| Customization: | Available |
|---|---|
| After-sales Service: | on-Line Service |
| Warranty: | One Year |
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The Vacuum RTP (Rapid Thermal Processing) Annealing Furnace is an exceptional high-vacuum, fast-heating tubular furnace, ingeniously equipped with a quartz chamber and state-of-the-art vacuum flanges. Utilizing advanced halogen lamp technology, it achieves an impressive rapid heating rate, propelling temperatures upwards at an extraordinary speed of 50°C per second. This innovative furnace stands out with its PID automatic control system featuring 30 programmable segments, ensuring precision and flexibility.
Meticulously crafted for the annealing of semiconductor or solar cell substrates, this high-temperature annealing tubular furnace is a pinnacle of rapid thermal processing, expertly handling samples in vacuum or controlled atmosphere environments. Its versatility makes it a staple in university laboratories as well as industrial research facilities , facilitating a wide array of applications, including:
Thin-film deposition, where precision matters
Rapid annealing of diverse materials, optimizing performance
Silicidation for advanced material enhancement
Diffusion, crucial for uniform material distribution
Crystallization to perfect material structures
Densification, ensuring robust and durable outputs
| Parameter | 2-inch Wafer | 4-inch Wafer | 6-inch Wafer |
|---|---|---|---|
| Wafer Size | 2 inches | 4 inches | 6 inches |
| Furnace Tube Outer Diameter | 100 mm | 110-150 mm | 180 mm |
| Heating Zone Length | 200 mm | 300 mm | 400 mm |
Note: We offer customization options to meet specific customer requirements.
| Feature | Specification |
|---|---|
| Product Name | RTP Rapid Annealing Furnace |
| Operating Temperature | 900°C |
| Controller | LED (Touchscreen LED optional) |
| Furnace Chamber | Open-type, sliding rail design |
| Tube Size | Customizable based on requirements |
| Heating Element | Halogen lamps |
| Heating Rate | 0-50°C/s |
| Thermocouple | Custom-designed based on actual needs |
| Temperature Controller | 30-segment high-precision digital programmable controller |
Our sliding tube furnace system is ingeniously designed with a pair of sliding rails at its foundation, accommodating two tube furnaces simultaneously. These can be deftly maneuvered left and right for expedited cooling. This RTP rapid annealing furnace excels at heating samples across a variety of environments, including vacuum, atmospheric, and air conditions, making it indispensable for rapid annealing, silicidation, diffusion, crystallization, densification, and numerous other material processes.
| Parameter | Specification |
|---|---|
| Display | LED |
| Temperature | 1200°C |
| Continuous Operating Temp | ≤1100°C |
| Heating Rate | Recommended 0-10°C/min |
| Furnace Tube | Tube Dimensions: OD50/ID44 × L1800mm |
| First Furnace: Heating Zone Length: 350mm | |
| Second Furnace: Heating Zone Length: 150mm | |
| (Other sizes customizable based on customer requirements) | |
| Heating Element | Molybdenum Disilicide (MoSi) Heating Wire |
| Sliding Rails/Table | Chrome-Plated Steel Dual Rails, Sliding Length: 1800mm |
| (Other sizes customizable based on customer requirements) | |
| Thermocouple | Type N |
| Tube Material | High-Purity Quartz |
| Sealing Flange | Stainless Steel Water-Cooled KF25 Flange (with mechanical vacuum gauge port) |
| Temperature Accuracy | ±1°C |
| Temperature Control | Two Independently Controlled Furnaces |
| - 30-step PID Auto Control via SCR Power Regulation |
The sliding three-zone tube furnace is a marvel of rapid thermal annealing technology, featuring an 80mm outer diameter quartz tube, capable of reaching a maximum temperature of 1200°C. It is thoughtfully equipped with sliding rails, allowing seamless transition from one side of the tube to the other for both rapid heating and cooling.
For optimal heating speed, preheat the furnace to your desired temperature, then slide it effortlessly over the sample position. For equally swift cooling, simply slide the furnace away post heating, ensuring efficiency and precision.
This system represents an ideal low-cost solution for rapid thermal processing (RTP),making advanced thermal processing accessible.
| Parameter | Specification |
|---|---|
| Shell Structure | Double-layer air-cooled |
| Furnace Chamber Material | Alumina refractory fiber |
| Max Temperature | 1200°C |
| Operating Temperature | 1100°C |
| Heating Rate | 10°C/min |
| Heating Element | Resistance wire |
| Temperature Control | PID temperature regulation, supports 30-segment heating/cooling programs, with over-temperature and thermocouple break protection |
| Thermocouple | Type N |
| Heating Zone Length | 220mm + 220mm + 220mm (other sizes customizable upon request) |
| Furnace Tube Size | Ø80mm × 2400mm (other sizes customizable upon request) |
| Furnace Tube | High-purity quartz tube |
| Sliding Rails | Chrome-plated steel dual rails |
| Rail Length | ~2500mm (other sizes customizable upon request) |
| Flange | 304 stainless steel sealing flange with silicone O-ring, easy assembly, reusable |
| Compatible Gas | Inert gas (slight positive pressure) |
This custom-designed RTP (Rapid Thermal Processing) annealing furnace is composed of a RTP sliding-rail tube furnace, a highly sophisticated multi-channel mass flow controller system, and a robust vacuum system, purposefully engineered for annealing semiconductor wafers, solar cells, or other samples up to 3 inches in size.
The tube furnace utilizes cutting-edge infrared lamp heating technology, achieving an extraordinary ultra-fast heating rate of 50°C per second. It boasts a 30-segment precise temperature control system with a remarkable accuracy of ±1°C. Equipped with a user-friendly RS485 interface and control software, this furnace offers seamless computer operation and monitoring, complete with real-time temperature curve displays for enhanced user experience.
This remarkable rapid thermal processing tube furnace is extensively utilized for the large-area synthesis of 2D graphene through CVD (Chemical Vapor Deposition) techniques and is intricately optimized for the annealing of semiconductor and solar cell wafers, ensuring superior performance and quality. The advanced computer system meticulously controls the furnace in real-time using the RS485 interface, along with specifically tailored software, which effectively visualizes comprehensive temperature profiles with precision.
| Parameter | Specification |
|---|---|
| Product Name | Open-Type Dual-Zone RTP Tube Furnace |
| Operating Temperature | ≤1000ºC |
| Controller | LCD Touch Screen |
| Furnace Tube Size | Quartz Tube OD80mm/ID72mm, Single-End Open (Custom sizes available) |
| Heating Zone | 300mm (Custom lengths available) |
| Furnace Type | Open-Type |
| Heating Element | Halogen Lamp Heating |
| Heating Rate | 30ºC/min |
| Temperature Sensor | Type N Thermocouple |
| Temperature Controller | 30-Segment High-Precision Digital Programmable Controller |
Part 2: Advanced Gas Mixing System
| Parameter | Specification |
|---|---|
| Flow Range | MFC1: Argon (O) 0-200sccm MFC2: Argon (Ar) 0-200sccm |
Part 3: Efficient Vacuum System
| Component | Specification |
|---|---|
| Vacuum Pump | Rotary Vane Pump |
| Accessories | Exhaust Filter + Corrosion-Resistant Digital Vacuum Gauge |
The rapid annealing furnace comes fully equipped with vacuum flanges positioned at both termini of the furnace tube, achieving a vacuum level of up to 10-5 Torr with a molecular pump and 10-3 Torr with a mechanical pump. Ingeniously designed sliding rails are installed at the furnace's base, facilitating manual movement with ease. The heating and cooling rates can reach an impressive 100°C per minute. For expeditious heating, the furnace can be preheated to the desired temperature and then strategically repositioned to the sample area. To ensure rapid cooling, the furnace is simply moved to the opposite end following the sample's heating process. Under vacuum or inert gas conditions, the heating and cooling rates can achieve a remarkable 10°C per second, rendering it an ideal, cost-effective solution for rapid thermal processing applications.
| Parameter | Specification |
|---|---|
| Furnace Tube Dimensions | Φ60mm × 1500mm (Customizable per customer requirements) |
| Heating Zone Length | 440mm (Customizable per customer requirements) |
| Operating Temperature | ≤1100°C |
| Maximum Temperature | 1200°C |
| Temperature Control System | 30-segment PID microcomputer programmable control (Optional LCD touchscreen display) |
| Temperature Control Accuracy | ±1°C |
| Temperature Protection | Over-temperature and thermocouple break protection |
| Heating Rate | 0~10°C/min |
| Heating Element | Resistance wire |
| Gas Tightness | 4.03 × 10<sup>-3</sup> Pa |
| Furnace Chamber Material | Japanese imported chamber material, no powdering, excellent insulation, high reflectivity, uniform temperature distribution, strong resistance to thermal expansion and contraction |
| Slide Rail Dimensions | Heavy-duty steel bidirectional slide rails, sliding length: 1200mm (Customizable per customer requirements) |
| Flange Connections | Standard with two stainless steel vacuum flanges, pre-installed mechanical pressure gauge and stainless steel shut-off valve |
| Sealing System | Silicone O-ring compression seal between furnace tube and flange, easy disassembly, reusable, excellent airtightness (ensures pressure gauge remains stable for 12 hours) |
| Furnace Tube Options | Fused quartz tube or alumina tube |
| Temperature Sensor | Type N thermocouple |
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