 1100mm (customizable) |
| Heating Element | Premium heating wire |
| Heating Rate | 0-10°C/min |
| Temperature Control | - Programmable 30-segment time-temperature curves - Touchscreen multi-segment PID control - Data logging with Excel export capability - Built-in over-temperature and thermocouple failure protection |
| Thermocouple | Type N thermocouple |
| Sealing Method | Custom stainless steel vacuum flange with sealing |
| Furnace Chamber | - Double-layer steel shell with dual cooling fans - Dual-zone vertical open structure for easy tube access - Alumina refractory fiber lining for energy efficiency |
| Vacuum Flange | Stainless steel vacuum flange with valve |
| Operating Voltage | 220V, 50Hz |
| Power Rating | 6KW (customizable) |
Gas Delivery System: Robust 3-Channel Mass Flow Control System
| Parameter | Specification |
|---|---|
| Power Supply | 220V/50Hz, maximum output 18W |
Key Features:
State-of-the-art touchscreen control with comprehensive data recording capabilities
Innovative dual-zone vertical design for optimal thermal management and efficiency
Fully integrated gas flow control system for seamless operations
Safety-first design with an array of protective features
Customizable components tailored to specific research needs
Note: Specifications can be tailored to meet specific requirements. This system harmonizes precision temperature control with cutting-edge gas delivery for advanced CVD applications.
| Parameter | Specification |
|---|---|
| Maximum Pressure | 3×10 Pa |
| Gas Channels | Can simultaneously connect 3 gas sources to slightly positive pressure |
| Flow Meter | Mass flow meter (other ranges optional) |
| Channel A Range | 1 SLM |
| Channel B Range | 1 SLM |
| Channel C Range | 1 SLM |
| Gas Line Pressure | -0.1 ~ 0.15 MPa |
| Accuracy | ±1% F.S. |
| Shut-off Valve | Stainless steel |
| Gas Line Tubing | 1/4" stainless steel tube |
Vacuum System Components
| Component | Specification |
|---|---|
| Vacuum Pump | 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube |
| Vacuum Gauge | Included (standard configuration) |
Primary Application:
This advanced dual-zone sliding-track CVD tube furnace boasts a sophisticated rail-guided sliding design, permitting rapid heating and cooling of materials via horizontal furnace movement. It can connect seamlessly to six gas sources, with precise flow measurement and control facilitated by a 6-channel touchscreen mass flow controller (MFC).
This high-performance high-temperature CVD system is meticulously designed for prestigious universities, leading research institutions, and prominent industrial manufacturers to conduct crucial experiments and production processes related to chemical vapor deposition (CVD).
Revolutionary sliding-track mechanism for accelerated thermal cycling
Comprehensive multi-gas compatibility (6 independent channels)
Unmatched precision flow control via intuitive touchscreen MFC interface
Versatile applications perfect for research and small-batch production
| Parameter | Specification |
|---|---|
| Furnace Access Mode | Swing-open design |
| Furnace Movement | Rail-guided horizontal sliding for rapid heating/cooling |
| Chamber Material | Alumina refractory fiber |
| Heating Element | Aluminum-containing heating wire |
| Maximum Temperature | 1200°C |
| Operating Temperature | ≤1100°C |
| Heating Rate | ≤20°C/min (Recommended: 15°C/min) |
| Heating Zones | Dual-zone |
| Total Zone Length | 200mm + 200mm |
| Tube Material | High-purity quartz |
| Tube Diameter | 60mm |
| Sealing Method | - Quick-release flange for material loading - Stainless steel vacuum flange with silicone seal |
| Control System | Multi-segment intelligent PID programming |
| Temperature Sensor | Type N thermocouple |
| Safety Alarms | Over-temperature & thermocouple failure alarms |
| Power Supply | 220V, 50Hz |
Gas Delivery System (KJ-6Z)
| Parameter | Specification |
|---|---|
| Operating Temperature | 5~45°C |
| Maximum Pressure | 3×10 Pa |
| Gas Channels | 6 independent gas inputs |
| Flow Meter Type | Mass flow meter (other ranges available at same cost) |
| Channel A Range | 0-300 SCCM |
| Channel B Range | 0-300 SCCM |
| Channel C Range | 0-300 SCCM |
| Channel D Range | 0-300 SCCM |
| Channel E Range | 0-300 SCCM |
| Channel F Range | 0-300 SCCM |
| Line Pressure | -0.1~0.15 MPa |
| Valves | Stainless steel shut-off valves |
| Tubing | Stainless steel |
Vacuum System
| Component | Specification |
|---|---|
| Pump System | Molecular pump unit with connecting pipes |
| Power | 220V/50Hz |
| Mobility | Wheel-mounted base for easy movement |
| Ultimate Vacuum | 6.67×10³ Pa |
Standard Accessories
Quartz furnace tube (1)
High-quality vacuum flange set (1)
Key Features:
Unique sliding mechanism enabling rapid thermal cycling
Six-channel precision gas control system for optimal performance
Research-grade vacuum capabilities for precise applications
Complete turnkey solution with all essential accessories
Industrial-grade construction with extensive safety protections
Robust tube stoppers (2)
Durable O-ring seals
Protective gloves (1 pair)
Handy crucible hook (1)
High-quality PTFE tubing (3m)
Precision hex keys (2)
Comprehensive operation manual
This advanced system is meticulously designed for sophisticated CVD processes, including:
Silicon carbide coating: Elevate your product robustness with our premium silicon carbide coating solutions, meticulously designed for ultimate durability and performance.
Conductivity testing of ceramic substrates: Ensure unparalleled precision and reliability in your ceramic substrates with our advanced conductivity testing processes.
2D material growth: Discover new horizons in technology with our cutting-edge 2D material growth solutions, offering unparalleled flexibility and innovation in material science.
Controlled growth of ZnO nanostructures: Achieve superior control and precision in the growth of ZnO nanostructures, leveraging our state-of-the-art techniques for enhanced performance.
Atmosphere sintering of ceramic capacitors (MLCC): Optimize your ceramic capacitors with our atmosphere sintering process, ensuring superior electrical performance and reliability.
It also serves as a critical component in your innovative production line. Dedicated graphene film growth furnace: Experience the pinnacle of graphene production with our dedicated furnace, optimized for exceptional film quality. For graphene preparation. The furnace features a unique and innovative Sliding rail base design: Our state-of-the-art sliding rail base ensures unmatched ease and efficiency in your production process., allowing manual lateral movement to expose the tube to room temperature for swift and efficient Rapid cooling: Achieve unparalleled cooling speeds, ensuring your processes are both quick and reliable..
This equipment is particularly suitable for a variety of demanding applications, providing exceptional results for CVD experiments requiring fast heating/cooling rates: Perfectly engineered to meet the rigorous demands of your most challenging CVD applications., making it ideal for:
High-efficiency graphene synthesis: Unlock the potential of graphene with our high-efficiency synthesis processes that deliver superior material properties.
Other CVD applications demanding rapid thermal cycling: Equip your lab with the capability to handle the most demanding CVD processes.
Key Advantages: Our state-of-the-art technology brings you a host of benefits.
Precision temperature control: Achieve flawless accuracy in sensitive material growth with our advanced temperature regulation systems. For sensitive material growth: Tailored solutions that cater to the most delicate and precise material development needs.
Unique sliding mechanism: Revolutionize your workflow with our innovative sliding mechanism that accelerates processing like never before. Enables faster processing: Maximize efficiency and throughput with our groundbreaking processing technologies.
Versatile applications: Adaptable to a range of advanced material research, our products offer unprecedented flexibility. Across advanced material research: Expand your research horizons with solutions designed to facilitate groundbreaking discoveries.
Optimized for both graphene and general CVD processes: Designed for excellence in both niche and broad-spectrum applications.
Sliding Rail Tube Furnace Specifications: Detailed specifications tailored to meet the needs of your complex operations.
Furnace Section: Our furnace is engineered for high-performance and reliability, a cornerstone of your operations.
| Parameter | Specification |
|---|---|
| Furnace Structure | Sliding rail design |
| Maximum Temperature | 1200°C |
| Continuous Operating Temperature | ≤1100°C |
| Heating Rate | Up to 20°C/min (Recommended: 10°C/min) |
| Heating Zone Length | 300mm (Single zone) |
| Heating Element | Phase-resistant heating wire |
| Thermocouple | Type K |
| Temperature Accuracy | ±1°C |
| Tube Diameter Options | Φ50, Φ60, Φ80 |
| Tube Material | High-purity quartz |
| Temperature Controller | PID intelligent program control |
| Vacuum Flange | 304 stainless steel - Left flange: Equipped with needle valve + ball valve - Right flange: KF25 interface with baffle valve |
Power Supply: Robust and reliable power solutions to keep your processes running smoothly.
| Input Power | Single-phase 220V, 50Hz, 3KW |: Efficient power solutions designed for seamless integration into your operations.
Vacuum System: Cutting-edge vacuum technology that ensures optimal performance and precision.
| Component | Specification |
|---|---|
| Rotary Vane Pump with Digital Gauge | - Ultimate vacuum: 10³ Torr - Tube vacuum: 10² Torr - Pumping speed: 4CFM (2L/s, 120L/min) - Options: Rotary vane pump/diffusion pump/molecular pump available |
Mass Flow Controller System: Achieve precise control and regulation of mass flow for superior process outcomes.
| Parameter | Specification |
|---|---|
| Channels | 3-channel high precision MFC |
| Flow Range | MF1-MF3: 50-1000sccm adjustable |
| Features | - Mixing chamber at bottom - 3 manual stainless steel needle valves |
Important Notes: Essential information for the safe and effective operation of your equipment.
| Warning | Description |
|---|---|
| Pressure Limit | Tube pressure must not exceed 0.02MPa |
| Gas Cylinder Safety | Must use pressure reducer (0.01-0.1MPa recommended) |
| High Temp Operation | Above 1000°C: Maintain atmospheric pressure |
| Gas Flow Limit | <200SCCM to protect quartz tube |
| Quartz Tube Limit | Continuous use <1100°C |
| Valve Warning | Never close both valves during heating |
Certifications: Our products are backed by rigorous standards and certifications, ensuring quality and safety.
| ISO Certification | CE Certification |: Trust in our certified solutions that adhere to international safety and quality standards.
Safety Precautions: Essential safety guidelines to protect both personnel and equipment during operation.
Do not open the furnace chamber when temperature ≥200°C: Critical precaution to prevent injury and maintain operational safety. To prevent personal injury: Safeguard operator well-being with strict adherence to safety protocols.
Tube pressure must never exceed 0.02MPa (absolute pressure): Essential pressure guidelines to mitigate risk of equipment damage. During operation to avoid equipment damage from overpressure: Protect your investment with our stringent operational guidelines.
Warning: Failure to follow these precautions may lead to serious consequences. Failure to follow these precautions may result in: Adverse outcomes if operational guidelines are neglected.
Serious personal injury: Ensure safety by adhering to all recommended precautions.
Equipment damage: Avoid costly repairs by following our comprehensive safety protocols.
Safety hazards: Minimize risk by understanding and implementing our safety measures.
When furnace temperature >1000°C, the tube must not be under vacuum: Critical to maintain atmospheric pressure to ensure safety. - Maintain atmospheric pressure inside the tube: Preserving equipment integrity through careful pressure management.
Avoid closing both inlet and outlet valves simultaneously during sample heating: Critical procedure to prevent pressure build-up. If valves must be closed: Specific guidelines for safe operation during critical procedures.
Continuously monitor pressure gauge readings: Ensure constant vigilance to maintain safety and performance.
Immediately open exhaust valve if absolute pressure exceeds 0.02MPa: Rapid response protocol to avert potential hazards.
Prevents hazardous situations (tube rupture, flange ejection, etc.): Comprehensive safety measures to protect your operations.
Equipment Application & Features: Explore the extensive capabilities and innovative features of our equipment.
This high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including: Tailored for excellence in CVD applications.
Silicon carbide (SiC) coating: Achieve superior durability and performance with our SiC coating solutions.
Conductivity testing of ceramic substrates: Ensure precision and reliability in ceramic substrates with advanced testing solutions.
Controlled growth of ZnO nanostructures: Innovative solutions for precise ZnO nanostructure development.
Atmosphere sintering of ceramic capacitors (MLCC): Optimize performance and reliability of ceramic capacitors with our sintering solutions.
Primary Users: Intended for researchers, scientists, and engineers eager to push the boundaries of material science.
Our esteemed clients include prestigious universities, renowned research institutions, and leading industrial manufacturers who utilize our cutting-edge equipment for vapor deposition-related experiments and high-quality production.
Key Specifications:
Our robust Alumina (AlO) furnace tube is engineered to endure intense temperatures of up to 1600°C, ensuring unparalleled performance.
Ingeniously designed for both vacuum and atmospheric conditions, our furnace adapts seamlessly to diverse experimental needs.
Featuring a high-performance MoSi (molybdenum disilicide) heating element, our furnace guarantees efficiency and reliability.
The furnace chamber is insulated with ceramic fiber, providing outstanding thermal uniformity and exceptional energy efficiency.
Advantages:
Ensuring high temperature stability with ±1°C precision, our equipment offers unmatched control.
Experience swift heating and cooling coupled with superior heat retention, enhancing operational efficiency.
Our equipment is designed with safety and ease-of-use in mind, ensuring user-friendly operation.
It is versatile for pioneering advanced materials research, expanding possibilities for innovation.
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1700°C |
| Operating Temperature | 1600°C |
| Display | LED Screen |
| Tube Diameter | 80mm (OD) |
| Tube Material | Alumina Tube |
| Heating Zone Length | 220+220+220mm (with gaps between zones) |
| Heating Element | MoSi (Molybdenum Disilicide) |
| Heating Rate | 0-5°C/min |
| Temperature Control | - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor - 30 programmable segments for ramp/soak control - Built-in PID auto-tuning with over-temperature & thermocouple failure protection - Over-temperature alarm allows unattended operation |
| Thermocouples | 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube) |
| Temperature Accuracy | ±1°C |
| Furnace Structure | - Double-layer steel shell with dual cooling fans (surface temp <60°C) - Fixed non-openable furnace design |
| Vacuum Flange | Stainless steel vacuum flange with valve |
| Operating Voltage | 220V 50Hz |
| Maximum Power | 6kW |
Gas Delivery System
| Component | Specification |
|---|---|
| 4-Channel Mass Flow Controllers | - MFC1: 0-100sccm - MFC2: 0-200sccm - MFC3: 0-500sccm - MFC4: 0-200sccm |
| Gas Mixing | - Bottom-mounted mixing chamber with liquid release valve - 4 manual stainless steel needle valves for gas control |
Vacuum System
| Component | Specification |
|---|---|
| Vacuum Pump + Gauge | Rotary vane pump achieves 10Pa vacuum (cooled state) |
Key Features:
Boasting ultra-high temperature capability of 1700°C with MoSi heating elements, it delivers exceptional results.
Equipped with precision multi-zone temperature control ensuring ±1°C accuracy, it provides optimal control over processes.
Programmable 30-segment thermal profiles allow for detailed temperature management, enhancing experimental flexibility.
Featuring a complete gas mixing system with 4-channel mass flow controllers (MFCs), it ensures precise gas delivery.
Industrial-grade vacuum performance ensures reliable and efficient operation in demanding environments.
Safety Precautions:
Never open the furnace chamber when the temperature is ≥200°C to prevent potential personal injury.
Ensure that tube pressure never exceeds 0.02MPa (absolute pressure) during operation to prevent potential equipment damage due to overpressure.
Warning: Failure to adhere to these precautions may result in:
Serious personal injury
Significant equipment damage
Safety hazards
When furnace temperature exceeds 1000°C, avoid vacuum conditions in the tube - maintain atmospheric pressure inside to ensure safety.
Avoid simultaneously closing both inlet and outlet valves during sample heating. If closure of valves is necessary:
Continuously monitor pressure gauge readings for any irregularities
Immediately open the exhaust valve if the absolute pressure surpasses 0.02MPa
This safety measure prevents hazardous situations such as tube rupture or flange ejection.
Equipment Description
This sophisticated system integrates:
A state-of-the-art gas flow control system
An efficient liquid injection system
Multi-stage temperature-controlled growth zones for optimal processing
A reliable water cooling system to enhance performance and safety
CNT Growth Furnace Specifications:
With a maximum operating temperature of: 1400°C, continuously adjustable from 0-1400°C, it offers flexibility and precision.
Vertical thermal field distribution paired with dual-zone temperature control provides precise thermal management.
The top-mounted liquid injection port equipped with flow guide components ensures accurate delivery.
This CNT/thin-film CVD equipment facilitates:
Continuous, uninterrupted growth processes for increased productivity
Precise thermal management for controlled and reliable nanostructure synthesis Integrated liquid/gas phase delivery for complex material deposition processes
ensuring superior results in advanced material creation.
Components for the Synthesis of Carbon Nanotubes (CNT)
Technical Specifications - Comprehensive Guide to the Carbon Nanotube/Nanowire CVD Growth Furnace
| Parameter | Specification |
|---|---|
| Equipment Name | Carbon Nanotube/Nanowire CVD Growth Furnace |
| Model | KJ-T1400V |
| Furnace Structure | Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness |
| Maximum Power | 20KW |
| Voltage | AC 220V single-phase, 50/60Hz |
| Heating Element | Silicon carbide (SiC) rods |
| Max Operating Temp | 1400°C |
| Continuous Working Temp | Adjustable between 100-1400°C |
| Heating Rate | 1-10°C/min |
| Furnace Tube Material & Dimensions | Alumina tube: OD 80mm × Length 1500mm |
| Heating Zone Length | 700mm + 400mm |
| Uniform Temp Zone Length | 800mm (±1°C) |
| Thermocouple | SEI thermocouple for temperature measurement and control |
| Temperature Control System | 30-segment PID programmable control |
| Temperature Accuracy | ±1°C |
Stainless Steel Flange
This system boasts a stainless steel vacuum flange assembly, featuring precise stainless steel needle valves and a mechanical pressure gauge. The robust armored flange includes thermocouple extensions leading to the inlet, ensuring accurate temperature monitoring.
Key Features:
Utilizes a high-purity alumina tube, ensuring growth without contamination.
Offers precision temperature control with an outstanding ±1°C accuracy across an 800mm uniform zone.
Note: All specifications are subject to thorough technical verification, meticulously designed for cutting-edge nanomaterial synthesis within controlled atmospheric conditions.
Incorporates robust SiC heating elements, facilitating ultra-high temperature operations.
Provides a comprehensive gas/vacuum interface, complete with precise measurement capabilities.
Equipment Introduction
The LCD Touchscreen CVD High-Temperature Furnace is a state-of-the-art tube furnace specially designed for Chemical Vapor Deposition (CVD) processes, featuring:
A sophisticated double-layer shell structure integrated with an advanced air-cooling system, ensuring the surface temperature remains below 55°C.
30-segment PID programmable intelligent temperature control system with precision phase-angle firing technology for meticulous and precise heating.
Alumina polycrystalline fiber chamber lining for exceptional thermal insulation and remarkable uniform temperature distribution.
Applications:
Optimized Silicon Carbide (SiC) coating processes
Conductivity testing and analysis of ceramic substrates
Controlled, precision growth of ZnO nanostructures
Atmospheric sintering processes for ceramic capacitors, specifically MLCCs
Key Advantages:
Intuitive, user-friendly touchscreen interface
Cutting-edge energy-efficient thermal design
Delivers research-grade temperature uniformity
Versatile capabilities for advanced material processing applications
Fully automated operation with capabilities for unattended operation
High-Temperature Furnace Specifications
| Parameter | Specification |
|---|---|
| Furnace Structure | Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness |
| Maximum Power | 5KW |
| Voltage | AC 220V single-phase, 50Hz |
| Heating Element | Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan) |
| Max Operating Temp | 1200°C |
| Continuous Working Temp | 1100°C |
| Heating Rate | 1-10°C/min |
| Furnace Tube Material & Dimensions | Quartz tube: OD 80mm × Length 1000mm |
| Heating Zone Length | Total 440mm |
| Uniform Temp Zone Length | 150mm (±1°C) |
| Control Interface | LCD touch screen |
| Thermocouple | Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen |
| Temperature Control | 30-segment PID programmable control |
| Temperature Accuracy | ±1°C |
| Vacuum Sealing System | Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve) |
| High Vacuum System | - Control panel for molecular pump speed/vacuum level monitoring - Turbo molecular pump + dry scroll pump - All KF-25 standard connections between pumps and quartz tube |
| Vacuum Level | 6.7×10³ Pa (empty chamber, room temperature) |
| Gas Delivery System | Three mass flow controllers with ranges: • Channel 1: 1-100 sccm • Channel 2: 1-200 sccm • Channel 3: 1-500 sccm |
Key Features:
Ultra-clean, alumina-coated chamber designed for contamination-sensitive processes
Precision 3-zone temperature monitoring system with a remarkable accuracy of (±1°C)
Research-grade vacuum capability capable of achieving pressures as low as 10³ Pa
Complete, precise gas flow control system featuring triple MFC (Mass Flow Controller) channels
Industrial-grade components crafted for extended durability and reliability
){kind=link}