PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications

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Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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Year of Establishment
2025-04-22
Registered Capital
1.48 Million USD
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications
  • PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications

Equipment Introduction

The RJ150-XK is an advanced tubular diffusion/oxidation furnace, meticulously engineered for cutting-edge R&D applications across enterprises, universities, and research institutes. It facilitates a myriad of processes, including but not limited to:

  • Polysilicon and silicon nitride deposition

  • Diffusion

  • Oxidation

  • Annealing

Key Features:

  • Versatile processing capabilities ideal for in-depth material research and innovation

  • Precision temperature control system ensuring consistent and reliable results

  • Compact design perfectly optimized for modern lab environments
    Product Features:

    1. Expertly supports an array of processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and beyond.
    2. Incorporates a robust industrial computer coupled with a PLC system for seamless automation of furnace temperature, boat movement, gas flow, and valves, achieving full automation of the complete process.
    3. Boasts an intuitive human-machine interface for effortless modification of process control parameters and real-time monitoring of process statuses.
    4. Offers a selection of multiple process pipelines for user convenience and flexibility.
    5. Enhanced by powerful software capabilities, including self-diagnostic tools that significantly minimize maintenance downtime.
    6. Features automatic regulation of the constant temperature zone and cascade control, ensuring precise temperature management within the reaction tube.
    7. Equipped with comprehensive alarms and safeguards against over-temperature, thermocouple breakage, short circuits, and process gas flow deviations.
    8. Offers customizable solutions tailored to meet specific customer requirements.

Technical Specifications

Model KJ150-XK
Operating Temperature ≤1300ºC
Wafer Size 2~8 inches (round wafers)
Number of Process Tubes 1~2 tubes per unit
Constant Temperature Zone Length 300~600mm
Constant Temperature Zone Accuracy ≤±0.5ºC
Temperature Stability ≤±0.5ºC/24h
Temperature Ramp Rate Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min
Safety Alarms & Protections Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions

The **RJ-1200T-V50** is a state-of-the-art **vertical fluidized bed CVD system**, meticulously crafted for **powder surface deposition experiments**. Featuring a unique **openable design**, the furnace allows for the opening of the body post-experiment, facilitating the easy removal of the quartz tube to retrieve processed particles.

Within the furnace tube, a **0.2mm porous quartz plate** (customizable in pore size) is strategically placed. The powder is deposited on this porous plate, and gas introduced from the **bottom of the tube** fluidizes the sample particles, suspending them within the heating zone for optimal deposition.

**Note:** During particle fluidization, excessive gas flow may result in particles escaping the heating zone. Adjustments to the gas flow rate should be based on the **particle size** to ensure precision during experiments.PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications

Technical Specifications

Parameter Specification
Heating Zone Length 400mm
Furnace Tube Dimensions Diameter: 50mm, Length: 900mm
Furnace Tube Material High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Sensor Type N thermocouple
Temperature Control Intelligent 30-segment PID programmable microcomputer control with auto-tuning
Temperature Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple breakage protection
Heating Rate 0-20°C/min
Heating Element Alloy resistance wire
Operating Voltage AC220V, single-phase, 50Hz
Maximum Power 3KW
Furnace Chamber Material Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution
Flange Stainless steel vacuum flange, easy to disassemble
Sealing System O-ring compression seal between furnace tube and flange, reusable, high airtightness
Fluidization Zone 1. Reaction gas uniformly passes through the reaction zone.
2. Solid particles are fluidized by gas in the heating zone.
3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.
Note Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.
Shell Structure Double-layer shell with air-cooling system, openable design
Furnace Structure Vertical structure
Parameter Specification
Internal Temperature ≤45ºC
Measurement & Control Devices  
Name Dual-channel Mass Flow Controller (MFC)
Gas Channels 2 channels
Flow Control Digital display, each gas line with independent needle valve control
Connection Method Double ferrule fitting
Flow Meter Mass flow meter
Flow Range MFC1: N 0-10 SLM
MFC2: CO 0-10 SLM
Gas Mixing Equipped with a precision gas mixing chamber
Power Supply 220V, 50Hz
Operating Ambient Temp. 5ºC~45ºC
Standard Accessories Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,
high-temperature gloves ×1 pair, crucible hook ×1,
hex wrench for flange disassembly ×1, warranty card & manual ×1 set
PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications

Equipment Introduction

The vertical dual-zone CVD system is architecturally comprised of:

  • A 1200°C dual-zone tube furnace, engineered for high-temperature applications

  • A 3-channel mass flow controller (MFC) gas supply system, ensuring precise gas delivery

  • A 2L/s vacuum pump with integral connecting components for seamless integration

The system is optimized with directional and swivel casters at the base, offering a compact footprint and superior mobility for flexible positioning.

Designed meticulously for CVD (Chemical Vapor Deposition) processes, this advanced system is perfectly suited for the esteemed environments of universities, innovative research centers, and dynamic industrial manufacturers to conduct a wide range of experiments and high-precision production processes involving cutting-edge chemical vapor deposition techniques.

(Note: The following content is structured to enhance clarity while rigorously maintaining technical accuracy and a natural English flow.)

Fluidized Bed Tube Furnace Specifications

Parameter Specification
Maximum Temperature 1200°C
Operating Temperature ≤1100°C
Display LCD touch screen
Tube Diameter 40mm (OD)
Tube Material Custom high-purity quartz tube
Furnace Tube Length Approx. 1100mm (customizable)
Heating Element Premium heating wire
Heating Rate 0-10°C/min
Temperature Control - Programmable 30-segment time-temperature curves
- Touchscreen multi-segment PID control
- Data logging with Excel export capability
- Built-in over-temperature and thermocouple failure protection
Thermocouple Type N thermocouple
Sealing Method Custom stainless steel vacuum flange with sealing
Furnace Chamber - Double-layer steel shell with dual cooling fans
- Dual-zone vertical open structure for easy tube access
- Alumina refractory fiber lining for energy efficiency
Vacuum Flange Stainless steel vacuum flange with valve
Operating Voltage 220V, 50Hz
Power Rating 6KW (customizable)

Gas Delivery System: Incorporating a 3-Channel Mass Flow Control System

Parameter Specification
Power Supply 220V/50Hz, maximum output 18W

Key Features:

  1. Highly advanced touchscreen control system equipped with data recording capabilities

  2. Innovative dual-zone vertical design ensures superior thermal management

  3. Comprehensive gas flow control system is seamlessly integrated

  4. Safety-centric design featuring multiple protective features for secure operation

  5. Tailored components can be customized to meet specific research requirements

Note: All specifications can be tailored to meet exact needs. This system fuses precision temperature control with efficient gas delivery, optimizing it for advanced CVD applications.

Parameter Specification
Maximum Pressure 3×10 Pa
Gas Channels Can simultaneously connect 3 gas sources to slightly positive pressure
Flow Meter Mass flow meter (other ranges optional)
Channel A Range 1 SLM
Channel B Range 1 SLM
Channel C Range 1 SLM
Gas Line Pressure -0.1 ~ 0.15 MPa
Accuracy ±1% F.S.
Shut-off Valve Stainless steel
Gas Line Tubing 1/4" stainless steel tube

Vacuum System Components

Component Specification
Vacuum Pump 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube
Vacuum Gauge Included (standard configuration)


PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications

Primary Application:

This state-of-the-art dual-zone sliding-track CVD tube furnace boasts a remarkable rail-guided sliding design, which allows for the swift heating and cooling of materials by horizontally maneuvering the furnace. It adeptly connects up to six gas sources, offering precise flow measurement and robust control via an intuitive touchscreen 6-channel Mass Flow Controller (MFC).

This top-tier high-temperature CVD system is specifically engineered for leading universities, forward-thinking research institutions, and industrial manufacturers to engage in a spectrum of experiments and production activities related to innovative chemical vapor deposition (CVD) processes.

Key Features:

  • Innovative Sliding-track mechanism facilitates rapid thermal cycling for efficiency

  • Compatible with multiple gases (featuring 6 independent channels)

  • Precision flow control system integrated with a user-friendly touchscreen MFC interface

  • Versatile for a diverse range of applications including research and small-batch production

    Parameter Specification
    Furnace Access Mode Swing-open design
    Furnace Movement Rail-guided horizontal sliding for rapid heating/cooling
    Chamber Material Alumina refractory fiber
    Heating Element Aluminum-containing heating wire
    Maximum Temperature 1200°C
    Operating Temperature ≤1100°C
    Heating Rate ≤20°C/min (Recommended: 15°C/min)
    Heating Zones Dual-zone
    Total Zone Length 200mm + 200mm
    Tube Material High-purity quartz
    Tube Diameter 60mm
    Sealing Method - Quick-release flange for material loading
    - Stainless steel vacuum flange with silicone seal
    Control System Multi-segment intelligent PID programming
    Temperature Sensor Type N thermocouple
    Safety Alarms Over-temperature & thermocouple failure alarms
    Power Supply 220V, 50Hz

    Gas Delivery System (KJ-6Z)

    Parameter Specification
    Operating Temperature 5~45°C
    Maximum Pressure 3×10 Pa
    Gas Channels 6 independent gas inputs
    Flow Meter Type Mass flow meter (other ranges available at same cost)
    Channel A Range 0-300 SCCM
    Channel B Range 0-300 SCCM
    Channel C Range 0-300 SCCM
    Channel D Range 0-300 SCCM
    Channel E Range 0-300 SCCM
    Channel F Range 0-300 SCCM
    Line Pressure -0.1~0.15 MPa
    Valves Stainless steel shut-off valves
    Tubing Stainless steel

    Vacuum System

    Component Specification
    Pump System Molecular pump unit with connecting pipes
    Power 220V/50Hz
    Mobility Wheel-mounted base for easy movement
    Ultimate Vacuum 6.67×10³ Pa

    Standard Accessories

  • Quartz furnace tube (1 piece)

  • Vacuum flange set (1 complete set)

  • Key Features:

  • Unique sliding mechanism ensures rapid thermal cycling

  • Sophisticated six-channel precision gas control system

  • Research-grade vacuum capabilities for maximum efficiency

  • Complete turnkey solution encompassing all essential accessories

  • Constructed with industrial-grade materials offering enhanced safety protections

  •  
  • Tube stoppers (2 units)

  • Durable O-ring seals

  • High-quality protective gloves (1 pair)

  • Practical crucible hook (1 unit)

  • PTFE tubing (3 meters in length)

  • Essential hex keys (2 pieces)

  • Comprehensive operation manual for user guidance
    PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications

    This cutting-edge system is meticulously engineered for precise CVD (Chemical Vapor Deposition) processes, ensuring seamless operation for a variety of applications including:

  • Advanced silicon carbide coating for enhanced material properties

  • Accurate conductivity testing of innovative ceramic substrates

  • Pioneering 2D material growth for future technologies

  • Expert-controlled growth of ZnO nanostructures with precision

  • Efficient atmosphere sintering of ceramic capacitors (MLCC) for superior performance

  • Moreover, it serves as an indispensable dedicated graphene film growth furnace for the meticulous preparation of high-quality graphene. The furnace boasts a sophisticated sliding rail base design, facilitating manual lateral movement to swiftly expose the tube to ambient room temperature for accelerated cooling.

    This specialized equipment is exceptionally suited for CVD experiments demanding rapid heating and cooling rates, positioning it as the ideal choice for:

  • High-efficiency synthesis of graphene with unparalleled precision

  • Other intricate CVD applications requiring swift thermal cycling

  • Key Advantages of this System:
    Unmatched precision temperature control ensuring optimal conditions for sensitive material growth
    A unique sliding mechanism that significantly enhances processing speed
    Versatile applications spanning across the forefront of advanced material research
    Optimized functionality for both graphene preparation and general CVD processes

    Sliding Rail Tube Furnace Specifications

    Furnace Section

    Parameter Specification
    Furnace Structure Sliding rail design
    Maximum Temperature 1200°C
    Continuous Operating Temperature ≤1100°C
    Heating Rate Up to 20°C/min (Recommended: 10°C/min)
    Heating Zone Length 300mm (Single zone)
    Heating Element Phase-resistant heating wire
    Thermocouple Type K
    Temperature Accuracy ±1°C
    Tube Diameter Options Φ50, Φ60, Φ80
    Tube Material High-purity quartz
    Temperature Controller PID intelligent program control
    Vacuum Flange 304 stainless steel
    - Left flange: Equipped with needle valve + ball valve
    - Right flange: KF25 interface with baffle valve

    Power Supply
    | Input Power | Single-phase 220V, 50Hz, 3KW |

    Vacuum System

    Component Specification
    Rotary Vane Pump with Digital Gauge - Ultimate vacuum: 10³ Torr
    - Tube vacuum: 10² Torr
    - Pumping speed: 4CFM (2L/s, 120L/min)
    - Options: Rotary vane pump/diffusion pump/molecular pump available

    Mass Flow Controller System

    Parameter Specification
    Channels 3-channel high precision MFC
    Flow Range MF1-MF3: 50-1000sccm adjustable
    Features - Mixing chamber at bottom
    - 3 manual stainless steel needle valves

    Important Notes

    Warning Description
    Pressure Limit Tube pressure must not exceed 0.02MPa
    Gas Cylinder Safety Must use pressure reducer (0.01-0.1MPa recommended)
    High Temp Operation Above 1000°C: Maintain atmospheric pressure
    Gas Flow Limit <200SCCM to protect quartz tube
    Quartz Tube Limit Continuous use <1100°C
    Valve Warning Never close both valves during heating

    Certifications
    | ISO Certification | CE Certification |

    Safety Precautions:

  • Never open the furnace chamber when the temperature is ≥200°C to ensure safe operation and prevent personal injury.

  • Ensure tube pressure never exceeds 0.02MPa (absolute pressure) during operation to prevent equipment damage due to overpressure.

  • Warning: Neglecting these precautions could lead to:

  • Severe personal injury

  • Potential equipment damage

  • Significant safety hazards

  •  
  • When furnace temperature exceeds 1000°C, ensure the tube is not under vacuum - maintain atmospheric pressure within the tube for safety.

  • Avoid closing both inlet and outlet valves simultaneously during sample heating to ensure safety. If closing valves is necessary:

    • Continuously monitor pressure gauge readings vigilantly

    • Promptly open the exhaust valve if the absolute pressure exceeds 0.02MPa

    • to prevent hazardous situations such as tube rupture or flange ejection.
      PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications
      Equipment Application & Features

      This high-temperature CVD tube furnace is specifically designed for intricate chemical vapor deposition (CVD) processes, including:

      Advanced silicon carbide (SiC) coating for superior material performance

      Conductivity testing of cutting-edge ceramic substrates

      Precision-controlled growth of ZnO nanostructures

      Atmosphere sintering of high-quality ceramic capacitors (MLCC)

      Primary Users:
      HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD's RJ PVD Coating Machine is designed to cater to the sophisticated needs of universities, cutting-edge research institutions, and industrial manufacturers. It is an ideal choice for conducting intricate vapor deposition-related experiments and scaling up production.

      Key Specifications:

      Equipped with an Alumina (AlO) furnace tube, this machine can withstand extreme temperatures reaching up to 1600°C, ensuring durability and extended use.

      Innovatively designed to operate under vacuum and various atmospheric conditions, enhancing versatility in applications.

      The heating element features high-performance MoSi (molybdenum disilicide), offering exceptional efficiency and resilience under high temperatures.

      The furnace chamber is insulated with ceramic fiber, providing outstanding thermal uniformity and maximizing energy efficiency.

      Advantages:
      Experience unparalleled high-temperature stability with precision control to within ±1°C, ensuring accurate and reliable performance.
      Benefit from rapid heating and cooling capabilities combined with excellent heat retention for optimal operational efficiency.
      Engineered for safety and user-friendliness, facilitating ease of operation while maintaining high safety standards.
      Versatile design supports advanced materials research, paving the way for innovative developments and discoveries.

      Parameter Specification
      Maximum Temperature 1700°C
      Operating Temperature 1600°C
      Display LED Screen
      Tube Diameter 80mm (OD)
      Tube Material Alumina Tube
      Heating Zone Length 220+220+220mm (with gaps between zones)
      Heating Element MoSi (Molybdenum Disilicide)
      Heating Rate 0-5°C/min
      Temperature Control - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor
      - 30 programmable segments for ramp/soak control
      - Built-in PID auto-tuning with over-temperature & thermocouple failure protection
      - Over-temperature alarm allows unattended operation
      Thermocouples 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)
      Temperature Accuracy ±1°C
      Furnace Structure - Double-layer steel shell with dual cooling fans (surface temp <60°C)
      - Fixed non-openable furnace design
      Vacuum Flange Stainless steel vacuum flange with valve
      Operating Voltage 220V 50Hz
      Maximum Power 6kW

      Gas Delivery System

      Component Specification
      4-Channel Mass Flow Controllers - MFC1: 0-100sccm
      - MFC2: 0-200sccm
      - MFC3: 0-500sccm
      - MFC4: 0-200sccm
      Gas Mixing - Bottom-mounted mixing chamber with liquid release valve
      - 4 manual stainless steel needle valves for gas control

      Vacuum System

      Component Specification
      Vacuum Pump + Gauge Rotary vane pump achieves 10Pa vacuum (cooled state)

      Key Features:

    • Boasting ultra-high temperature capability up to 1700°C, thanks to robust MoSi heating elements, this system pushes the boundaries of performance.

    • Leverage precision multi-zone temperature control with ±1°C accuracy for nuanced and detailed thermal management.

    • Utilize programmable 30-segment thermal profiles for tailored and sophisticated process customization.

    • Includes a complete gas mixing system with 4-channel MFCs to ensure precise and versatile gas delivery.

    • Exhibits industrial-grade vacuum performance, indispensable for high-quality and consistent results.

      Safety Precautions:

    • For your safety, do not open the furnace chamber when the temperature is equal to or exceeds 200°C. Adhering to this precaution is essential to prevent potential personal injury.

    • Ensure tube pressure remains within safe limits, never exceeding 0.02MPa (absolute pressure), during operations to prevent equipment damage. Maintaining pressure within this range is crucial to avoid damaging the equipment due to overpressure.

    • Warning: Failure to observe these precautions could lead to serious consequences including:

    • Grave personal injury, posing significant health risks.

    • Potential damage to the equipment, leading to costly repairs or replacements.

    • Safety hazards, increasing the risk of accidents and operational disruptions.

    •  
    • When the furnace temperature exceeds 1000°C, ensure the tube is not under vacuum-maintain atmospheric pressure within the tube. This is critical to prevent any pressure-related issues.

    • Avoid the simultaneous closure of both inlet and outlet valves during sample heating to ensure safe operations. If it becomes necessary to close the valves temporarily:

      • Continuously monitor pressure gauge readings to ensure pressure remains within safe limits.

      • Open the exhaust valve immediately if the absolute pressure exceeds 0.02MPa to avert hazardous situations.

      • Such vigilance prevents dangerous scenarios like tube rupture or flange ejection.
        PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications

        Equipment Description

        This state-of-the-art system seamlessly integrates:

      • A sophisticated gas flow control system for precise regulation.

      • An advanced liquid injection system, enhancing material flexibility.

      • Multi-stage temperature-controlled growth zones for optimized performance.

      • A robust water cooling system to maintain operational stability and prolong equipment life.

      • CNT Growth Furnace Specifications:

      • Maximum operating temperature: Achieves up to 1400°C, with continuous adjustability from 0-1400°C, enabling precise thermal control.

      • Features vertical thermal field distribution for consistent and uniform heat application. with dual-zone temperature control, providing enhanced flexibility and precision.

      • Includes a top-mounted liquid injection port equipped with flow guide components for streamlined operations. with flow guide components

      • This Highly specialized CNT/thin-film CVD equipment enables:
        Continuous and uninterrupted growth processes, maximizing efficiency.
        Precise thermal management for controlled and refined nanostructure synthesis. for controlled nanostructure synthesis
        Integrated liquid/gas phase delivery for versatile and complex material deposition. for complex material deposition

      • Carbon nanotube (CNT) synthesis components

        Technical Specifications - Carbon Nanotube/Nanowire CVD Growth Furnace

        Parameter Specification
        Equipment Name Carbon Nanotube/Nanowire CVD Growth Furnace
        Model KJ-T1400V
        Furnace Structure Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness
        Maximum Power 20KW
        Voltage AC 220V single-phase, 50/60Hz
        Heating Element Silicon carbide (SiC) rods
        Max Operating Temp 1400°C
        Continuous Working Temp Adjustable between 100-1400°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Alumina tube: OD 80mm × Length 1500mm
        Heating Zone Length 700mm + 400mm
        Uniform Temp Zone Length 800mm (±1°C)
        Thermocouple SEI thermocouple for temperature measurement and control
        Temperature Control System 30-segment PID programmable control
        Temperature Accuracy ±1°C

        Stainless Steel Flange
        The system boasts a premium stainless steel vacuum flange assembly, fully equipped with precision-engineered stainless steel needle valves and a mechanical pressure gauge for exact pressure readings. The armored flange design allows for thermocouple extension to the inlet, ensuring precise temperature monitoring throughout the process.

        Key Features:

      • High-purity alumina tube ensures contamination-free growth, maintaining the integrity of materials.

      • Precision temperature control (±1°C) is maintained across an 800mm uniform zone, ensuring consistent performance.

      • Note: All specifications are subject to rigorous technical verification. This system is meticulously designed for the advanced synthesis of nanomaterials under strictly controlled atmospheres.

      • Robust SiC heating elements facilitate ultra-high temperature operation, ensuring reliability in the most demanding conditions.

      • Complete gas/vacuum interface equipped with state-of-the-art measurement capabilities for precise control.
        PVD Coating Machine for Thin-Film Deposition Research in Laboratory Custom Specifications

        Equipment Introduction

        The LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:

      • Double-layer shell structure with an innovative air-cooling system, ensuring the surface temperature remains comfortably below 55°C

      • 30-segment PID programmable intelligent temperature control with advanced phase-angle firing for precise heating regulation

      • Alumina polycrystalline fiber chamber lining provides exceptional thermal insulation and ensures uniform temperature distribution

      • Applications:
        Silicon carbide (SiC) coating applications
        Conductivity testing on ceramic substrates
        Controlled growth of ZnO nanostructures for innovative applications
        Atmosphere sintering of ceramic capacitors (MLCC) for enhanced performance

        Key Advantages:

      • User-friendly touchscreen interface for seamless operation

      • Energy-efficient thermal design reduces operational costs

      • Research-grade temperature uniformity for precise results

      • Versatile for advanced material processing across various applications

      •  
      • Fully automated operation with unattended capability, maximizing efficiency

        High-Temperature Furnace Specifications

        Parameter Specification
        Furnace Structure Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness
        Maximum Power 5KW
        Voltage AC 220V single-phase, 50Hz
        Heating Element Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)
        Max Operating Temp 1200°C
        Continuous Working Temp 1100°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Quartz tube: OD 80mm × Length 1000mm
        Heating Zone Length Total 440mm
        Uniform Temp Zone Length 150mm (±1°C)
        Control Interface LCD touch screen
        Thermocouple Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen
        Temperature Control 30-segment PID programmable control
        Temperature Accuracy ±1°C
        Vacuum Sealing System Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)
        High Vacuum System - Control panel for molecular pump speed/vacuum level monitoring
        - Turbo molecular pump + dry scroll pump
        - All KF-25 standard connections between pumps and quartz tube
        Vacuum Level 6.7×10³ Pa (empty chamber, room temperature)
        Gas Delivery System Three mass flow controllers with ranges:
        • Channel 1: 1-100 sccm
        • Channel 2: 1-200 sccm
        • Channel 3: 1-500 sccm

        Key Features:

      • Ultra-clean alumina-coated chamber ideal for contamination-sensitive processes requiring utmost purity

      • Precision 3-zone temperature monitoring (±1°C) ensures exact control

      • Research-grade vacuum capability down to 10³ Pa for superior atmosphere management

      • Complete gas flow control system with triple MFC channels for unmatched precision

      • Industrial-grade components designed with extended durability for long-lasting performance

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