Three-Target Magnetron Sputtering Coater Instrument

• Customization: Available
• After-sales Service: on-Line Service
• Warranty: One Year
• Model NO.: RJ-CK325-3S
• Type: Coating Production Line
• Coating: Vacuum Coating
• Substrate: Steel
• Certification: CE
• Condition: New
• Sample Stage: Dia. 100mm
• Heating Temperature: Max 500ºC
• Rotate Speed: 1-30rpm Adjustable
• Chamber Material: High Purity Quartz
• Transport Package: Wooden Case
• Specification: Customized
• Trademark: RJ
• Origin: Zhengzhou, China

Product Description

(Three Targets: 2×500W DC, 1×500W RF)
Three-Target Magnetron Sputtering Coating System
Sample Stage	Size	Φ100-200mm	Temperature Accuracy	±1°C
	Heating Temperature	Up to 500°C	Rotation Speed	1-30 rpm adjustable
Magnetron Sputtering Heads	Quantity	2" ×3 (1", 2" optional)	Chiller Specifications	10L/min flow rate
	Cooling Method	Water-cooled
Vacuum Chamber	Chamber Size	φ320mm × 380mm	Viewport	φ100mm
	Chamber Material	Stainless Steel	Opening Method	Top-lifting
Mass Flow Controller	2 channels; Range: 100sccm (customizable for multi-channel gas paths as needed)
Vacuum System	Model	CY-GZK103-A	Pumping Port	KF40
	Molecular Pump	FJ-150	Exhaust Port	KF16
	Backing Pump	GHD-031B	Vacuum Measurement	Compound Vacuum Gauge
	Ultimate Vacuum	10E-5Pa	Power Supply	AC 220V, 50/60Hz
	Pumping Speed	Molecular Pump: 150L/s; Rotary Pump: 4L/s; Overall Performance: 20 min to reach 10E-3Pa
Power Configuration	Quantity	DC Power Supply, RF Power Supply	Max Output Power	DC: 500W; RF: 300W
Other Specifications	Operating Voltage	AC 220V, 50Hz	Dimensions	1100mm × 650mm × 1280mm
	Total Power	3.5 kW	Weight	300 kg
	Ultimate Vacuum Level	10E-5Pa

Triple-Target Magnetron Sputtering Coating System

The triple-target magnetron sputtering coating system is a cost-effective, self-developed thin-film deposition device featuring standardization, modularity, and customization.

Key Features:

• Target Options: 1-inch or 2-inch magnetron targets, allowing customers to choose based on substrate size.

• Power Supply:

  • 500W DC power supply for depositing metal films.

  • 300W RF power supply for depositing non-metal films.

  • Three targets enable multi-layer or repeated coating.

  • Customizable power options (DC, RF, pulsed) available in 300W-1000W configurations.

• Gas Control System:

  • Standard: Two high-precision mass flow controllers (MFCs).

  • Upgradable: Up to four MFCs for complex gas environments.

• Vacuum System:

  • Standard turbo molecular pump with an ultimate vacuum of 10^(-5)  Pa.

  • Optional alternative pump models available.

  • Electrically controlled valves allow sample exchange without shutting down the pump, significantly improving efficiency.

• Control System:

  • Optional integrated industrial PC for automated control, including:

    • Vacuum pump management

    • Sputtering power adjustment

    • And other advanced functions to enhance experimental efficiency.

Applications:

This system is ideal for depositing single or multi-layer films, including:

• Ferroelectric films

• Conductive films

• Alloy films

• Semiconductor films

• Ceramic films

• Dielectric films

• Optical films

• Oxide films

• Hard coatings

• PTFE (Teflon) films

Advantages Over Competing Systems:

• Wide applicability across diverse materials.

• Compact design for easy operation.

• An ideal solution for laboratory-scale thin-film preparation.

This triple-target magnetron sputtering system combines performance, flexibility, and user-friendly operation, making it a top choice for advanced material research and development.