High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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Year of Establishment
2025-04-22
Registered Capital
1.48 Million USD
  • High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing
  • High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing
  • High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing
  • High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing
  • High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing
  • High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Desktop
Material
Stainless Steel
Type
Electric Stove
Transport Package
Wooden Case
Specification
Customized
Trademark
RG

Product Description

High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing

The Vacuum RTP (Rapid Thermal Processing) Annealing Furnace is a high-vacuum fast-heating tubular furnace equipped with a quartz chamber and vacuum flanges. It utilizes halogen lamp heating, achieving a rapid heating rate of up to 50°C per second, and features PID automatic control with 30 programmable segments.

Specifically designed for annealing semiconductor or solar cell substrates, this high-temperature annealing tubular furnace enables rapid thermal processing of samples in vacuum or controlled atmosphere environments. It is widely used in university laboratories and industrial research facilities for applications such as:

  • Thin-film deposition

  • Rapid annealing of various materials

  • Silicidation

  • Diffusion

  • Crystallization

  • Densification
     

    Parameter 2-inch Wafer 4-inch Wafer 6-inch Wafer
    Wafer Size 2 inches 4 inches 6 inches
    Furnace Tube Outer Diameter 100 mm 110-150 mm 180 mm
    Heating Zone Length 200 mm 300 mm 400 mm

    Note: Other sizes can be customized based on customer requirements.

     

    Product Details

    Feature Specification
    Product Name RTP Rapid Annealing Furnace
    Operating Temperature 900°C
    Controller LED (Touchscreen LED optional)
    Furnace Chamber Open-type, sliding rail design
    Tube Size Customizable based on requirements
    Heating Element Halogen lamps
    Heating Rate 0-50°C/s
    Thermocouple Custom-designed based on actual needs
    Temperature Controller 30-segment high-precision digital programmable controller
    High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision ProcessingThe sliding tube furnace is equipped with a pair of sliding rails at the bottom, with two tube furnaces mounted on the rails simultaneously. The furnaces can be moved left and right to achieve rapid cooling. This RTP rapid annealing furnace can heat samples in various environments such as vacuum, atmospheric, and air conditions. It is primarily used for rapid annealing, silicidation, diffusion, crystallization, densification, and other processes for a variety of materials.
    Parameter Specification
    Display LED
    Temperature 1200°C
    Continuous Operating Temp ≤1100°C
    Heating Rate Recommended 0-10°C/min
    Furnace Tube Tube Dimensions: OD50/ID44 × L1800mm
      First Furnace: Heating Zone Length: 350mm
      Second Furnace: Heating Zone Length: 150mm
      (Other sizes customizable based on customer requirements)
    Heating Element Molybdenum Disilicide (MoSi) Heating Wire
    Sliding Rails/Table Chrome-Plated Steel Dual Rails, Sliding Length: 1800mm
      (Other sizes customizable based on customer requirements)
    Thermocouple Type N
    Tube Material High-Purity Quartz
    Sealing Flange Stainless Steel Water-Cooled KF25 Flange (with mechanical vacuum gauge port)
    Temperature Accuracy ±1°C
    Temperature Control Two Independently Controlled Furnaces
      - 30-step PID Auto Control via SCR Power Regulation
    High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing

    The sliding three-zone tube furnace is a rapid thermal annealing furnace with an 80mm outer diameter quartz tube and a maximum temperature of 1200°C. The furnace is equipped with a pair of sliding rails at the bottom, allowing the furnace to move from one side of the tube to the other for rapid heating and cooling.

    To achieve the fastest heating, preheat the furnace to the desired temperature and then slide it over the sample position. For the quickest cooling, simply slide the furnace away from the sample after heating is complete.

    This system is an ideal low-cost solution for rapid thermal processing (RTP).
     

    Parameter Specification
    Shell Structure Double-layer air-cooled
    Furnace Chamber Material Alumina refractory fiber
    Max Temperature 1200°C
    Operating Temperature 1100°C
    Heating Rate 10°C/min
    Heating Element Resistance wire
    Temperature Control PID temperature regulation, supports 30-segment heating/cooling programs, with over-temperature and thermocouple break protection
    Thermocouple Type N
    Heating Zone Length 220mm + 220mm + 220mm (other sizes customizable upon request)
    Furnace Tube Size Ø80mm × 2400mm (other sizes customizable upon request)
    Furnace Tube High-purity quartz tube
    Sliding Rails Chrome-plated steel dual rails
    Rail Length ~2500mm (other sizes customizable upon request)
    Flange 304 stainless steel sealing flange with silicone O-ring, easy assembly, reusable
    Compatible Gas Inert gas (slight positive pressure)
High-Performance 1200° C Rtp Sliding Annealing Equipment for Precision Processing

This custom RTP (Rapid Thermal Processing) annealing furnace consists of an RTP sliding-rail tube furnace, a multi-channel mass flow controller system, and a vacuum system, specifically designed for annealing semiconductor wafers, solar cells, or other samples (up to 3" in size).

The tube furnace utilizes infrared lamp heating, achieving an ultra-fast heating rate of 50°C per second. It features 30-segment precise temperature control with an accuracy of ±1°C. Equipped with an RS485 interface and control software, the furnace can be operated and monitored via computer, displaying real-time temperature curves.

This rapid thermal processing tube furnace is widely used for large-area 2D graphene growth via CVD and is optimized for semiconductor and solar cell wafer annealing. The computer controls the furnace in real-time through the RS485 interface and dedicated software, while visualizing temperature profiles.

Parameter Specification
Product Name Open-Type Dual-Zone RTP Tube Furnace
Operating Temperature ≤1000ºC
Controller LCD Touch Screen
Furnace Tube Size Quartz Tube OD80mm/ID72mm, Single-End Open (Custom sizes available)
Heating Zone 300mm (Custom lengths available)
Furnace Type Open-Type
Heating Element Halogen Lamp Heating
Heating Rate 30ºC/min
Temperature Sensor Type N Thermocouple
Temperature Controller 30-Segment High-Precision Digital Programmable Controller

Part 2: Gas Mixing System

Parameter Specification
Flow Range MFC1: Argon (O) 0-200sccm
MFC2: Argon (Ar) 0-200sccm

Part 3: Vacuum System

Component Specification
Vacuum Pump Rotary Vane Pump
Accessories Exhaust Filter + Corrosion-Resistant Digital Vacuum Gauge
High-Performance 1200&deg; C Rtp Sliding Annealing Equipment for Precision ProcessingThe rapid annealing furnace is equipped with vacuum flanges at both ends of the furnace tube. The vacuum level can reach 10<sup>-5</sup> Torr with a molecular pump and 10<sup>-3</sup> Torr with a mechanical pump. A pair of sliding rails is installed at the bottom of the furnace, allowing manual movement. The maximum heating and cooling rates can reach 100°C per minute. To achieve the fastest heating, the furnace can be preheated to the set temperature and then moved to the sample position. For the fastest cooling, the furnace can be moved to the other end after heating the sample. Under vacuum or inert gas conditions, the heating and cooling rates can reach 10°C per second, making it an ideal low-cost furnace for rapid thermal processing.
Parameter Specification
Furnace Tube Dimensions Φ60mm × 1500mm (Customizable per customer requirements)
Heating Zone Length 440mm (Customizable per customer requirements)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Control System 30-segment PID microcomputer programmable control (Optional LCD touchscreen display)
Temperature Control Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple break protection
Heating Rate 0~10°C/min
Heating Element Resistance wire
Gas Tightness 4.03 × 10<sup>-3</sup> Pa
Furnace Chamber Material Japanese imported chamber material, no powdering, excellent insulation, high reflectivity, uniform temperature distribution, strong resistance to thermal expansion and contraction
Slide Rail Dimensions Heavy-duty steel bidirectional slide rails, sliding length: 1200mm (Customizable per customer requirements)
Flange Connections Standard with two stainless steel vacuum flanges, pre-installed mechanical pressure gauge and stainless steel shut-off valve
Sealing System Silicone O-ring compression seal between furnace tube and flange, easy disassembly, reusable, excellent airtightness (ensures pressure gauge remains stable for 12 hours)
Furnace Tube Options Fused quartz tube or alumina tube
Temperature Sensor Type N thermocouple



 

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