Desktop Single-Target Magnetron Sputtering Coater

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
Diamond Member Since 2025

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Year of Establishment
2025-04-22
Registered Capital
1.48 Million USD
  • Desktop Single-Target Magnetron Sputtering Coater
  • Desktop Single-Target Magnetron Sputtering Coater
  • Desktop Single-Target Magnetron Sputtering Coater
  • Desktop Single-Target Magnetron Sputtering Coater
  • Desktop Single-Target Magnetron Sputtering Coater
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Basic Info.

Model NO.
RJ-CK200-1S
Type
Coating Production Line
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Sample Stage
Dia. 100mm
Heating Temperature
Max 500ºC
Rotate Speed
1-30rpm Adjustable
Chamber Material
High Purity Quartz
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

Desktop single-target magnetron coating instrument
This device is a single-target magnetron coating instrument, which can be used for the preparation of metal films, in the fields of electronics, optics, special ceramics, etc. It can also be used for laboratory SEM sample preparation.
This setup features a quartz vacuum chamber that allows for omnidirectional visibility of the coating process, facilitating the observation and recording of experiments. The chamber is designed to be easy to open and clean, making it highly suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample stage, which can effectively improve the uniformity of the film and the quality of the film. The whole machine is designed in a modular way, with a simple operation
logic and an intuitive interface that is easy to get started with.
The model can also be equipped with a film thickness gauge component, which can monitor the film thickness data in real time and provide reliable parameters for the experimental process.
Note: This device does not include a vacuum pump. Users should use it with a molecular pump set. Our molecular pump set is recommended.

 


Sample stage
Size 100mm Heating
temperature
500 ºC or less

Rotational speed

1-30r/min
Temperature control
accuracy

+ / - 1 ºC
Magnetron sputtering
head

Quantity

2 inches x1

Cooling method

Water cooling

Vacuum chamber
Cavity size Φ200mm X 220mm Observation
window
Omnidirectional view
Cavity material High-purity quartz Opening
method
Top cover removable

Power configuration
Number     of     DC
power supplies
1 Output
power
≤400W
Output voltage ≤600V Response
time
< 5ms
Water cooling
system
Tank volume 9L Traffic 10L/min
Film thickness
gauge
Measurement
accuracy
0.1 Angstroms Cooling
method

Water cooling

Others

Supply voltage

AC220V,50Hz
Power of the whole
machine

1kw
Desktop Single-Target Magnetron Sputtering CoaterDesktop Single-Target Magnetron Sputtering CoaterDesktop Single-Target Magnetron Sputtering CoaterDesktop Single-Target Magnetron Sputtering CoaterDesktop Single-Target Magnetron Sputtering Coater

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