Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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Year of Establishment
2025-04-22
Registered Capital
1.48 Million USD
  • Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System
  • Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System
  • Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System
  • Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System
  • Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System
  • Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System

Equipment Introduction

TheRJ150-XKemerges as an extraordinarytubular diffusion/oxidation furnace,ingeniously designed for cutting-edge R&D applications spanning enterprises, universities, and highly regarded research institutes. This adaptable equipment masterfully supports a plethora of pivotal processes, including:

  • Polysiliconandsilicon nitridedeposition

  • Diffusion

  • Oxidation

  • Annealing

Key Features:

  • Comprehensive processing capabilitiescrafted for avant-garde material research

  • Meticulous temperature controlguarantees consistently exceptional results

  • Sleek designoptimized for effortless integration in laboratory settings
    Product Features:

    1. Masterfully accommodates an extensive array of processes, including polysilicon, silicon nitride, diffusion, oxidation, annealing, and more.
    2. Utilizes a formidable industrial computer + PLC setup, offering fully automated command over furnace temperature, boat movement, gas flow, and valves, facilitating seamless process automation.
    3. Features a user-friendly human-machine interface, allowing seamless process control adjustments and real-time process status updates.
    4. Outfitted with multiple process pipelines, providing users with convenient selection choices.
    5. Integrates potent software attributes, including self-diagnostic utilities that significantly diminish maintenance endeavors.
    6. Incorporates automatic constant temperature zone adjustments and cascade control for precise regulation of actual process temperatures within the reaction tube.
    7. Incorporates essential alarms and protective functions for circumstances such as over-temperature, thermocouple damage, short circuits, and anomalies in process gas flow.
    8. Offers bespoke product solutions to cater to unique customer specifications.

Technical Specifications

Model KJ150-XK
Operating Temperature ≤1300ºC
Wafer Size 2~8 inches (round wafers)
Number of Process Tubes 1~2 tubes per unit
Constant Temperature Zone Length 300~600mm
Constant Temperature Zone Accuracy ≤±0.5ºC
Temperature Stability ≤±0.5ºC/24h
Temperature Ramp Rate Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min
Safety Alarms & Protections Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions

The **RJ-1200T-V50** is a sophisticated **vertical fluidized bed CVD system** meticulously designed for **powder surface deposition experiments**. Boasting an **openable design**, the furnace affords easy access for quartz tube removal and processed particle collection post-experimentation.

Within the furnace tube, a **0.2mm porous quartz plate** (customizable pore sizes available) is strategically placed. Powder is positioned atop this porous plate, with gas introduced from the **tube's base**. As gas permeates the porous plate, it adeptly **fluidizes the sample particles**, keeping them suspended within the heating zone for optimal deposition.

**Note:** During particle fluidization, excessive gas flow may cause **particles to escape the heating zone**. Thus, the gas flow rate must be finely tuned in accordance with **particle size** during experimentation.Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System

Technical Specifications

Parameter Specification
Heating Zone Length 400mm
Furnace Tube Dimensions Diameter: 50mm, Length: 900mm
Furnace Tube Material High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Sensor Type N thermocouple
Temperature Control Intelligent 30-segment PID programmable microcomputer control with auto-tuning
Temperature Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple breakage protection
Heating Rate 0-20°C/min
Heating Element Alloy resistance wire
Operating Voltage AC220V, single-phase, 50Hz
Maximum Power 3KW
Furnace Chamber Material Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution
Flange Stainless steel vacuum flange, easy to disassemble
Sealing System O-ring compression seal between furnace tube and flange, reusable, high airtightness
Fluidization Zone 1. Reaction gas uniformly passes through the reaction zone.
2. Solid particles are fluidized by gas in the heating zone.
3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.
Note Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.
Shell Structure Double-layer shell with air-cooling system, openable design
Furnace Structure Vertical structure
Parameter Specification
Internal Temperature ≤45ºC
Measurement & Control Devices  
Name Dual-channel Mass Flow Controller (MFC)
Gas Channels 2 channels
Flow Control Digital display, each gas line with independent needle valve control
Connection Method Double ferrule fitting
Flow Meter Mass flow meter
Flow Range MFC1: N 0-10 SLM
MFC2: CO 0-10 SLM
Gas Mixing Equipped with a precision gas mixing chamber
Power Supply 220V, 50Hz
Operating Ambient Temp. 5ºC~45ºC
Standard Accessories Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,
high-temperature gloves ×1 pair, crucible hook ×1,
hex wrench for flange disassembly ×1, warranty card & manual ×1 set
Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System

Equipment Introduction

The vertical dual-zone CVD system is composed of the following advanced components:

  • Astate-of-the-art 1200°C dual-zone tube furnace

  • A3-channel mass flow controller (MFC) gas supply system,

  • Ahigh-efficiency 2L/s vacuum pumpwith comprehensive connecting components

This system featuresdirectional and swivel castersat the base, ensuring asleek and compact footprint, paving the way for effortless mobility throughout your facility space.

Expertly Designed foradvanced CVD processes, this cutting-edge system is perfectly ideal foresteemed universities, pioneering research centers, and innovative industrial manufacturersconducting sophisticated experiments and high-caliber production involvingstate-of-the-art chemical vapor deposition.

(Note: Structured for clarity while meticulously maintaining technical accuracy and a smooth flow of natural English.)

Fluidized Bed Tube Furnace Specifications

Parameter Specification
Maximum Temperature 1200°C
Operating Temperature ≤1100°C
Display LCD touch screen
Tube Diameter 40mm (OD)
Tube Material Custom high-purity quartz tube
Furnace Tube Length Approx. 1100mm (customizable)
Heating Element Premium heating wire
Heating Rate 0-10°C/min
Temperature Control - Programmable 30-segment time-temperature curves
- Touchscreen multi-segment PID control
- Data logging with Excel export capability
- Built-in over-temperature and thermocouple failure protection
Thermocouple Type N thermocouple
Sealing Method Custom stainless steel vacuum flange with sealing
Furnace Chamber - Double-layer steel shell with dual cooling fans
- Dual-zone vertical open structure for easy tube access
- Alumina refractory fiber lining for energy efficiency
Vacuum Flange Stainless steel vacuum flange with valve
Operating Voltage 220V, 50Hz
Power Rating 6KW (customizable)

Gas Delivery System: Advanced 3-Channel Mass Flow Control System

Parameter Specification
Power Supply 220V/50Hz, maximum output 18W

Key Features:

  1. Cutting-edge touchscreen control system with seamless data recording capabilities

  2. Ingenious dual-zone vertical design for unmatched optimal thermal management

  3. Comprehensive and integrated gas flow control system

  4. Safety-centric design featuring multiple cutting-edge protection features

  5. Tailor-made components that are highly adaptable for specific research demands

Note: Specifications can be precisely tailored to meet exacting requirements. This system harmoniously fuses intricate temperature control with an efficient gas delivery system for groundbreaking CVD applications.

Parameter Specification
Maximum Pressure 3×10 Pa
Gas Channels Can simultaneously connect 3 gas sources to slightly positive pressure
Flow Meter Mass flow meter (other ranges optional)
Channel A Range 1 SLM
Channel B Range 1 SLM
Channel C Range 1 SLM
Gas Line Pressure -0.1 ~ 0.15 MPa
Accuracy ±1% F.S.
Shut-off Valve Stainless steel
Gas Line Tubing 1/4" stainless steel tube

Vacuum System Components

Component Specification
Vacuum Pump 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube
Vacuum Gauge Included (standard configuration)


Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System

Primary Application:

Thisinnovative dual-zone sliding-track CVD tube furnacefeatures an advancedrail-guided sliding design, enabling rapid thermal transitions with its horizontally sliding furnace. It can seamlessly connectsix individual gas sources, with precise flow measurement and control facilitated through asophisticated touchscreen 6-channel mass flow controller (MFC).

Thishigh-performance high-temperature CVD systemis meticulously crafted forprestigious universities, avant-garde research institutions, and forward-thinking industrial manufacturersto facilitate extraordinary experiments and production expertly tailored tocutting-edge chemical vapor deposition (CVD).

Key Features:

  • Innovative sliding-track mechanismenabling swift and efficient thermal cycling

  • Multi-gas compatibility(featuring 6 independent channels)

  • Precision flow controlthrough an intuitive and sophisticated touchscreen MFC interface

  • Versatile utilityfor both research and small-batch production initiatives

    Parameter Specification
    Furnace Access Mode Swing-open design
    Furnace Movement Rail-guided horizontal sliding for rapid heating/cooling
    Chamber Material Alumina refractory fiber
    Heating Element Aluminum-containing heating wire
    Maximum Temperature 1200°C
    Operating Temperature ≤1100°C
    Heating Rate ≤20°C/min (Recommended: 15°C/min)
    Heating Zones Dual-zone
    Total Zone Length 200mm + 200mm
    Tube Material High-purity quartz
    Tube Diameter 60mm
    Sealing Method - Quick-release flange for material loading
    - Stainless steel vacuum flange with silicone seal
    Control System Multi-segment intelligent PID programming
    Temperature Sensor Type N thermocouple
    Safety Alarms Over-temperature & thermocouple failure alarms
    Power Supply 220V, 50Hz

    Gas Delivery System (KJ-6Z)

    Parameter Specification
    Operating Temperature 5~45°C
    Maximum Pressure 3×10 Pa
    Gas Channels 6 independent gas inputs
    Flow Meter Type Mass flow meter (other ranges available at same cost)
    Channel A Range 0-300 SCCM
    Channel B Range 0-300 SCCM
    Channel C Range 0-300 SCCM
    Channel D Range 0-300 SCCM
    Channel E Range 0-300 SCCM
    Channel F Range 0-300 SCCM
    Line Pressure -0.1~0.15 MPa
    Valves Stainless steel shut-off valves
    Tubing Stainless steel

    Vacuum System

    Component Specification
    Pump System Molecular pump unit with connecting pipes
    Power 220V/50Hz
    Mobility Wheel-mounted base for easy movement
    Ultimate Vacuum 6.67×10³ Pa

    Standard Accessories

  • High-quality Quartz furnace tube (1)

  • Comprehensive Vacuum flange set (1)

  • Key Features:

  • The unique sliding mechanism ensures rapid and efficient thermal cycling efficiency

  • A state-of-the-art six-channel precision gas control system

  • Research-grade vacuum capability

  • Complete turnkey solution equipped with all the essential accessories needed

  • Industrial-grade construction robustly fortified with top-tier safety protections

  •  
  • Durable Tube stoppers (2)

  • High-quality O-ring seals

  • Protective Gloves (1 Pair): Safeguard your hands with our durable, high-quality protective gloves, essential for ensuring safety during all operational procedures.

  • Crucible Hook (1): An indispensable tool, this expertly crafted crucible hook is designed for ease of handling and secure management of crucibles in high-temperature environments.

  • PTFE Tubing (3m): This premium PTFE tubing provides superior chemical resistance and flexibility, perfect for a variety of laboratory and industrial applications requiring durable tubing solutions.

  • Hex Keys (2): Precision-engineered hex keys offer reliability and ease of use for all your equipment assembly and maintenance needs, ensuring seamless operation.

  • Operation Manual: Comprehensive and user-friendly, our operation manual guides you through every aspect of system setup, operation, and maintenance for optimal performance.
    Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System

    This system is explicitly designed for: Tailored specifically for high-performance applications, our system excels in:CVD Processes: Experience unparalleled precision with our system, ideal for Chemical Vapor Deposition processes in cutting-edge research and manufacturing., including:

  • Silicon Carbide Coating: Achieve superior silicon carbide coatings with our advanced technology, ensuring exceptional durability and performance.

  • Conductivity Testing of Ceramic Substrates: Our system facilitates precise conductivity testing of ceramic substrates, supporting innovation in material science.

  • 2D Material Growth: Pioneering the way for next-gen materials, our system supports the growth of two-dimensional materials with unrivaled accuracy.

  • Controlled Growth of ZnO Nanostructures: Enable precise control over ZnO nanostructure growth, fostering advancements in nanotechnology.

  • Atmosphere Sintering of Ceramic Capacitors (MLCC): Perfect for the atmosphere sintering of ceramic capacitors, our system ensures optimal electrical performance.

  • It also serves as aDedicated Graphene Film Growth Furnace: A specialized furnace crafted for graphene film growth, empowering researchers and manufacturers alike.for graphene preparation. The furnace features aSliding Rail Base Design: Intuitive and efficient, the sliding rail base design facilitates easy manipulation for various processing needs., allowing manual lateral movement to expose the tube to room temperature forRapid Cooling: Achieve rapid cooling with precision, essential for maintaining structural integrity and expediting research cycles..

    This equipment is particularly suitable forCVD Experiments Requiring Fast Heating/Cooling Rates: Designed for experiments demanding swift thermal adjustments, ensuring accuracy and efficiency., making it ideal for:

  • High-Efficiency Graphene Synthesis: Maximize graphene yield and quality with our high-efficiency synthesis capabilities, setting new standards in material innovation.

  • Other CVD Applications Demanding Rapid Thermal Cycling: From research to production, our system excels in delivering rapid thermal cycling for diverse CVD applications.

  • Key Advantages:
    Precision Temperature Control: Achieve unparalleled precision in temperature management, vital for the growth of sensitive materials.for sensitive material growth.
    Unique Sliding Mechanism: Our innovative sliding mechanism streamlines processes, enhancing productivity and reducing cycle times.enables faster processing.
    Versatile Applications: From graphene to general CVD processes, our system adapts effortlessly to support diverse research and industrial applications.across advanced material research.
    Optimized for both graphene and general CVD processes: Our system's versatility makes it a cornerstone for advancements in CVD technology.

    Sliding Rail Tube Furnace Specifications

    Furnace Section: The heart of your operation, engineered for reliability and advanced thermal performance.

    Parameter Specification
    Furnace Structure Sliding rail design
    Maximum Temperature 1200°C
    Continuous Operating Temperature ≤1100°C
    Heating Rate Up to 20°C/min (Recommended: 10°C/min)
    Heating Zone Length 300mm (Single zone)
    Heating Element Phase-resistant heating wire
    Thermocouple Type K
    Temperature Accuracy ±1°C
    Tube Diameter Options Φ50, Φ60, Φ80
    Tube Material High-purity quartz
    Temperature Controller PID intelligent program control
    Vacuum Flange 304 stainless steel
    - Left flange: Equipped with needle valve + ball valve
    - Right flange: KF25 interface with baffle valve

    Power Supply
    | Input Power | Single-phase 220V, 50Hz, 3KW |: Effortlessly power your operations with our robust and efficient power supply specifications.

    Vacuum System: Engineered for optimal performance in vacuum conditions, ensuring the integrity and precision of your processes.

    Component Specification
    Rotary Vane Pump with Digital Gauge - Ultimate vacuum: 10³ Torr
    - Tube vacuum: 10² Torr
    - Pumping speed: 4CFM (2L/s, 120L/min)
    - Options: Rotary vane pump/diffusion pump/molecular pump available

    Mass Flow Controller System: Achieve precise control over gas flow rates, essential for consistent and repeatable results.

    Parameter Specification
    Channels 3-channel high precision MFC
    Flow Range MF1-MF3: 50-1000sccm adjustable
    Features - Mixing chamber at bottom
    - 3 manual stainless steel needle valves

    Important Notes: Crucial insights and guidelines to maximize the utility and longevity of your equipment.

    Warning Description
    Pressure Limit Tube pressure must not exceed 0.02MPa
    Gas Cylinder Safety Must use pressure reducer (0.01-0.1MPa recommended)
    High Temp Operation Above 1000°C: Maintain atmospheric pressure
    Gas Flow Limit <200SCCM to protect quartz tube
    Quartz Tube Limit Continuous use <1100°C
    Valve Warning Never close both valves during heating

    Certifications
    | ISO Certification | CE Certification |: Our equipment meets the highest international standards, guaranteeing quality and safety.

    Safety Precautions:

  • Do not open the furnace chamber when temperature ≥200°C: To ensure safety, never open the chamber at high temperatures, preventing injury.to prevent personal injury.

  • Tube pressure must never exceed 0.02MPa (absolute pressure): Adhere to pressure guidelines to safeguard equipment integrity and avoid damage.during operation to avoid equipment damage from overpressure.

  • Warning:Failure to follow these precautions may result in:

  • Serious Personal Injury: Adhering to safety protocols is paramount to preventing harm to personnel.

  • Equipment Damage: Protect your investment by following operational guidelines to prevent damage.

  • Safety Hazards: Maintain a safe working environment by adhering to all safety precautions.

  •  
  • When furnace temperature >1000°C, the tube must not be under vacuum: Keep the tube at atmospheric pressure to prevent equipment failure.- maintain atmospheric pressure inside the tube.

  • Avoid closing both inlet and outlet valves simultaneously during sample heating: Ensures a safe and efficient heating process.If valves must be closed:

    • Continuously Monitor Pressure Gauge Readings: Vigilant monitoring prevents potential hazards and ensures operational safety.

    • Immediately open exhaust valve if absolute pressure exceeds 0.02MPa: Prevents hazardous situations by maintaining safe pressure levels.

    • Prevents Hazardous Situations (tube rupture, flange ejection, etc.): Follow these protocols to avert accidents and ensure safety.
      Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System
      Equipment Application & Features: Discover the full range of applications and features that make our equipment a leader in the industry.

      This state-of-the-art high-temperature CVD tube furnace is meticulously crafted for chemical vapor deposition (CVD) processes, providing unparalleled performance for applications such as:

      Silicon carbide (SiC) coating, ensuring superior quality and efficiency.

      Conductivity testing of ceramic substrates, delivering precise and reliable results.

      Controlled growth of ZnO nanostructures, advancing cutting-edge nanotechnology.

      Atmosphere sintering of ceramic capacitors (MLCC), optimizing production and enhancing durability.

      Primary Users:
      Our distinguished clientele encompasses renowned universities, pioneering research institutions, and leading industrial manufacturers. These esteemed partners are deeply involved in advanced vapor deposition experiments and production processes, continually driving the envelope of innovation and development.

      Key Specifications:

      Expertly crafted with precision, the Alumina (AlO) furnace tube is engineered to withstand extraordinary temperatures reaching up to 1600°C, ensuring unmatched resilience and durability in the most extreme conditions.

      Designed with unparalleled versatility, the system's vacuum & atmosphere-capable configuration offers remarkable adaptability to meet diverse operational requirements.

      The heating element, constructed of cutting-edge MoSi (molybdenum disilicide), delivers unparalleled performance and reliability that is second to none.

      Encased in advanced ceramic fiber insulation, the furnace chamber guarantees superior thermal uniformity and exceptional energy efficiency, perfecting operational excellence.

      Advantages:
      Unmatched in precision, this system maintains exceptional high-temperature stability with an accuracy of ±1°C, ensuring consistently reliable results.
      Experience swift heating and cooling phases with outstanding heat retention capabilities, streamlining your process cycles and boosting productivity.
      Engineered for user safety and convenience, our system offers an intuitive user interface designed to maximize safety and operational satisfaction.
      This equipment is a versatile powerhouse, ideally suited for cutting-edge materials research and pushing the boundaries of scientific discovery.

      Parameter Specification
      Maximum Temperature 1700°C
      Operating Temperature 1600°C
      Display LED Screen
      Tube Diameter 80mm (OD)
      Tube Material Alumina Tube
      Heating Zone Length 220+220+220mm (with gaps between zones)
      Heating Element MoSi (Molybdenum Disilicide)
      Heating Rate 0-5°C/min
      Temperature Control - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor
      - 30 programmable segments for ramp/soak control
      - Built-in PID auto-tuning with over-temperature & thermocouple failure protection
      - Over-temperature alarm allows unattended operation
      Thermocouples 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)
      Temperature Accuracy ±1°C
      Furnace Structure - Double-layer steel shell with dual cooling fans (surface temp <60°C)
      - Fixed non-openable furnace design
      Vacuum Flange Stainless steel vacuum flange with valve
      Operating Voltage 220V 50Hz
      Maximum Power 6kW

      Gas Delivery System

      Component Specification
      4-Channel Mass Flow Controllers - MFC1: 0-100sccm
      - MFC2: 0-200sccm
      - MFC3: 0-500sccm
      - MFC4: 0-200sccm
      Gas Mixing - Bottom-mounted mixing chamber with liquid release valve
      - 4 manual stainless steel needle valves for gas control

      Vacuum System

      Component Specification
      Vacuum Pump + Gauge Rotary vane pump achieves 10Pa vacuum (cooled state)

      Key Features:

    • Boasting an impressive capability to achieve ultra-high temperatures of 1700°C, powered by MoSi heating elements, our system sets a new benchmark in thermal performance.

    • Enjoy precision multi-zone temperature control with an exceptional accuracy of ±1°C, allowing for detailed thermal management and optimization.

    • Customizable programmable 30-segment thermal profiles offer flexibility and control, enabling you to tailor your processes with expert precision.

    • Our comprehensive gas mixing system features 4-channel MFCs, ensuring precise and efficient gas delivery for optimal process conditions.

    • Delivering industrial-grade vacuum performance, our system ensures peak operational efficiency and reliability even under the most strenuous conditions.

      Safety Precautions:

    • It is crucial to avoid opening the furnace chamber when the temperature exceeds 200°C to ensure operator safety and mitigate potential hazards.to prevent personal injury.

    • Tube pressure must be closely monitored to ensure it does not exceed 0.02MPa (absolute pressure) during operation, preventing equipment damage from overpressure.during operation to avoid equipment damage from overpressure.

    • Warning:Failure to adhere to these critical safety precautions can result in:

    • severe personal injury,

    • potential equipment damage,

    • or significant safety hazards, emphasizing the importance of strict compliance with operational guidelines.

    •  
    • When the furnace temperature exceeds 1000°C, it is imperative to maintain atmospheric pressure inside the tube, as vacuum conditions are strictly prohibited to protect the equipment's integrity.- maintain atmospheric pressure inside the tube.

    • Ensure a seamless operation by avoiding the simultaneous closure of both inlet and outlet valves during sample heating, thereby preventing any adverse conditions.Should the closure of valves be necessary:

      • It is crucial to maintain a vigilant eye on the pressure gauge readings at all times.

      • Take immediate action by opening the exhaust valve if the absolute pressure exceeds 0.02MPa. This proactive step safeguards against potential hazards like tube ruptures or flange ejection.

      • Mitigates risks such as tube rupture and flange ejection, ensuring safety and reliability.
        Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System

        Equipment Description

        This state-of-the-art system seamlessly integrates:

      • an advanced, precision-engineered gas flow control system,

      • a durable and efficient liquid injection system,

      • multi-stage, temperature-controlled growth zones for high-precision applications,

      • and a dependable water cooling system designed to enhance operational stability.

      • CNT Growth Furnace Specifications:

      • Engineered to reach a maximum operating temperature of 1400°C, this furnace offers continuously adjustable parameters from 0 to 1400°C, catering to a wide range of application needs.1400°C, with continuous adjustability from 0-1400°C for maximum versatility.

      • Featuring a unique vertical thermal field distribution,incorporatingdual-zone temperature control to ensure precise thermal management,

      • the strategically positioned top-mounted liquid injection portis enhanced with flow guide components, optimizing material deposition.

      • ThisInnovative CNT/Thin-Film CVD equipmentprovides:
        seamless, continuous growth processes,
        exacting thermal managementfor meticulously controlled nanostructure synthesis,
        and an integrated liquid/gas phase delivery systemfor intricate material deposition, setting a new standard in material science innovation.

      • Unveiling the pinnacle of precision and innovation: Carbon Nanotube (CNT) Synthesis Components. Engineered to propel your research and development processes to new heights.

        Technical Specifications - Embark on a journey into unparalleled precision with our Carbon Nanotube/Nanowire CVD Growth Furnace, your gateway to revolutionary advancements.

        Parameter Specification
        Equipment Name Carbon Nanotube/Nanowire CVD Growth Furnace
        Model KJ-T1400V
        Furnace Structure Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness
        Maximum Power 20KW
        Voltage AC 220V single-phase, 50/60Hz
        Heating Element Silicon carbide (SiC) rods
        Max Operating Temp 1400°C
        Continuous Working Temp Adjustable between 100-1400°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Alumina tube: OD 80mm × Length 1500mm
        Heating Zone Length 700mm + 400mm
        Uniform Temp Zone Length 800mm (±1°C)
        Thermocouple SEI thermocouple for temperature measurement and control
        Temperature Control System 30-segment PID programmable control
        Temperature Accuracy ±1°C

        Crafted with precision: Stainless Steel Flange, ensuring enduring durability and optimal performance in any application.
        Transform your setup with our comprehensive system, featuring a rugged stainless steel vacuum flange assembly equipped with premium stainless steel needle valves and a mechanical pressure gauge. The armored flange ensures seamless thermocouple extensions to the inlet, providing precise temperature monitoring for optimal performance.

        Key Features that distinguish us:

      • Achieve unrivaled purity with our High-purity alumina tube, meticulously designed for contamination-free growth processes.

      • Experience the pinnacle of precision: Maintain temperature control within ±1°C over an extensive 800mm uniform zone, ensuring consistent, high-quality results with every use.

      • Note: Specifications are subject to rigorous technical verification. This furnace is expertly crafted for advanced nanomaterial synthesis under meticulously controlled atmospheric conditions.

      • Empower your operations with our Robust SiC heating elements, designed for ultra-high temperature functionality and exceptional reliability.

      • Benefit from our comprehensive gas/vacuum interface, offering extensive measurement capabilities for proactive and efficient process management.
        Microwave Plasma Chemical Vapor Deposition (MPCVD) Furnace for Single-Crystal Diamond Deposition System

        A Glimpse into Our Equipment:

        The zenith of technological innovation:LCD Touchscreen CVD High-Temperature Furnacestands as atube furnacemasterfully designed forOur state-of-the-art CVD processes redefine innovation, offering unparalleled precision and efficiency.and boasting features that set new benchmarks, such as:

      • An advanced double-layer shell structure,complemented seamlessly by an ingenioushighly efficient air-cooling system,designed to maintain optimal surface temperatures belowa safe and consistent 55°C.

      • A sophisticated 30-segment PID programmable intelligent temperature control system,skillfully integrated withcutting-edge phase-angle firing technologyfor precise, reliable heating solutions.

      • An Alumina polycrystalline fiber chamber lining,ensuringexceptional thermal insulation capabilitiesandconsistent, uniform temperature distribution.

      • Applications that redefine the horizons of possibility:
        Pioneering advanced Silicon carbide (SiC) coating techniques,
        Precision conductivity testing tailored meticulously for ceramic substrates,
        Controlled, innovative growth of ZnO nanostructures for cutting-edge solutions,
        Atmosphere sintering processes engineered for ceramic capacitors (MLCC).

        Key Advantages that empower groundbreaking performance:

      • An intuitive, user-friendly touchscreen interface for unparalleled ease of use,

      • A cutting-edge, energy-efficient thermal design that sets new standards,

      • Unrivaled research-grade temperature uniformity for precise experiments,

      • Versatility that empowers pioneering advanced material processing techniques.

      •  
      • Fully automated operation,offeringunmatched capability for unattended operation.

        High-Temperature Furnace Specifications that impress even the most discerning:

        Parameter Specification
        Furnace Structure Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness
        Maximum Power 5KW
        Voltage AC 220V single-phase, 50Hz
        Heating Element Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)
        Max Operating Temp 1200°C
        Continuous Working Temp 1100°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Quartz tube: OD 80mm × Length 1000mm
        Heating Zone Length Total 440mm
        Uniform Temp Zone Length 150mm (±1°C)
        Control Interface LCD touch screen
        Thermocouple Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen
        Temperature Control 30-segment PID programmable control
        Temperature Accuracy ±1°C
        Vacuum Sealing System Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)
        High Vacuum System - Control panel for molecular pump speed/vacuum level monitoring
        - Turbo molecular pump + dry scroll pump
        - All KF-25 standard connections between pumps and quartz tube
        Vacuum Level 6.7×10³ Pa (empty chamber, room temperature)
        Gas Delivery System Three mass flow controllers with ranges:
        • Channel 1: 1-100 sccm
        • Channel 2: 1-200 sccm
        • Channel 3: 1-500 sccm

        Key Features that define a new standard of excellence:

      • An ultra-clean, alumina-coated chamber,ideal for contamination-sensitive processes, ensuring pristine outcomes.

      • Precision 3-zone temperature monitoring,maintained with incredible accuracy within (±1°C).

      • Top-tier research-grade vacuum capability,achieving pressures as low as 10³ Pa, essential for high-precision tasks.

      • Comprehensive gas flow control,facilitated by versatile triple MFC channels for optimal regulation.

      • Industrial-grade componentsthat boast extended durability, meeting all your demanding needs with ease.

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