| Customization: | Available |
|---|---|
| After-sales Service: | on-Line Service |
| Warranty: | One Year |
Suppliers with verified business licenses
Equipment Introduction
The RJ150-XK is a tubular diffusion/oxidation furnace designed for R&D applications in enterprises, universities, and research institutes. It supports a variety of processes including:
Polysilicon and silicon nitride deposition
Diffusion
Oxidation
Annealing
Versatile processing for advanced material research
Precision temperature control for consistent results
Compact design optimized for lab environments
Product Features:
1. Capable of accommodating processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and more.
2. Utilizes a highly reliable industrial computer + PLC system to achieve fully automated control over furnace temperature, boat movement, gas flow, and valves, enabling complete automation of the entire process.
3. Features a user-friendly human-machine interface, allowing easy modification of process control parameters and real-time display of various process statuses.
4. Offers multiple process pipelines for convenient user selection.
5. Equipped with powerful software functionality, including self-diagnostic tools to significantly reduce maintenance time.
6. Automatic adjustment of the constant temperature zone and cascade control ensure precise regulation of the actual process temperature in the reaction tube.
7. Includes alarms and protective functions for over-temperature, thermocouple breakage, thermocouple short circuits, and deviations in process gas flow.
8. Customizable products available based on customer requirements.
Technical Specifications
| Model | KJ150-XK |
|---|---|
| Operating Temperature | ≤1300ºC |
| Wafer Size | 2~8 inches (round wafers) |
| Number of Process Tubes | 1~2 tubes per unit |
| Constant Temperature Zone Length | 300~600mm |
| Constant Temperature Zone Accuracy | ≤±0.5ºC |
| Temperature Stability | ≤±0.5ºC/24h |
| Temperature Ramp Rate | Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min |
| Safety Alarms & Protections | Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions |
Technical Specifications
| Parameter | Specification |
|---|---|
| Heating Zone Length | 400mm |
| Furnace Tube Dimensions | Diameter: 50mm, Length: 900mm |
| Furnace Tube Material | High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable) |
| Operating Temperature | ≤1100°C |
| Maximum Temperature | 1200°C |
| Temperature Sensor | Type N thermocouple |
| Temperature Control | Intelligent 30-segment PID programmable microcomputer control with auto-tuning |
| Temperature Accuracy | ±1°C |
| Temperature Protection | Over-temperature and thermocouple breakage protection |
| Heating Rate | 0-20°C/min |
| Heating Element | Alloy resistance wire |
| Operating Voltage | AC220V, single-phase, 50Hz |
| Maximum Power | 3KW |
| Furnace Chamber Material | Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution |
| Flange | Stainless steel vacuum flange, easy to disassemble |
| Sealing System | O-ring compression seal between furnace tube and flange, reusable, high airtightness |
| Fluidization Zone | 1. Reaction gas uniformly passes through the reaction zone. 2. Solid particles are fluidized by gas in the heating zone. 3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments. |
| Note | Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size. |
| Shell Structure | Double-layer shell with air-cooling system, openable design |
| Furnace Structure | Vertical structure |
| Parameter | Specification |
|---|---|
| Internal Temperature | ≤45ºC |
| Measurement & Control Devices | |
| Name | Dual-channel Mass Flow Controller (MFC) |
| Gas Channels | 2 channels |
| Flow Control | Digital display, each gas line with independent needle valve control |
| Connection Method | Double ferrule fitting |
| Flow Meter | Mass flow meter |
| Flow Range | MFC1: N 0-10 SLM MFC2: CO 0-10 SLM |
| Gas Mixing | Equipped with a precision gas mixing chamber |
| Power Supply | 220V, 50Hz |
| Operating Ambient Temp. | 5ºC~45ºC |
| Standard Accessories | Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4, high-temperature gloves ×1 pair, crucible hook ×1, hex wrench for flange disassembly ×1, warranty card & manual ×1 set |
Equipment Introduction
The vertical dual-zone CVD system primarily consists of:
A 1200°C dual-zone tube furnace
A 3-channel mass flow controller (MFC) gas supply system
A 2L/s vacuum pump with related connecting components
The system is equipped with directional and swivel casters at the base, ensuring compact footprint and flexible mobility.
Designed for CVD processes, this system is ideal for universities, research centers, and industrial manufacturers conducting experiments and production involving chemical vapor deposition.
(Note: Structured for clarity while maintaining technical accuracy and natural English flow.)
Fluidized Bed Tube Furnace Specifications
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1200°C |
| Operating Temperature | ≤1100°C |
| Display | LCD touch screen |
| Tube Diameter | 40mm (OD) |
| Tube Material | Custom high-purity quartz tube |
| Furnace Tube Length | Approx. 1100mm (customizable) |
| Heating Element | Premium heating wire |
| Heating Rate | 0-10°C/min |
| Temperature Control | - Programmable 30-segment time-temperature curves - Touchscreen multi-segment PID control - Data logging with Excel export capability - Built-in over-temperature and thermocouple failure protection |
| Thermocouple | Type N thermocouple |
| Sealing Method | Custom stainless steel vacuum flange with sealing |
| Furnace Chamber | - Double-layer steel shell with dual cooling fans - Dual-zone vertical open structure for easy tube access - Alumina refractory fiber lining for energy efficiency |
| Vacuum Flange | Stainless steel vacuum flange with valve |
| Operating Voltage | 220V, 50Hz |
| Power Rating | 6KW (customizable) |
Gas Delivery System: 3-Channel Mass Flow Control System
| Parameter | Specification |
|---|---|
| Power Supply | 220V/50Hz, maximum output 18W |
Key Features:
Advanced touchscreen control with data recording
Dual-zone vertical design for optimal thermal management
Complete gas flow control system included
Safety-focused design with multiple protection features
Customizable components for specific research needs
Note: Specifications may be customized based on actual requirements. The system combines precision temperature control with efficient gas delivery for advanced CVD applications.
| Parameter | Specification |
|---|---|
| Maximum Pressure | 3×10 Pa |
| Gas Channels | Can simultaneously connect 3 gas sources to slightly positive pressure |
| Flow Meter | Mass flow meter (other ranges optional) |
| Channel A Range | 1 SLM |
| Channel B Range | 1 SLM |
| Channel C Range | 1 SLM |
| Gas Line Pressure | -0.1 ~ 0.15 MPa |
| Accuracy | ±1% F.S. |
| Shut-off Valve | Stainless steel |
| Gas Line Tubing | 1/4" stainless steel tube |
Vacuum System Components
| Component | Specification |
|---|---|
| Vacuum Pump | 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube |
| Vacuum Gauge | Included (standard configuration) |
Primary Application:
This dual-zone sliding-track CVD tube furnace features a rail-guided sliding design, allowing for rapid heating and cooling of materials by horizontally moving the furnace. It can simultaneously connect six gas sources, with precise flow measurement and control via a touchscreen 6-channel mass flow controller (MFC).
This high-temperature CVD system is primarily designed for universities, research institutions, and industrial manufacturers to conduct experiments and production related to chemical vapor deposition (CVD).
Sliding-track mechanism for fast thermal cycling
Multi-gas compatibility (6 independent channels)
Precision flow control with touchscreen MFC interface
Versatile applications in research and small-batch production
| Parameter | Specification |
|---|---|
| Furnace Access Mode | Swing-open design |
| Furnace Movement | Rail-guided horizontal sliding for rapid heating/cooling |
| Chamber Material | Alumina refractory fiber |
| Heating Element | Aluminum-containing heating wire |
| Maximum Temperature | 1200°C |
| Operating Temperature | ≤1100°C |
| Heating Rate | ≤20°C/min (Recommended: 15°C/min) |
| Heating Zones | Dual-zone |
| Total Zone Length | 200mm + 200mm |
| Tube Material | High-purity quartz |
| Tube Diameter | 60mm |
| Sealing Method | - Quick-release flange for material loading - Stainless steel vacuum flange with silicone seal |
| Control System | Multi-segment intelligent PID programming |
| Temperature Sensor | Type N thermocouple |
| Safety Alarms | Over-temperature & thermocouple failure alarms |
| Power Supply | 220V, 50Hz |
Gas Delivery System (KJ-6Z)
| Parameter | Specification |
|---|---|
| Operating Temperature | 5~45°C |
| Maximum Pressure | 3×10 Pa |
| Gas Channels | 6 independent gas inputs |
| Flow Meter Type | Mass flow meter (other ranges available at same cost) |
| Channel A Range | 0-300 SCCM |
| Channel B Range | 0-300 SCCM |
| Channel C Range | 0-300 SCCM |
| Channel D Range | 0-300 SCCM |
| Channel E Range | 0-300 SCCM |
| Channel F Range | 0-300 SCCM |
| Line Pressure | -0.1~0.15 MPa |
| Valves | Stainless steel shut-off valves |
| Tubing | Stainless steel |
Vacuum System
| Component | Specification |
|---|---|
| Pump System | Molecular pump unit with connecting pipes |
| Power | 220V/50Hz |
| Mobility | Wheel-mounted base for easy movement |
| Ultimate Vacuum | 6.67×10³ Pa |
Standard Accessories
Quartz furnace tube (1)
Vacuum flange set (1)
Key Features:
Unique sliding mechanism enables rapid thermal cycling
Six-channel precision gas control system
Research-grade vacuum capability
Complete turnkey solution with all necessary accessories
Industrial-grade construction with safety protections
Tube stoppers (2)
O-ring seals
Protective gloves (1 pair)
Crucible hook (1)
PTFE tubing (3m)
Hex keys (2)
Operation manual
This system is designed for CVD processes, including:
Silicon carbide coating
Conductivity testing of ceramic substrates
2D material growth
Controlled growth of ZnO nanostructures
Atmosphere sintering of ceramic capacitors (MLCC)
It also serves as a dedicated graphene film growth furnace for graphene preparation. The furnace features a sliding rail base design, allowing manual lateral movement to expose the tube to room temperature for rapid cooling.
This equipment is particularly suitable for CVD experiments requiring fast heating/cooling rates, making it ideal for:
High-efficiency graphene synthesis
Other CVD applications demanding rapid thermal cycling
Key Advantages:
Precision temperature control for sensitive material growth
Unique sliding mechanism enables faster processing
Versatile applications across advanced material research
Optimized for both graphene and general CVD processes
Sliding Rail Tube Furnace Specifications
Furnace Section
| Parameter | Specification |
|---|---|
| Furnace Structure | Sliding rail design |
| Maximum Temperature | 1200°C |
| Continuous Operating Temperature | ≤1100°C |
| Heating Rate | Up to 20°C/min (Recommended: 10°C/min) |
| Heating Zone Length | 300mm (Single zone) |
| Heating Element | Phase-resistant heating wire |
| Thermocouple | Type K |
| Temperature Accuracy | ±1°C |
| Tube Diameter Options | Φ50, Φ60, Φ80 |
| Tube Material | High-purity quartz |
| Temperature Controller | PID intelligent program control |
| Vacuum Flange | 304 stainless steel - Left flange: Equipped with needle valve + ball valve - Right flange: KF25 interface with baffle valve |
Power Supply
| Input Power | Single-phase 220V, 50Hz, 3KW |
Vacuum System
| Component | Specification |
|---|---|
| Rotary Vane Pump with Digital Gauge | - Ultimate vacuum: 10³ Torr - Tube vacuum: 10² Torr - Pumping speed: 4CFM (2L/s, 120L/min) - Options: Rotary vane pump/diffusion pump/molecular pump available |
Mass Flow Controller System
| Parameter | Specification |
|---|---|
| Channels | 3-channel high precision MFC |
| Flow Range | MF1-MF3: 50-1000sccm adjustable |
| Features | - Mixing chamber at bottom - 3 manual stainless steel needle valves |
Important Notes
| Warning | Description |
|---|---|
| Pressure Limit | Tube pressure must not exceed 0.02MPa |
| Gas Cylinder Safety | Must use pressure reducer (0.01-0.1MPa recommended) |
| High Temp Operation | Above 1000°C: Maintain atmospheric pressure |
| Gas Flow Limit | <200SCCM to protect quartz tube |
| Quartz Tube Limit | Continuous use <1100°C |
| Valve Warning | Never close both valves during heating |
Certifications
| ISO Certification | CE Certification |
Safety Precautions:
Do not open the furnace chamber when temperature ≥200°C to prevent personal injury.
Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.
Warning: Failure to follow these precautions may result in:
Serious personal injury
Equipment damage
Safety hazards
When furnace temperature >1000°C, the tube must not be under vacuum - maintain atmospheric pressure inside the tube.
Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:
Continuously monitor pressure gauge readings
Immediately open exhaust valve if absolute pressure exceeds 0.02MPa
Prevents hazardous situations (tube rupture, flange ejection, etc.)
Equipment Application & Features
This high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including:
Silicon carbide (SiC) coating
Conductivity testing of ceramic substrates
Controlled growth of ZnO nanostructures
Atmosphere sintering of ceramic capacitors (MLCC)
Primary Users:
Universities, research institutions, and industrial manufacturers for vapor deposition-related experiments and production.
Key Specifications:
Alumina (AlO) furnace tube withstands temperatures up to 1600°C
Vacuum & atmosphere-capable design
Heating element: High-performance MoSi (molybdenum disilicide)
Furnace chamber: Ceramic fiber insulation for excellent thermal uniformity & energy efficiency
Advantages:
High temperature stability (±1°C precision)
Rapid heating/cooling with superior heat retention
Safe & user-friendly operation
Versatile for advanced materials research
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1700°C |
| Operating Temperature | 1600°C |
| Display | LED Screen |
| Tube Diameter | 80mm (OD) |
| Tube Material | Alumina Tube |
| Heating Zone Length | 220+220+220mm (with gaps between zones) |
| Heating Element | MoSi (Molybdenum Disilicide) |
| Heating Rate | 0-5°C/min |
| Temperature Control | - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor - 30 programmable segments for ramp/soak control - Built-in PID auto-tuning with over-temperature & thermocouple failure protection - Over-temperature alarm allows unattended operation |
| Thermocouples | 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube) |
| Temperature Accuracy | ±1°C |
| Furnace Structure | - Double-layer steel shell with dual cooling fans (surface temp <60°C) - Fixed non-openable furnace design |
| Vacuum Flange | Stainless steel vacuum flange with valve |
| Operating Voltage | 220V 50Hz |
| Maximum Power | 6kW |
Gas Delivery System
| Component | Specification |
|---|---|
| 4-Channel Mass Flow Controllers | - MFC1: 0-100sccm - MFC2: 0-200sccm - MFC3: 0-500sccm - MFC4: 0-200sccm |
| Gas Mixing | - Bottom-mounted mixing chamber with liquid release valve - 4 manual stainless steel needle valves for gas control |
Vacuum System
| Component | Specification |
|---|---|
| Vacuum Pump + Gauge | Rotary vane pump achieves 10Pa vacuum (cooled state) |
Key Features:
Ultra-high temperature capability (1700°C) with MoSi heating elements
Precision multi-zone temperature control (±1°C)
Programmable 30-segment thermal profiles
Complete gas mixing system with 4-channel MFCs
Industrial-grade vacuum performance
Safety Precautions:
Do not open the furnace chamber when temperature ≥200°C to prevent personal injury.
Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.
Warning: Failure to follow these precautions may result in:
Serious personal injury
Equipment damage
Safety hazards
When furnace temperature >1000°C, the tube must not be under vacuum - maintain atmospheric pressure inside the tube.
Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:
Continuously monitor pressure gauge readings
Immediately open exhaust valve if absolute pressure exceeds 0.02MPa
Prevents hazardous situations (tube rupture, flange ejection, etc.)
Equipment Description
This system integrates:
Gas flow control system
Liquid injection system
Multi-stage temperature-controlled growth zones
Water cooling system
CNT Growth Furnace Specifications:
Maximum operating temperature: 1400°C (continuously adjustable from 0-1400°C)
Vertical thermal field distribution with dual-zone temperature control
Top-mounted liquid injection port with flow guide components
This CNT/thin-film CVD equipment enables:
Continuous, uninterrupted growth processes
Precise thermal management for controlled nanostructure synthesis
Integrated liquid/gas phase delivery for complex material deposition
Carbon nanotube (CNT) synthesis components
Technical Specifications - Carbon Nanotube/Nanowire CVD Growth Furnace
| Parameter | Specification |
|---|---|
| Equipment Name | Carbon Nanotube/Nanowire CVD Growth Furnace |
| Model | KJ-T1400V |
| Furnace Structure | Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness |
| Maximum Power | 20KW |
| Voltage | AC 220V single-phase, 50/60Hz |
| Heating Element | Silicon carbide (SiC) rods |
| Max Operating Temp | 1400°C |
| Continuous Working Temp | Adjustable between 100-1400°C |
| Heating Rate | 1-10°C/min |
| Furnace Tube Material & Dimensions | Alumina tube: OD 80mm × Length 1500mm |
| Heating Zone Length | 700mm + 400mm |
| Uniform Temp Zone Length | 800mm (±1°C) |
| Thermocouple | SEI thermocouple for temperature measurement and control |
| Temperature Control System | 30-segment PID programmable control |
| Temperature Accuracy | ±1°C |
Stainless Steel Flange
The system includes a stainless steel vacuum flange assembly (equipped with stainless steel needle valves and mechanical pressure gauge). The armored flange allows thermocouple extension to the inlet for temperature monitoring.
Key Features:
High-purity alumina tube for contamination-free growth
Precision temperature control (±1°C) across 800mm uniform zone
Note: All specifications subject to technical verification. Designed for advanced nanomaterial synthesis under controlled atmospheres.
Robust SiC heating elements for ultra-high temperature operation
Complete gas/vacuum interface with measurement capabilities
Equipment Introduction
The LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:
Double-layer shell structure with an air-cooling system, keeping the surface temperature below 55°C
30-segment PID programmable intelligent temperature control with phase-angle firing for precise heating
Alumina polycrystalline fiber chamber lining for excellent thermal insulation and uniform temperature distribution
Applications:
Silicon carbide (SiC) coating
Conductivity testing of ceramic substrates
Controlled growth of ZnO nanostructures
Atmosphere sintering of ceramic capacitors (MLCC)
Key Advantages:
User-friendly touchscreen interface
Energy-efficient thermal design
Research-grade temperature uniformity
Versatile for advanced material processing
Fully automated operation with unattended capability
High-Temperature Furnace Specifications
| Parameter | Specification |
|---|---|
| Furnace Structure | Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness |
| Maximum Power | 5KW |
| Voltage | AC 220V single-phase, 50Hz |
| Heating Element | Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan) |
| Max Operating Temp | 1200°C |
| Continuous Working Temp | 1100°C |
| Heating Rate | 1-10°C/min |
| Furnace Tube Material & Dimensions | Quartz tube: OD 80mm × Length 1000mm |
| Heating Zone Length | Total 440mm |
| Uniform Temp Zone Length | 150mm (±1°C) |
| Control Interface | LCD touch screen |
| Thermocouple | Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen |
| Temperature Control | 30-segment PID programmable control |
| Temperature Accuracy | ±1°C |
| Vacuum Sealing System | Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve) |
| High Vacuum System | - Control panel for molecular pump speed/vacuum level monitoring - Turbo molecular pump + dry scroll pump - All KF-25 standard connections between pumps and quartz tube |
| Vacuum Level | 6.7×10³ Pa (empty chamber, room temperature) |
| Gas Delivery System | Three mass flow controllers with ranges: • Channel 1: 1-100 sccm • Channel 2: 1-200 sccm • Channel 3: 1-500 sccm |
Key Features:
Ultra-clean alumina-coated chamber for contamination-sensitive processes
Precision 3-zone temperature monitoring (±1°C)
Research-grade vacuum capability down to 10³ Pa
Complete gas flow control with triple MFC channels
Industrial-grade components with extended durability
){kind=link}