Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating

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Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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Year of Establishment
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  • Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating
  • Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating
  • Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating
  • Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating
  • Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating
  • Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating
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Basic Info.

Model NO.
Made-to-order
Application
Industry, School, Hospital, Lab
Customized
Customized
Certification
CE
Structure
Portable
Material
Steel
Type
Tubular Furnace
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ
Origin
Zhengzhou, China

Product Description

Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating

Equipment Introduction

The RJ150-XK is a tubular diffusion/oxidation furnace specifically engineered for groundbreaking R&D applications in enterprises, universities, and research institutes. It adeptly supports a myriad of processes including:

  • Polysilicon and silicon nitride deposition

  • Diffusion

  • Oxidation

  • Annealing

Key Features:

  • Versatile processing capabilities designed for pioneering research in advanced materials

  • Precision temperature control ensuring uniform and consistent experimental results

  • Compact design perfectly optimized for cutting-edge lab environments
    Product Features:

    1. Expertly accommodates a wide range of processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and beyond.
    2. Employs a state-of-the-art industrial computer + PLC system to deliver fully automated control over furnace temperature, boat movement, gas flow, and valves, facilitating seamless process automation.
    3. Boasts an intuitive human-machine interface, allowing effortless modification of process control parameters and real-time display of various process statuses.
    4. Provides multiple process pipelines, empowering users with convenient and flexible selection options.
    5. Equipped with robust software capabilities, featuring self-diagnostic tools to substantially reduce maintenance time.
    6. Automatic adjustment of the constant temperature zone with cascade control ensures precise regulation of the actual process temperature within the reaction tube.
    7. Includes comprehensive alarms and protective mechanisms for over-temperature, thermocouple breakage, and deviations in process gas flow, ensuring maximum safety.
    8. Offers customizable products tailored to meet specific customer requirements.

Technical Specifications

Model KJ150-XK
Operating Temperature ≤1300ºC
Wafer Size 2~8 inches (round wafers)
Number of Process Tubes 1~2 tubes per unit
Constant Temperature Zone Length 300~600mm
Constant Temperature Zone Accuracy ≤±0.5ºC
Temperature Stability ≤±0.5ºC/24h
Temperature Ramp Rate Max heating rate: 10ºC/min, Max cooling rate: 5ºC/min
Safety Alarms & Protections Over-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functions

The **RJ-1200T-V50** is an innovative **vertical fluidized bed CVD system**, meticulously crafted for conducting **powder surface deposition experiments**. Its furnace features an **openable design** allowing the furnace body to be opened post-experiment to easily remove the quartz tube and retrieve processed particles.

Within the furnace tube lies a **0.2mm porous quartz plate** (with customizable pore sizes). The powder is placed on this porous plate, while gas is introduced from the **tube's bottom**. As the gas flows upwards through the porous plate, it **fluidizes the sample particles**, suspending them within the heating zone for optimized deposition.

**Note:** When fluidizing particles, be cautious as excessive gas flow may cause them to **exit the heating zone**. Therefore, adjust the gas flow rate according to the **particle size** during experiments for optimal results.Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating

Technical Specifications

Parameter Specification
Heating Zone Length 400mm
Furnace Tube Dimensions Diameter: 50mm, Length: 900mm
Furnace Tube Material High-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)
Operating Temperature ≤1100°C
Maximum Temperature 1200°C
Temperature Sensor Type N thermocouple
Temperature Control Intelligent 30-segment PID programmable microcomputer control with auto-tuning
Temperature Accuracy ±1°C
Temperature Protection Over-temperature and thermocouple breakage protection
Heating Rate 0-20°C/min
Heating Element Alloy resistance wire
Operating Voltage AC220V, single-phase, 50Hz
Maximum Power 3KW
Furnace Chamber Material Polycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distribution
Flange Stainless steel vacuum flange, easy to disassemble
Sealing System O-ring compression seal between furnace tube and flange, reusable, high airtightness
Fluidization Zone 1. Reaction gas uniformly passes through the reaction zone.
2. Solid particles are fluidized by gas in the heating zone.
3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.
Note Excessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.
Shell Structure Double-layer shell with air-cooling system, openable design
Furnace Structure Vertical structure
Parameter Specification
Internal Temperature ≤45ºC
Measurement & Control Devices  
Name Dual-channel Mass Flow Controller (MFC)
Gas Channels 2 channels
Flow Control Digital display, each gas line with independent needle valve control
Connection Method Double ferrule fitting
Flow Meter Mass flow meter
Flow Range MFC1: N 0-10 SLM
MFC2: CO 0-10 SLM
Gas Mixing Equipped with a precision gas mixing chamber
Power Supply 220V, 50Hz
Operating Ambient Temp. 5ºC~45ºC
Standard Accessories Main unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,
high-temperature gloves ×1 pair, crucible hook ×1,
hex wrench for flange disassembly ×1, warranty card & manual ×1 set
Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating

Equipment Introduction

The advanced vertical dual-zone CVD system is efficiently comprised of:

  • A state-of-the-art 1200°C dual-zone tube furnace

  • A high-performance 3-channel mass flow controller (MFC) gas supply system

  • A powerful 2L/s vacuum pump with all necessary connecting components

The system is meticulously designed with directional and swivel casters at its base, ensuring a compact footprint and exceptional mobility.

Crafted meticulously for sophisticated CVD processes, this cutting-edge system becomes the perfect choice for universities, research centers, and industrial manufacturers seeking excellence in carrying out both experimental and production activities centered on advanced chemical vapor deposition techniques.

(Note: Designed to maintain clarity with an emphasis on technical precision and smooth English articulation.)

Fluidized Bed Tube Furnace Specifications at a Glance

Parameter Specification
Maximum Temperature 1200°C
Operating Temperature ≤1100°C
Display LCD touch screen
Tube Diameter 40mm (OD)
Tube Material Custom high-purity quartz tube
Furnace Tube Length Approx. 1100mm (customizable)
Heating Element Premium heating wire
Heating Rate 0-10°C/min
Temperature Control - Programmable 30-segment time-temperature curves
- Touchscreen multi-segment PID control
- Data logging with Excel export capability
- Built-in over-temperature and thermocouple failure protection
Thermocouple Type N thermocouple
Sealing Method Custom stainless steel vacuum flange with sealing
Furnace Chamber - Double-layer steel shell with dual cooling fans
- Dual-zone vertical open structure for easy tube access
- Alumina refractory fiber lining for energy efficiency
Vacuum Flange Stainless steel vacuum flange with valve
Operating Voltage 220V, 50Hz
Power Rating 6KW (customizable)

Gas Delivery System: State-of-the-art 3-Channel Mass Flow Control System

Parameter Specification
Power Supply 220V/50Hz, maximum output 18W

Distinguished Features:

  1. Sophisticated touchscreen interface for seamless control and comprehensive data logging

  2. Ingenious dual-zone vertical structure optimizing thermal management efficiency

  3. Includes a comprehensive gas flow control system

  4. Designed with safety as a priority, incorporating multiple protection mechanisms

  5. Customizable components tailored for specific research endeavors

Note: Tailor specifications to meet unique requirements. This system fuses precise temperature regulation with efficient gas delivery for superior CVD applications.

Parameter Specification
Maximum Pressure 3×10 Pa
Gas Channels Can simultaneously connect 3 gas sources to slightly positive pressure
Flow Meter Mass flow meter (other ranges optional)
Channel A Range 1 SLM
Channel B Range 1 SLM
Channel C Range 1 SLM
Gas Line Pressure -0.1 ~ 0.15 MPa
Accuracy ±1% F.S.
Shut-off Valve Stainless steel
Gas Line Tubing 1/4" stainless steel tube

Components of the Vacuum System

Component Specification
Vacuum Pump 2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tube
Vacuum Gauge Included (standard configuration)


Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating

Primary Application:

This innovative dual-zone sliding-track CVD tube furnace boasts a rail-guided sliding mechanism, facilitating rapid thermal transitions by horizontally moving the furnace. Capable of simultaneously connecting up to six distinct gas sources, it ensures precise flow measurement and control via an intuitive touchscreen 6-channel mass flow controller (MFC).

This high-temperature CVD marvel is ingeniously crafted for academic institutions, research laboratories, and industrial manufacturers to advance experiments and production tied to state-of-the-art chemical vapor deposition (CVD).

Distinguished Features:

  • Innovative sliding-track mechanism enabling swift thermal cycling

  • Compatibility with multiple gas types (6 independent channels)

  • Precision-driven flow control utilizing a touchscreen MFC interface

  • Versatile for applications in research and limited-scale production

    Parameter Specification
    Furnace Access Mode Swing-open design
    Furnace Movement Rail-guided horizontal sliding for rapid heating/cooling
    Chamber Material Alumina refractory fiber
    Heating Element Aluminum-containing heating wire
    Maximum Temperature 1200°C
    Operating Temperature ≤1100°C
    Heating Rate ≤20°C/min (Recommended: 15°C/min)
    Heating Zones Dual-zone
    Total Zone Length 200mm + 200mm
    Tube Material High-purity quartz
    Tube Diameter 60mm
    Sealing Method - Quick-release flange for material loading
    - Stainless steel vacuum flange with silicone seal
    Control System Multi-segment intelligent PID programming
    Temperature Sensor Type N thermocouple
    Safety Alarms Over-temperature & thermocouple failure alarms
    Power Supply 220V, 50Hz

    Gas Delivery System (Model: KJ-6Z)

    Parameter Specification
    Operating Temperature 5~45°C
    Maximum Pressure 3×10 Pa
    Gas Channels 6 independent gas inputs
    Flow Meter Type Mass flow meter (other ranges available at same cost)
    Channel A Range 0-300 SCCM
    Channel B Range 0-300 SCCM
    Channel C Range 0-300 SCCM
    Channel D Range 0-300 SCCM
    Channel E Range 0-300 SCCM
    Channel F Range 0-300 SCCM
    Line Pressure -0.1~0.15 MPa
    Valves Stainless steel shut-off valves
    Tubing Stainless steel

    Integral Vacuum System

    Component Specification
    Pump System Molecular pump unit with connecting pipes
    Power 220V/50Hz
    Mobility Wheel-mounted base for easy movement
    Ultimate Vacuum 6.67×10³ Pa

    Standard Accessories Included

  • Quartz furnace tube (1) for superior heat tolerance

  • Vacuum flange set (1) for airtight sealing

  • Key Features:

  • Innovative sliding mechanism ensures rapid thermal cycling

  • Precision-engineered six-channel gas control system

  • Vacuum capability meeting research-grade standards

  • Fully equipped turnkey solution with all essential accessories

  • Industrial-grade construction fortified with safety features

  •  
  • Pair of durable tube stoppers (2)

  • High-quality O-ring seals for secure connections

  • Safety-enhancing protective gloves (1 pair)

  • Efficient crucible hook (1)

  • Reliable PTFE tubing (3m) for chemical resistance

  • Hex keys (2) for easy assembly and maintenance

  • Comprehensive operation manual
    Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating

    This system is expertly designed to cater to CVD processes, including:

  • Silicon carbide coating

  • Conductivity testing of ceramic substrates

  • 2D material growth

  • Controlled growth of ZnO nanostructures

  • Atmosphere sintering of ceramic capacitors (MLCC)

  • It also serves as a dedicated graphene film growth furnace for graphene preparation. The furnace features a sliding rail base design, allowing manual lateral movement to expose the tube to room temperature for rapid cooling.

    This equipment is particularly suitable for CVD experiments requiring fast heating/cooling rates, making it ideal for:

  • High-efficiency graphene synthesis

  • Other CVD applications demanding rapid thermal cycling

  • Key Advantages:
    Precision temperature control for sensitive material growth
    Unique sliding mechanism enables faster processing
    Versatile applications across advanced material research
    Optimized for both graphene and general CVD processes

    Sliding Rail Tube Furnace Specifications

    Furnace Section

    Parameter Specification
    Furnace Structure Sliding rail design
    Maximum Temperature 1200°C
    Continuous Operating Temperature ≤1100°C
    Heating Rate Up to 20°C/min (Recommended: 10°C/min)
    Heating Zone Length 300mm (Single zone)
    Heating Element Phase-resistant heating wire
    Thermocouple Type K
    Temperature Accuracy ±1°C
    Tube Diameter Options Φ50, Φ60, Φ80
    Tube Material High-purity quartz
    Temperature Controller PID intelligent program control
    Vacuum Flange 304 stainless steel
    - Left flange: Equipped with needle valve + ball valve
    - Right flange: KF25 interface with baffle valve

    Power Supply
    | Input Power | Single-phase 220V, 50Hz, 3KW |

    Vacuum System

    Component Specification
    Rotary Vane Pump with Digital Gauge - Ultimate vacuum: 10³ Torr
    - Tube vacuum: 10² Torr
    - Pumping speed: 4CFM (2L/s, 120L/min)
    - Options: Rotary vane pump/diffusion pump/molecular pump available

    Mass Flow Controller System

    Parameter Specification
    Channels 3-channel high precision MFC
    Flow Range MF1-MF3: 50-1000sccm adjustable
    Features - Mixing chamber at bottom
    - 3 manual stainless steel needle valves

    Important Notes

    Warning Description
    Pressure Limit Tube pressure must not exceed 0.02MPa
    Gas Cylinder Safety Must use pressure reducer (0.01-0.1MPa recommended)
    High Temp Operation Above 1000°C: Maintain atmospheric pressure
    Gas Flow Limit <200SCCM to protect quartz tube
    Quartz Tube Limit Continuous use <1100°C
    Valve Warning Never close both valves during heating

    Certifications
    | ISO Certification | CE Certification |

    Safety Precautions:

  • Do not open the furnace chamber when temperature ≥200°C to prevent personal injury.

  • Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.

  • Warning: Failure to follow these precautions may result in:

  • Serious personal injury

  • Equipment damage

  • Safety hazards

  •  
  • When furnace temperature >1000°C, the tube must not be under vacuum - maintain atmospheric pressure inside the tube.

  • Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:

    • Continuously monitor pressure gauge readings

    • Immediately open exhaust valve if absolute pressure exceeds 0.02MPa

    • Prevents hazardous situations (tube rupture, flange ejection, etc.)
      Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating
      Equipment Application & Features

      This high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including:

      Silicon carbide (SiC) coating

      Conductivity testing of ceramic substrates

      Controlled growth of ZnO nanostructures

      Atmosphere sintering of ceramic capacitors (MLCC)

      Primary Users:
      Our RJ Customized PVD Coating Machine from Zhengzhou, China, is the epitome of precision and excellence, attracting universities, research institutions, and industrial manufacturers who are engaging in advanced vapor deposition-related experiments and production processes.

      Key Specifications:

      Alumina (AlO) furnace tube withstands temperatures soaring up to an impressive 1600°C, showcasing durability and superior performance.

      Vacuum & atmosphere-capable design, offering unmatched versatility for various experimental conditions.

      Heating element: High-performance MoSi (molybdenum disilicide), ensuring efficient and consistent heating outcomes.

      Furnace chamber: Crafted with ceramic fiber insulation, it provides exceptional thermal uniformity and energy efficiency, setting standards in the industry.

      Advantages:
      High temperature stability with precision control (±1°C), ensuring reliability in every experiment.
      Experience rapid heating and cooling complemented by superior heat retention, propelling your research forward.
      Safe & user-friendly operation, engineered to simplify processes while maximizing security.
      Versatile for advanced materials research, opening new avenues for innovation and discovery.

      Parameter Specification
      Maximum Temperature 1700°C
      Operating Temperature 1600°C
      Display LED Screen
      Tube Diameter 80mm (OD)
      Tube Material Alumina Tube
      Heating Zone Length 220+220+220mm (with gaps between zones)
      Heating Element MoSi (Molybdenum Disilicide)
      Heating Rate 0-5°C/min
      Temperature Control - PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor
      - 30 programmable segments for ramp/soak control
      - Built-in PID auto-tuning with over-temperature & thermocouple failure protection
      - Over-temperature alarm allows unattended operation
      Thermocouples 3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)
      Temperature Accuracy ±1°C
      Furnace Structure - Double-layer steel shell with dual cooling fans (surface temp <60°C)
      - Fixed non-openable furnace design
      Vacuum Flange Stainless steel vacuum flange with valve
      Operating Voltage 220V 50Hz
      Maximum Power 6kW

      Gas Delivery System

      Component Specification
      4-Channel Mass Flow Controllers - MFC1: 0-100sccm
      - MFC2: 0-200sccm
      - MFC3: 0-500sccm
      - MFC4: 0-200sccm
      Gas Mixing - Bottom-mounted mixing chamber with liquid release valve
      - 4 manual stainless steel needle valves for gas control

      Vacuum System

      Component Specification
      Vacuum Pump + Gauge Rotary vane pump achieves 10Pa vacuum (cooled state)

      Key Features:

    • Ultra-high temperature capability reaching up to 1700°C, powered by MoSi heating elements for top-tier performance.

    • Precision multi-zone temperature control (±1°C), allowing for detailed and customizable thermal management.

    • Programmable 30-segment thermal profiles, offering flexibility and control over complex thermal operations.

    • Complete gas mixing system with 4-channel MFCs, designed for precision and efficiency in delivery.

    • Industrial-grade vacuum performance, ensuring reliable and consistent results in every application.

      Safety Precautions:

    • Do not open the furnace chamber when temperature is ≥200°C to safeguard against personal injury. Ensure personal safety is prioritized by adhering to this guideline.

    • Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to prevent equipment damage from overpressure. Adhering to these limits is crucial for maintaining the integrity of the equipment.

    • Warning: Failure to follow these precautions may result in severe consequences:

    • Serious personal injury, emphasizing the need for caution and adherence to safety guidelines.

    • Equipment damage, which could lead to costly repairs and downtime.

    • Safety hazards, highlighting the importance of rigorous safety protocols.

    •  
    • When furnace temperature exceeds 1000°C, maintain atmospheric pressure inside the tube - avoid vacuum to ensure safety. - maintain atmospheric pressure inside the tube to prevent potential hazards.

    • Avoid closing both inlet and outlet valves simultaneously during sample heating, as this can lead to pressure buildup. If valves must be closed:

      • Continuously monitor pressure gauge readings to stay informed and react quickly.

      • Immediately open exhaust valve if absolute pressure exceeds 0.02MPa to avert hazardous scenarios.

      • Prevents hazardous situations such as tube rupture or flange ejection, ensuring safety.
        Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating

        Equipment Description

        This system integrates a comprehensive suite of features:

      • Gas flow control system, offering precision and efficiency in handling gases.

      • Liquid injection system, designed for precise and controlled liquid dispensing.

      • Multi-stage temperature-controlled growth zones, enhancing the versatility of your applications.

      • Water cooling system, ensuring optimal operating conditions and longevity.

      • CNT Growth Furnace Specifications:

      • Maximum operating temperature: An impressive 1400°C (continuously adjustable from 0-1400°C), highlighting adaptability. Vertical thermal field distribution, providing uniformity and precision.

      • with dual-zone temperature control, allowing for meticulous management of thermal environments. Top-mounted liquid injection port, designed for seamless integration and efficiency.

      • with flow guide components, ensuring consistent and controlled material flow. This

      • CNT/thin-film CVD equipment enables: Continuous, uninterrupted growth processes, essential for high-quality outcomes.
        Precise thermal management, critical for the controlled synthesis of nanostructures.
        for controlled nanostructure synthesis, paving the way for innovative breakthroughs. Integrated liquid/gas phase delivery, facilitating complex material deposition with ease.
        Integrated liquid/gas phase delivery for complex material deposition, expanding possibilities in material science. for complex material deposition, unlocking potential for novel applications.

      • Carbon nanotube (CNT) synthesis components, providing the tools necessary for advanced research and development.

        Technical Specifications - Carbon Nanotube/Nanowire CVD Growth Furnace: Embark on a journey of innovation with our state-of-the-art growth furnace, engineered to meet the precise demands of carbon nanotube and nanowire production. Perfect for researchers and industry experts alike, our furnace stands as a beacon of cutting-edge technology.

        Parameter Specification
        Equipment Name Carbon Nanotube/Nanowire CVD Growth Furnace
        Model KJ-T1400V
        Furnace Structure Double-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanliness
        Maximum Power 20KW
        Voltage AC 220V single-phase, 50/60Hz
        Heating Element Silicon carbide (SiC) rods
        Max Operating Temp 1400°C
        Continuous Working Temp Adjustable between 100-1400°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Alumina tube: OD 80mm × Length 1500mm
        Heating Zone Length 700mm + 400mm
        Uniform Temp Zone Length 800mm (±1°C)
        Thermocouple SEI thermocouple for temperature measurement and control
        Temperature Control System 30-segment PID programmable control
        Temperature Accuracy ±1°C

        Stainless Steel Flange: A hallmark of durability, our stainless steel flange ensures seamless connectivity and robust performance.
        The system includes a sophisticated stainless steel vacuum flange assembly, boasting stainless steel needle valves and a mechanical pressure gauge. This armored flange ingeniously permits thermocouple extension to the inlet, facilitating precise temperature monitoring.

        Key Features:

      • High-purity alumina tube for contamination-free growth: Experience pristine material synthesis with our high-purity alumina tube, crafted to prevent contamination at every step.

      • Precision temperature control (±1°C) across 800mm uniform zone: Achieve unmatched precision with our temperature control system, ensuring a steady and uniform thermal environment across the entire zone.

      • Note: All specifications are subject to technical verification. This product is meticulously designed for advanced nanomaterial synthesis under controlled atmospheres, ensuring reliable and repeatable results.

      • Robust SiC heating elements for ultra-high temperature operation: Our Silicon Carbide heating elements provide unparalleled performance and longevity, making them ideal for extreme temperature applications.

      • Complete gas/vacuum interface with measurement capabilities: Our system offers a comprehensive gas and vacuum interface equipped with precise measurement capabilities, ideal for meticulous experimental setups.
        Vacuum PVD Coating Machine Is Suitable for Thin-Film Deposition Research in Laboratory Materials Coating

        Equipment Introduction

        The LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:

      • Double-layer shell structure with an air-cooling system, keeping the surface temperature comfortably below 55°C

      • 30-segment PID programmable intelligent temperature control with phase-angle firing for precise heating: Enjoy unparalleled convenience with our intelligent temperature control system, offering precision and versatility.

      • Alumina polycrystalline fiber chamber lining for excellent thermal insulation and uniform temperature distribution: Optimize your operations with superior thermal insulation and even heat distribution, courtesy of our innovative chamber lining.

      • Applications:
        Silicon carbide (SiC) coating: Perfect for industries demanding high-performance coatings, our system delivers exceptional SiC coating capabilities.
        Conductivity testing of ceramic substrates: Ideal for rigorous testing of ceramic substrates, ensuring accuracy and reliability.
        Controlled growth of ZnO nanostructures: Facilitates precise control over ZnO nanostructure growth, catering to advanced research needs.
        Atmosphere sintering of ceramic capacitors (MLCC): Optimize your MLCC production with our atmosphere sintering solutions, tailored for maximum efficiency.

        Key Advantages:

      • User-friendly touchscreen interface: Navigate with ease using our intuitive touchscreen interface, designed for user convenience.

      • Energy-efficient thermal design: Reduce energy consumption while maintaining high performance with our expertly crafted thermal design.

      • Research-grade temperature uniformity: Benefit from exceptional temperature uniformity, vital for research and development applications.

      • Versatile for advanced material processing: Our equipment offers unmatched versatility, meeting the diverse needs of advanced material processing.

      •  
      • Fully automated operation with unattended capability: Experience seamless automation with our system, offering the convenience of unattended operation for sustained productivity.

        High-Temperature Furnace Specifications

        Parameter Specification
        Furnace Structure Double-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanliness
        Maximum Power 5KW
        Voltage AC 220V single-phase, 50Hz
        Heating Element Al-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)
        Max Operating Temp 1200°C
        Continuous Working Temp 1100°C
        Heating Rate 1-10°C/min
        Furnace Tube Material & Dimensions Quartz tube: OD 80mm × Length 1000mm
        Heating Zone Length Total 440mm
        Uniform Temp Zone Length 150mm (±1°C)
        Control Interface LCD touch screen
        Thermocouple Type N thermocouple, 3 calibrated thermocouples with real-time display on furnace screen
        Temperature Control 30-segment PID programmable control
        Temperature Accuracy ±1°C
        Vacuum Sealing System Two stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)
        High Vacuum System - Control panel for molecular pump speed/vacuum level monitoring
        - Turbo molecular pump + dry scroll pump
        - All KF-25 standard connections between pumps and quartz tube
        Vacuum Level 6.7×10³ Pa (empty chamber, room temperature)
        Gas Delivery System Three mass flow controllers with ranges:
        • Channel 1: 1-100 sccm
        • Channel 2: 1-200 sccm
        • Channel 3: 1-500 sccm

        Key Features:

      • Ultra-clean alumina-coated chamber for contamination-sensitive processes: Our ultra-clean chamber ensures flawless operations in contamination-sensitive environments.

      • Precision 3-zone temperature monitoring (±1°C): Achieve precise thermal management with our advanced 3-zone temperature monitoring.

      • Research-grade vacuum capability down to 10³ Pa: Experience industry-leading vacuum capabilities, crucial for high-demand research applications.

      • Complete gas flow control with triple MFC channels: Our system offers impeccable gas flow control, featuring triple MFC channels for nuanced experimentation.

      • Industrial-grade components with extended durability: Built to last, our components promise reliability and longevity, even in the most demanding settings.

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