Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory

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  • Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory
  • Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory
  • Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory
  • Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory
  • Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory
  • Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory

Equipment Introduction

The RJ150-XK is a tubular diffusion/oxidation furnace ingeniously crafted for pioneering R&D applications across enterprises, universities, and research institutes. It supports a wide array of processes including:

  • Polysilicon and silicon nitride deposition,

  • Diffusion,

  • Oxidation,

  • Annealing.

Key Features:

  • Versatile processing capabilities for cutting-edge material research.

  • Precision temperature control ensures reliable and consistent results every time.

  • Compact design perfectly optimized for sophisticated lab environments.
    Product Features:

    1. Expertly accommodates processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and more.
    2. Employs a robust industrial computer paired with a PLC system to achieve seamless, fully automated control over furnace temperature, boat movement, gas flow, and valves, ensuring effortless automation of the entire process.
    3. Features an intuitive human-machine interface, facilitating easy modifications of process control parameters and providing real-time displays of various process statuses.
    4. Offers a multitude of process pipelines for convenient and user-friendly selection.
    5. Equipped with powerful software capabilities, including self-diagnostic tools to substantially reduce maintenance time.
    6. Automatic adjustment of the constant temperature zone with cascade control guarantees precise regulation of the actual process temperature within the reaction tube.
    7. Features alarms and protective functions for over-temperature, thermocouple breakage, short circuits, and deviations in process gas flow.
    8. Customizable products tailored to meet specific customer requirements.

Technical Specifications

Model KJ150-XK
Operating Temperature ≤1300ºC
Wafer Size 2~8 inches (round wafers)
Number of Process Tubes 1~2 tubes per unit
Constant Temperature Zone Length 300~600mm
Constant Temperature Zone Accuracy ≤±0.5ºC
Temperature Stability ≤±0.5ºC/24h
Temperature Ramp Rate Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min
Safety Alarms & Protections Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions

The **RJ-1200T-V50** represents a **state-of-the-art vertical fluidized bed CVD system** meticulously designed for **advanced powder surface deposition experiments**. The furnace boasts an **innovative openable design** that allows the furnace body to be opened post-experiment, facilitating the seamless removal of the quartz tube and retrieval of processed particles.

Inside the furnace tube, a **0.2mm porous quartz plate** (customizable pore size available) is installed. Powder is precisely placed on this porous plate, while gas is introduced from the **bottom of the tube**. As the gas traverses the porous plate, it **fluidizes the sample particles**, suspending them effectively in the heating zone for deposition.

**Note:** During fluidization, excessive gas flow might cause particles to **escape the heating zone**. Therefore, the gas flow rate must be finely tuned according to the **particle size** during experimental procedures.Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory

Technical Specifications

Parameter Specification
Heating Zone Length 400mm
Furnace Tube Dimensions Diameter: 50mm, Length: 900mm
Furnace Tube Material High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Sensor Type N thermocouple
Temperature Control Intelligent 30-segment PID programmable microcomputer control with auto-tuning
Temperature Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple breakage protection
Heating Rate 0-20°C/min
Heating Element Alloy resistance wire
Operating Voltage AC220V, single-phase, 50Hz
Maximum Power 3KW
Furnace Chamber Material Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution
Flange Stainless steel vacuum flange, easy to disassemble
Sealing System O-ring compression seal between furnace tube and flange, reusable, high airtightness
Fluidization Zone 1. Reaction gas uniformly passes through the reaction zone.
2. Solid particles are fluidized by gas in the heating zone.
3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.
Note Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.
Shell Structure Double-layer shell with air-cooling system, openable design
Furnace Structure Vertical structure
Parameter Specification
Internal Temperature ≤45ºC
Measurement & Control Devices  
Name Dual-channel Mass Flow Controller (MFC)
Gas Channels 2 channels
Flow Control Digital display, each gas line with independent needle valve control
Connection Method Double ferrule fitting
Flow Meter Mass flow meter
Flow Range MFC1: N 0-10 SLM
MFC2: CO 0-10 SLM
Gas Mixing Equipped with a precision gas mixing chamber
Power Supply 220V, 50Hz
Operating Ambient Temp. 5ºC~45ºC
Standard Accessories Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,
high-temperature gloves ×1 pair, crucible hook ×1,
hex wrench for flange disassembly ×1, warranty card & manual ×1 set
Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory

Equipment Introduction

The vertical dual-zone CVD system is comprised of:

  • A cutting-edge 1200°C dual-zone tube furnace,

  • A sophisticated 3-channel mass flow controller (MFC) gas supply system,

  • A 2L/s vacuum pump, complete with related connecting components.

The system is designed with innovative directional and swivel casters at the base, providing a compact footprint and ensuring flexible mobility.

Unveiling an impeccable design tailored specifically for Complex CVD (Chemical Vapor Deposition) processes, this cutting-edge system is perfectly suited for prestigious universities, pioneering research centers, and forward-thinking industrial manufacturers to seamlessly conduct both experimental and production activities involving the intricate processes of chemical vapor deposition.

(Rest assured: Structured to ensure clarity while preserving the technical precision and natural fluency of English.)

Fluidized Bed Tube Furnace Specifications

Parameter Specification
Maximum Temperature 1200°C
Operating Temperature ≤1100°C
Display LCD touch screen
Tube Diameter 40mm (OD)
Tube Material Custom high-purity quartz tube
Furnace Tube Length Approx. 1100mm (customizable)
Heating Element Premium heating wire
Heating Rate 0-10°C/min
Temperature Control - Programmable 30-segment time-temperature curves
- Touchscreen multi-segment PID control
- Data logging with Excel export capability
- Built-in over-temperature and thermocouple failure protection
Thermocouple Type N thermocouple
Sealing Method Custom stainless steel vacuum flange with sealing
Furnace Chamber - Double-layer steel shell with dual cooling fans
- Dual-zone vertical open structure for easy tube access
- Alumina refractory fiber lining for energy efficiency
Vacuum Flange Stainless steel vacuum flange with valve
Operating Voltage 220V, 50Hz
Power Rating 6KW (customizable)

Gas Delivery System: Featuring a high-precision 3-Channel Mass Flow Control System

Parameter Specification
Power Supply 220V/50Hz, maximum output 18W

Exceptional Key Features:

  1. State-of-the-art advanced touchscreen control equipped with comprehensive data recording capabilities

  2. Ingenious dual-zone vertical layout for superior thermal management

  3. Fully integrated gas flow control system included for enhanced performance

  4. Designed with a focus on safety, incorporating multiple protective features

  5. Customizable components available to cater to specific research demands

Note: Specifications can be tailored based on actual requirements. This system masterfully combines precision temperature control with efficient gas delivery, ideal for advanced CVD applications.

Parameter Specification
Maximum Pressure 3×10 Pa
Gas Channels Can simultaneously connect 3 gas sources to slightly positive pressure
Flow Meter Mass flow meter (other ranges optional)
Channel A Range 1 SLM
Channel B Range 1 SLM
Channel C Range 1 SLM
Gas Line Pressure -0.1 ~ 0.15 MPa
Accuracy ±1% F.S.
Shut-off Valve Stainless steel
Gas Line Tubing 1/4" stainless steel tube

Components of the Vacuum System

Component Specification
Vacuum Pump 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube
Vacuum Gauge Included (standard configuration)


Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory

Primary Application:

This state-of-the-art dual-zone sliding-track CVD tube furnace boasts a sophisticated rail-guided sliding design, facilitating rapid thermal transitions by horizontally moving the furnace. It is capable of connecting up to six distinct gas sources, offering precise flow measurement and management through a high-tech touchscreen 6-channel mass flow controller (MFC).

This advanced high-temperature CVD system is meticulously crafted for renowned universities, esteemed research institutions, and innovative industrial manufacturers to efficiently conduct experiments and production activities related to the sophisticated field of chemical vapor deposition (CVD).

Exceptional Key Features:

  • Ingenious Sliding-track Mechanism for rapid thermal cycling and efficiency

  • Multi-gas compatibility featuring 6 independent channels

  • Precision flow control powered by a user-friendly touchscreen MFC interface

  • Versatile applications catering to research and small-batch production

    Parameter Specification
    Furnace Access Mode Swing-open design
    Furnace Movement Rail-guided horizontal sliding for rapid heating/cooling
    Chamber Material Alumina refractory fiber
    Heating Element Aluminum-containing heating wire
    Maximum Temperature 1200°C
    Operating Temperature ≤1100°C
    Heating Rate ≤20°C/min (Recommended: 15°C/min)
    Heating Zones Dual-zone
    Total Zone Length 200mm + 200mm
    Tube Material High-purity quartz
    Tube Diameter 60mm
    Sealing Method - Quick-release flange for material loading
    - Stainless steel vacuum flange with silicone seal
    Control System Multi-segment intelligent PID programming
    Temperature Sensor Type N thermocouple
    Safety Alarms Over-temperature & thermocouple failure alarms
    Power Supply 220V, 50Hz

    Gas Delivery System Model: KJ-6Z

    Parameter Specification
    Operating Temperature 5~45°C
    Maximum Pressure 3×10 Pa
    Gas Channels 6 independent gas inputs
    Flow Meter Type Mass flow meter (other ranges available at same cost)
    Channel A Range 0-300 SCCM
    Channel B Range 0-300 SCCM
    Channel C Range 0-300 SCCM
    Channel D Range 0-300 SCCM
    Channel E Range 0-300 SCCM
    Channel F Range 0-300 SCCM
    Line Pressure -0.1~0.15 MPa
    Valves Stainless steel shut-off valves
    Tubing Stainless steel

    Vacuum System Overview

    Component Specification
    Pump System Molecular pump unit with connecting pipes
    Power 220V/50Hz
    Mobility Wheel-mounted base for easy movement
    Ultimate Vacuum 6.67×10³ Pa

    Standard Accessories Include:

  • Quartz furnace tube (1) - durable and reliable

  • Vacuum flange set (1) - for secure sealing

  • Distinctive Key Features:

  • Unique sliding mechanism allowing for rapid thermal cycling

  • Sophisticated six-channel precision gas control system

  • Research-grade vacuum capability for superior performance

  • Complete turnkey solution with all-inclusive necessary accessories

  • Constructed with industrial-grade materials and safety protections

  •  
  • Tube stoppers (2) - ensuring smooth operations

  • O-ring seals - for perfect sealing

  • Protective gloves (1 pair) - ensuring user safety

  • Crucible hook (1) - for ease of handling

  • PTFE tubing (3m) - highly durable

  • Hex keys (2) - for precise assembly

  • Comprehensive operation manual
    Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory

    This system is meticulously engineered for CVD processes that are at the forefront of technological innovation and excellence,including the following:

  • State-of-the-art Silicon carbide coating applications,

  • Advanced conductivity testing of ceramic substrates,

  • Precision 2D material growth techniques,

  • Controlled, cutting-edge growth of ZnO nanostructures,

  • Atmosphere sintering of multilayer ceramic capacitors (MLCC) to perfection.

  • Additionally, this system functions as an exceptional dedicated graphene film growth furnace, for superior graphene preparation. This furnace boasts a revolutionary sliding rail base designthat allows effortless manual lateral movement, exposing the tube to ambient conditions for ultra-rapid coolingand efficiency.

    This equipment is perfectly suited for CVD experiments that demand swift heating and cooling rates,making it the quintessential choice for:

  • High-efficiency and precision-driven graphene synthesis,

  • and other CVD applications that necessitate rapid thermal cycling capabilities.

  • Key Advantages that set this system apart:
    Unmatched precision temperature control, ensuring optimal conditions for the growth of sensitive materials,
    A unique sliding mechanism that enables significantly faster processing times,
    Versatility across an array of applications in the sphere of advanced material research,
    Optimized functionality for both graphene-specific and general CVD processes.

    Fascinating Sliding Rail Tube Furnace Specifications:

    Furnace Section Specifications:

    Parameter Specification
    Furnace Structure Sliding rail design
    Maximum Temperature 1200°C
    Continuous Operating Temperature ≤1100°C
    Heating Rate Up to 20°C/min (Recommended: 10°C/min)
    Heating Zone Length 300mm (Single zone)
    Heating Element Phase-resistant heating wire
    Thermocouple Type K
    Temperature Accuracy ±1°C
    Tube Diameter Options Φ50, Φ60, Φ80
    Tube Material High-purity quartz
    Temperature Controller PID intelligent program control
    Vacuum Flange 304 stainless steel
    - Left flange: Equipped with needle valve + ball valve
    - Right flange: KF25 interface with baffle valve

    Power Supply Details:
    | Input Power | Single-phase 220V, 50Hz, 3KW | Ensures reliable and consistent performance.

    Robust Vacuum System

    Component Specification
    Rotary Vane Pump with Digital Gauge - Ultimate vacuum: 10³ Torr
    - Tube vacuum: 10² Torr
    - Pumping speed: 4CFM (2L/s, 120L/min)
    - Options: Rotary vane pump/diffusion pump/molecular pump available

    Advanced Mass Flow Controller System

    Parameter Specification
    Channels 3-channel high precision MFC
    Flow Range MF1-MF3: 50-1000sccm adjustable
    Features - Mixing chamber at bottom
    - 3 manual stainless steel needle valves

    Important Considerations for Users:

    Warning Description
    Pressure Limit Tube pressure must not exceed 0.02MPa
    Gas Cylinder Safety Must use pressure reducer (0.01-0.1MPa recommended)
    High Temp Operation Above 1000°C: Maintain atmospheric pressure
    Gas Flow Limit <200SCCM to protect quartz tube
    Quartz Tube Limit Continuous use <1100°C
    Valve Warning Never close both valves during heating

    Certifications Obtained:
    | ISO Certification | CE Certification | A testament to its global quality standards.

    Safety Precautions to ensure user safety:

  • Do not open the furnace chamber when temperature is equal to or exceeds 200°C to prevent any risk of personal injury.

  • Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid potential equipment damage due to overpressure.

  • Critical Warning: Failure to adhere to these precautions may result in:

  • Severe personal injury,

  • Irreversible equipment damage,

  • and significant safety hazards.

  •  
  • When furnace temperature exceeds 1000°C, the tube should not be under vacuum - it is crucial to maintain atmospheric pressure inside the tube.

  • Avoid concurrently closing both inlet and outlet valves during sample heating. If closure of valves is necessary:

    • Be vigilant in continuously monitoring pressure gauge readings

    • Immediately open the exhaust valve if absolute pressure readings exceed 0.02MPa

    • To prevent hazardous situations such as tube rupture or flange ejection.
      Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory
      Equipment Application & Features Comprehensive Overview:

      This advanced high-temperature CVD tube furnace is meticulously crafted for chemical vapor deposition (CVD) processes, including:

      Leading-edge Silicon carbide (SiC) coating applications,

      Sophisticated conductivity testing of ceramic substrates,

      Controlled and innovative growth of ZnO nanostructures,

      and atmosphere sintering of ceramic capacitors (MLCC) to meet the highest standards.

      Primary Users:
      Our RJ PVD Coating Machine is the preferred choice for Universities, esteemed research institutions, and innovative industrial manufacturers. Perfect for conducting intricate vapor deposition-related experiments and ensuring seamless production processes.

      Key Specifications:

      Alumina (AlO) furnace tube, expertly crafted to withstand scorching temperatures up to 1600°C.

      Ingeniously designed for both vacuum & atmospheric conditions, ensuring versatile operational capabilities.

      Heating element: Incorporates a high-performance MoSi (molybdenum disilicide) for reliable thermal management.

      Furnace chamber: Features ceramic fiber insulation, guaranteeing excellent thermal uniformity and enhanced energy efficiency.

      Advantages:
      Unmatched high temperature stability with an impressive precision of ±1°C.
      Experience rapid heating and cooling, coupled with superior heat retention capabilities for optimal performance.
      Engineered for safe & user-friendly operation, ensuring peace of mind.
      Versatile and ideal for cutting-edge advanced materials research.

      Parameter Specification
      Maximum Temperature 1700°C
      Operating Temperature 1600°C
      Display LED Screen
      Tube Diameter 80mm (OD)
      Tube Material Alumina Tube
      Heating Zone Length 220+220+220mm (with gaps between zones)
      Heating Element MoSi (Molybdenum Disilicide)
      Heating Rate 0-5°C/min
      Temperature Control - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor
      - 30 programmable segments for ramp/soak control
      - Built-in PID auto-tuning with over-temperature & thermocouple failure protection
      - Over-temperature alarm allows unattended operation
      Thermocouples 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)
      Temperature Accuracy ±1°C
      Furnace Structure - Double-layer steel shell with dual cooling fans (surface temp <60°C)
      - Fixed non-openable furnace design
      Vacuum Flange Stainless steel vacuum flange with valve
      Operating Voltage 220V 50Hz
      Maximum Power 6kW

      Gas Delivery System

      Component Specification
      4-Channel Mass Flow Controllers - MFC1: 0-100sccm
      - MFC2: 0-200sccm
      - MFC3: 0-500sccm
      - MFC4: 0-200sccm
      Gas Mixing - Bottom-mounted mixing chamber with liquid release valve
      - 4 manual stainless steel needle valves for gas control

      Vacuum System

      Component Specification
      Vacuum Pump + Gauge Rotary vane pump achieves 10Pa vacuum (cooled state)

      Key Features:

    • Boasting an ultra-high temperature capability reaching up to 1700°C, powered by MoSi heating elements.

    • Features precision multi-zone temperature control with a remarkable accuracy of ±1°C.

    • Customize your operations with programmable 30-segment thermal profiles for precise process management.

    • Equipped with a comprehensive gas mixing system featuring 4-channel MFCs for precise gas distribution.

    • Delivers industrial-grade vacuum performance for optimal operational efficiency.

      Safety Precautions:

    • For your safety, do not open the furnace chamber when temperature is ≥200°C to prevent potential personal injury.

    • Ensure tube pressure does not exceed 0.02MPa (absolute pressure) during operation to prevent possible equipment damage due to overpressure.

    • Warning: Failure to adhere to these precautions may result in:

    • Serious personal injury that could otherwise be avoided.

    • Significant equipment damage leading to operational delays.

    • Increased safety hazards that compromise your working environment.

    •  
    • If the furnace temperature exceeds 1000°C, ensure the tube is not under vacuum - maintain atmospheric pressure within the tube for safety.

    • To prevent malfunctions, avoid simultaneously closing both inlet and outlet valves during sample heating. If the need arises to close the valves:

      • Continuously monitor pressure gauge readings for any fluctuations.

      • Promptly open the exhaust valve if absolute pressure rises above 0.02MPa

      • This ensures the prevention of hazardous situations such as tube rupture or flange ejection.
        Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory

        Equipment Description

        This sophisticated system integrates:

      • A comprehensive gas flow control system for precision operations.

      • An advanced liquid injection system to enhance material processing.

      • Multi-stage temperature-controlled growth zones for optimal thermal management.

      • An efficient water cooling system ensuring consistent performance.

      • CNT Growth Furnace Specifications:

      • Maximum operating temperature: A robust 1400°C, continuously adjustable from 0-1400°C for tailored processes.

      • Vertical thermal field distribution with precise dual-zone temperature control.

      • Features a top-mounted liquid injection port with specialized flow guide components for enhanced efficiency.

      • This CNT/thin-film CVD equipment facilitates:
        Continuous, uninterrupted growth processes for consistent outcomes.
        Precise thermal management for controlled synthesis of nanostructures tailored to your needs.
        Integrated liquid/gas phase delivery enables complex material deposition with precision and ease.

      • Experience the forefront of innovation with our Carbon Nanotube (CNT) Synthesis Components, designed to elevate your material synthesis processes to the next level of precision and excellence.

        Technical Specifications - Carbon Nanotube/Nanowire CVD Growth Furnace. Discover the detailed engineering behind our state-of-the-art furnace, crafted to meet the meticulous demands of CNT and nanowire growth with unparalleled efficiency.

        Parameter Specification
        Equipment Name Carbon Nanotube/Nanowire CVD Growth Furnace
        Model KJ-T1400V
        Furnace Structure Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness
        Maximum Power 20KW
        Voltage AC 220V single-phase, 50/60Hz
        Heating Element Silicon carbide (SiC) rods
        Max Operating Temp 1400°C
        Continuous Working Temp Adjustable between 100-1400°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Alumina tube: OD 80mm × Length 1500mm
        Heating Zone Length 700mm + 400mm
        Uniform Temp Zone Length 800mm (±1°C)
        Thermocouple SEI thermocouple for temperature measurement and control
        Temperature Control System 30-segment PID programmable control
        Temperature Accuracy ±1°C

        Stainless Steel Flange. Built for durability and precision, our stainless steel flange is an essential component for secure and reliable system connections.
        The system includes a stainless steel vacuum flange assembly, equipped with stainless steel needle valves and a mechanical pressure gauge. This robust armored flange ensures secure thermocouple extension to the inlet, facilitating accurate temperature monitoring for your peace of mind.

        Key Features:

      • Utilizing a high-purity alumina tube, this system ensures contamination-free growth, guaranteeing the integrity and quality of your work.

      • Achieve precision temperature control with a remarkable ±1°C consistency across an 800mm uniform zone, ensuring optimal conditions for your processes.

      • Note: All specifications are subject to technical verification. This cutting-edge equipment is specifically designed for advanced nanomaterial synthesis under precisely controlled atmospheres, ensuring exceptional results.

      • Robust SiC heating elements provide ultra-high temperature operation, supporting demanding synthesis needs with unmatched reliability.

      • The system features a complete gas/vacuum interface, equipped with advanced measurement capabilities for comprehensive monitoring and control.
        Vacuum/PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory

        Equipment Introduction

        The LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specifically designed to optimize CVD processes, featuring:

      • An innovative double-layer shell structure complete with an efficient air-cooling system, expertly maintaining the surface temperature below 55°C

      • Advanced 30-segment PID programmable intelligent temperature control incorporating phase-angle firing technology for precise and controlled heating

      • The alumina polycrystalline fiber chamber lining ensures superior thermal insulation and flawless uniform temperature distribution

      • Applications:
        Ideal for Silicon Carbide (SiC) coating applications
        Conductivity testing of ceramic substrates with unrivaled precision
        Facilitates controlled growth of ZnO nanostructures for advanced applications
        Perfect for atmosphere sintering of ceramic capacitors (MLCC), ensuring high-quality outcomes

        Key Advantages:

      • Intuitive user-friendly touchscreen interface for seamless operation

      • Energy-efficient thermal design reduces operational costs while maximizing performance

      • Research-grade temperature uniformity ensures repeatable and reliable results

      • Versatile and adaptable for a wide range of advanced material processing needs

      •  
      • Fully automated operation with the convenience of unattended capability, offering peace of mind and efficiency

        High-Temperature Furnace Specifications

        Parameter Specification
        Furnace Structure Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness
        Maximum Power 5KW
        Voltage AC 220V single-phase, 50Hz
        Heating Element Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)
        Max Operating Temp 1200°C
        Continuous Working Temp 1100°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Quartz tube: OD 80mm × Length 1000mm
        Heating Zone Length Total 440mm
        Uniform Temp Zone Length 150mm (±1°C)
        Control Interface LCD touch screen
        Thermocouple Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen
        Temperature Control 30-segment PID programmable control
        Temperature Accuracy ±1°C
        Vacuum Sealing System Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)
        High Vacuum System - Control panel for molecular pump speed/vacuum level monitoring
        - Turbo molecular pump + dry scroll pump
        - All KF-25 standard connections between pumps and quartz tube
        Vacuum Level 6.7×10³ Pa (empty chamber, room temperature)
        Gas Delivery System Three mass flow controllers with ranges:
        • Channel 1: 1-100 sccm
        • Channel 2: 1-200 sccm
        • Channel 3: 1-500 sccm

        Key Features:

      • Ultra-clean alumina-coated chamber perfect for contamination-sensitive processes, ensuring pristine results every time

      • Precision 3-zone temperature monitoring (±1°C)

      • Research-grade vacuum capability achieving impressive vacuum levels down to 10³ Pa

      • Comprehensive gas flow control via sophisticated triple MFC channels, offering precise management of process atmospheres

      • Industrial-grade components engineered for extended durability and long-term performance

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