Desktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample

Product Details
Customization: Available
Application Field: Aerospace, Automotive, Electronics, Marine, Medical Devices, Oil & Gas, Power Generation, Railways
Coating Material: Metal
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  • Desktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample
  • Desktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample
  • Desktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample
  • Desktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample
  • Desktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample
  • Desktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample
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Basic Info.

Model NO.
Made-to-order
Power Source
Electric
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ

Product Description

Desktop Single-Target Magnetron Sputtering Coating Machine for Sem SampleThis equipment is a desktop single-target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory.
This desktop single-target 
magnetron sputtering coater equipment adopts quartz vacuum chamber,and the coating process is Omni-visible,which is easy to observe and record the experiment .The cavity design is easy to open, easy to clean, and very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, intuitive operation interface, easy to get started.
Desktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample

magnetron sputtering coater technical parameter:

Product Name Desktop single-target magnetron sputtering coater
Product Model RJ-MSZ180-1-DC-Q
Installation Condition 1,Working environment   temperature: 25ºC±15ºC,humidity: 55%Rh±10%Rh;
2,Equipment power supply:AC220V,50Hz, must be well grounded;
3,Rated power:1000w;
4,Equipment for gas:The equipment chamber   should be filled with argon gas for cleaning. The customer should prepare argon   gas with purity ≥99.99%.
5,Table size requirements:   600mm×600mm×700mm,bearing   capacity ≥ 50kg;
 6,The position should be well   ventilated and cooled.
Technical Indicators 1, Sputtering power supply:DC power supply 300W;maximum output voltage 600V,limited current output 500mA
2, Magnetron target:2 inch balance target,magnetic coupling baffle;
3, Suitable target material: φ50mm x 3mm in thickness
4, Cavity size :φ180mm x 200mm
5, Cavity material: high   purity quartz
6, Rotating heating sample   table:rotate   speed 1~20rpm  continuously adjustable;maximum heating   temperature 500ºC,the lowest recommended   heating rate 10ºC/min,the highest recommended   heating rate 20ºC/min.
7, Cooling mode :magnetic target and   molecular pump require circulating water cooler
8, Water-cooling machine:the tank volume 9L,flow rate 10L/min
9, Gas supply system:mass flow meter, type of   gas Argon,flow   1~30sccm(customizable)
10, Accuracy of flow meter :±1.5% measuring range
11, The air pumping interface   of the vacuum chamber is KF25
12, Air intake interface is   1/4 inch double ferrule joint
13, Touch screen is 7inch   color touch screen
14, Adjustable sputtering   current,sputtering   safety current value and safety vacuum value can be set;
15,  safety   protection: over current, vacuum is too low automatically cut off the   sputtering current
16, Ultimate vacuum:5E-4Pa(matching molecular   pump);
17, Vacuum   measurement is Parana vacuum gauge ,the range is:1~105Pa
Notice 1,Magnetron sputtering has   a high working vacuum, generally within 2Pa, and needs to be used with   molecular pump. 
2,In order to achieve a   high oxygen free environment, the vacuum chamber should be cleaned at least 3   times with high purity inert gas.
3,Magnetron sputtering is   sensitive to the air intake, so mass flow meter is needed to control the air   intake  
Optional   accessory
Film
thickness   Monitor
1,Film thickness resolution:0.0136Å(aluminum)
2,Accuracy of film   thickness :±0.5%,it depends on process   conditions, especially sensor position, material stress, temperature and   density  
3,Measuring speed:100ms-1s/times,measurement range can be   set :500000Å(aluminum)
4,Standard sensor crystal:6MHz
5,Suitable for wafer frequency:6MHz
suitable for wafer size:Φ14mm
mounting flange:CF35
Another Accessory ·   1,   series high performance molecular pump set(including composite vacuum gauge,   measuring range 10-5Pa~105Pa)
series small molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~102Pa)
VRD-4 bipolar rotary vane   vacuum pump
2,KF25 Vacuum bellows; The   length can be 0.5m, 1m or 1.5m. KF25 clamp bracket
3,Film thickness meter   crystal oscillator;
4,Stainless steel   fine-tuning valve (only suitable for low coating requirements)
Desktop Single-Target Magnetron Sputtering Coating Machine for Sem SampleDesktop Single-Target Magnetron Sputtering Coating Machine for Sem SampleDesktop Single-Target Magnetron Sputtering Coating Machine for Sem Sample

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