Customization: | Available |
---|---|
After-sales Service: | on-Line Service |
Warranty: | One Year |
Suppliers with verified business licenses
Equipment Introduction
The RJ150-XK is a tubular diffusion/oxidation furnace specifically engineered for groundbreaking R&D applications in enterprises, universities, and research institutes. It adeptly supports a myriad of processes including:
Polysilicon and silicon nitride deposition
Diffusion
Oxidation
Annealing
Versatile processing capabilities designed for pioneering research in advanced materials
Precision temperature control ensuring uniform and consistent experimental results
Compact design perfectly optimized for cutting-edge lab environments
Product Features:
1. Expertly accommodates a wide range of processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and beyond.
2. Employs a state-of-the-art industrial computer + PLC system to deliver fully automated control over furnace temperature, boat movement, gas flow, and valves, facilitating seamless process automation.
3. Boasts an intuitive human-machine interface, allowing effortless modification of process control parameters and real-time display of various process statuses.
4. Provides multiple process pipelines, empowering users with convenient and flexible selection options.
5. Equipped with robust software capabilities, featuring self-diagnostic tools to substantially reduce maintenance time.
6. Automatic adjustment of the constant temperature zone with cascade control ensures precise regulation of the actual process temperature within the reaction tube.
7. Includes comprehensive alarms and protective mechanisms for over-temperature, thermocouple breakage, and deviations in process gas flow, ensuring maximum safety.
8. Offers customizable products tailored to meet specific customer requirements.
Technical Specifications
Model | KJ150-XK |
---|---|
Operating Temperature | ≤1300ºC |
Wafer Size | 2~8 inches (round wafers) |
Number of Process Tubes | 1~2 tubes per unit |
Constant Temperature Zone Length | 300~600mm |
Constant Temperature Zone Accuracy | ≤±0.5ºC |
Temperature Stability | ≤±0.5ºC/24h |
Temperature Ramp Rate | Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min |
Safety Alarms & Protections | Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions |
Technical Specifications
Parameter | Specification |
---|---|
Heating Zone Length | 400mm |
Furnace Tube Dimensions | Diameter: 50mm, Length: 900mm |
Furnace Tube Material | High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable) |
Operating Temperature | ≤1100°C |
Maximum Temperature | 1200°C |
Temperature Sensor | Type N thermocouple |
Temperature Control | Intelligent 30-segment PID programmable microcomputer control with auto-tuning |
Temperature Accuracy | ±1°C |
Temperature Protection | Over-temperature and thermocouple breakage protection |
Heating Rate | 0-20°C/min |
Heating Element | Alloy resistance wire |
Operating Voltage | AC220V, single-phase, 50Hz |
Maximum Power | 3KW |
Furnace Chamber Material | Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution |
Flange | Stainless steel vacuum flange, easy to disassemble |
Sealing System | O-ring compression seal between furnace tube and flange, reusable, high airtightness |
Fluidization Zone | 1. Reaction gas uniformly passes through the reaction zone. 2. Solid particles are fluidized by gas in the heating zone. 3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments. |
Note | Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size. |
Shell Structure | Double-layer shell with air-cooling system, openable design |
Furnace Structure | Vertical structure |
Parameter | Specification |
---|---|
Internal Temperature | ≤45ºC |
Measurement & Control Devices | |
Name | Dual-channel Mass Flow Controller (MFC) |
Gas Channels | 2 channels |
Flow Control | Digital display, each gas line with independent needle valve control |
Connection Method | Double ferrule fitting |
Flow Meter | Mass flow meter |
Flow Range | MFC1: N 0-10 SLM MFC2: CO 0-10 SLM |
Gas Mixing | Equipped with a precision gas mixing chamber |
Power Supply | 220V, 50Hz |
Operating Ambient Temp. | 5ºC~45ºC |
Standard Accessories | Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4, high-temperature gloves ×1 pair, crucible hook ×1, hex wrench for flange disassembly ×1, warranty card & manual ×1 set |
Equipment Introduction
The advanced vertical dual-zone CVD system is efficiently comprised of:
A state-of-the-art 1200°C dual-zone tube furnace
A high-performance 3-channel mass flow controller (MFC) gas supply system
A powerful 2L/s vacuum pump with all necessary connecting components
The system is meticulously designed with directional and swivel casters at its base, ensuring a compact footprint and exceptional mobility.
Crafted meticulously for sophisticated CVD processes, this cutting-edge system becomes the perfect choice for universities, research centers, and industrial manufacturers seeking excellence in carrying out both experimental and production activities centered on advanced chemical vapor deposition techniques.
(Note: Designed to maintain clarity with an emphasis on technical precision and smooth English articulation.)
Fluidized Bed Tube Furnace Specifications at a Glance
Parameter | Specification |
---|---|
Maximum Temperature | 1200°C |
Operating Temperature | ≤1100°C |
Display | LCD touch screen |
Tube Diameter | 40mm (OD) |
Tube Material | Custom high-purity quartz tube |
Furnace Tube Length | Approx. 1100mm (customizable) |
Heating Element | Premium heating wire |
Heating Rate | 0-10°C/min |
Temperature Control | - Programmable 30-segment time-temperature curves - Touchscreen multi-segment PID control - Data logging with Excel export capability - Built-in over-temperature and thermocouple failure protection |
Thermocouple | Type N thermocouple |
Sealing Method | Custom stainless steel vacuum flange with sealing |
Furnace Chamber | - Double-layer steel shell with dual cooling fans - Dual-zone vertical open structure for easy tube access - Alumina refractory fiber lining for energy efficiency |
Vacuum Flange | Stainless steel vacuum flange with valve |
Operating Voltage | 220V, 50Hz |
Power Rating | 6KW (customizable) |
Gas Delivery System: State-of-the-art 3-Channel Mass Flow Control System
Parameter | Specification |
---|---|
Power Supply | 220V/50Hz, maximum output 18W |
Distinguished Features:
Sophisticated touchscreen interface for seamless control and comprehensive data logging
Ingenious dual-zone vertical structure optimizing thermal management efficiency
Includes a comprehensive gas flow control system
Designed with safety as a priority, incorporating multiple protection mechanisms
Customizable components tailored for specific research endeavors
Note: Tailor specifications to meet unique requirements. This system fuses precise temperature regulation with efficient gas delivery for superior CVD applications.
Parameter | Specification |
---|---|
Maximum Pressure | 3×10 Pa |
Gas Channels | Can simultaneously connect 3 gas sources to slightly positive pressure |
Flow Meter | Mass flow meter (other ranges optional) |
Channel A Range | 1 SLM |
Channel B Range | 1 SLM |
Channel C Range | 1 SLM |
Gas Line Pressure | -0.1 ~ 0.15 MPa |
Accuracy | ±1% F.S. |
Shut-off Valve | Stainless steel |
Gas Line Tubing | 1/4" stainless steel tube |
Components of the Vacuum System
Component | Specification |
---|---|
Vacuum Pump | 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube |
Vacuum Gauge | Included (standard configuration) |
Primary Application:
This innovative dual-zone sliding-track CVD tube furnace boasts a rail-guided sliding mechanism, facilitating rapid thermal transitions by horizontally moving the furnace. Capable of simultaneously connecting up to six distinct gas sources, it ensures precise flow measurement and control via an intuitive touchscreen 6-channel mass flow controller (MFC).
This high-temperature CVD marvel is ingeniously crafted for academic institutions, research laboratories, and industrial manufacturers to advance experiments and production tied to state-of-the-art chemical vapor deposition (CVD).
Innovative sliding-track mechanism enabling swift thermal cycling
Compatibility with multiple gas types (6 independent channels)
Precision-driven flow control utilizing a touchscreen MFC interface
Versatile for applications in research and limited-scale production
Parameter | Specification |
---|---|
Furnace Access Mode | Swing-open design |
Furnace Movement | Rail-guided horizontal sliding for rapid heating/cooling |
Chamber Material | Alumina refractory fiber |
Heating Element | Aluminum-containing heating wire |
Maximum Temperature | 1200°C |
Operating Temperature | ≤1100°C |
Heating Rate | ≤20°C/min (Recommended: 15°C/min) |
Heating Zones | Dual-zone |
Total Zone Length | 200mm + 200mm |
Tube Material | High-purity quartz |
Tube Diameter | 60mm |
Sealing Method | - Quick-release flange for material loading - Stainless steel vacuum flange with silicone seal |
Control System | Multi-segment intelligent PID programming |
Temperature Sensor | Type N thermocouple |
Safety Alarms | Over-temperature & thermocouple failure alarms |
Power Supply | 220V, 50Hz |
Gas Delivery System (Model: KJ-6Z)
Parameter | Specification |
---|---|
Operating Temperature | 5~45°C |
Maximum Pressure | 3×10 Pa |
Gas Channels | 6 independent gas inputs |
Flow Meter Type | Mass flow meter (other ranges available at same cost) |
Channel A Range | 0-300 SCCM |
Channel B Range | 0-300 SCCM |
Channel C Range | 0-300 SCCM |
Channel D Range | 0-300 SCCM |
Channel E Range | 0-300 SCCM |
Channel F Range | 0-300 SCCM |
Line Pressure | -0.1~0.15 MPa |
Valves | Stainless steel shut-off valves |
Tubing | Stainless steel |
Integral Vacuum System
Component | Specification |
---|---|
Pump System | Molecular pump unit with connecting pipes |
Power | 220V/50Hz |
Mobility | Wheel-mounted base for easy movement |
Ultimate Vacuum | 6.67×10³ Pa |
Standard Accessories Included
Quartz furnace tube (1) for superior heat tolerance
Vacuum flange set (1) for airtight sealing
Key Features:
Innovative sliding mechanism ensures rapid thermal cycling
Precision-engineered six-channel gas control system
Vacuum capability meeting research-grade standards
Fully equipped turnkey solution with all essential accessories
Industrial-grade construction fortified with safety features
Pair of durable tube stoppers (2)
High-quality O-ring seals for secure connections
Safety-enhancing protective gloves (1 pair)
Efficient crucible hook (1)
Reliable PTFE tubing (3m) for chemical resistance
Hex keys (2) for easy assembly and maintenance
Comprehensive operation manual
This system is expertly designed to cater to CVD processes, including:
Silicon carbide coating
Conductivity testing of ceramic substrates
2D material growth
Controlled growth of ZnO nanostructures
Atmosphere sintering of ceramic capacitors (MLCC)
It also serves as a dedicated graphene film growth furnace for graphene preparation. The furnace features a sliding rail base design, allowing manual lateral movement to expose the tube to room temperature for rapid cooling.
This equipment is particularly suitable for CVD experiments requiring fast heating/cooling rates, making it ideal for:
High-efficiency graphene synthesis
Other CVD applications demanding rapid thermal cycling
Key Advantages:
Precision temperature control for sensitive material growth
Unique sliding mechanism enables faster processing
Versatile applications across advanced material research
Optimized for both graphene and general CVD processes
Sliding Rail Tube Furnace Specifications
Furnace Section
Parameter | Specification |
---|---|
Furnace Structure | Sliding rail design |
Maximum Temperature | 1200°C |
Continuous Operating Temperature | ≤1100°C |
Heating Rate | Up to 20°C/min (Recommended: 10°C/min) |
Heating Zone Length | 300mm (Single zone) |
Heating Element | Phase-resistant heating wire |
Thermocouple | Type K |
Temperature Accuracy | ±1°C |
Tube Diameter Options | Φ50, Φ60, Φ80 |
Tube Material | High-purity quartz |
Temperature Controller | PID intelligent program control |
Vacuum Flange | 304 stainless steel - Left flange: Equipped with needle valve + ball valve - Right flange: KF25 interface with baffle valve |
Power Supply
| Input Power | Single-phase 220V, 50Hz, 3KW |
Vacuum System
Component | Specification |
---|---|
Rotary Vane Pump with Digital Gauge | - Ultimate vacuum: 10³ Torr - Tube vacuum: 10² Torr - Pumping speed: 4CFM (2L/s, 120L/min) - Options: Rotary vane pump/diffusion pump/molecular pump available |
Mass Flow Controller System
Parameter | Specification |
---|---|
Channels | 3-channel high precision MFC |
Flow Range | MF1-MF3: 50-1000sccm adjustable |
Features | - Mixing chamber at bottom - 3 manual stainless steel needle valves |
Important Notes
Warning | Description |
---|---|
Pressure Limit | Tube pressure must not exceed 0.02MPa |
Gas Cylinder Safety | Must use pressure reducer (0.01-0.1MPa recommended) |
High Temp Operation | Above 1000°C: Maintain atmospheric pressure |
Gas Flow Limit | <200SCCM to protect quartz tube |
Quartz Tube Limit | Continuous use <1100°C |
Valve Warning | Never close both valves during heating |
Certifications
| ISO Certification | CE Certification |
Safety Precautions:
Do not open the furnace chamber when temperature ≥200°C to prevent personal injury.
Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.
Warning: Failure to follow these precautions may result in:
Serious personal injury
Equipment damage
Safety hazards
When furnace temperature >1000°C, the tube must not be under vacuum - maintain atmospheric pressure inside the tube.
Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:
Continuously monitor pressure gauge readings
Immediately open exhaust valve if absolute pressure exceeds 0.02MPa
Prevents hazardous situations (tube rupture, flange ejection, etc.)
Equipment Application & Features
This high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including:
Silicon carbide (SiC) coating
Conductivity testing of ceramic substrates
Controlled growth of ZnO nanostructures
Atmosphere sintering of ceramic capacitors (MLCC)
Primary Users:
Our RJ Customized PVD Coating Machine from Zhengzhou, China, is the epitome of precision and excellence, attracting universities, research institutions, and industrial manufacturers who are engaging in advanced vapor deposition-related experiments and production processes.
Key Specifications:
Alumina (AlO) furnace tube withstands temperatures soaring up to an impressive 1600°C, showcasing durability and superior performance.
Vacuum & atmosphere-capable design, offering unmatched versatility for various experimental conditions.
Heating element: High-performance MoSi (molybdenum disilicide), ensuring efficient and consistent heating outcomes.
Furnace chamber: Crafted with ceramic fiber insulation, it provides exceptional thermal uniformity and energy efficiency, setting standards in the industry.
Advantages:
High temperature stability with precision control (±1°C), ensuring reliability in every experiment.
Experience rapid heating and cooling complemented by superior heat retention, propelling your research forward.
Safe & user-friendly operation, engineered to simplify processes while maximizing security.
Versatile for advanced materials research, opening new avenues for innovation and discovery.
Parameter | Specification |
---|---|
Maximum Temperature | 1700°C |
Operating Temperature | 1600°C |
Display | LED Screen |
Tube Diameter | 80mm (OD) |
Tube Material | Alumina Tube |
Heating Zone Length | 220+220+220mm (with gaps between zones) |
Heating Element | MoSi (Molybdenum Disilicide) |
Heating Rate | 0-5°C/min |
Temperature Control | - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor - 30 programmable segments for ramp/soak control - Built-in PID auto-tuning with over-temperature & thermocouple failure protection - Over-temperature alarm allows unattended operation |
Thermocouples | 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube) |
Temperature Accuracy | ±1°C |
Furnace Structure | - Double-layer steel shell with dual cooling fans (surface temp <60°C) - Fixed non-openable furnace design |
Vacuum Flange | Stainless steel vacuum flange with valve |
Operating Voltage | 220V 50Hz |
Maximum Power | 6kW |
Gas Delivery System
Component | Specification |
---|---|
4-Channel Mass Flow Controllers | - MFC1: 0-100sccm - MFC2: 0-200sccm - MFC3: 0-500sccm - MFC4: 0-200sccm |
Gas Mixing | - Bottom-mounted mixing chamber with liquid release valve - 4 manual stainless steel needle valves for gas control |
Vacuum System
Component | Specification |
---|---|
Vacuum Pump + Gauge | Rotary vane pump achieves 10Pa vacuum (cooled state) |
Key Features:
Ultra-high temperature capability reaching up to 1700°C, powered by MoSi heating elements for top-tier performance.
Precision multi-zone temperature control (±1°C), allowing for detailed and customizable thermal management.
Programmable 30-segment thermal profiles, offering flexibility and control over complex thermal operations.
Complete gas mixing system with 4-channel MFCs, designed for precision and efficiency in delivery.
Industrial-grade vacuum performance, ensuring reliable and consistent results in every application.
Safety Precautions:
Do not open the furnace chamber when temperature is ≥200°C to safeguard against personal injury. Ensure personal safety is prioritized by adhering to this guideline.
Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to prevent equipment damage from overpressure. Adhering to these limits is crucial for maintaining the integrity of the equipment.
Warning: Failure to follow these precautions may result in severe consequences:
Serious personal injury, emphasizing the need for caution and adherence to safety guidelines.
Equipment damage, which could lead to costly repairs and downtime.
Safety hazards, highlighting the importance of rigorous safety protocols.
When furnace temperature exceeds 1000°C, maintain atmospheric pressure inside the tube - avoid vacuum to ensure safety. - maintain atmospheric pressure inside the tube to prevent potential hazards.
Avoid closing both inlet and outlet valves simultaneously during sample heating, as this can lead to pressure buildup. If valves must be closed:
Continuously monitor pressure gauge readings to stay informed and react quickly.
Immediately open exhaust valve if absolute pressure exceeds 0.02MPa to avert hazardous scenarios.
Prevents hazardous situations such as tube rupture or flange ejection, ensuring safety.
Equipment Description
This system integrates a comprehensive suite of features:
Gas flow control system, offering precision and efficiency in handling gases.
Liquid injection system, designed for precise and controlled liquid dispensing.
Multi-stage temperature-controlled growth zones, enhancing the versatility of your applications.
Water cooling system, ensuring optimal operating conditions and longevity.
CNT Growth Furnace Specifications:
Maximum operating temperature: An impressive 1400°C (continuously adjustable from 0-1400°C), highlighting adaptability. Vertical thermal field distribution, providing uniformity and precision.
with dual-zone temperature control, allowing for meticulous management of thermal environments. Top-mounted liquid injection port, designed for seamless integration and efficiency.
with flow guide components, ensuring consistent and controlled material flow. This
CNT/thin-film CVD equipment enables: Continuous, uninterrupted growth processes, essential for high-quality outcomes.
Precise thermal management, critical for the controlled synthesis of nanostructures.
for controlled nanostructure synthesis, paving the way for innovative breakthroughs. Integrated liquid/gas phase delivery, facilitating complex material deposition with ease.
Integrated liquid/gas phase delivery for complex material deposition, expanding possibilities in material science. for complex material deposition, unlocking potential for novel applications.
Carbon nanotube (CNT) synthesis components, providing the tools necessary for advanced research and development.
Technical Specifications - Carbon Nanotube/Nanowire CVD Growth Furnace: Embark on a journey of innovation with our state-of-the-art growth furnace, engineered to meet the precise demands of carbon nanotube and nanowire production. Perfect for researchers and industry experts alike, our furnace stands as a beacon of cutting-edge technology.
Parameter | Specification |
---|---|
Equipment Name | Carbon Nanotube/Nanowire CVD Growth Furnace |
Model | KJ-T1400V |
Furnace Structure | Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness |
Maximum Power | 20KW |
Voltage | AC 220V single-phase, 50/60Hz |
Heating Element | Silicon carbide (SiC) rods |
Max Operating Temp | 1400°C |
Continuous Working Temp | Adjustable between 100-1400°C |
Heating Rate | 1-10°C/min |
Furnace Tube Material & Dimensions | Alumina tube: OD 80mm × Length 1500mm |
Heating Zone Length | 700mm + 400mm |
Uniform Temp Zone Length | 800mm (±1°C) |
Thermocouple | SEI thermocouple for temperature measurement and control |
Temperature Control System | 30-segment PID programmable control |
Temperature Accuracy | ±1°C |
Stainless Steel Flange: A hallmark of durability, our stainless steel flange ensures seamless connectivity and robust performance.
The system includes a sophisticated stainless steel vacuum flange assembly, boasting stainless steel needle valves and a mechanical pressure gauge. This armored flange ingeniously permits thermocouple extension to the inlet, facilitating precise temperature monitoring.
Key Features:
High-purity alumina tube for contamination-free growth: Experience pristine material synthesis with our high-purity alumina tube, crafted to prevent contamination at every step.
Precision temperature control (±1°C) across 800mm uniform zone: Achieve unmatched precision with our temperature control system, ensuring a steady and uniform thermal environment across the entire zone.
Note: All specifications are subject to technical verification. This product is meticulously designed for advanced nanomaterial synthesis under controlled atmospheres, ensuring reliable and repeatable results.
Robust SiC heating elements for ultra-high temperature operation: Our Silicon Carbide heating elements provide unparalleled performance and longevity, making them ideal for extreme temperature applications.
Complete gas/vacuum interface with measurement capabilities: Our system offers a comprehensive gas and vacuum interface equipped with precise measurement capabilities, ideal for meticulous experimental setups.
Equipment Introduction
The LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:
Double-layer shell structure with an air-cooling system, keeping the surface temperature comfortably below 55°C
30-segment PID programmable intelligent temperature control with phase-angle firing for precise heating: Enjoy unparalleled convenience with our intelligent temperature control system, offering precision and versatility.
Alumina polycrystalline fiber chamber lining for excellent thermal insulation and uniform temperature distribution: Optimize your operations with superior thermal insulation and even heat distribution, courtesy of our innovative chamber lining.
Applications:
Silicon carbide (SiC) coating: Perfect for industries demanding high-performance coatings, our system delivers exceptional SiC coating capabilities.
Conductivity testing of ceramic substrates: Ideal for rigorous testing of ceramic substrates, ensuring accuracy and reliability.
Controlled growth of ZnO nanostructures: Facilitates precise control over ZnO nanostructure growth, catering to advanced research needs.
Atmosphere sintering of ceramic capacitors (MLCC): Optimize your MLCC production with our atmosphere sintering solutions, tailored for maximum efficiency.
Key Advantages:
User-friendly touchscreen interface: Navigate with ease using our intuitive touchscreen interface, designed for user convenience.
Energy-efficient thermal design: Reduce energy consumption while maintaining high performance with our expertly crafted thermal design.
Research-grade temperature uniformity: Benefit from exceptional temperature uniformity, vital for research and development applications.
Versatile for advanced material processing: Our equipment offers unmatched versatility, meeting the diverse needs of advanced material processing.
Fully automated operation with unattended capability: Experience seamless automation with our system, offering the convenience of unattended operation for sustained productivity.
High-Temperature Furnace Specifications
Parameter | Specification |
---|---|
Furnace Structure | Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness |
Maximum Power | 5KW |
Voltage | AC 220V single-phase, 50Hz |
Heating Element | Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan) |
Max Operating Temp | 1200°C |
Continuous Working Temp | 1100°C |
Heating Rate | 1-10°C/min |
Furnace Tube Material & Dimensions | Quartz tube: OD 80mm × Length 1000mm |
Heating Zone Length | Total 440mm |
Uniform Temp Zone Length | 150mm (±1°C) |
Control Interface | LCD touch screen |
Thermocouple | Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen |
Temperature Control | 30-segment PID programmable control |
Temperature Accuracy | ±1°C |
Vacuum Sealing System | Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve) |
High Vacuum System | - Control panel for molecular pump speed/vacuum level monitoring - Turbo molecular pump + dry scroll pump - All KF-25 standard connections between pumps and quartz tube |
Vacuum Level | 6.7×10³ Pa (empty chamber, room temperature) |
Gas Delivery System | Three mass flow controllers with ranges: • Channel 1: 1-100 sccm • Channel 2: 1-200 sccm • Channel 3: 1-500 sccm |
Key Features:
Ultra-clean alumina-coated chamber for contamination-sensitive processes: Our ultra-clean chamber ensures flawless operations in contamination-sensitive environments.
Precision 3-zone temperature monitoring (±1°C): Achieve precise thermal management with our advanced 3-zone temperature monitoring.
Research-grade vacuum capability down to 10³ Pa: Experience industry-leading vacuum capabilities, crucial for high-demand research applications.
Complete gas flow control with triple MFC channels: Our system offers impeccable gas flow control, featuring triple MFC channels for nuanced experimentation.
Industrial-grade components with extended durability: Built to last, our components promise reliability and longevity, even in the most demanding settings.