Advanced Crystal Growth Furnace with High-Temperature Crucible Tube Technology

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
Diamond Member Since 2025

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Year of Establishment
2025-04-22
Registered Capital
1.48 Million USD
  • Advanced Crystal Growth Furnace with High-Temperature Crucible Tube Technology
  • Advanced Crystal Growth Furnace with High-Temperature Crucible Tube Technology
  • Advanced Crystal Growth Furnace with High-Temperature Crucible Tube Technology
  • Advanced Crystal Growth Furnace with High-Temperature Crucible Tube Technology
  • Advanced Crystal Growth Furnace with High-Temperature Crucible Tube Technology
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Basic Info.

Model NO.
RJ1700-100T2F
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Max Temperature
1650°c (Short-Term), 1600°c (Continuous)
Power Supply
AC380V, 50Hz, 9.5kw
Crucible Tube
Φ100×1300 mm (99% Al2O3, <1700°c)
Furnace Movement
300 mm Travel, 0.03–6000 mm/H Speed
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

Bridgman Crystal Growth Furnace
Model: RJ1700-100T2F
Overview
A high-precision furnace designed for single-crystal growth of semiconductors, metals, and ceramics using the Bridgman (vertical gradient freeze) method. Combines crucible descent, furnace movement, and rotation pulling technologies to enhance crystal quality and uniformity.
 
Key Features
  1. Precision Control
    • PID temperature control (±1°C accuracy) with programmable multi-segment profiles.
    • Servo-driven mechanics for smooth crucible descent (0.03-6000 mm/h) and rotation.
  2. Optimized Thermal Gradient
    • Dual heating zones (100+100 mm) with silicon molybdenum (MoSi2) heating elements (Tmax: 1650°C).
    • Ideal temperature gradient for defect-free crystal growth.
  3. Automation & Monitoring
    • Touchscreen/PC interface for real-time control of temperature, speed, and rotation.
    • Data logging (temperature, position, RPM) and analysis software.
  4. Versatile Configurations
    • Works under vacuum or protective atmospheres (sealed with stainless steel flanges).
    • Graphite sample stage (Φ80 mm) with embedded B-type thermocouple.
 
Technical Specifications
Parameter Value
Max Temperature 1650°C (short-term), 1600°C (continuous)
Power Supply AC380V, 50Hz, 9.5KW
Crucible Tube Φ100×1300 mm (99% Al2O3, <1700°C)
Furnace Movement 300 mm travel, 0.03-6000 mm/h speed
Atmosphere Options Vacuum/inert gas (N2, Ar)
Weight ~700 kg
 
Applications
  • Semiconductors: GaAs, SiC, CdTe crystal growth.
  • Metallurgy: High-purity alloy solidification.
  • Ceramics: Oxide single crystals (e.g., YAG).
 
Safety & Maintenance
  • Do not open above 300°C.
  • Vacuum limit: ≤800°C; for >1000°C, maintain atmospheric pressure.
  • Annual maintenance recommended (excludes consumables like O-rings).
 
Support
  • 1-year warranty (excludes wear parts).
  • Lifetime technical assistance.
Advanced Crystal Growth Furnace with High-Temperature Crucible Tube TechnologyAdvanced Crystal Growth Furnace with High-Temperature Crucible Tube TechnologyAdvanced Crystal Growth Furnace with High-Temperature Crucible Tube TechnologyAdvanced Crystal Growth Furnace with High-Temperature Crucible Tube TechnologyAdvanced Crystal Growth Furnace with High-Temperature Crucible Tube Technology
 

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