PVD Coating Machine for Thin-Film Deposition Research in Laboratory

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Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

PVD Coating Machine for Thin-Film Deposition Research in Laboratory

Equipment Introduction

The RJ150-XK is a tubular diffusion/oxidation furnace designed meticulously for R&D applications within enterprises, prestigious universities, and esteemed research institutes. It supports a diverse range of processes, including:

  • Polysilicon and silicon nitride deposition

  • Diffusion

  • Oxidation

  • Annealing

Key Features:

  • Versatile processing capabilities for the forefront of advanced material research

  • Precision temperature control ensures consistently exceptional results

  • Compact design perfectly optimized for sophisticated lab environments
    Product Features:

    1. Masterfully capable of accommodating processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and more.
    2. Utilizes a highly reliable industrial computer + PLC system, achieving seamless fully automated control over furnace temperature, boat movement, gas flow, and valves, enabling complete automation of the entire process.
    3. Features an intuitive human-machine interface, allowing for effortless modification of process control parameters and real-time display of various process statuses.
    4. Offers numerous process pipelines for user convenience and selection flexibility.
    5. Equipped with robust software functionality, including self-diagnostic tools, significantly reducing maintenance time and enhancing efficiency.
    6. Automatic adjustment of the constant temperature zone alongside cascade control ensures precise regulation of the actual process temperature within the reaction tube.
    7. Comprehensive alarm and protective functions for over-temperature, thermocouple breakage, short circuits, and deviations in process gas flow.
    8. Customizable product solutions available, designed to meet specific customer requirements.

Technical Specifications

Model KJ150-XK
Operating Temperature ≤1300ºC
Wafer Size 2~8 inches (round wafers)
Number of Process Tubes 1~2 tubes per unit
Constant Temperature Zone Length 300~600mm
Constant Temperature Zone Accuracy ≤±0.5ºC
Temperature Stability ≤±0.5ºC/24h
Temperature Ramp Rate Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min
Safety Alarms & Protections Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions

The **RJ-1200T-V50** is a state-of-the-art **vertical fluidized bed CVD system** crafted specifically for **powder surface deposition experiments**. The furnace showcases an **openable design**-post-experiment, the furnace body can effortlessly open to access the quartz tube and retrieve processed particles.

Inside the furnace tube lies a **0.2mm porous quartz plate** (with customizable pore size). The powder rests on this innovative porous plate, while gas is introduced from the **bottom of the tube**. As the gas gracefully flows through the porous plate, it **fluidizes the sample particles**, effortlessly suspending them in the heating zone for optimal deposition.

**Note:** Exercise caution when fluidizing the particles, as excessive gas flow may cause them to **escape the heating zone**. Therefore, meticulous adjustment of the gas flow rate tailored to the **particle size** is essential during experiments.PVD Coating Machine for Thin-Film Deposition Research in Laboratory

Technical Specifications

Parameter Specification
Heating Zone Length 400mm
Furnace Tube Dimensions Diameter: 50mm, Length: 900mm
Furnace Tube Material High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Sensor Type N thermocouple
Temperature Control Intelligent 30-segment PID programmable microcomputer control with auto-tuning
Temperature Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple breakage protection
Heating Rate 0-20°C/min
Heating Element Alloy resistance wire
Operating Voltage AC220V, single-phase, 50Hz
Maximum Power 3KW
Furnace Chamber Material Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution
Flange Stainless steel vacuum flange, easy to disassemble
Sealing System O-ring compression seal between furnace tube and flange, reusable, high airtightness
Fluidization Zone 1. Reaction gas uniformly passes through the reaction zone.
2. Solid particles are fluidized by gas in the heating zone.
3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.
Note Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.
Shell Structure Double-layer shell with air-cooling system, openable design
Furnace Structure Vertical structure
Parameter Specification
Internal Temperature ≤45ºC
Measurement & Control Devices  
Name Dual-channel Mass Flow Controller (MFC)
Gas Channels 2 channels
Flow Control Digital display, each gas line with independent needle valve control
Connection Method Double ferrule fitting
Flow Meter Mass flow meter
Flow Range MFC1: N 0-10 SLM
MFC2: CO 0-10 SLM
Gas Mixing Equipped with a precision gas mixing chamber
Power Supply 220V, 50Hz
Operating Ambient Temp. 5ºC~45ºC
Standard Accessories Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,
high-temperature gloves ×1 pair, crucible hook ×1,
hex wrench for flange disassembly ×1, warranty card & manual ×1 set
PVD Coating Machine for Thin-Film Deposition Research in Laboratory

Equipment Introduction

The exceptional vertical dual-zone CVD system primarily encompasses:

  • A 1200°C dual-zone tube furnace

  • A 3-channel mass flow controller (MFC) gas supply system

  • A 2L/s vacuum pump along with essential connecting components

The system is thoughtfully equipped with directional and swivel casters at the base, ensuring a compact footprint and flexible mobility for ease of use and convenience.

Meticulously engineered for state-of-the-art CVD processes, this innovative system is perfectly suited for leading universities, cutting-edge research centers, and advanced industrial manufacturers to conduct intricate experiments and scalable production involving sophisticated chemical vapor deposition techniques.

(Note: The content is structured to enhance clarity while ensuring the preservation of technical accuracy and a natural flow of English.)

Fluidized Bed Tube Furnace: Unparalleled Specifications

Parameter Specification
Maximum Temperature 1200°C
Operating Temperature ≤1100°C
Display LCD touch screen
Tube Diameter 40mm (OD)
Tube Material Custom high-purity quartz tube
Furnace Tube Length Approx. 1100mm (customizable)
Heating Element Premium heating wire
Heating Rate 0-10°C/min
Temperature Control - Programmable 30-segment time-temperature curves
- Touchscreen multi-segment PID control
- Data logging with Excel export capability
- Built-in over-temperature and thermocouple failure protection
Thermocouple Type N thermocouple
Sealing Method Custom stainless steel vacuum flange with sealing
Furnace Chamber - Double-layer steel shell with dual cooling fans
- Dual-zone vertical open structure for easy tube access
- Alumina refractory fiber lining for energy efficiency
Vacuum Flange Stainless steel vacuum flange with valve
Operating Voltage 220V, 50Hz
Power Rating 6KW (customizable)

Gas Delivery System: Premier 3-Channel Mass Flow Control System

Parameter Specification
Power Supply 220V/50Hz, maximum output 18W

Standout Features:

  1. State-of-the-art touchscreen control coupled with data recording capabilities

  2. Innovative dual-zone vertical design ensuring optimal thermal management

  3. Comprehensive gas flow control system integrated

  4. Design emphasizes safety with multiple protection features

  5. Components can be customized to meet specific research demands

Note: Specifications are adaptable based on precise requirements. This system marries precision temperature control with seamless gas delivery for cutting-edge CVD applications.

Parameter Specification
Maximum Pressure 3×10 Pa
Gas Channels Can simultaneously connect 3 gas sources to slightly positive pressure
Flow Meter Mass flow meter (other ranges optional)
Channel A Range 1 SLM
Channel B Range 1 SLM
Channel C Range 1 SLM
Gas Line Pressure -0.1 ~ 0.15 MPa
Accuracy ±1% F.S.
Shut-off Valve Stainless steel
Gas Line Tubing 1/4" stainless steel tube

Vacuum System: Essential Components

Component Specification
Vacuum Pump 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube
Vacuum Gauge Included (standard configuration)


PVD Coating Machine for Thin-Film Deposition Research in Laboratory

Main Application:

This innovative dual-zone sliding-track CVD tube furnace boasts a highly efficient rail-guided sliding design, facilitating rapid thermal transitions by horizontally moving the furnace. It can interface with an impressive six gas sources, featuring precise flow measurement and control using a touchscreen-enabled 6-channel mass flow controller (MFC).

This advanced high-temperature CVD system is expertly designed for prominent universities, leading research institutions, and forward-thinking industrial manufacturers to execute detailed experiments and production related to innovative chemical vapor deposition (CVD).

Remarkable Features:

  • Ingenious sliding-track mechanism facilitates swift thermal cycling

  • Versatile multi-gas compatibility (includes 6 independent channels)

  • Precision flow control powered by an intuitive touchscreen MFC interface

  • Adaptable for versatile applications in intense research and small-batch production environments

    Parameter Specification
    Furnace Access Mode Swing-open design
    Furnace Movement Rail-guided horizontal sliding for rapid heating/cooling
    Chamber Material Alumina refractory fiber
    Heating Element Aluminum-containing heating wire
    Maximum Temperature 1200°C
    Operating Temperature ≤1100°C
    Heating Rate ≤20°C/min (Recommended: 15°C/min)
    Heating Zones Dual-zone
    Total Zone Length 200mm + 200mm
    Tube Material High-purity quartz
    Tube Diameter 60mm
    Sealing Method - Quick-release flange for material loading
    - Stainless steel vacuum flange with silicone seal
    Control System Multi-segment intelligent PID programming
    Temperature Sensor Type N thermocouple
    Safety Alarms Over-temperature & thermocouple failure alarms
    Power Supply 220V, 50Hz

    Gas Delivery System (KJ-6Z): Top-Tier Performance

    Parameter Specification
    Operating Temperature 5~45°C
    Maximum Pressure 3×10 Pa
    Gas Channels 6 independent gas inputs
    Flow Meter Type Mass flow meter (other ranges available at same cost)
    Channel A Range 0-300 SCCM
    Channel B Range 0-300 SCCM
    Channel C Range 0-300 SCCM
    Channel D Range 0-300 SCCM
    Channel E Range 0-300 SCCM
    Channel F Range 0-300 SCCM
    Line Pressure -0.1~0.15 MPa
    Valves Stainless steel shut-off valves
    Tubing Stainless steel

    Vacuum System: Excellence at its Core

    Component Specification
    Pump System Molecular pump unit with connecting pipes
    Power 220V/50Hz
    Mobility Wheel-mounted base for easy movement
    Ultimate Vacuum 6.67×10³ Pa

    Standard Accessories: Comprehensive Kit

  • Durable Quartz furnace tube (1)

  • Complete Vacuum flange set (1)

  • Key Highlights:

  • Innovative sliding mechanism ensures rapid thermal cycling

  • Precision six-channel gas control system

  • Research-grade vacuum performance capability

  • Comprehensive turnkey solution with all necessary accessories

  • Built with industrial-grade materials and enhanced safety protections

  •  
  • Two robust Tube stoppers

  • High-quality O-ring seals

  • Protective gloves for safe handling (1 pair)

  • Ergonomic Crucible hook (1)

  • Durable PTFE tubing (3m)

  • Set of Hex keys (2)

  • Comprehensive Operation manual
    PVD Coating Machine for Thin-Film Deposition Research in Laboratory

    This cutting-edge system is meticulously designed for CVD processes: These cutting-edge processes are at the forefront of material innovation, offering unparalleled precision and control in the design and development of advanced materials., including the following innovative techniques:

  • Silicon carbide coating: Achieve superior thermal conductivity and durability with our advanced silicon carbide coatings, ideal for a wide range of high-performance applications.

  • Conductivity testing of ceramic substrates: Ensure optimal performance and reliability of ceramic materials through precise conductivity testing, enhancing their application potential.

  • 2D material growth: Explore new dimensions in material science with our controlled 2D material growth capabilities, paving the way for next-generation technological advancements.

  • Controlled growth of ZnO nanostructures: Harness the power of nanoscale engineering with our state-of-the-art techniques for ZnO nanostructure growth, opening new avenues in electronics and photonics.

  • Atmosphere sintering of ceramic capacitors (MLCC): Optimize the electrical performance of ceramic capacitors with precise atmosphere sintering, crucial for cutting-edge electronic devices.

  • It also serves as a specialized apparatus for cutting-edge research, dedicated graphene film growth furnace: Tailored for the intricate process of graphene film growth, for graphene preparation. The furnace features a state-of-the-art sliding rail base design: A breakthrough in design innovation,allowing manual lateral movement to expose the tube to room temperature for efficient rapid cooling: This ensures swift thermal transitions, pivotal for high-throughput experiments.

    This equipment is particularly suitable for researchers and technologists engaged in CVD experiments requiring fast heating/cooling rates: Essential for maximizing experimental efficiency and precision, making it ideal for:

  • High-efficiency graphene synthesis: Propel your graphene research forward with our furnace, designed for unmatched synthesis efficiency.

  • Other CVD applications demanding rapid thermal cycling: Meet the demanding requirements of modern CVD applications with ease.

  • Key Advantages: Discover the features that set our equipment apart:
    Precision temperature control: Achieve unparalleled consistency and accuracy in material growth. for sensitive material growth: Protect delicate processes and ensure highest quality outcomes.
    Unique sliding mechanism: Experience the revolutionary ease of use and time efficiency. enables faster processing: Push the boundaries of what's possible with accelerated processing speeds.
    Versatile applications: From graphene to a broad range of advanced material studies, across advanced material research: Our solutions are designed to support your most ambitious research goals.
    Optimized for both graphene and general CVD processes: A dual-functionality approach to meet diverse research needs.

    Sliding Rail Tube Furnace Specifications: An overview of this cutting-edge equipment:

    Furnace Section: These are the core features powering your research advancements:

    Parameter Specification
    Furnace Structure Sliding rail design
    Maximum Temperature 1200°C
    Continuous Operating Temperature ≤1100°C
    Heating Rate Up to 20°C/min (Recommended: 10°C/min)
    Heating Zone Length 300mm (Single zone)
    Heating Element Phase-resistant heating wire
    Thermocouple Type K
    Temperature Accuracy ±1°C
    Tube Diameter Options Φ50, Φ60, Φ80
    Tube Material High-purity quartz
    Temperature Controller PID intelligent program control
    Vacuum Flange 304 stainless steel
    - Left flange: Equipped with needle valve + ball valve
    - Right flange: KF25 interface with baffle valve

    Power Supply: A robust supply system supporting demanding research needs:
    | Input Power | Single-phase 220V, 50Hz, 3KW |: Ensures consistent and reliable energy delivery for optimal performance.

    Vacuum System: Built for efficiency and precision:

    Component Specification
    Rotary Vane Pump with Digital Gauge - Ultimate vacuum: 10³ Torr
    - Tube vacuum: 10² Torr
    - Pumping speed: 4CFM (2L/s, 120L/min)
    - Options: Rotary vane pump/diffusion pump/molecular pump available

    Mass Flow Controller System: Masterful control over material inputs for precise experimentation.

    Parameter Specification
    Channels 3-channel high precision MFC
    Flow Range MF1-MF3: 50-1000sccm adjustable
    Features - Mixing chamber at bottom
    - 3 manual stainless steel needle valves

    Important Notes: Critical information to maximize safety and performance:

    Warning Description
    Pressure Limit Tube pressure must not exceed 0.02MPa
    Gas Cylinder Safety Must use pressure reducer (0.01-0.1MPa recommended)
    High Temp Operation Above 1000°C: Maintain atmospheric pressure
    Gas Flow Limit <200SCCM to protect quartz tube
    Quartz Tube Limit Continuous use <1100°C
    Valve Warning Never close both valves during heating

    Certifications: Our commitment to quality and safety:
    | ISO Certification | CE Certification |: A testament to our adherence to global standards.

    Safety Precautions: Essential guidelines to ensure safe and effective operation:

  • Do not open the furnace chamber when temperature ≥200°C: Protect yourself from potential harm. to prevent personal injury: Safety is our top priority.

  • Tube pressure must never exceed 0.02MPa (absolute pressure): Safeguard the equipment from damage due to overpressure. during operation to avoid equipment damage from overpressure.

  • Warning: Heed this crucial advice to ensure a safe working environment: Failure to follow these precautions may result in severe consequences, such as:

  • Serious personal injury: Prioritize safety to avoid accidents.

  • Equipment damage: Maintain equipment integrity through careful operation.

  • Safety hazards: A proactive approach to prevent potential risks.

  •  
  • When furnace temperature >1000°C, the tube must not be under vacuum: Ensure atmospheric pressure is maintained to prevent complications. - maintain atmospheric pressure inside the tube.

  • Avoid closing both inlet and outlet valves simultaneously during sample heating: Prevent pressure build-up and ensure smooth operations. If valves must be closed: Follow this protocol for safe equipment handling:

    • Continuously monitor pressure gauge readings: Stay alert to avoid dangerous pressure levels.

    • Immediately open exhaust valve if absolute pressure exceeds 0.02MPa: Act quickly to prevent hazardous situations.

    • Prevents hazardous situations (tube rupture, flange ejection, etc.): Safety checks designed to avert critical failures.
      PVD Coating Machine for Thin-Film Deposition Research in Laboratory
      Equipment Application & Features: Discover the broad range of possibilities with our technology:

      This high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including a wide array of applications:

      Silicon carbide (SiC) coating: Maximize the potential of SiC in your research.

      Conductivity testing of ceramic substrates: Critical for enhancing material performance.

      Controlled growth of ZnO nanostructures: Leading-edge capabilities for ZnO applications.

      Atmosphere sintering of ceramic capacitors (MLCC): Essential for producing high-quality electronic components.

      Primary Users: Tailored for professionals at the forefront of material science and engineering.
      The RJ PVD Coating Machine from HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD is meticulously designed for universities, research institutions, and industrial manufacturers, providing unparalleled solutions for vapor deposition-related experiments and production, ensuring precision and reliability to meet the highest standards.

      Key Specifications:

      Alumina (AlO) furnace tube expertly crafted to endure extreme temperatures reaching up to 1600°C, promising durability and resilience.

      Ingenious vacuum and atmosphere-capable design, allowing versatile experimentation with commendable ease.

      State-of-the-art heating element made from high-performance MoSi (molybdenum disilicide) for optimal efficiency.

      Furnace chamber features ceramic fiber insulation, providing exceptional thermal uniformity and remarkable energy efficiency for dependable performance.

      Advantages:
      Unmatched high temperature stability with ±1°C precision, ensuring consistent and reliable operations.
      Experience the advantage of rapid heating/cooling, combined with superior heat retention for optimal operational efficiency.
      Ensures safe and user-friendly operation, prioritizing user safety and convenience at every step.
      Versatility for advanced materials research, making it an indispensable tool for cutting-edge scientific exploration.

      Parameter Specification
      Maximum Temperature 1700°C
      Operating Temperature 1600°C
      Display LED Screen
      Tube Diameter 80mm (OD)
      Tube Material Alumina Tube
      Heating Zone Length 220+220+220mm (with gaps between zones)
      Heating Element MoSi (Molybdenum Disilicide)
      Heating Rate 0-5°C/min
      Temperature Control - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor
      - 30 programmable segments for ramp/soak control
      - Built-in PID auto-tuning with over-temperature & thermocouple failure protection
      - Over-temperature alarm allows unattended operation
      Thermocouples 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)
      Temperature Accuracy ±1°C
      Furnace Structure - Double-layer steel shell with dual cooling fans (surface temp <60°C)
      - Fixed non-openable furnace design
      Vacuum Flange Stainless steel vacuum flange with valve
      Operating Voltage 220V 50Hz
      Maximum Power 6kW

      Gas Delivery System

      Component Specification
      4-Channel Mass Flow Controllers - MFC1: 0-100sccm
      - MFC2: 0-200sccm
      - MFC3: 0-500sccm
      - MFC4: 0-200sccm
      Gas Mixing - Bottom-mounted mixing chamber with liquid release valve
      - 4 manual stainless steel needle valves for gas control

      Vacuum System

      Component Specification
      Vacuum Pump + Gauge Rotary vane pump achieves 10Pa vacuum (cooled state)

      Key Features:

    • Boasting ultra-high temperature capability of 1700°C with MoSi heating elements for exceptional performance.

    • Precision-engineered multi-zone temperature control with a remarkable ±1°C accuracy for meticulous thermal management.

    • Programmable 30-segment thermal profiles offer tailored operational flexibility to suit diverse application needs.

    • Comprehensive gas mixing system equipped with 4-channel MFCs, enabling intricate material processing.

    • Industrial-grade vacuum performance ensures superior operational standards and reliability.

      Safety Precautions:

    • Caution: Avoid opening the furnace chamber when the temperature exceeds 200°C to prevent the risk of personal injury. Exercise caution to prevent personal injury.

    • Tube pressure must be diligently maintained and never exceed 0.02MPa (absolute pressure) during operation to avert equipment damage. Maintain vigilance during operation to avoid equipment impairment due to overpressure.

    • Warning: Neglecting these precautions may result in dire consequences such as:

    • Serious personal injury, which could have lasting repercussions.

    • Potential damage to the equipment, affecting its functionality and performance.

    • Formation of safety hazards, posing significant risks.

    •  
    • When furnace temperature exceeds 1000°C, ensure the tube is not under vacuum - maintain atmospheric pressure within. - maintain atmospheric pressure inside the tube to prevent complications.

    • Avoid the simultaneous closure of both inlet and outlet valves during sample heating to ensure smooth operation. If valves must be closed during operation:

      • Continuously monitor pressure gauge readings for optimal safety assurance.

      • Promptly open the exhaust valve if absolute pressure surpasses 0.02MPa to prevent hazardous conditions.

      • Mitigates hazardous situations such as tube rupture or flange ejection, safeguarding both equipment and personnel.
        PVD Coating Machine for Thin-Film Deposition Research in Laboratory

        Equipment Description

        This advanced system integrates:

      • A sophisticated gas flow control system for precise regulation.

      • A refined liquid injection system, facilitating seamless material processes.

      • Multi-stage temperature-controlled growth zones for efficient thermal management.

      • A robust water cooling system ensuring consistent operational temperature control.

      • CNT Growth Furnace Specifications:

      • Maximum operating temperature: 1400°C, with continuous adjustability from 0-1400°C, offering flexibility and precision.

      • Vertical thermal field distribution, with dual-zone temperature control for enhanced performance.

      • Top-mounted liquid injection port, with flow guide components, meticulously crafted for optimal delivery.

      • This CNT/thin-film CVD equipment enables:
        Continuous, uninterrupted growth processes to meet demanding production requirements.
        Precise thermal management, facilitating controlled nanostructure synthesis with remarkable precision.
        Integrated liquid/gas phase delivery for complex material deposition, expanding the horizons of material science.

      • Comprehensive components for Carbon nanotube (CNT) synthesis, bringing cutting-edge technology to your fingertips.

        Technical Specifications - Marvel at our Carbon Nanotube/Nanowire CVD Growth Furnace, the pinnacle of innovation and precision engineering!

        Parameter Specification
        Equipment Name Carbon Nanotube/Nanowire CVD Growth Furnace
        Model KJ-T1400V
        Furnace Structure Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness
        Maximum Power 20KW
        Voltage AC 220V single-phase, 50/60Hz
        Heating Element Silicon carbide (SiC) rods
        Max Operating Temp 1400°C
        Continuous Working Temp Adjustable between 100-1400°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Alumina tube: OD 80mm × Length 1500mm
        Heating Zone Length 700mm + 400mm
        Uniform Temp Zone Length 800mm (±1°C)
        Thermocouple SEI thermocouple for temperature measurement and control
        Temperature Control System 30-segment PID programmable control
        Temperature Accuracy ±1°C

        Stainless Steel Flange - Crafted for durability and performance, a steadfast component in our advanced systems.
        The system boasts an intricate stainless steel vacuum flange assembly, seamlessly integrated with precision needle valves and a mechanical pressure gauge. The armored flange ingeniously facilitates thermocouple extension to the inlet, guaranteeing precise temperature monitoring.

        Key Features: Discover the groundbreaking attributes that redefine excellence.

      • High-purity alumina tube for pristine growth, ensuring every process remains untouched by contamination.

      • Experience precision like never before with temperature control at an impeccable ±1°C across an expansive 800mm uniform zone.

      • Note: Specifications are subject to rigorous technical verification. Designed to spearhead the synthesis of advanced nanomaterials under meticulously controlled environments.

      • Robust SiC heating elements, crafted for ultra-high temperature operations, ensuring peak performance and reliability.

      • A comprehensive gas/vacuum interface with cutting-edge measurement capabilities.
        PVD Coating Machine for Thin-Film Deposition Research in Laboratory

        Equipment Introduction - Unveil the pinnacle of technological advancement.

        The LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:

      • A double-layer shell structure with an innovative air-cooling system, ensuring the surface temperature remains below 55°C, enhancing safety and performance.

      • 30-segment PID programmable intelligent temperature control with sophisticated phase-angle firing for ultra-precise heating

      • Alumina polycrystalline fiber chamber lining for supreme thermal insulation and consistent temperature distribution

      • Applications: Elevate your projects with a myriad of applications.
        Silicon carbide (SiC) coating - Achieve unparalleled coatings with our state-of-the-art technology.
        Conductivity testing of ceramic substrates - Precision testing for optimal conductivity results.
        Controlled growth of ZnO nanostructures - Tailored growth processes for superior results.
        Atmosphere sintering of ceramic capacitors (MLCC) - Advanced sintering for high-performance capacitors.

        Key Advantages: Experience unrivaled benefits designed for excellence.

      • User-friendly touchscreen interface - Intuitive and easy to navigate for seamless operation.

      • Energy-efficient thermal design - Engineered to minimize energy consumption while maximizing output.

      • Research-grade temperature uniformity - Consistently accurate results for all your research needs.

      • Versatile for advanced material processing - Adaptable to a wide range of cutting-edge applications.

      •  
      • Fully automated operation with comprehensive unattended capability, ensuring efficiency and ease.

        High-Temperature Furnace Specifications - Delve into the specifics of our high-performance furnace.

        Parameter Specification
        Furnace Structure Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness
        Maximum Power 5KW
        Voltage AC 220V single-phase, 50Hz
        Heating Element Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)
        Max Operating Temp 1200°C
        Continuous Working Temp 1100°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Quartz tube: OD 80mm × Length 1000mm
        Heating Zone Length Total 440mm
        Uniform Temp Zone Length 150mm (±1°C)
        Control Interface LCD touch screen
        Thermocouple Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen
        Temperature Control 30-segment PID programmable control
        Temperature Accuracy ±1°C
        Vacuum Sealing System Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)
        High Vacuum System - Control panel for molecular pump speed/vacuum level monitoring
        - Turbo molecular pump + dry scroll pump
        - All KF-25 standard connections between pumps and quartz tube
        Vacuum Level 6.7×10³ Pa (empty chamber, room temperature)
        Gas Delivery System Three mass flow controllers with ranges:
        • Channel 1: 1-100 sccm
        • Channel 2: 1-200 sccm
        • Channel 3: 1-500 sccm

        Key Features: Unlock the potential with these superior features.

      • Ultra-clean alumina-coated chamber for processes sensitive to contamination, delivering purity at every step.

      • Precision 3-zone temperature monitoring (±1°C),

      • offering research-grade vacuum capability reaching down to 10³ Pa, for immaculate high-vacuum conditions.

      • Complete gas flow control with triple MFC channels, ensuring precise and adaptable flow management.

      • Industrial-grade components with extended durability, engineered to withstand the rigors of demanding environments.

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