Customization: | Available |
---|---|
After-sales Service: | on-Line Service |
Warranty: | One Year |
Suppliers with verified business licenses
Equipment Introduction
The RJ150-XK is a tubular diffusion/oxidation furnace meticulously designed for R&D applications across enterprises, universities, and leading research institutes. It adeptly supports an array of processes, including:
Polysilicon and silicon nitride deposition
Diffusion
Oxidation
Annealing
Cutting-edge versatility in processing to drive forward advanced material research
Precision-tuned temperature control ensuring consistently outstanding results
Space-efficient design perfectly optimized for laboratory environments
Product Features:
1. Masterfully accommodates a range of processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and more, broadening your research horizons.
2. Employs an advanced industrial computer + PLC system for fully automated management of furnace temperature, boat movement, gas flow, and valves, ensuring seamless automation of the entire process.
3. Boasts an intuitive human-machine interface, facilitating effortless modification of process control parameters and providing real-time updates on process statuses.
4. Features multiple process pipelines for user convenience and adaptability.
5. Houses robust software functionalities, including self-diagnostic capabilities to significantly reduce maintenance time and ensure smooth operations.
6. Offers automatic adjustment of the constant temperature zone and cascade control, ensuring meticulous regulation of the process temperature within the reaction tube.
7. Incorporates alarms and protective features against over-temperature, thermocouple breakage, thermocouple short circuits, and process gas flow deviations, enhancing safety and reliability.
8. Provides customization options to tailor products to specific customer needs and requirements.
Technical Specifications
Model | KJ150-XK |
---|---|
Operating Temperature | ≤1300ºC |
Wafer Size | 2~8 inches (round wafers) |
Number of Process Tubes | 1~2 tubes per unit |
Constant Temperature Zone Length | 300~600mm |
Constant Temperature Zone Accuracy | ≤±0.5ºC |
Temperature Stability | ≤±0.5ºC/24h |
Temperature Ramp Rate | Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min |
Safety Alarms & Protections | Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions |
Technical Specifications
Parameter | Specification |
---|---|
Heating Zone Length | 400mm |
Furnace Tube Dimensions | Diameter: 50mm, Length: 900mm |
Furnace Tube Material | High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable) |
Operating Temperature | ≤1100°C |
Maximum Temperature | 1200°C |
Temperature Sensor | Type N thermocouple |
Temperature Control | Intelligent 30-segment PID programmable microcomputer control with auto-tuning |
Temperature Accuracy | ±1°C |
Temperature Protection | Over-temperature and thermocouple breakage protection |
Heating Rate | 0-20°C/min |
Heating Element | Alloy resistance wire |
Operating Voltage | AC220V, single-phase, 50Hz |
Maximum Power | 3KW |
Furnace Chamber Material | Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution |
Flange | Stainless steel vacuum flange, easy to disassemble |
Sealing System | O-ring compression seal between furnace tube and flange, reusable, high airtightness |
Fluidization Zone | 1. Reaction gas uniformly passes through the reaction zone. 2. Solid particles are fluidized by gas in the heating zone. 3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments. |
Note | Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size. |
Shell Structure | Double-layer shell with air-cooling system, openable design |
Furnace Structure | Vertical structure |
Parameter | Specification |
---|---|
Internal Temperature | ≤45ºC |
Measurement & Control Devices | |
Name | Dual-channel Mass Flow Controller (MFC) |
Gas Channels | 2 channels |
Flow Control | Digital display, each gas line with independent needle valve control |
Connection Method | Double ferrule fitting |
Flow Meter | Mass flow meter |
Flow Range | MFC1: N 0-10 SLM MFC2: CO 0-10 SLM |
Gas Mixing | Equipped with a precision gas mixing chamber |
Power Supply | 220V, 50Hz |
Operating Ambient Temp. | 5ºC~45ºC |
Standard Accessories | Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4, high-temperature gloves ×1 pair, crucible hook ×1, hex wrench for flange disassembly ×1, warranty card & manual ×1 set |
Equipment Introduction
The vertical dual-zone CVD system is expertly composed of:
A 1200°C dual-zone tube furnace
A 3-channel mass flow controller (MFC) gas supply system
A 2L/s vacuum pump accompanied by related connecting components for seamless integration
The system is outfitted with directional and swivel casters at its base, ensuring a compact footprint and effortless mobility.
Ingeniously designed for highly efficient CVD processes,this advanced system is the perfect choice for leading universities, cutting-edge research centers, and progressive industrial manufacturers conducting groundbreaking experiments and robust production involving the precise method of chemical vapor deposition.
(Note: Meticulously structured to ensure clarity, while preserving technical precision and maintaining an effortless natural English flow.)
Fluidized Bed Tube Furnace Specifications
Parameter | Specification |
---|---|
Maximum Temperature | 1200°C |
Operating Temperature | ≤1100°C |
Display | LCD touch screen |
Tube Diameter | 40mm (OD) |
Tube Material | Custom high-purity quartz tube |
Furnace Tube Length | Approx. 1100mm (customizable) |
Heating Element | Premium heating wire |
Heating Rate | 0-10°C/min |
Temperature Control | - Programmable 30-segment time-temperature curves - Touchscreen multi-segment PID control - Data logging with Excel export capability - Built-in over-temperature and thermocouple failure protection |
Thermocouple | Type N thermocouple |
Sealing Method | Custom stainless steel vacuum flange with sealing |
Furnace Chamber | - Double-layer steel shell with dual cooling fans - Dual-zone vertical open structure for easy tube access - Alumina refractory fiber lining for energy efficiency |
Vacuum Flange | Stainless steel vacuum flange with valve |
Operating Voltage | 220V, 50Hz |
Power Rating | 6KW (customizable) |
Innovative Gas Delivery System: 3-Channel Mass Flow Control System
Parameter | Specification |
---|---|
Power Supply | 220V/50Hz, maximum output 18W |
Distinguished Key Features:
State-of-the-art touchscreen control with comprehensive data recording capabilities
Ingenious dual-zone vertical design ensuring optimal thermal management
Inclusive complete gas flow control system
Meticulously engineered safety-focused design with multiple protection features
Customizable components tailored for specific research needs
Note: Specifications are flexible and can be customized based on specific requirements. The system seamlessly combines precision temperature control with efficient gas delivery, perfectly suited for advanced CVD applications.
Parameter | Specification |
---|---|
Maximum Pressure | 3×10 Pa |
Gas Channels | Can simultaneously connect 3 gas sources to slightly positive pressure |
Flow Meter | Mass flow meter (other ranges optional) |
Channel A Range | 1 SLM |
Channel B Range | 1 SLM |
Channel C Range | 1 SLM |
Gas Line Pressure | -0.1 ~ 0.15 MPa |
Accuracy | ±1% F.S. |
Shut-off Valve | Stainless steel |
Gas Line Tubing | 1/4" stainless steel tube |
Vacuum System Components
Component | Specification |
---|---|
Vacuum Pump | 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube |
Vacuum Gauge | Included (standard configuration) |
Primary Application:
This cutting-edge dual-zone sliding-track CVD tube furnace boasts a sophisticated rail-guided sliding design, facilitating rapid heating and cooling of materials through horizontal furnace movement. It can proficiently connect up to six gas sources, with precise and reliable flow measurement and control via an intuitive touchscreen 6-channel mass flow controller (MFC).
This high-temperature CVD system is expertly designed for prestigious universities, innovative research institutions, and forward-thinking industrial manufacturers to conduct pioneering experiments and efficient production related to the sophisticated chemical vapor deposition (CVD) process.
Innovative Sliding-track mechanism enabling fast and efficient thermal cycling
Multi-gas compatibility (6 independent channels) for versatility
Precision flow control via state-of-the-art touchscreen MFC interface
Versatile applications suitable for research and small-batch production
Parameter | Specification |
---|---|
Furnace Access Mode | Swing-open design |
Furnace Movement | Rail-guided horizontal sliding for rapid heating/cooling |
Chamber Material | Alumina refractory fiber |
Heating Element | Aluminum-containing heating wire |
Maximum Temperature | 1200°C |
Operating Temperature | ≤1100°C |
Heating Rate | ≤20°C/min (Recommended: 15°C/min) |
Heating Zones | Dual-zone |
Total Zone Length | 200mm + 200mm |
Tube Material | High-purity quartz |
Tube Diameter | 60mm |
Sealing Method | - Quick-release flange for material loading - Stainless steel vacuum flange with silicone seal |
Control System | Multi-segment intelligent PID programming |
Temperature Sensor | Type N thermocouple |
Safety Alarms | Over-temperature & thermocouple failure alarms |
Power Supply | 220V, 50Hz |
Sophisticated Gas Delivery System (KJ-6Z)
Parameter | Specification |
---|---|
Operating Temperature | 5~45°C |
Maximum Pressure | 3×10 Pa |
Gas Channels | 6 independent gas inputs |
Flow Meter Type | Mass flow meter (other ranges available at same cost) |
Channel A Range | 0-300 SCCM |
Channel B Range | 0-300 SCCM |
Channel C Range | 0-300 SCCM |
Channel D Range | 0-300 SCCM |
Channel E Range | 0-300 SCCM |
Channel F Range | 0-300 SCCM |
Line Pressure | -0.1~0.15 MPa |
Valves | Stainless steel shut-off valves |
Tubing | Stainless steel |
Advanced Vacuum System
Component | Specification |
---|---|
Pump System | Molecular pump unit with connecting pipes |
Power | 220V/50Hz |
Mobility | Wheel-mounted base for easy movement |
Ultimate Vacuum | 6.67×10³ Pa |
Standard High-Quality Accessories
Durable Quartz furnace tube (1)
Comprehensive Vacuum flange set (1)
Key Features:
Unique and efficient sliding mechanism enabling rapid thermal cycling
Precision six-channel gas control system
Research-grade vacuum capability for reliable performance
Complete turnkey solution with all essential accessories
Industrial-grade construction with enhanced safety protections
Tube stoppers (2)
Reliable O-ring seals
Safety-first protective gloves (1 pair)
Versatile Crucible hook (1)
Durable PTFE tubing (3m)
Convenient Hex keys (2)
Comprehensive Operation manual
This sophisticated system is crafted for exceptional CVD processes, including:
Silicon carbide coating to enhance durability and performance in demanding applications.
Conductivity testing of ceramic substrates, ensuring optimal electrical properties.
2D material growth for cutting-edge research and technological advancements.
Controlled growth of ZnO nanostructures, paving the way for innovations in nanotechnology.
Atmosphere sintering of ceramic capacitors (MLCC), essential for high-performance electronic components.
It also serves as a dedicated graphene film growth furnace, for graphene preparation. The furnace features a sliding rail base design, providing theversatility of manual lateral movement to expose the tube to room temperature for rapid cooling, thus ensuring efficient thermal management in your processes..
This equipment is particularly suitable for CVD experiments requiring fast heating/cooling rates,making it ideal for:
High-efficiency graphene synthesis, greatly enhancing quality and consistency.
Other CVD applications demanding rapid thermal cycling, supporting advanced research needs.
Key Advantages:
Precision temperature control, essential for sensitive material growth and achieving superior results.
Unique sliding mechanism, designed for enabling faster processing, thus economically beneficial.
Versatile applications, allowing usage across advanced material research domains.
Optimized for both graphene and general CVD processes, delivering unmatched versatility.
Sliding Rail Tube Furnace Specifications
Furnace Section
Parameter | Specification |
---|---|
Furnace Structure | Sliding rail design |
Maximum Temperature | 1200°C |
Continuous Operating Temperature | ≤1100°C |
Heating Rate | Up to 20°C/min (Recommended: 10°C/min) |
Heating Zone Length | 300mm (Single zone) |
Heating Element | Phase-resistant heating wire |
Thermocouple | Type K |
Temperature Accuracy | ±1°C |
Tube Diameter Options | Φ50, Φ60, Φ80 |
Tube Material | High-purity quartz |
Temperature Controller | PID intelligent program control |
Vacuum Flange | 304 stainless steel - Left flange: Equipped with needle valve + ball valve - Right flange: KF25 interface with baffle valve |
Power Supply
| Input Power | Single-phase 220V, 50Hz, 3KW | sufficient for extensive operations.
Vacuum System, ensuring pressure stability and operational safety.
Component | Specification |
---|---|
Rotary Vane Pump with Digital Gauge | - Ultimate vacuum: 10³ Torr - Tube vacuum: 10² Torr - Pumping speed: 4CFM (2L/s, 120L/min) - Options: Rotary vane pump/diffusion pump/molecular pump available |
Mass Flow Controller System, for precise gas management and optimal process control.
Parameter | Specification |
---|---|
Channels | 3-channel high precision MFC |
Flow Range | MF1-MF3: 50-1000sccm adjustable |
Features | - Mixing chamber at bottom - 3 manual stainless steel needle valves |
Important Notes
Warning | Description |
---|---|
Pressure Limit | Tube pressure must not exceed 0.02MPa |
Gas Cylinder Safety | Must use pressure reducer (0.01-0.1MPa recommended) |
High Temp Operation | Above 1000°C: Maintain atmospheric pressure |
Gas Flow Limit | <200SCCM to protect quartz tube |
Quartz Tube Limit | Continuous use <1100°C |
Valve Warning | Never close both valves during heating |
Certifications
| ISO Certification | CE Certification | assuring compliance with international standards.
Safety Precautions:
Do not open the furnace chamber when temperature ≥200°C, to prevent personal injury, ensuring workplace safety.
Tube pressure must never exceed 0.02MPa (absolute pressure), during operation to avoid equipment damage from overpressure, maintaining longevity.
Warning: Failure to follow these precautions may result in:
Serious personal injury,
Equipment damage, or
Safety hazards, reinforcing the importance of guidelines.
When furnace temperature >1000°C, the tube must not be under vacuum, - maintain atmospheric pressure inside the tube, safeguarding operational integrity.
Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:
Continuously monitor pressure gauge readings, ensuring constant vigilance.
Immediately open exhaust valve if absolute pressure exceeds 0.02MPa,
to prevent hazardous situations (tube rupture, flange ejection, etc.), ensuring safety.
Equipment Application & Features
This high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including:
Silicon carbide (SiC) coating, enhancing resilience and functionality.
Conductivity testing of ceramic substrates, ensuring high-quality output.
Controlled growth of ZnO nanostructures, crucial for innovative applications.
Atmosphere sintering of ceramic capacitors (MLCC), vital for the electronics industry.
Primary Users: Cutting-edge researchers, pioneering engineers, and industry leaders.
Our state-of-the-art Precision RJ PVD Coating Machine is indispensable for universities, research institutions, and industrial manufacturers. Ideal for conducting advanced vapor deposition experiments and facilitating high-performance production, it ensures precision and reliability across various applications.
Key Specifications:
Featuring an Alumina (AlO) furnace tube engineered to endure extreme temperatures reaching up to 1600°C, ensuring robust and reliable performance under high thermal conditions.
Expertly crafted with a vacuum and atmosphere-capable design, this machine offers versatile operational capabilities, adapting seamlessly to diverse experimental needs.
Equipped with a high-performance MoSi (molybdenum disilicide) heating element, it guarantees exceptional thermal performance and longevity.
The furnace chamber, lined with ceramic fiber insulation, offers excellent thermal uniformity and energy efficiency, optimizing processing conditions.
Advantages:
Exhibiting high temperature stability with precision up to ±1°C, this machine ensures consistent and accurate results every time.
Engineered for rapid heating and cooling, it features superior heat retention, significantly enhancing processing efficiency.
Designed for safe and user-friendly operation, ensuring ease of use without compromising on safety standards.
Versatile and ideal for advanced materials research, it supports cutting-edge investigations and innovations.
Parameter | Specification |
---|---|
Maximum Temperature | 1700°C |
Operating Temperature | 1600°C |
Display | LED Screen |
Tube Diameter | 80mm (OD) |
Tube Material | Alumina Tube |
Heating Zone Length | 220+220+220mm (with gaps between zones) |
Heating Element | MoSi (Molybdenum Disilicide) |
Heating Rate | 0-5°C/min |
Temperature Control | - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor - 30 programmable segments for ramp/soak control - Built-in PID auto-tuning with over-temperature & thermocouple failure protection - Over-temperature alarm allows unattended operation |
Thermocouples | 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube) |
Temperature Accuracy | ±1°C |
Furnace Structure | - Double-layer steel shell with dual cooling fans (surface temp <60°C) - Fixed non-openable furnace design |
Vacuum Flange | Stainless steel vacuum flange with valve |
Operating Voltage | 220V 50Hz |
Maximum Power | 6kW |
Gas Delivery System
Component | Specification |
---|---|
4-Channel Mass Flow Controllers | - MFC1: 0-100sccm - MFC2: 0-200sccm - MFC3: 0-500sccm - MFC4: 0-200sccm |
Gas Mixing | - Bottom-mounted mixing chamber with liquid release valve - 4 manual stainless steel needle valves for gas control |
Vacuum System
Component | Specification |
---|---|
Vacuum Pump + Gauge | Rotary vane pump achieves 10Pa vacuum (cooled state) |
Key Features:
Boasting ultra-high temperature capability up to 1700°C with robust MoSi heating elements, it accommodates the most demanding thermal processing tasks.
Incorporates precision multi-zone temperature control with a tolerance of ±1°C, facilitating meticulous thermal management.
Includes programmable 30-segment thermal profiles, allowing tailored thermal processes for material-specific requirements.
Features a comprehensive gas mixing system with advanced 4-channel MFCs, enabling precise gas flow control.
Delivers industrial-grade vacuum performance, meeting the rigorous demands of sophisticated research applications.
Safety Precautions:
Never open the furnace chamber when the temperature is ≥200°C. to prevent personal injury.
Ensure tube pressure does not exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.
Warning: Failure to adhere to these precautions may result in:
Serious personal injury
Equipment damage
Potential safety hazards
When furnace temperature exceeds 1000°C, refrain from maintaining the tube under vacuum - ensure atmospheric pressure inside the tube is maintained.
Avoid closing both inlet and outlet valves simultaneously during sample heating to prevent hazardous conditions. If it becomes necessary to close the valves:
Continuously monitor pressure gauge readings for safety.
Immediately open the exhaust valve if the absolute pressure exceeds 0.02MPa to avert danger.
This prevents hazardous situations such as tube rupture or flange ejection.
Equipment Description
This advanced system integrates:
A sophisticated gas flow control system
An efficient liquid injection system
Multi-stage temperature-controlled growth zones for precise process management
A reliable water cooling system for enhanced operational stability
CNT Growth Furnace Specifications:
Designed with a maximum operating temperature reaching: 1400°C, with continuous adjustability from 0 to 1400°C.
Features vertical thermal field distribution with dual-zone temperature control capabilities for precise thermal management.
Includes a top-mounted liquid injection port incorporating flow guide components for optimized material delivery.
This state-of-the-art CNT/thin-film CVD equipment allows for:
Continuous, uninterrupted growth processes, enhancing research productivity.
Facilitates precise thermal management to enable controlled and reproducible nanostructure synthesis.
Provides integrated liquid/gas phase delivery for sophisticated and complex material deposition processes, pushing the boundaries of innovation.
Carbon nanotube (CNT) synthesis components - Elevating the synthesis of carbon nanotubes with unparalleled precision, ensuring optimal outcomes in any nanotechnology application.
Technical Specifications - Carbon Nanotube/Nanowire CVD Growth Furnace. Meticulously engineered for creating carbon-based nanomaterials, this furnace exemplifies top-tier performance in nanotechnology advancements.
Parameter | Specification |
---|---|
Equipment Name | Carbon Nanotube/Nanowire CVD Growth Furnace |
Model | KJ-T1400V |
Furnace Structure | Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness |
Maximum Power | 20KW |
Voltage | AC 220V single-phase, 50/60Hz |
Heating Element | Silicon carbide (SiC) rods |
Max Operating Temp | 1400°C |
Continuous Working Temp | Adjustable between 100-1400°C |
Heating Rate | 1-10°C/min |
Furnace Tube Material & Dimensions | Alumina tube: OD 80mm × Length 1500mm |
Heating Zone Length | 700mm + 400mm |
Uniform Temp Zone Length | 800mm (±1°C) |
Thermocouple | SEI thermocouple for temperature measurement and control |
Temperature Control System | 30-segment PID programmable control |
Temperature Accuracy | ±1°C |
Stainless Steel Flange - Crafted from premium-grade stainless steel, this flange promises exceptional durability and performance in demanding environments.
The system includes a stainless steel vacuum flange assembly (equipped with stainless steel needle valves and mechanical pressure gauge). The armored flange allows thermocouple extension to the inlet for precise temperature monitoring, ensuring optimal performance and reliability.
Key Features:
High-purity alumina tube for contamination-free growth - Guarantees the integrity and purity of your nanomaterial production, offering unmatched performance.
Precision temperature control (±1°C) across 800mm uniform zone - Ensures consistent temperature regulation for unparalleled growth uniformity and precision.
Note: All specifications are subject to technical verification. Designed for advanced nanomaterial synthesis under meticulously controlled atmospheres, promising industry-leading performance.
Robust SiC heating elements for ultra-high temperature operation - Delivering durability and reliability for the most demanding high-temperature applications.
Complete gas/vacuum interface with measurement capabilities - Facilitates comprehensive control and monitoring, ensuring the highest standards in process accuracy and efficiency.
Equipment Introduction
The LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:
Double-layer shell structure with an air-cooling system, keeping the surface temperature comfortably below 55°C
30-segment PID programmable intelligent temperature control with phase-angle firing for precise and efficient heating
Alumina polycrystalline fiber chamber lining for excellent thermal insulation and uniform temperature distribution
Applications:
Silicon carbide (SiC) coating - Achieve superior coating quality with our cutting-edge technology.
Conductivity testing of ceramic substrates - Ideal for precise and reliable conductivity analysis.
Controlled growth of ZnO nanostructures - Perfectly engineered for innovative and controlled nanostructure development.
Atmosphere sintering of ceramic capacitors (MLCC) - Precisely manage the sintering environment for optimal capacitor performance.
Key Advantages:
User-friendly touchscreen interface - Simplifies operation with intuitive controls for seamless user experience.
Energy-efficient thermal design - Maximizes efficiency while minimizing energy consumption, offering a sustainable solution.
Research-grade temperature uniformity - Delivers consistent and dependable temperature control for research precision.
Versatile for advanced material processing - Adaptable for a myriad of advanced and intricate material processing needs.
Fully automated operation with unattended capability - Enables seamless, continuous operation without constant supervision.
High-Temperature Furnace Specifications
Parameter | Specification |
---|---|
Furnace Structure | Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness |
Maximum Power | 5KW |
Voltage | AC 220V single-phase, 50Hz |
Heating Element | Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan) |
Max Operating Temp | 1200°C |
Continuous Working Temp | 1100°C |
Heating Rate | 1-10°C/min |
Furnace Tube Material & Dimensions | Quartz tube: OD 80mm × Length 1000mm |
Heating Zone Length | Total 440mm |
Uniform Temp Zone Length | 150mm (±1°C) |
Control Interface | LCD touch screen |
Thermocouple | Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen |
Temperature Control | 30-segment PID programmable control |
Temperature Accuracy | ±1°C |
Vacuum Sealing System | Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve) |
High Vacuum System | - Control panel for molecular pump speed/vacuum level monitoring - Turbo molecular pump + dry scroll pump - All KF-25 standard connections between pumps and quartz tube |
Vacuum Level | 6.7×10³ Pa (empty chamber, room temperature) |
Gas Delivery System | Three mass flow controllers with ranges: • Channel 1: 1-100 sccm • Channel 2: 1-200 sccm • Channel 3: 1-500 sccm |
Key Features:
Ultra-clean alumina-coated chamber for contamination-sensitive processes - Ensuring the highest purity standards required for delicate processes.
Precision 3-zone temperature monitoring (±1°C) - Guarantees meticulous temperature control for supreme process accuracy.
Research-grade vacuum capability down to 10³ Pa - Achieves exceptional vacuum levels, vital for high-precision research applications.
Complete gas flow control with triple MFC channels - Offers comprehensive flow management, enhancing process reliability and efficiency.
Industrial-grade components with extended durability - Built to withstand rigorous use, ensuring lasting operational excellence.