| Customization: | Available |
|---|---|
| After-sales Service: | on-Line Service |
| Warranty: | One Year |
Suppliers with verified business licenses
| Feature | Specification |
|---|---|
| Structural Characteristics | The 150W RF power supply enables plasma enhancement, significantly reducing experimental temperatures. |
| • The 3-channel mass flow controller (MFC) system allows precise gas flow adjustment. | |
| Power Supply | • AC 208-220V, 50/60Hz |
| • Total power: 4KW | |
| Single-Zone Tube Furnace | • Max temperature: 1100°C (< 2h); Continuous working temperature: 1000°C |
| • PID temperature controller with 30-segment programmable remote control system | |
| • Input power: 220V, single-phase, 1.5KW | |
| • Heating zone length: 200mm; Uniform temperature zone: 100mm | |
| • Openable furnace design for rapid cooling and easy tube replacement | |
| Plasma RF Power Supply | • Output power: 0-150W adjustable (±1% stability) |
| • RF frequency: 13.56MHz (±0.005% stability) | |
| • Max reflected power: 150W | |
| • Matching: Manual tuning | |
| • RF output port: 50Ω, N-type connector | |
| • Noise: < 50dB | |
| • Cooling: Air-cooled | |
| • Current: 220V AC, 50/60Hz | |
| Quartz Tube | • High-purity quartz tube |
| • Dimensions: φ50mm × 1200mm (L) | |
| Sealing Flanges | • Pair of stainless steel quick-connect flanges (equipped with KF25 vacuum fittings) |
| Vacuum Pump (Optional, billed separately) | • Dual-stage vacuum pump |
| • KF16 flange & bellows for connecting the tube furnace to the pump | |
| 8-Channel Mass Flow Controller System (Optional, billed separately) | • 4-channel MFC system for precise gas flow control (Accuracy: ±0.02%) |
| • Flow ranges: | |
| - Channel 1: 0-100 SCCM | |
| - Channel 2: 0-200 SCCM | |
| - Channel 3: 1-200 SCCM | |
| • Voltage: 220V AC, 50/60Hz | |
| • Gas fittings: 6.35mm stainless steel tubing | |
| • Stainless steel needle valve for manual gas flow control | |
| Dimensions & Weight | • 1400mm (L) × 600mm (W) × 1240mm (H) |
| • Net weight: 90kg | |
| Warranty | • 1-year warranty, lifetime maintenance (excludes consumables like quartz tubes, O-rings, heating elements) |
| Certification | • CE certified |
| Usage Notes | • Tube pressure must not exceed 0.02MPa |
| • A pressure reducer must be installed on gas cylinders due to high internal pressure. | |
| • When furnace temperature >1000°C, the tube must not be under vacuum; internal pressure should match atmospheric pressure. | |
| • Gas flow into the tube must be <200 SCCM to avoid thermal shock from cold gas flow. | |
| • Long-term quartz tube use temperature <1100°C. | |
| • For sample heating experiments, avoid closing the pump/vent valves on the flanges. If valves are closed, monitor pressure gauges closely; immediately open the vent valve if pressure exceeds 0.02MPa. |
Plasma-Enhanced CVD System
The Plasma-Enhanced CVD (PECVD) system consists of a plasma generator, a three-zone tube furnace, a single-zone tube furnace, an RF power supply, and a vacuum system.
To enable chemical reactions at lower temperatures, this system utilizes the high reactivity of plasma to facilitate deposition. Hence, this method is referred to as Plasma-Enhanced Chemical Vapor Deposition (PECVD).
This PECVD graphene thin-film deposition system employs 13.56 MHz RF power to ionize precursor gases containing thin-film constituent atoms, generating plasma within the vacuum chamber. By leveraging the strong chemical activity of plasma, the system optimizes reaction conditions and enhances deposition kinetics, enabling the formation of high-quality thin films on substrates.
Application Scope of Plasma-Enhanced CVD System
The Plasma-Enhanced CVD (PECVD) system is suitable for various experimental applications including:
Graphene synthesis
Sulfide preparation
Nanomaterial fabrication
This system can deposit multiple thin film types on flat or similarly shaped substrates, such as:
SiOx and SiNx films
Amorphous silicon, microcrystalline silicon, and nanocrystalline silicon
SiC and diamond-like carbon (DLC) films
Both p-type and n-type doped films
The deposited films exhibit superior characteristics including:
Excellent uniformity
High density
Strong adhesion
Outstanding insulating properties
Widely applied in industrial fields such as:
Cutting tools and precision molds (for wear-resistant coatings)
Hard coatings (for enhanced durability)
High-end decorative finishes
The system demonstrates particular advantages in applications requiring:
Low-temperature deposition processes
Precise film composition control
High-quality thin film production
Plasma-Enhanced CVD System Technical Specifications:
| Three-Zone Tube Furnace | Specification |
|---|---|
| ModelRJ | RJ-PECVD50R-1200-Q |
| Tube Material | High-purity quartz |
| Tube Diameter | 50mm |
| Tube Length | 2830mm |
| Furnace Length | 660mm |
| Heating Zone Length | 200mm+200mm+200mm |
| Operating Temperature | 0~1100°C |
| Temperature Accuracy | ±1°C |
| Temperature Control Mode | 30/50-segment programmable |
| Display Mode | LCD |
| Sealing Method | 304 stainless steel vacuum flange |
| Flange Interface | 1/4" ferrule fitting, KF16/25/40 flange |
| Achievable Vacuum | 4.4E-3Pa |
| Power Supply | AC220V 50/60Hz |
| Single-Zone Tube Furnace | Specification |
|---|---|
| Model | RJ-O1200-50IT |
| Tube Material | High-purity quartz |
| Tube Diameter | 50mm |
| Tube Length | 2830mm |
| Furnace Length | 440mm |
| Heating Zone Length | 400mm |
| Uniform Temperature Zone | 200mm |
| Operating Temperature | 0~1100°C |
| Temperature Accuracy | ±1°C |
| Temperature Control Mode | 30/50-segment programmable |
| Display Mode | LCD |
| Sealing Method | 304 stainless steel vacuum flange |
| Flange Interface | 1/4" ferrule fitting, KF16/25/40 flange |
| Achievable Vacuum | 4.4E-3Pa |
| Power Supply | AC220V 50/60Hz |
| RF Output System | Specification |
|---|---|
| Operating Frequency | 13.56MHz ±0.005% |
| Operation Mode | Continuous output |
| Display Mode | LCD |
| Impedance Matching | Capable of uniform plasma distribution across three zones |
| Power Stability | ≤2W |
| Normal Reflected Power | ≤3W |
| Maximum Reflected Power | ≤70W |
| Harmonic Distortion | ≤-50dBc |
| System Efficiency | ≥70% |
| Power Factor | ≥90% |
| Power Supply | Single-phase AC (187V-253V) 50/60Hz |
| Control Mode | Internal/PLC control, analog/RS232/485 communication |
| Protection Features | DC overcurrent, amplifier overcurrent, reflected power protection |
| Cooling Method | Forced air cooling |
| Mass Flow Controller System | Specification |
|---|---|
| MFC1 Range | 0-200sccm (H) |
| MFC2 Range | 0-200sccm (CH) |
| MFC3 Range | 0-500sccm (N) |
| MFC4 Range | 0-500sccm (Ar) |
| Accuracy | ±1.5% F.S. |
| Repeatability | ±0.2% F.S. |
| Linearity | ±1% F.S. |
| Response Time | ≤4s |
| Operating Pressure | -0.15MPa ~ 0.15MPa |
| Flow Control | Touchscreen LCD, digital display, individual needle valves |
| Gas Inlet | 1/4" NPS or 6mm OD stainless tube |
| Gas Outlet | 1/4" NPS or 6mm OD stainless tube |
| Connection | Double ferrule fitting |
| Operating Temperature | 5~45°C |
| Gas Mixing | Equipped with gas mixing chamber |
| Power Supply | AC220V 50/60Hz |
| Vacuum System | Specification |
|---|---|
| Mechanical Pump | Rotary vane pump |
| Pumping Speed | 1.1L/s |
| Exhaust Port | KF16 |
| Vacuum Measurement | Pirani gauge |
| Ultimate Vacuum | 1.0E-1Pa |
| Power Supply | AC220V 50/60Hz |
| Pumping Port | KF16 |
| Additional Features | Specification |
|---|---|
| Rail System | 3m length, enables sliding of three-zone furnace for rapid heating/cooling |
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