Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage

Product Details
Customization: Available
Application Field: Aerospace, Automotive, Electronics, Marine, Medical Devices, Oil & Gas, Power Generation, Railways
Coating Material: Metal
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  • Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage
  • Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage
  • Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage
  • Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage
  • Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage
  • Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage
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Basic Info.

Model NO.
Made-to-order
Power Source
Electric
Transport Package
Wooden Case
Specification
Customized
Trademark
RJ

Product Description

Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample StageThis equipment is a single-target magnetron sputtering coater with a tiltable sample stage. The angle between the sample stage and the target surface is adjustable, and magnetron sputtering coater can be used to make films with specific growth angles. The appearance of the equipment is desktop level, which greatly reduces the installation site requirements. The equipment is equipped with a DC power supply, which can be used for sputtering of metal and other conductive materials. The vacuum system of the equipment adopts turbomolecular pump group, which has fast pumping speed, high ultimate vacuum degree and excellent vacuum performance. This equipment has a compact structure and perfect functions and is easy to use, and is very suitable for various coating tests.
Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage

magnetron sputtering coater technical parameters:

product name

single target magnetron sputtering coater   with tiltable sample stage

Product number

RJ-MSZ180-60Q-I-DC-Q

sample stage

Dimensions

φ60mm

Heating temperature

<=500ºC

Adjustable speed

<=20rpm

Magnetic target gun

Equipped with a two-inch magnetic control   target, target size: diameter 50.8mm, thickness <=3mm

vacuum chamber

Cavity size

φ180mm X150mm

observation window

omnidirectionally transparent

Cavity material

High purity quartz

Lower flange

Contains sample stage tilt mechanism and   rotation mechanism

Opening method

Removable top cover

Vacuum system

Backing pump

Low noise bipolar rotary vane pump

Molecular pump

Low noise and high pumping speed   turbomolecular pump

Vacuum measurement

Composite vacuum gauge, range: 10-5~105Pa

Air extraction interface

KF16

Air extraction interface

KF40

Exhaust interface

KF16

System vacuum

1.0×10-4Pa

Power supply

AC 220V 50/60Hz

Pumping rate

The pumping speed of the molecular pump   is 600L/s, and the pumping speed of the backing pump is 1.1L/s.

Power configuration

Number of power supplies

A set of DC power supply

Output Power

300W

Other parameters

Supply voltage

AC220V,50Hz

Total power

2kW

Overall size

550mm X 350mm X400mm

Lab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample StageLab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample StageLab Single Target Magnetron Sputtering Coating Machine with Tiltable Sample Stage

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