| Customization: | Available |
|---|---|
| Application Field: | Aerospace, Automotive, Electronics, Marine, Medical Devices, Oil & Gas, Power Generation, Railways |
| Coating Material: | Metal |
| Shipping Cost: | Contact the supplier about freight and estimated delivery time. |
|---|
| Payment Methods: |
|
|---|---|
| Support payments in USD |
| Secure payments: | Every payment you make on Made-in-China.com is protected by the platform. |
|---|
| Refund policy: | Claim a refund if your order doesn't ship, is missing, or arrives with product issues. |
|---|
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
CY-MSH500S-100F-II-DCRF-SS is a laboratory-specific magnetron sputtering coater with two target positions developed by our company. The magnetron sputtering coater equipment is equipped with a DC power supply and a radio frequency power supply, which can be used to prepare single or multilayer iron Electrical film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
a. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and speed, high coating rate, low sample temperature rise, and is a typical high-speed low-temperature sputtering.
b. The magnetron sputter target is equipped with a water-cooled interlayer. The water-cooled machine can effectively take away the heat and avoid the heat accumulation on the target surface, so that the magnetron sputter can work stably for a long time.
c. The sample stage adopts a reciprocating design, and the left side is equipped with a magnetic coupling push rod, which can push the sample stage left and right.
d. The whole machine adopts touch screen control, built-in one-button coating program, easy to operate, it is an ideal equipment for laboratory preparation of films
| Model | RJ-MSH500S-100F-II-DCRF-SS | |
| Input | AC220V,50Hz | |
| Total power | 6KW | |
| Ultimate vacuum degree | 5x10-4Pa | |
| Sample table parameters | Size | 100mm x 100mm |
| Reciprocating stroke | 200mm | |
| Magnetron sputtering head parameters | Quantity | 2-set, 2-inch |
| Cooling mode | Water cooled, required flow rate10L/min | |
| Water chiller | 10L/min circulating water cooling | |
| Vacuum chamber | Size | φ500mm x 490mm H |
| Material | Stainless steel | |
| Watch window | φ100mm | |
| Open mode | front opening door | |
| Gas flow controller | 1channel 200sccm Ar; | |
| Vacuum pump | Molecular pump system pumping 600L/S | |
| Film thickness gauge | Quartz vibrating film thickness gauge, one set, Resolution 0.10 Å | |
| Sputter power supply | DC power supply: one set, 500W, for preparing metal films RF power supply: one set, 500W, for non - metallic coating |
|
| Operating mode | All-in-one computer operation | |
| Overall dimensions | 1090mm x 900mm x 1250mm | |
| Total weight | 350kg | |
){kind=link}