| Customization: | Available |
|---|---|
| After-sales Service: | on-Line Service |
| Warranty: | One Year |
Suppliers with verified business licenses
Equipment Introduction
The RJ150-XK is a tubular diffusion/oxidation furnace designed meticulously for cutting-edge R&D applications across enterprises, universities, and research institutes. It elegantly supports an array of complex processes, including:
Polysilicon and silicon nitride deposition
Diffusion
Oxidation
Annealing
Versatile processing capabilities tailored for advanced material research
Precision temperature control ensures consistent, reliable results
Compact design optimized exclusively for lab environments
Product Features:
1. Seamlessly accommodates myriad processes such as polysilicon and silicon nitride deposition, diffusion, oxidation, annealing, and more.
2. Employs a highly reliable industrial computer + PLC system to execute full automation of furnace temperature, boat movement, gas flow, and valves, ensuring a completely automated operation.
3. Boasts a user-friendly interface, facilitating effortless modification of control parameters and real-time monitoring of process statuses.
4. Offers a selection of multiple process pipelines for user convenience.
5. Equipped with robust software functionalities, including self-diagnostic tools, drastically reducing maintenance time.
6. Automatic adjustments of the constant temperature zone and cascade control ensure precise temperature regulation within the reaction tube.
7. Features alarms and protective functions against over-temperature, thermocouple breakage, short circuits, and aberrations in process gas flow.
8. Offers customizable products tailored to customer-specific requirements.
Technical Specifications
| Model | KJ150-XK |
|---|---|
| Operating Temperature | ≤1300ºC |
| Wafer Size | 2~8 inches (round wafers) |
| Number of Process Tubes | 1~2 tubes per unit |
| Constant Temperature Zone Length | 300~600mm |
| Constant Temperature Zone Accuracy | ≤±0.5ºC |
| Temperature Stability | ≤±0.5ºC/24h |
| Temperature Ramp Rate | Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min |
| Safety Alarms & Protections | Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions |
Technical Specifications
| Parameter | Specification |
|---|---|
| Heating Zone Length | 400mm |
| Furnace Tube Dimensions | Diameter: 50mm, Length: 900mm |
| Furnace Tube Material | High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable) |
| Operating Temperature | ≤1100°C |
| Maximum Temperature | 1200°C |
| Temperature Sensor | Type N thermocouple |
| Temperature Control | Intelligent 30-segment PID programmable microcomputer control with auto-tuning |
| Temperature Accuracy | ±1°C |
| Temperature Protection | Over-temperature and thermocouple breakage protection |
| Heating Rate | 0-20°C/min |
| Heating Element | Alloy resistance wire |
| Operating Voltage | AC220V, single-phase, 50Hz |
| Maximum Power | 3KW |
| Furnace Chamber Material | Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution |
| Flange | Stainless steel vacuum flange, easy to disassemble |
| Sealing System | O-ring compression seal between furnace tube and flange, reusable, high airtightness |
| Fluidization Zone | 1. Reaction gas uniformly passes through the reaction zone. 2. Solid particles are fluidized by gas in the heating zone. 3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments. |
| Note | Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size. |
| Shell Structure | Double-layer shell with air-cooling system, openable design |
| Furnace Structure | Vertical structure |
| Parameter | Specification |
|---|---|
| Internal Temperature | ≤45ºC |
| Measurement & Control Devices | |
| Name | Dual-channel Mass Flow Controller (MFC) |
| Gas Channels | 2 channels |
| Flow Control | Digital display, each gas line with independent needle valve control |
| Connection Method | Double ferrule fitting |
| Flow Meter | Mass flow meter |
| Flow Range | MFC1: N 0-10 SLM MFC2: CO 0-10 SLM |
| Gas Mixing | Equipped with a precision gas mixing chamber |
| Power Supply | 220V, 50Hz |
| Operating Ambient Temp. | 5ºC~45ºC |
| Standard Accessories | Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4, high-temperature gloves ×1 pair, crucible hook ×1, hex wrench for flange disassembly ×1, warranty card & manual ×1 set |
Equipment Introduction
The vertical dual-zone CVD system is primarily composed of:
A 1200°C dual-zone tube furnace
A 3-channel mass flow controller (MFC) gas supply system
A 2L/s vacuum pump accompanied by essential connecting components
The system is smoothly maneuverable on directional and swivel casters at its base, ensuring a compact footprint and remarkable mobility.
Expertly crafted for cutting-edge CVD processes, this advanced system is perfectly suited for renowned universities, pioneering research centers, and forward-thinking industrial manufacturers to perform experiments and production tasks involving chemical vapor deposition with unparalleled precision.
(Note: Structured for clarity while maintaining technical accuracy and natural English flow.)
Specifications of the State-of-the-Art Fluidized Bed Tube Furnace
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1200°C |
| Operating Temperature | ≤1100°C |
| Display | LCD touch screen |
| Tube Diameter | 40mm (OD) |
| Tube Material | Custom high-purity quartz tube |
| Furnace Tube Length | Approx. 1100mm (customizable) |
| Heating Element | Premium heating wire |
| Heating Rate | 0-10°C/min |
| Temperature Control | - Programmable 30-segment time-temperature curves - Touchscreen multi-segment PID control - Data logging with Excel export capability - Built-in over-temperature and thermocouple failure protection |
| Thermocouple | Type N thermocouple |
| Sealing Method | Custom stainless steel vacuum flange with sealing |
| Furnace Chamber | - Double-layer steel shell with dual cooling fans - Dual-zone vertical open structure for easy tube access - Alumina refractory fiber lining for energy efficiency |
| Vacuum Flange | Stainless steel vacuum flange with valve |
| Operating Voltage | 220V, 50Hz |
| Power Rating | 6KW (customizable) |
Gas Delivery System: Cutting-Edge 3-Channel Mass Flow Control System
| Parameter | Specification |
|---|---|
| Power Supply | 220V/50Hz, maximum output 18W |
Key Features Include:
Sophisticated touchscreen control with robust data recording capabilities
Innovative Dual-zone vertical design for supreme thermal management
Integrated, comprehensive gas flow control system
Design with a focus on safety, incorporating multiple protection features
Customizable components tailored for specific research objectives
Note: Specifications can be tailored to meet specific requirements. This system merges precise temperature control with efficient gas delivery, ideal for advanced CVD applications.
| Parameter | Specification |
|---|---|
| Maximum Pressure | 3×10 Pa |
| Gas Channels | Can simultaneously connect 3 gas sources to slightly positive pressure |
| Flow Meter | Mass flow meter (other ranges optional) |
| Channel A Range | 1 SLM |
| Channel B Range | 1 SLM |
| Channel C Range | 1 SLM |
| Gas Line Pressure | -0.1 ~ 0.15 MPa |
| Accuracy | ±1% F.S. |
| Shut-off Valve | Stainless steel |
| Gas Line Tubing | 1/4" stainless steel tube |
Components of the Vacuum System
| Component | Specification |
|---|---|
| Vacuum Pump | 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube |
| Vacuum Gauge | Included (standard configuration) |
Primary Application Highlights:
This revolutionary dual-zone sliding-track CVD tube furnace boasts a precision rail-guided sliding design, enabling rapid heating and cooling of materials by horizontally mobilizing the furnace. It seamlessly connects six diverse gas sources, with exact flow measurement and control facilitated through a touchscreen-enabled 6-channel mass flow controller (MFC).
This cutting-edge high-temperature CVD system is meticulously designed for prestigious universities, esteemed research institutions, and innovative industrial manufacturers to undertake experiments and production processes centered around chemical vapor deposition (CVD) with exceptional efficiency.
Ingenious Sliding-track mechanism ensuring swift thermal cycling
Compatibility with multiple gases (6 meticulously controlled independent channels)
Precision flow control via an intuitive touchscreen MFC interface
Versatile in applications across research and small-batch production offering limitless possibilities
| Parameter | Specification |
|---|---|
| Furnace Access Mode | Swing-open design |
| Furnace Movement | Rail-guided horizontal sliding for rapid heating/cooling |
| Chamber Material | Alumina refractory fiber |
| Heating Element | Aluminum-containing heating wire |
| Maximum Temperature | 1200°C |
| Operating Temperature | ≤1100°C |
| Heating Rate | ≤20°C/min (Recommended: 15°C/min) |
| Heating Zones | Dual-zone |
| Total Zone Length | 200mm + 200mm |
| Tube Material | High-purity quartz |
| Tube Diameter | 60mm |
| Sealing Method | - Quick-release flange for material loading - Stainless steel vacuum flange with silicone seal |
| Control System | Multi-segment intelligent PID programming |
| Temperature Sensor | Type N thermocouple |
| Safety Alarms | Over-temperature & thermocouple failure alarms |
| Power Supply | 220V, 50Hz |
Gas Delivery System (KJ-6Z)
| Parameter | Specification |
|---|---|
| Operating Temperature | 5~45°C |
| Maximum Pressure | 3×10 Pa |
| Gas Channels | 6 independent gas inputs |
| Flow Meter Type | Mass flow meter (other ranges available at same cost) |
| Channel A Range | 0-300 SCCM |
| Channel B Range | 0-300 SCCM |
| Channel C Range | 0-300 SCCM |
| Channel D Range | 0-300 SCCM |
| Channel E Range | 0-300 SCCM |
| Channel F Range | 0-300 SCCM |
| Line Pressure | -0.1~0.15 MPa |
| Valves | Stainless steel shut-off valves |
| Tubing | Stainless steel |
Vacuum System
| Component | Specification |
|---|---|
| Pump System | Molecular pump unit with connecting pipes |
| Power | 220V/50Hz |
| Mobility | Wheel-mounted base for easy movement |
| Ultimate Vacuum | 6.67×10³ Pa |
Standard Accessories Available
Quartz furnace tube (1)
Vacuum flange set (1)
Key Features Include:
Unique sliding mechanism for expedited thermal cycling
High-precision six-channel gas control system
Vacuum capabilities suitable for research-grade requirements
Complete turnkey solution, inclusive of all essential accessories
Built with industrial-grade construction and robust safety protections
Tube stoppers (2)
Durable O-ring seals
Protective gloves (1 pair) for safe handling
Crucible hook (1) for convenient use
PTFE tubing (3m) for seamless integration
Hex keys (2) for assembly and maintenance
Comprehensive operation manual
This system is exquisitely engineered for Seamlessly engineered for excellence, our PVD Coating Machine embraces the future with advanced CVD processes that redefine precision and efficiency.Our comprehensive suite of capabilities includes:
The unrivaled Silicon carbide coating, setting new standards in durability and performance.
Conductivity testing of ceramic substrates, ensuring ultimate reliability and superior outcomes.
Innovative 2D material growth that pushes the boundaries of material science.
Expertly controlled growth of ZnO nanostructures, enabling cutting-edge applications.
Atmosphere sintering of ceramic capacitors (MLCC), enhancing product longevity and stability.
Our versatile machine is expertly designed to serve as a dedicated graphene film growth furnace for meticulous graphene preparation. The furnace is expertly crafted and features a state-of-the-art sliding rail base designthat facilitates manual lateral movement, seamlessly exposing the tube to room temperature for swift and efficient rapid coolingwithout compromising structural integrity.
This meticulously designed equipment is particularly suitable for CVD experiments demanding accelerated heating/cooling ratesand is the epitome of innovation, perfect for:
High-efficiency graphene synthesis, achieving unparalleled quality.
Other CVD applications that demand rapid thermal cycling, ensuring consistent performance.
Key Advantages that set us apart:
Unparalleled precision temperature control for delicate and sensitive material growth,
A unique sliding mechanism that dramatically enhances processing speed,
Versatile applications spanning across advanced material research, empowering innovative discoveries.
Masterfully optimized for both graphene and general CVD processes, leading the field in adaptability.
Discover the Sliding Rail Tube Furnace Specifications that guarantee excellence:
Furnace Section
| Parameter | Specification |
|---|---|
| Furnace Structure | Sliding rail design |
| Maximum Temperature | 1200°C |
| Continuous Operating Temperature | ≤1100°C |
| Heating Rate | Up to 20°C/min (Recommended: 10°C/min) |
| Heating Zone Length | 300mm (Single zone) |
| Heating Element | Phase-resistant heating wire |
| Thermocouple | Type K |
| Temperature Accuracy | ±1°C |
| Tube Diameter Options | Φ50, Φ60, Φ80 |
| Tube Material | High-purity quartz |
| Temperature Controller | PID intelligent program control |
| Vacuum Flange | 304 stainless steel - Left flange: Equipped with needle valve + ball valve - Right flange: KF25 interface with baffle valve |
Power Supply
| Input Power | Single-phase 220V, 50Hz, 3KW |
Vacuum System: Featuring precision engineering for optimal performance.
| Component | Specification |
|---|---|
| Rotary Vane Pump with Digital Gauge | - Ultimate vacuum: 10³ Torr - Tube vacuum: 10² Torr - Pumping speed: 4CFM (2L/s, 120L/min) - Options: Rotary vane pump/diffusion pump/molecular pump available |
Mass Flow Controller System: Ensuring consistent and reliable results.
| Parameter | Specification |
|---|---|
| Channels | 3-channel high precision MFC |
| Flow Range | MF1-MF3: 50-1000sccm adjustable |
| Features | - Mixing chamber at bottom - 3 manual stainless steel needle valves |
Important Notes to ensure safe and optimal operation.
| Warning | Description |
|---|---|
| Pressure Limit | Tube pressure must not exceed 0.02MPa |
| Gas Cylinder Safety | Must use pressure reducer (0.01-0.1MPa recommended) |
| High Temp Operation | Above 1000°C: Maintain atmospheric pressure |
| Gas Flow Limit | <200SCCM to protect quartz tube |
| Quartz Tube Limit | Continuous use <1100°C |
| Valve Warning | Never close both valves during heating |
Certifications: Your assurance of quality and compliance with
| ISO Certification | CE Certification |
Safety Precautions: Adhere strictly to ensure a safe working environment.
Never open the furnace chamber when temperatures reach or exceed 200°C to prevent any risk of personal injury.
Tube pressure must strictly remain below 0.02MPa (absolute pressure) during operation to avert the risk of damage from overpressure.
Warning: Your safety is paramount. Neglecting these precautions may lead to:
Severe personal injury, which we are committed to helping you prevent.
Potential equipment damage, safeguarding your investment.
Avoidance of safety hazards ensures a secure operational environment.
When temperatures exceed 1000°C, ensure atmospheric pressure is maintained inside the tube - this is essential to prevent any adverse occurrences.
Prevent closing both inlet and outlet valves simultaneously during sample heating to avoid pressure build-up. If it is necessary to close valves:
Vigilantly monitor pressure gauge readings
and promptly open the exhaust valve if absolute pressure exceeds 0.02MPa
to prevent hazardous situations such as tube rupture or flange ejection.
Equipment Application & Features: Engineered for excellence.
This high-temperature CVD tube furnace is meticulously designed for advanced chemical vapor deposition (CVD) processes, encompassing:
High-performance Silicon carbide (SiC) coating, delivering unmatched results.
Accurate conductivity testing of ceramic substrates, ensuring maximum reliability.
Controlled growth of ZnO nanostructures, expanding the horizons of innovation.
Atmosphere sintering of ceramic capacitors (MLCC) seamlessly enhances the production process with precision.
Primary Users:
Our innovative solutions cater to universities, leading research institutions, and industrial manufacturers engaged in cutting-edge vapor deposition-related experiments and production.
Key Specifications:
The robust Alumina (AlO) furnace tube withstands remarkable temperatures up to 1600°C, ensuring optimal performance and reliability.
Experience the flexibility of a vacuum and atmosphere-capable design, engineered for versatile applications.
Equipped with high-performance MoSi (molybdenum disilicide) heating elements, it guarantees exceptional heat efficiency.
The furnace chamber features advanced ceramic fiber insulation, providing outstanding thermal uniformity and superior energy efficiency.
Advantages:
Remarkable high-temperature stability with an impressive precision of ±1°C.
Experience rapid heating and cooling cycles with superior heat retention capabilities.
Designed for safe and user-friendly operation, ensuring ease of use.
Versatility redefined for advanced materials research, empowering innovation.
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1700°C |
| Operating Temperature | 1600°C |
| Display | LED Screen |
| Tube Diameter | 80mm (OD) |
| Tube Material | Alumina Tube |
| Heating Zone Length | 220+220+220mm (with gaps between zones) |
| Heating Element | MoSi (Molybdenum Disilicide) |
| Heating Rate | 0-5°C/min |
| Temperature Control | - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor - 30 programmable segments for ramp/soak control - Built-in PID auto-tuning with over-temperature & thermocouple failure protection - Over-temperature alarm allows unattended operation |
| Thermocouples | 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube) |
| Temperature Accuracy | ±1°C |
| Furnace Structure | - Double-layer steel shell with dual cooling fans (surface temp <60°C) - Fixed non-openable furnace design |
| Vacuum Flange | Stainless steel vacuum flange with valve |
| Operating Voltage | 220V 50Hz |
| Maximum Power | 6kW |
Gas Delivery System
| Component | Specification |
|---|---|
| 4-Channel Mass Flow Controllers | - MFC1: 0-100sccm - MFC2: 0-200sccm - MFC3: 0-500sccm - MFC4: 0-200sccm |
| Gas Mixing | - Bottom-mounted mixing chamber with liquid release valve - 4 manual stainless steel needle valves for gas control |
Vacuum System
| Component | Specification |
|---|---|
| Vacuum Pump + Gauge | Rotary vane pump achieves 10Pa vacuum (cooled state) |
Key Features:
Boasting ultra-high temperature capability up to 1700°C with MoSi heating elements, it sets new standards.
Enjoy precision multi-zone temperature control with ±1°C accuracy for consistent results.
Programmable 30-segment thermal profiles for tailored process flexibility and control.
Comprehensive gas mixing system equipped with 4-channel MFCs for precision delivery.
Achieve industrial-grade vacuum performance, ensuring unparalleled reliability.
Safety Precautions:
Safety first: Never open the furnace chamber when the temperature is ≥200°C to protect against personal injury.
Ensure tube pressure always remains below 0.02MPa (absolute pressure) during operation to prevent equipment damage from overpressure.
Warning: Ignoring these precautions may result in:
Serious personal injury,
potential equipment damage,
and other safety hazards.
When furnace temperature exceeds 1000°C, avoid vacuum conditions within the tube - maintain atmospheric pressure to ensure safety.
Avoid simultaneous closure of both inlet and outlet valves during sample heating. If closure is necessary:
Continuously monitor pressure gauge readings for safety.
Open exhaust valve immediately if absolute pressure exceeds 0.02MPa
to prevent hazardous situations like tube rupture or flange ejection.
Equipment Description
This advanced system integrates:
A sophisticated gas flow control system,
An efficient liquid injection system,
Multi-stage, temperature-controlled growth zones for precise operations,
And a reliable water cooling system.
CNT Growth Furnace Specifications:
Maximum operating temperature: An impressive 1400°C, continuously adjustable from 0-1400°C.
Featuring vertical thermal field distribution with dual-zone temperature control for enhanced precision.
Top-mounted liquid injection port with integrated flow guide components.
This CNT/thin-film CVD equipment facilitates:
Continuous and uninterrupted growth processes,
Delivering precise thermal management, for controlled synthesis of nanostructures.
Integrated liquid and gas phase delivery for comprehensive process control. for complex material deposition
Carbon nanotube (CNT) synthesis components
Technical Specifications - Carbon Nanotube/Nanowire CVD Growth Furnace
| Parameter | Specification |
|---|---|
| Equipment Name | Carbon Nanotube/Nanowire CVD Growth Furnace |
| Model | KJ-T1400V |
| Furnace Structure | Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness |
| Maximum Power | 20KW |
| Voltage | AC 220V single-phase, 50/60Hz |
| Heating Element | Silicon carbide (SiC) rods |
| Max Operating Temp | 1400°C |
| Continuous Working Temp | Adjustable between 100-1400°C |
| Heating Rate | 1-10°C/min |
| Furnace Tube Material & Dimensions | Alumina tube: OD 80mm × Length 1500mm |
| Heating Zone Length | 700mm + 400mm |
| Uniform Temp Zone Length | 800mm (±1°C) |
| Thermocouple | SEI thermocouple for temperature measurement and control |
| Temperature Control System | 30-segment PID programmable control |
| Temperature Accuracy | ±1°C |
Stainless Steel Flange
The system includes a stainless steel vacuum flange assembly (equipped with stainless steel needle valves and mechanical pressure gauge). The armored flange allows thermocouple extension to the inlet for temperature monitoring.
Key Features:
High-purity alumina tube for contamination-free growth
Precision temperature control (±1°C) across 800mm uniform zone
Note: All specifications subject to technical verification. Designed for advanced nanomaterial synthesis under controlled atmospheres.
Robust SiC heating elements for ultra-high temperature operation
Complete gas/vacuum interface with measurement capabilities
Equipment Introduction
The LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:
Double-layer shell structure with an air-cooling system, keeping the surface temperature below 55°C
30-segment PID programmable intelligent temperature control with phase-angle firing for precise heating
Alumina polycrystalline fiber chamber lining for excellent thermal insulation and uniform temperature distribution
Applications:
Silicon carbide (SiC) coating
Conductivity testing of ceramic substrates
Controlled growth of ZnO nanostructures
Atmosphere sintering of ceramic capacitors (MLCC)
Key Advantages:
User-friendly touchscreen interface
Energy-efficient thermal design
Research-grade temperature uniformity
Versatile for advanced material processing
Fully automated operation with unattended capability
High-Temperature Furnace Specifications
| Parameter | Specification |
|---|---|
| Furnace Structure | Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness |
| Maximum Power | 5KW |
| Voltage | AC 220V single-phase, 50Hz |
| Heating Element | Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan) |
| Max Operating Temp | 1200°C |
| Continuous Working Temp | 1100°C |
| Heating Rate | 1-10°C/min |
| Furnace Tube Material & Dimensions | Quartz tube: OD 80mm × Length 1000mm |
| Heating Zone Length | Total 440mm |
| Uniform Temp Zone Length | 150mm (±1°C) |
| Control Interface | LCD touch screen |
| Thermocouple | Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen |
| Temperature Control | 30-segment PID programmable control |
| Temperature Accuracy | ±1°C |
| Vacuum Sealing System | Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve) |
| High Vacuum System | - Control panel for molecular pump speed/vacuum level monitoring - Turbo molecular pump + dry scroll pump - All KF-25 standard connections between pumps and quartz tube |
| Vacuum Level | 6.7×10³ Pa (empty chamber, room temperature) |
| Gas Delivery System | Three mass flow controllers with ranges: • Channel 1: 1-100 sccm • Channel 2: 1-200 sccm • Channel 3: 1-500 sccm |
Key Features:
Ultra-clean alumina-coated chamber for contamination-sensitive processes
Precision 3-zone temperature monitoring (±1°C)
Research-grade vacuum capability down to 10³ Pa
Complete gas flow control with triple MFC channels
Industrial-grade components with extended durability
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