Versatile Dual-Target Magnetron Sputtering Coating Solution

• Customization: Available
• After-sales Service: on-Line Service
• Warranty: One Year
• Type: Coating Production Line
• Coating: Vacuum Coating
• Substrate: Steel
• Certification: CE
• Condition: New
• Sample Stage: Dia. 100mm
• Heating Temperature: Max 500ºC
• Rotate Speed: 1-30rpm Adjustable
• Chamber Material: High Purity Quartz
• Transport Package: Wooden Case
• Specification: Customized
• Trademark: RJ
• Origin: Zhengzhou, China

Product Description

Desktop Dual-Target Magnetron Sputtering System
(Modular Co-Sputtering System for Advanced Thin-Film Deposition)

 

Key Specifications

Component	Parameters
Sample Stage	- Diameter: 100-150mm - Heating: ≤500°C (±1°C) - Rotation: 1-20 rpm adjustable
Magnetron Targets	- Quantity: 2× 2-inch - Cooling: Water-cooled (10L/min flow rate)
Vacuum Chamber	- Dimensions: Φ219mm × 280mm (stainless steel) - Viewport: φ40mm quartz window - Loading: Front/top-opening design with rotatable shutter for target switching
Power Supply	- DC + RF: 1×300W (max), ≤600V, response time <5ms
Cooling System	- Water tank: 9L capacity, 10L/min flow rate
Thickness Monitor	- Accuracy: 0.1Å (optional, water-cooled)
Vacuum Pump	- Primary: Rotary vane pump (1.1L/s) - Secondary: Turbo molecular pump (60L/s, import-grade) - Ports: KF40 (inlet), KF16 (outlet)
General	- Power: AC 220V, 50Hz, 4.5kW total

 

Features

1. Multi-Layer Deposition
   • Dual-target co-sputtering with mechanical shutter for sequential/pulsed deposition.
   • Heated rotating stage ensures film uniformity (e.g., for alloy/oxide stacks).
2. High-Vacuum Performance
   • Stainless steel chamber (base pressure <10^-5 Pa with recommended pump).
   • Compact import-grade turbo pump minimizes footprint while maintaining 60L/s speed.
3. Process Control
   • Optional real-time thickness monitoring (0.1Å resolution).
   • Front-loading design with quartz window for in-situ observation.

 

Applications

• Electronics: Conductive/metallic films (e.g., Au, Al, Cu).
• Optics: Anti-reflection/IR coatings.
• Research: Multilayer SEM samples, ceramic thin films (with RF power).

 

Technical Notes

• Pump Not Included - Compatible with imported turbo molecular pumps (e.g., Pfeiffer HiPace 80).
• Upgradable: Add pulsed DC or additional RF power for reactive sputtering.

 

Why Choose This System?
 Space-Saving: Desktop design (optimized for labs with limited space).
 Flexible Deposition: Switch targets without breaking vacuum.
 Industrial-Grade Precision: ±1°C temperature control, fast pump-down.
For OEM configurations (e.g., 4-target systems), contact our engineering team.

 

*Note: All specifications comply with ISO 9001. Custom gas manifolds (e.g., 4-channel MFC) available upon request.*