| Customization: | Available |
|---|---|
| After-sales Service: | on-Line Service |
| Warranty: | One Year |
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The Vacuum RTP (Rapid Thermal Processing) Annealing Furnace stands as a masterpiece of engineering, offering an unparalleled high-vacuum, swift-heating tubular furnace system. It boasts a pristine quartz chamber accompanied by robust vacuum flanges. At its core, it harnesses the brilliance of halogen lamp heating technology, propelling it to reach a remarkable rapid heating rate. 50°C per second, complemented by sophisticated PID automatic control that works harmoniously with 30 programmable segments.
Crafted with precision for annealing tasks, this high-temperature annealing tubular furnace excels in elevating semiconductor or solar cell substrates. Its refined rapid thermal processing capabilities are adept at handling samples in either vacuum or controlled atmosphere environments. The furnace finds its place of honor in the esteemed halls of university laboratories and the cutting-edge world of industrial research facilities where it serves myriad applications such as:
Thin-film deposition - a critical process in advanced material sciences
Rapid annealing of various materials - ensuring enhanced performance and longevity
Silicidation - critical for creating superior quality conductive layers
Diffusion - optimizing material properties for advanced applications
Crystallization - achieving the desired structural formations
Densification - enhancing the compactness and integrity of materials
| Parameter | 2-inch Wafer | 4-inch Wafer | 6-inch Wafer |
|---|---|---|---|
| Wafer Size | 2 inches | 4 inches | 6 inches |
| Furnace Tube Outer Diameter | 100 mm | 110-150 mm | 180 mm |
| Heating Zone Length | 200 mm | 300 mm | 400 mm |
Important Note: We offer customization of sizes tailored precisely to meet your unique requirements.
| Feature | Specification |
|---|---|
| Product Name | RTP Rapid Annealing Furnace |
| Operating Temperature | 900°C |
| Controller | LED (Touchscreen LED optional) |
| Furnace Chamber | Open-type, sliding rail design |
| Tube Size | Customizable based on requirements |
| Heating Element | Halogen lamps |
| Heating Rate | 0-50°C/s |
| Thermocouple | Custom-designed based on actual needs |
| Temperature Controller | 30-segment high-precision digital programmable controller |
Our state-of-the-art sliding tube furnace is ingeniously equipped with dual sliding rails at its base. This design allows two tube furnaces to glide seamlessly, enabling rapid cooling. This RTP rapid annealing furnace masterfully heats samples in diverse settings such as vacuum, atmospheric, and air conditions. Its primary function includes rapid annealing, silicidation, diffusion, crystallization, densification, among other specialized processes for a wide array of materials.
| Parameter | Specification |
|---|---|
| Display | LED |
| Temperature | 1200°C |
| Continuous Operating Temp | ≤1100°C |
| Heating Rate | Recommended 0-10°C/min |
| Furnace Tube | Tube Dimensions: OD50/ID44 × L1800mm |
| First Furnace: Heating Zone Length: 350mm | |
| Second Furnace: Heating Zone Length: 150mm | |
| (Other sizes customizable based on customer requirements) | |
| Heating Element | Molybdenum Disilicide (MoSi) Heating Wire |
| Sliding Rails/Table | Chrome-Plated Steel Dual Rails, Sliding Length: 1800mm |
| (Other sizes customizable based on customer requirements) | |
| Thermocouple | Type N |
| Tube Material | High-Purity Quartz |
| Sealing Flange | Stainless Steel Water-Cooled KF25 Flange (with mechanical vacuum gauge port) |
| Temperature Accuracy | ±1°C |
| Temperature Control | Two Independently Controlled Furnaces |
| - 30-step PID Auto Control via SCR Power Regulation |
The innovatively designed sliding three-zone tube furnace represents the pinnacle of rapid thermal annealing technology. With an 80mm outer diameter quartz tube, it achieves staggering temperatures of up to 1200°C. A unique pair of sliding rails at its base permits dynamic movement of the furnace across the tube, facilitating both rapid heating and cooling.
For unmatched heating efficiency, preheat the furnace to your target temperature, then effortlessly slide it over the sample location. For expedited cooling, simply retract the furnace post-heating.
This meticulously crafted system serves as an exceptional low-cost solution for rapid thermal processing (RTP).
| Parameter | Specification |
|---|---|
| Shell Structure | Double-layer air-cooled |
| Furnace Chamber Material | Alumina refractory fiber |
| Max Temperature | 1200°C |
| Operating Temperature | 1100°C |
| Heating Rate | 10°C/min |
| Heating Element | Resistance wire |
| Temperature Control | PID temperature regulation, supports 30-segment heating/cooling programs, with over-temperature and thermocouple break protection |
| Thermocouple | Type N |
| Heating Zone Length | 220mm + 220mm + 220mm (other sizes customizable upon request) |
| Furnace Tube Size | Ø80mm × 2400mm (other sizes customizable upon request) |
| Furnace Tube | High-purity quartz tube |
| Sliding Rails | Chrome-plated steel dual rails |
| Rail Length | ~2500mm (other sizes customizable upon request) |
| Flange | 304 stainless steel sealing flange with silicone O-ring, easy assembly, reusable |
| Compatible Gas | Inert gas (slight positive pressure) |
This bespoke RTP (Rapid Thermal Processing) annealing furnace features a sophisticated RTP sliding-rail tube furnace, complemented by a cutting-edge multi-channel mass flow controller system, and an efficient vacuum system, purpose-built for annealing semiconductor wafers, solar cells, or other samples with dimensions up to 3 inches.
The tube furnace employs advanced infrared lamp heating technology, reaching an extraordinary heating rate of 50°C per second. Its cutting-edge design includes 30-segment precise temperature control with a remarkable accuracy of ±1°C. Equipped with a state-of-the-art RS485 interface and intuitive control softwareWith the cutting-edge technology of RTP Sliding Rapid Annealing by RG, the furnace can be effortlessly operated and meticulously monitored via computer, providing real-time, dynamic temperature curves for precise control and optimal performance.
This state-of-the-art rapid thermal processing tube furnace is extensively utilized for the expansive growth of 2D graphene layers through advanced CVD techniques and is expertly optimized for the annealing of semiconductor and solar cell wafers, ensuring superior quality and efficiency.The sophisticated system allows the computer to control the furnace in real-time via the RS485 interface, complemented by specialized software, which intricately visualizes comprehensive temperature profiles.
| Parameter | Specification |
|---|---|
| Product Name | Open-Type Dual-Zone RTP Tube Furnace |
| Operating Temperature | ≤1000ºC |
| Controller | LCD Touch Screen |
| Furnace Tube Size | Quartz Tube OD80mm/ID72mm, Single-End Open (Custom sizes available) |
| Heating Zone | 300mm (Custom lengths available) |
| Furnace Type | Open-Type |
| Heating Element | Halogen Lamp Heating |
| Heating Rate | 30ºC/min |
| Temperature Sensor | Type N Thermocouple |
| Temperature Controller | 30-Segment High-Precision Digital Programmable Controller |
Part 2: Gas Mixing System
| Parameter | Specification |
|---|---|
| Flow Range | MFC1: Argon (O) 0-200sccm MFC2: Argon (Ar) 0-200sccm |
Part 3: Vacuum System
| Component | Specification |
|---|---|
| Vacuum Pump | Rotary Vane Pump |
| Accessories | Exhaust Filter + Corrosion-Resistant Digital Vacuum Gauge |
The rapid annealing furnace is ingeniously designed with vacuum flanges at both ends of the furnace tube, enabling a remarkable vacuum level of 10-5 Torr with a molecular pump and 10-3 Torr with a mechanical pump. Equipped with a pair of smooth sliding rails at the base, it allows seamless manual movement. The system boasts exceptional heating and cooling rates of up to 100°C per minute. To facilitate the fastest heating, the furnace can be preheated to the desired temperature before being repositioned to the sample location. For swift cooling, it can be moved to the opposite end post-sample heating. Under controlled vacuum or inert gas conditions, the heating and cooling rates can achieve an impressive 10°C per second, establishing it as an unparalleled, cost-effective solution for rapid thermal processing innovations.
| Parameter | Specification |
|---|---|
| Furnace Tube Dimensions | Φ60mm × 1500mm (Customizable per customer requirements) |
| Heating Zone Length | 440mm (Customizable per customer requirements) |
| Operating Temperature | ≤1100°C |
| Maximum Temperature | 1200°C |
| Temperature Control System | 30-segment PID microcomputer programmable control (Optional LCD touchscreen display) |
| Temperature Control Accuracy | ±1°C |
| Temperature Protection | Over-temperature and thermocouple break protection |
| Heating Rate | 0~10°C/min |
| Heating Element | Resistance wire |
| Gas Tightness | 4.03 × 10<sup>-3</sup> Pa |
| Furnace Chamber Material | Japanese imported chamber material, no powdering, excellent insulation, high reflectivity, uniform temperature distribution, strong resistance to thermal expansion and contraction |
| Slide Rail Dimensions | Heavy-duty steel bidirectional slide rails, sliding length: 1200mm (Customizable per customer requirements) |
| Flange Connections | Standard with two stainless steel vacuum flanges, pre-installed mechanical pressure gauge and stainless steel shut-off valve |
| Sealing System | Silicone O-ring compression seal between furnace tube and flange, easy disassembly, reusable, excellent airtightness (ensures pressure gauge remains stable for 12 hours) |
| Furnace Tube Options | Fused quartz tube or alumina tube |
| Temperature Sensor | Type N thermocouple |
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