Advanced Constant Pressure Control System for Optimal Performance

• Customization: Available
• After-sales Service: on-Line Service
• Warranty: One Year
• Model NO.: RJ-HY-DRV16
• Application: Industry, School, Hospital, Lab
• Customized: Customized
• Certification: CE
• Structure: Desktop
• Material: Steel
• Type: Tubular Furnace
• Power Supply: Single-Phase 220V/50Hz
• Power Consumption: 1kw
• Vacuum Pump: Drv16c VFD Pump (Kf25 Flange)
• High Precision: 200-700PA
• Transport Package: Wooden Case
• Specification: Customized
• Trademark: RJ
• Origin: Zhengzhou, China

Product Description

Constant Pressure Control System (Model: RJ-HY-DRV16)
1. System Overview
An advanced pressure regulation system utilizing variable frequency drive (VFD) technology for precise vacuum control in thin-film deposition and material processing applications. Designed for integration with tube furnaces, CVD/PECVD systems, and analytical instruments.
2. Key Features
2.1 Precision Pressure Control

• Dual-range regulation:
  • Fine control: 200-700Pa (±1Pa) via digital vacuum gauge
  • Broad control: 10-50kPa (±1%) via pressure sensor
• Real-time adaptive pumping speed adjustment

2.2 Intelligent Monitoring

• IoT-enabled (WiFi/RJ45) remote operation
• 30-day data logging capacity (8hrs/day)
• TCP/IP protocol for SCADA integration
• Visual pressure trending display

3. Technical Specifications

Parameter	Specification
Power Supply	Single-phase 220V/50Hz
Power Consumption	1KW
Vacuum Pump	DRV16C VFD Pump (KF25 flange)
	- Includes oil mist filter
Pressure Ranges
High Precision	200-700Pa
Standard Range	10-50kPa
Measurement Devices
Digital Vacuum Gauge	PG800K (1-10,000Pa)
Pressure Sensor	0-100kPa range
Physical Dimensions	650×420×450mm
Weight	40kg

4. Performance Characteristics
4.1 Control Parameters

Metric	Value
Flow Rate Range	200-1000ml/min (fine)
	6-17L/min (standard)
Response Time	<500ms for 10% pressure fluctuation
Stability	±0.5% of setpoint

4.2 System Integration

• Compatible with:
  • Thermal CVD systems
  • Plasma-enhanced deposition
  • Sputtering systems
  • Gas mixing stations
• Standard KF25 flange connection

5. Operational Advantages

1. Process Optimization
   • Maintains stable pressure during gas flow changes
   • Enables repeatable deposition conditions
   • Reduces film defects from pressure fluctuations
2. User Benefits
   • Touchscreen interface with recipe storage
   • Automated pump speed adjustment
   • Remote monitoring via mobile/desktop
3. Safety Features
   • Over-pressure protection
   • Pump overload safeguards
   • Emergency venting capability

6. Maintenance & Support

• 12-month warranty (consumables excluded)
• Lifetime technical assistance
• Recommended service interval: 2000 operational hours

7. Typical Applications

• Semiconductor thin-film deposition
• Optical coating processes
• Vacuum annealing systems
• Surface modification treatments
• Research-scale material synthesis

This system represents a significant advancement in process control technology, offering laboratory-grade precision with industrial reliability. The VFD pump architecture reduces energy consumption by up to 40% compared to conventional vacuum systems while providing superior pressure stability.
For optimal performance, we recommend pairing with our RJ-series tube furnaces and gas delivery systems for complete process integration.